Patents for C25D 7 - Electroplating characterised by the article coated (12,170)
02/2004
02/26/2004US20040035694 Contact assemblies, methods for making contact assemblies, and plating machines with contact assemblies for plating microelectronic workpieces
02/26/2004DE10237480A1 Process for coating a thermo-bimetal with a coating material comprises degreasing the surface of the bimetal to be coated, pickling the degreased surface, and depositing the coating material
02/26/2004CA2465363A1 Electrolytic copper plating solutions
02/25/2004EP1392092A1 COPPER PLATED CIRCUIT LAYER−CARRYING COPPER CLAD LAMINATED SHEET AND METHOD OF PRODUCING PRINTED WIRING BOARD USING THE COPPER PLATED CIRCUIT LAYER−CARRYING COPPER CLAD LAMINATED SHEET
02/25/2004EP1391540A2 Methods and apparatus for improved current density and feature fill control in ECD reactors
02/25/2004EP1391538A2 Chrome plated engine valve
02/25/2004EP1390967A2 Method of sealing wafer backside for full-face electrochemical plating
02/24/2004US6695962 Used to deposit, polish, or electro-polish metal films on a substrate, or to remove such metal films from such a substrate
02/24/2004US6695587 Gas turbine airfoil protected by aluminide and platinum aluminide coatings, and its preparation
02/24/2004US6694943 Cylinder for internal combustion engine and method of treating inner wall surface of the cylinder
02/19/2004US20040033904 Electrodepositing the metal layer on a biaxially textured metal substrate such that the surface of the metal layer has the same texture as that of the substrate.
02/19/2004US20040031693 Coating or coppering substrates such as semiconductor wafers in electrolytic cells to form electroconductive layers that are readily annealed at low temperatures; electrical and electronic apparatus
02/19/2004US20040031690 Conductive particles and method and device for manufacturing the same, anisotropic conductive adhesive and conductive connection structure, and electronic circuit components and method of manufacturing the same
02/19/2004US20040031461 Chrome plated engine valve
02/18/2004EP1389285A2 Structural components for the boiler zone of power plants or refuse incineration plants
02/18/2004CN1476740A Printed wiring board-use copper foil and copper clad laminated sheet using printed wiring board-use copper foil
02/17/2004US6693031 Formation of a metallic interlocking structure
02/17/2004US6692629 Flip-chip bumbing method for fabricating solder bumps on semiconductor wafer
02/17/2004US6691912 Methods of avoiding blowhole formation by conditioning through holes and glass
02/17/2004US6691763 Die manufacturing
02/12/2004WO2004013381A2 Insoluble anode loop in copper electrodeposition cell for interconnect formation
02/12/2004WO2003053621A3 Wire for high-speed electrical discharge machining
02/12/2004US20040029006 Smooth surfaces, fine crystal structure; tensile strength, elongation
02/12/2004US20040027718 Method for seed layer removal for magnetic heads
02/12/2004US20040026257 Methods and apparatus for improved current density and feature fill control in ECD reactors
02/12/2004US20040026255 Plating substrate; electrolytic cell containing ion exchanging membrane
02/12/2004US20040026254 Covering dielectric with electroconductive polymer active material; laser ablation
02/12/2004DE10235020A1 Device for etching large surface semiconductor wafers in a trough-shaped receiver containing a liquid electrolyte used in semiconductor manufacture comprises a testing head provided with a device for holding at least one wafer
02/12/2004DE10234285A1 Vorrichtung zur galvanischen Abscheidung prothetischer, metallischer Dentalformteile Apparatus for electrodepositing prosthetic, metallic, molded dental components
02/11/2004CN1138022C Equipment and technology for electroplating steel pipe inner wall by using auxiliary anode and spray-plating zinc solution
02/10/2004US6689686 System and method for electroplating fine geometries
02/10/2004US6689216 Filling copper into recesses for interconnects formed on a semiconductor and removing a plating liquid remaining on the substrate-contacting portion with suction
02/05/2004WO2004011188A1 Brazing product and method of manufacturing a brazing product
02/05/2004US20040022940 Can reinforce the thin portion of the seed layer and ensures complete filling with copper of the fine recesses, and which is so stable that its performance is not lowered after a long-term continuous use thereof.
02/05/2004US20040022009 Component formation via plating technology
02/05/2004US20040020783 Copper bath and methods of depositing a matt copper coating
02/05/2004US20040020781 Electro-chemical deposition cell for face-up processing of single semiconductor substrates
02/05/2004US20040020780 Connecting a power supply between a conductive layer on substrate and an electrode positioned in processing solution; immersing substrate into the processing solution; applying a forward electrical bias to conductive layer during immersion
02/05/2004US20040020779 Method and device for producing a galvanic layer on a substrate surface
02/05/2004DE10234122A1 Device for electrochemically processing a workpiece for electrophoretic or galvanic deposition comprises separately arranged electrodes which are impinged with a current produced by a current source
02/05/2004DE10232612A1 Vorrichtung und Verfahren zur Überwachung eines elektrolytischen Prozesses Apparatus and method for monitoring an electrolytic process
02/05/2004DE10229005A1 Vorrichtung und Verfahren zur elektrochemischen Metallabscheidung Apparatus and method for electro-chemical metal deposition
02/05/2004CA2493037A1 Brazing product and method of manufacturing a brazing product
02/04/2004EP1386984A1 Cathode cartridge for electroplating tester
02/04/2004EP1222321B1 Method and device for the electrolytic treatment of electrically conducting surfaces separated plates and film material pieces in addition to uses of said method
02/04/2004CN1473357A Substrate processing method
02/04/2004CN1473284A Mask forming and removing method, and semiconductor device, electric circuit, display module, color filter and emissive device manufactured by the same method
02/04/2004CN1473206A Plasma electroplating
02/04/2004CN1472794A Method for forming copper teading wires in semiconductor device
02/04/2004CN1137511C Method for galvanically forming conductor structures of high-purity copper in production of integrated circuits
02/04/2004CN1137510C Method for making semiconductor device
02/03/2004US6686607 Structure and method for mounting a semiconductor element
02/03/2004US6685817 Controlling thickness of plating over a width of a substrate
02/03/2004US6685815 Covering substrate supported within housing with electrolyte, displacing portion of electrolyte from housing prior to electrically biasing substrate, electrically biasing substrate
02/03/2004US6685814 Baffles, shields
01/2004
01/29/2004WO2004010464A2 Methods of electrochemically treating semiconductor substrates, and methods of forming capacitor constructions
01/29/2004WO2004009879A1 Plating device
01/29/2004WO2004009878A2 Electrochemical processing cell
01/29/2004WO2004009875A2 Tilted electrochemical plating cell with constant wafer immersion angle
01/29/2004WO2004009871A1 Multilayer plated fuel line parts for automobile
01/29/2004US20040018675 Nickel plating process having controlled hydrogen concentration
01/29/2004US20040018660 Method of fabricating multilayered UBM for flip chip interconnections by electroplating
01/29/2004US20040016648 For immersing a substrate for plating operations
01/29/2004US20040016647 Positioning substrate in a catholyte solution comprising acid source and copper source contained in a catholyte chamber of a plating cell, applying a plating bias between the substrate and an anode positioned in an anolyte chamber
01/29/2004US20040016637 Multi-chemistry plating system
01/29/2004US20040016636 Electrochemical processing cell
01/29/2004DE10229001A1 Verfahren und System zum Steuern der Ionenverteilung während des galvanischen Auftragens eines Metalls auf eine Werkstückoberfläche A method and system for controlling the distribution of ions during the galvanic depositing a metal on a workpiece surface
01/29/2004DE10228323A1 Verfahren zum Elektroplattieren von metallischen und Metallmatrix-Komposit Folien, Beschichtungen und Mikrokomponenten Method for electroplating of metal and metal matrix composite films, coatings and micro components
01/28/2004EP1384448A1 Apparatus for the electrolytic deposition on metallic prothetic dental elements
01/28/2004CN1470677A Plastic surface laser-carving and electroplating method
01/28/2004CN1470676A Apparatus for removing fir-tree crystal of metal strip edge
01/27/2004US6682642 Seed repair and electroplating bath
01/27/2004US6682220 Lightweight bearing and wave gear drive
01/22/2004WO2004007811A2 Device and method for monitoring an electrolytic process
01/22/2004WO2004007810A1 Electromagnetic wave shield material and process for producing the same
01/22/2004WO2004007809A2 Plain bearing having an overlay alloy layer
01/22/2004US20040013793 High aspect ratio; photoresists
01/22/2004US20040011655 For performing plating on a long conductive substrate
01/22/2004US20040011653 Methods of electrochemically treating semiconductor substrates, and methods of forming capacitor constructions
01/22/2004DE10326337A1 Vorrichtung zum Entfernen von Dendriten an den Kanten eines Metall-Bandes An apparatus for removing dendrites at the edges of a metal band
01/22/2004DE10228843A1 Verfahren zur chargenweisen Beschichtung von Sägedraht A method for the batchwise coating of saw wire
01/21/2004EP1382065A1 Electropolishing metal layers on wafers having trenches or vias with dummy structures
01/21/2004EP1381474A1 Internal heat spreader plating methods and devices
01/21/2004CN2600454Y Diamond internal blade plating forming device
01/21/2004CN2600453Y Foam Ni(Cu) and nickel net (felt) producing equipment
01/21/2004CN1469460A Thin film bearing belt for assembling electronic parts
01/21/2004CN1468982A Gold-plating apparatus and gold-plating method
01/21/2004CN1135307C Micro-valve and process for producing micro-valve
01/20/2004US6679983 Bath, source of metal ions, an electrolyte comprising two or more acids and optional additive(s); fill of small features with less overplate; copper electroplating
01/15/2004WO2004006228A2 Reflective or semi-reflective metal alloy coatings
01/15/2004WO2003090257A3 Method for the production of thin metal-containing layers having low electrical resistance
01/15/2004WO2002047139A3 Methode of forming a copper film on a substrate
01/15/2004US20040009659 Method of forming copper wiring in a semiconductor device
01/15/2004US20040007611 Asymmetric plating
01/15/2004US20040007478 Electroetching system and process
01/15/2004US20040007474 Electrolytic copper plating method, phosphorous copper anode for electrolytic plating method, and semiconductor wafer having low particle adhesion plated with said method and anode
01/15/2004US20040007473 Electrolyte/organic additive separation in electroplating processes
01/15/2004US20040007467 A vessel surface is shaped to provide a uniform current density at a microfeature semiconductor workpiece; electrodeposition, electroplating
01/15/2004US20040007459 Anode isolation by diffusion differentials
01/15/2004US20040006869 Method of manufacturing sheet material and method of manufacturing circuit device using the same
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