Patents for C25D 7 - Electroplating characterised by the article coated (12,170)
04/2004
04/14/2004EP1407062A1 Composite foil and its manufacturing process
04/14/2004EP1406739A1 Continuous casting roll for casting molten baths and method for producing one such continuous casting roll
04/14/2004CN1145719C Conductive roller in electroplating strip device and cooling method for said conductive roller
04/13/2004US6720089 Pure titanium panel with frame around margin to inhibit movement during heat treatment which forms decorative recrystallized area, including four interconnected elements with stiffening adjacent corners and contacting margin
04/08/2004WO2004019385A3 Coating support and method for the selective coating of conductive tracks on one such support
04/08/2004WO2004006228A3 Reflective or semi-reflective metal alloy coatings
04/08/2004WO2004001178A3 Method and apparatus for downhole pipe or casing repair
04/08/2004WO2003044248A8 Device for electrolytic treatment and hardening of the surface of the heat exchange tubes of steam generators of nuclear power plants
04/08/2004WO2002072923A3 Electrolyte media for the deposition of tin alloys and methods for depositing tin alloys
04/08/2004US20040065558 Electrolyte media for the deposition of tin alloys and methods for depositing tin alloys
04/08/2004US20040065556 Method for electroplating a cylindrical inside surface of a work-piece-extending substantially over a semi-circle
04/08/2004US20040065553 Contacting substrate with masking structure; multilayer, three-dimensional structure ; cycles; etching to remove residues
04/08/2004US20040065552 Method for electrochemical fabrication
04/08/2004US20040065543 Insoluble electrode for electrochemical operations on substrates
04/08/2004US20040065225 Electrodeposition; using gold sulfite complex; dental molding
04/08/2004US20040064951 Method of producing a workpiece having at least one bearing eye
04/08/2004US20040064950 Method of producing a workpiece forming at least one bearing eye
04/08/2004US20040064949 Method of producing a workpiece having at least one bearing eye
04/08/2004US20040064948 Method of producing a workpiece having at least one bearing eye
04/07/2004EP1405336A2 Substrate processing method
04/07/2004EP1404899A1 Method and electrode for defining and replicating structures in conducting materials
04/06/2004US6717236 Filling via with copper-rich copper-zinc alloy electroplated on copper surface from stable chemical solution, controlling zinc doping; improved interconnect reliability and corrosion resistance
04/06/2004US6716738 Method of fabricating multilayered UBM for flip chip interconnections by electroplating
04/06/2004US6716334 Electroplating process chamber and method with pre-wetting and rinsing capability
04/06/2004US6716329 Processing apparatus and processing system
04/01/2004WO2004003935A3 Cu ecp planarization by insertion of polymer treatment step between gap fill and bulk fill steps
04/01/2004US20040060825 Copper-plating liquid, plating method and plating apparatus
04/01/2004US20040060824 Chemical treatment, plating, and residue elimination method
04/01/2004US20040060581 Vertical proximity processor
04/01/2004US20040060580 Meniscus, vacuum, IPA vapor, drying manifold
04/01/2004US20040060573 Proximity head for drying a substrate; and a cleaning system for cleaning wafers
04/01/2004US20040060195 Methods and systems for processing a substrate using a dynamic Liquid meniscus
03/2004
03/31/2004EP1403401A2 Precious alloyed metal solder plating process
03/31/2004EP1402568A2 Method and apparatus for controlling a plating process
03/31/2004CN1143906C Process for depositing layer of material on substrate
03/30/2004US6711925 Process for manufacturing a conductive wire suitable for use in semiconductor packages
03/25/2004WO2003060959A3 Method for applying metal features onto barrier layers using electrochemical deposition
03/25/2004US20040056357 Circuit device and method of manufacturing the same
03/25/2004US20040055895 Electrodeposition of noble metal and one other metal for alloying with noble metal on the surface of a microelectronic workpiece, using an acid bath; electrolysis
03/25/2004US20040055893 Utilizes a vacuum chuck-type substrate holder configured to secure a substrate thereto with the back side of the substrate being in contact with the vacuum chuck and the production side being exposed to an electrolyte solution
03/25/2004US20040055890 ProvideS a film having a highly uniform thickness by plating; electric current limiting member limits horizontal flow of an electric current in the plating liquid between second electrode and substrate within plating vessel during plating
03/25/2004US20040055889 Using ultraviolet light; joining semiconductor die to substrate; prevent short circuiting
03/25/2004US20040055877 Workpiece processor having processing chamber with improved processing fluid flow
03/25/2004US20040055876 Cam driven paddle assembly for a plating cell
03/25/2004DE10242772A1 Galvanisierungseinrichtung Electroplating
03/25/2004DE10241619A1 Vorrichtung und Verfahren zum elektrolytischen Behandeln von zumindest oberflächlich elektrisch leitfähigem Behandlungsgut Method and apparatus for electrolytic treatment of at least superficially electrically conductive material to be treated
03/24/2004EP1400613A2 Tin plating method
03/24/2004EP1399385A2 Catalyst-induced growth of carbon nanotubes on tips of cantilevers and nanowires
03/24/2004CN1484714A Ni-plated steel plate for alkali-manganese dry cell anode can and alkali manganese dry cell anode can
03/23/2004US6709564 Electrodepositing copper; organic additive increases throwing power, leveling, suppresses deposition rate; copper salts increase overvoltage; copper pyrophosphate; cyanide, halide, thiocyanate, sulfamate; 2,5-dimercapto-1,3,4-thiadiazole
03/23/2004US6709563 Copper-plating liquid, plating method and plating apparatus
03/23/2004US6709562 Void-free and seamless; copper is superior to the electromigration resistance of alcu
03/18/2004WO2004022814A2 Device and method for electrolytically treating an at least superficially electrically conducting work piece
03/18/2004WO2003093524A3 Apparatus and method for regulating the electrical power applied to a substrate during immersion
03/18/2004US20040053509 Fluid treatment system
03/18/2004US20040053077 Magnetic film and thin film magnetic head using this magnetic film
03/18/2004US20040053019 Printed wiring board-use copper foil and copper clad laminated sheet using the printed wiring board-use copper foil
03/18/2004US20040051999 Soft magnetic film and thin film magnetic head using the same
03/18/2004US20040050711 Substrate is brought into contact, at least once, with a processing solution containing at least one of organic substance and sulfur compound which are contained in a plating solution
03/18/2004DE202004000597U1 Decorative metal material, e.g. for a fountain pen cap, has a black chrome layer which is plated to the metal surface and forms a bond between the substrate surface and the paint layer
03/17/2004EP1398400A2 Apparatus for galvanisation
03/17/2004EP1397828A1 Electrolytic processing device and substrate processing apparatus
03/17/2004EP1397530A2 Apparatus and methods for electrochemical processing of microelectronic workpieces
03/17/2004CN1482286A Galvanization apparatus and process of tube-type crystallizer
03/16/2004US6706418 For use in electroplating printed circuit boards and other electronic packaging devices
03/16/2004US6706166 Method for improving an electrodeposition process through use of a multi-electrode assembly
03/11/2004WO2004020704A1 Apparatus and method for deposition of an electrophoretic emulsion
03/11/2004US20040045832 Methods for using the solutions and products formed by using such methods and solutions in which the solutions contain copper alkanesulfonate salts and free alkanesulfonic acids, wherein the free acid has a concentration from about 0.05 to
03/11/2004US20040045831 Apparatus for electro-chemically depositing a metal onto a substrate. The apparatus generally includes a head assembly having a cathode and a wafer holder disposed above the cathode. The apparatus further includes a process kit disposed
03/11/2004US20040045813 Wafer processing apparatus, wafer stage, and wafer processing method
03/11/2004US20040045502 Apparatus for and method of processing substrate
03/10/2004CN1480988A Filming method of substrate and filming appts.
03/10/2004CN1480563A Electrolytic copper foil and electrolytic copper foil for secondary cell collector
03/09/2004US6703145 Process for electrolytic coating of a substrate and product produced
03/04/2004WO2004019385A2 Coating support and method for the selective coating of conductive tracks on one such support
03/04/2004WO2004018740A1 Surface treated steel plate for battery cases, its manufacturing method, battery case formed using the steel plate, battery using the battery case
03/04/2004WO2004018739A1 Surface treated steel plate for battery cases and battery case using same
03/04/2004WO2003090257B1 Method for the production of thin metal-containing layers having low electrical resistance
03/04/2004US20040043609 Method of fabricating semiconductor device
03/04/2004US20040043242 Copper foil for chip-on-film use, plasma display panel, or high-frequency printed circuit board
03/04/2004US20040041194 Metal plating using seed film
03/04/2004US20040040855 Bonding pads; integrated circuit dies; multilayers; electroconductive and dielectric layers
03/04/2004CA2496131A1 Coating support and method for the selective coating of conductive tracks on one such support
03/03/2004EP1394291A2 Copper foil for chip-on-film use, plasma display panel, or high-frequency printed circuit board
03/03/2004EP1392889A1 Anode assembly and process for supplying electrolyte to a planar substrate surface
03/03/2004CN1479565A 布线基板及其制造方法 Wiring board and manufacturing method thereof
03/03/2004CN1479391A Surface treatment steel plate for battery case, battery case and battery using the case
03/02/2004US6699396 Methods for electroplating large copper interconnects
03/02/2004US6699380 Robotic transferring between cells
03/02/2004US6699373 Apparatus for processing the surface of a microelectronic workpiece
02/2004
02/26/2004WO2004017384A1 Device for etching semiconductors with a large surface area
02/26/2004WO2004016829A2 Electrolytic copper plating solutions
02/26/2004WO2003018878A3 Segmented counterelectrode for an electrolytic treatment system
02/26/2004US20040038148 Positive type radiation-sensitive resin composition for producing product formed by plating and process for producing product formed by plating
02/26/2004US20040038052 Microelectronic workpiece for electrochemical deposition processing and methods of manufacturing and using such microelectronic workpieces
02/26/2004US20040038049 Release layer, a diffusion preventive layer and a copper electroplating layer; printed circuits
02/26/2004US20040037682 Substrate holder, plating apparatus, and plating method
02/26/2004US20040035712 An electrical apparatus comprising tank, chucks, shaft and drives, for electrodepositing a copper layer on a substrate, cleaning or etching, uniformity deposition from a solution
02/26/2004US20040035707 For plating copper onto semiconductor wafer; methods apply to patterned metal layers plated onto seed layer partially protected by overlying photoresist; sealing performed by engaging seal against photoresist to prevent corrosion
02/26/2004US20040035695 Flow diffuser to be used in electro-chemical plating system
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