Patents for C25D 7 - Electroplating characterised by the article coated (12,170)
06/2004
06/24/2004WO2004053202A1 Methods for forming copper interconnect structures by co-plating of noble metals and structures formed thereby
06/24/2004WO2004053193A1 Peel strength enhancement of copper laminates 102426-201
06/24/2004WO2004052547A2 Coated and magnetic particles and applications thereof
06/24/2004WO2004010464B1 Methods of electrochemically treating semiconductor substrates, and methods of forming capacitor constructions
06/24/2004US20040118699 Homogeneous copper-palladium alloy plating for enhancement of electro-migration resistance in interconnects
06/24/2004US20040118696 electrolytically treating a copper or copper alloy substrate with a solution of phosphoric acid and a carboxylic acid, and electrodepositing tin or tin alloy; reduced tendency to form whiskers
06/24/2004US20040118694 Multi-chemistry electrochemical processing system
06/24/2004US20040118692 Plating-rinse-plating process for fabricating copper interconnects
06/24/2004US20040118690 successive conditioning, Pd activation, electroless copper plating, and electrolytic copper plating treatments; irradiation with ultraviolet light in the presence of treatment solution; resin is activated to improve copper adhesion
06/24/2004US20040118676 Plating apparatus and plating method
06/23/2004EP1432016A2 A plating-rinse-plating process for fabricating copper interconnects
06/23/2004EP1431424A2 Plating apparatus and plating method
06/23/2004EP1430167A2 Plating apparatus and method
06/23/2004EP1430166A2 Electrolyte media for the deposition of tin alloys and methods for depositing tin alloys
06/23/2004CN1506502A Method and equipment for controlling local electric current to obtain uniform electroplating thickness
06/23/2004CN1506501A Electroplating liquid
06/23/2004CN1155111C Method for producing solar cell precursor thin film and solar cell
06/22/2004US6752915 Web conveying apparatus, and apparatus and method for electrodeposition using web conveying apparatus
06/22/2004US6752884 Method for manufacturing mesh screen of electrodeless lighting system
06/22/2004US6752855 For providing substrate such as a semiconductor wafer solution treatment
06/17/2004WO2004052062A1 Device for the metallisation of printed forms which are equipped with electrically conductive tracks and associated metallisation method
06/17/2004WO2004050937A2 Method for coating piston rings for internal combustion engines
06/17/2004US20040116004 Method for producing male terminal fittings and terminal fitting
06/17/2004US20040115932 Method and apparatus for controlling local current to achieve uniform plating thickness
06/17/2004US20040115340 Depositing particles comprising at least one coating on a substrate; andreflowing the particles to at least partially melt the coating, thereby forming a substantially continuous solidified solder material
06/17/2004US20040113244 Package substrate manufactured using electrolytic leadless plating process, and method for manufacturing the same
06/17/2004US20040112760 Constant low force wafer carrier for electrochemical mechanical processing and chemical mechanical polishing
06/17/2004US20040112634 Method for plating polymer molding material, circuit forming component and method for producing circuit forming component
06/17/2004DE10256063A1 Verfahren zum Beschichten von Kolbenringen für Verbrennungsmotoren A process for coating of piston rings for internal combustion engines
06/16/2004EP1429429A1 A method for producing male terminal fittings and terminal fitting
06/16/2004EP1428982A1 A method of depositing a local MCrAIY-coating
06/16/2004EP1427872A1 Electrode attachment to anode assembly
06/16/2004EP1427656A1 Belt apparatus for carrying elements during treatment
06/16/2004CN1505141A Structure comprising a barrier layer of a tungsten alloy and manufacturing method thereof
06/15/2004US6750597 Method for manufacturing spark plug and spark plug
06/15/2004US6750144 Method for electrochemical metallization and planarization of semiconductor substrates having features of different sizes
06/15/2004US6749728 Methods and apparatus for holding and positioning semiconductor workpieces during electropolishing and/or electroplating of the workpieces
06/15/2004US6749391 Microelectronic workpiece transfer devices and methods of using such devices in the processing of microelectronic workpieces
06/10/2004WO2004048825A1 Gland packing and process for producing the same
06/10/2004WO2004038072A3 Plating uniformity control by contact ring shaping
06/10/2004WO2004009875A3 Tilted electrochemical plating cell with constant wafer immersion angle
06/10/2004US20040108217 Forming aperture in dielectric overcoating substrate; forming barrier; plating with copper alloy
06/10/2004US20040108213 Plating bath composition control
06/10/2004US20040108199 Device for electrodepositing metallic, prosthetic, molded, dental components
06/10/2004US20040108136 Structure comprising a barrier layer of a tungsten alloy comprising cobalt and/or nickel
06/09/2004EP1425067A2 Radioactive implantable devices and methods and apparatuses for their production and use
06/09/2004EP1070159A4 Electrodeposition of metals in small recesses using modulated electric fields
06/09/2004DE20320396U1 Veredelungsanlage zum Veredeln von langgestrecktem Wickelgut Processing plant for finishing long winding
06/09/2004CN1503345A Method of forming planar Cu interconnects without chemical mechanical polishing
06/09/2004CN1502725A Wafer electroplating device and method
06/09/2004CN1152983C Device for segregating metal from electrolytic solution containing metal
06/08/2004US6746591 ECP gap fill by modulating the voltate on the seed layer to increase copper concentration inside feature
06/08/2004US6746578 Selective shield/material flow mechanism
06/03/2004WO2004046426A1 Integrated plating and planarization process and apparatus therefor
06/03/2004WO2004046418A1 Substrate processing apparatus and method for processing substrate
06/03/2004US20040106235 Method for manufacturing circuit devices
06/03/2004US20040104120 Wafer chuck assembly for holding a wafer
06/03/2004US20040104119 Electronic apparatus for plating copper onto substrate, a support of a detachable cathode clamp ring positioned at perimeter of the substrate; anode assembly is movable in a direction perpendicular to substrate, fluid inlets
06/03/2004US20040103921 Method for electrochemically treating articles and apparatus and method for cleaning articles
06/03/2004DE10261852B3 Mixture of di-, tri- and other oligomeric phenazinium compounds, used in copper electroplating bath for decorative plating or plating circuit board or semiconductor substrate, is prepared from monomer by diazotization and boiling
06/02/2004EP1424407A1 Plating bath for forming thin resistance layer, method of formation of resistance layer, conductive base with resistance layer, and circuit board material with resistance layer
06/02/2004CN2618928Y 边缘罩 Edge cover
06/02/2004CN1152430C Manufacture of wire holder in double electroplating mold
06/01/2004US6743719 Method for forming a conductive copper structure
06/01/2004US6743532 Multi-layer coating, nickel basecoat layer, and a layers of carbon- rich refractory metal or refractory metal alloy carbonitride alternating with layers of nitrogen-rich refractory metal or refractory metal alloy carbonitride.
05/2004
05/27/2004WO2004044273A1 Electropolishing system and process
05/27/2004WO2004044270A1 Anode for electrometallurgical applications
05/27/2004US20040101708 Coated article
05/27/2004US20040099534 Overcoating barrier or seed layer with copper, or other metal; connecting electrode to edges of wafer; applying potentials
05/27/2004US20040099533 Microelectronics; positioning contactors; concentric anodes; nozzles; electroplating
05/27/2004US20040099532 Using insulating shield; electrochemical plating bath; uniform current distribution
05/26/2004EP1422320A1 Copper electroplating bath
05/26/2004EP1352110B1 Electrodeposited bearing alloy, electroplating bath, and electrodeposition method
05/26/2004EP1228267B1 Process and apparatus for cleaning and/or coating metal surfaces using electro-plasma technology
05/26/2004EP0859877B1 Flexible continuous cathode contact circuit for electrolytic plating of c4, tab microbumps, and ultra large scale interconnects
05/26/2004CN1500057A Belt appts. for carrying elements during treatment
05/26/2004CN1151009C Fabricating interconnects and tips using sacrificial substrates
05/25/2004US6741085 Contact carriers (tiles) for populating larger substrates with spring contacts
05/25/2004US6740426 Lead, copper alloy dispersed with silicon nitride particles; automobile, boat bearings; wear and friction resistance
05/25/2004US6740425 Electroless deposition using catalyst
05/25/2004US6740242 For forming an interconnection by embedding copper in fine interconnection groove defined in surface of semiconductor substrate through copper sulfate plating
05/25/2004US6740221 Positioning substrate in an electroplating bath; forming doped copper layer on substrate; wherein the doped copper layer comprises an amount of non-metal that is controlled for increasing electromigration resistance in doped copper layer
05/25/2004US6740164 Plating apparatus and method of manufacturing semiconductor device
05/21/2004WO2004042790A2 Method for increasing the copper to superconductor ratio in a superconductor wire
05/20/2004US20040097070 Method of producing metal film
05/20/2004US20040094511 Method of forming planar Cu interconnects without chemical mechanical polishing
05/20/2004US20040094427 Includes a table with a polishing pad; the table and pad have holes forming channels for dispensing electroplating solution; plurality of electroplating anodes disposed in the channels and in contact with the electroplating solution
05/20/2004US20040094403 Integrated plating and planarization apparatus having a variable-diameter counterelectrode
05/19/2004EP1419523A1 Dummy structures to reduce metal recess in electropolishing process
05/19/2004EP1419290A2 Segmented counterelectrode for an electrolytic treatment system
05/19/2004EP1419289A1 Device for continuous electrodeposition and electrical or electronic components manufactured in strip comprising a plated layer by electrodeposition
05/19/2004EP1341951B1 Copper bath and method of depositing a matt copper coating
05/19/2004EP1325176B1 Method for electroplating a strip of foam
05/19/2004DE10251658A1 Verfahren zum Verbinden von zur Herstellung von Mikrostrukturbauteilen geeigneten, mikrostrukturierten Bauteillagen sowie Mikrostrukturbauteil A method of joining for the production of microstructured components suitable micro-structured component layers, as well as micro-structural component
05/19/2004CN1498290A Phosphate film processing method and film processing device
05/19/2004CN1497691A Manufacturing method of circuit device
05/19/2004CN1150353C Method for forming zinc-oxide film and method of preparing semiconductor element matrix and photoelectric elements
05/18/2004US6736953 High frequency electrochemical deposition
05/18/2004US6736945 Wafer plating apparatus
05/18/2004US6736204 Heat transfer surface with a microstructure of projections galvanized onto it
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