Patents for C25D 7 - Electroplating characterised by the article coated (12,170)
03/2005
03/24/2005US20050061676 System for electrochemically processing a workpiece
03/24/2005US20050061661 Electrodeposition device and electrodeposition system for coating structures which have already been made conductive
03/24/2005US20050061659 Plating apparatus and plating method
03/24/2005DE19748926B4 Verfahren zum Galvanisieren einer siliciumhaltigen Aluminiumlegierung, Zylinderblock aus einer siliciumhaltigen Aluminiumlegierung Method of electroplating a silicon-containing aluminum alloy cylinder block of a silicon-containing aluminum alloy
03/24/2005DE19746703B4 Galvanisiervorrichtung Plating apparatus
03/24/2005CA2532451A1 Device and method for electrolytically treating electrically insulated structures
03/23/2005EP1516943A2 Protective coating for turbine engine component
03/23/2005EP1516357A2 Substrate holder and plating apparatus
03/23/2005EP1516076A1 Process for electroplating metallic and metall matrix composite foils, coatings and microcomponents
03/23/2005CN1599809A Pretreatment process for coating of aluminium materials
03/23/2005CN1599513A Ultra-thin copper foil with carrier and method of producing ultra-thin copper foil with carrier and printed circuit board,
03/23/2005CN1597290A Metal mould for processing plastic gloves and its production method
03/22/2005US6869516 Spraying a vapor mixture of isopropyl alcohol and nitrogen to effectively remove electrolyte residue from the contact ring
03/22/2005US6869515 Providing substrate with electroconductive surface; providing electrochemical deposition cell; immersing substrate in electrolyte; providing uniform powerful turbulent agitation; providing electroplating current for filling openings
03/22/2005US6869510 Methods and apparatus for processing the surface of a microelectronic workpiece
03/22/2005CA2139207C Sliding parts and method of producing same
03/17/2005US20050058945 Reduces the tendency of the copper etch step from under-cutting the nickel/gold to cause slivers that cause short circuiting by providing a conforming nickel/gold layer that extends down the side of the traces
03/17/2005US20050056542 Plating tool, plating method, electroplating apparatus, plated product, and method for producing plated product
03/17/2005US20050056541 Enclosing in tubal shield; connecting to cathode; immersion into bath
03/17/2005US20050056538 Insoluble anode with an auxiliary electrode
03/17/2005DE19861248B4 Electrodeposition unit for semiconductor wafer coating - has anode with central opening to promote uniform deposited layer thickness
03/16/2005EP1514957A1 Method for manufacturing plated film, cathode roll for plating, and method for manufacturing circuit board
03/16/2005EP1513968A1 Components for electrical connectors, and metal strip therefore
03/16/2005EP1409772B1 Method for selectively electroplating a strip-shaped, metal support material
03/16/2005EP1204787B1 Method for continuous nickel-plating of an aluminium conductor and corresponding device
03/16/2005CN1193115C Electrolytic copper-plated R-T-B magnet and method thereof and electrolytic copper solution
03/15/2005US6868214 Optical waveguide, method of fabricating the waveguide, and optical interconnection device using the waveguide
03/15/2005US6867136 Method for electrochemically processing a workpiece
03/15/2005US6866765 Electrolytic copper-plated R-T-B magnet and plating method thereof
03/15/2005US6866764 Electroless deposition using organometallic polymer and organosilicon polymer; forming copper film
03/15/2005US6866763 Thickness profile control member is included that has first and second regions that allow for processing at first and second rates different from each other; for planar deposition or etching of conductive layers in integrated circuits
03/10/2005WO2005021822A1 Method for producing a hardened steel part
03/10/2005WO2005021821A1 Method for producing hardened parts from sheet steel
03/10/2005WO2005021820A1 Method for producing a hardened profile part
03/10/2005WO2004013381A3 Insoluble anode loop in copper electrodeposition cell for interconnect formation
03/10/2005WO2003056609A3 Apparatus and method for electroplating a wafer surface
03/10/2005US20050053772 Electrophotography; transferring visible images
03/10/2005US20050051437 Having porous member (plating solution impregnated member), the plating apparatus being capable of handling and easily controlling composition of plating soution; especially for electroless deposition of copper or silver; for filling fine interconnect pattern in semiconductor substrate
03/10/2005US20050051435 Spray coating the inner wall surface of a hollow body, more specifically of a pin holder of an igniter, with gold, the one end side of which is open and comprises there a perimeter edge; for electrical igniter units for igniting fuels; for air bags or for belt tighteners in automotive vehicles
03/10/2005US20050051433 System for monitoring, dosing and distribution of a chemical composition in a material treatment process, the chemical composition containing at least one additive for maintaining quality of the chemical treatment process; particularly directed to the field of management of electroplating bath solutions
03/10/2005US20050050767 Wet chemical processing chambers for processing microfeature workpieces
03/09/2005EP1415021A4 Copper on invar composite and method of making
03/09/2005EP1257694A4 Conditioning of through holes and glass
03/09/2005EP1148976B1 Method and apparatus for deposition on and polishing of a semiconductor surface
03/09/2005CN1592800A Electrolytic copper plating solutions
03/09/2005CN1590597A Copper electroplating film method
03/09/2005CN1590594A Plating method
03/09/2005CN1590591A Multi-porous Ni foil for cathode of alkaline battery method for mfg. Ni foil and mfg. device thereof
03/09/2005CN1192690C Copper clad laminated sheet and its mfg. method
03/08/2005US6863991 Coated biperiodic metallic mesh arrays with molecular monolayers and lipid bilayers thereon
03/08/2005US6863795 Plating a wafer by exposing to a first solution of a sulfur depolarizing compound to brighten and level; exposing to a metal compound solution, applying a current; elimination of depletion/monitoring of additives and defects (bumps)
03/08/2005US6863441 Sliding member
03/03/2005WO2005019504A1 Method of preparing printed or daubed image and printed or daubed image element by it
03/03/2005WO2005018688A1 Sanitary hose with an antimicrobial finish
03/03/2005WO2005018311A2 Fishhook
03/03/2005US20050048775 Depositing a tantalum film
03/03/2005US20050048769 Method of manufacturing a semiconductor device
03/03/2005US20050048306 Method of producing ultra-thin copper foil with carrier, ultra-thin copper foil with carrier produced by the same, printed circuit board, multilayer printed circuit board and chip on film circuit board
03/03/2005US20050045488 Copper electrodeposition in microelectronics
03/03/2005US20050045486 Plating method and plating solution
03/03/2005US20050045485 Reducing or avoiding pitting; utilizing such as amine based polyalkylene oxide; reliable interconnect formation for ultra large scale integration microcircuits
03/03/2005US20050045474 Contact assemblies for electrochemical processing of microelectronic workpieces and method of making thereof
03/03/2005US20050045473 Device for galvanizing member-shaped substrates
03/03/2005DE10337748A1 Elektrisch leitfähiges Material Electrically conductive material
03/03/2005DE10212436B4 Vorrichtung zur Behandlung von strangförmigem metallischen Gut und ihre Verwendung Apparatus for treating strand-metallic material and their use
03/02/2005EP1511366A2 Method of producing ultra-thin copper foil with carrier, ultra-thin copper foil with carrier produced by the same, printed circuit board, multilayer printed circuit board and chip on film circuit board
03/02/2005EP1510601A1 Apparatus for electroplating wafers
03/02/2005CN1586890A Nickel plated metal printing masterplate and its producing method
03/02/2005CN1191605C Method and apparatus for holding and positioing semiconductor workpieces during electropolishing and/or electroplating of the workpieces
03/02/2005CN1191392C Galvanic bath, method for producing structurded hard chromium layers and use thereof
03/01/2005US6861355 Metal plating using seed film
03/01/2005US6860981 Minimizing whisker growth in tin electrodeposits
03/01/2005US6860769 Cathode contact pin for an electroplating process
02/2005
02/24/2005WO2005018021A1 Battery case-use surface-treated steel sheet, battery case and battery using it
02/24/2005WO2005016017A1 Emulsions
02/24/2005US20050042886 System for ultraviolet atmospheric seed layer remediation
02/24/2005US20050042868 Method for forming plating film
02/24/2005US20050040141 Wire for high-speed electrical discharge machining
02/24/2005US20050040049 Electrochemical depositing copper on a semiconductor wafer, chemical mechanical polishing of the conductive surface; deliverying solution to anode cavity, applying a potential
02/24/2005US20050040046 Electrochemical deposition system for depositing copper on a semiconductor substrate; transfer system is within same apparatus to prevent contamination of copper seeding layer
02/24/2005DE202004015858U1 Fire extinguishing fitting for hygienically conveying drinking water is made from aluminum or aluminum alloy completely or partially coated with tin
02/24/2005DE102004030018A1 Gleitelement Slider
02/24/2005DE102004030017A1 Gleitelement Slider
02/23/2005EP1508385A1 System for ultraviolet cleaning
02/23/2005EP1507900A1 Copper laminate, composite lamellar material comprising said copper laminate and a procedure for producing it
02/23/2005EP1507612A1 Method for the galvanic coating of a continuous casting mould
02/23/2005EP1419290B1 Segmented counterelectrode for an electrolytic treatment system
02/23/2005CN1585835A Electropolishing assembly and methods for electropolishing conductive layers
02/23/2005CN1191003C Device and method for treating circuit supports with impulse excitation
02/23/2005CN1190520C Copper electroplating method
02/22/2005US6858479 Low resistivity copper conductor line, liquid crystal display device having the same and method for forming the same
02/22/2005US6858123 An electroplating solution comprising copper sulfate, sulfuric acid, hydrochloride, an ethylene oxide adduct or polyethylene glycol, hydroxylamine sulfate, and hydroxyl amine chloride; making semiconductors
02/22/2005US6858122 Nickel electroplating solution
02/22/2005US6858121 Method and apparatus for filling low aspect ratio cavities with conductive material at high rate
02/17/2005WO2005015627A1 Substrate processing apparatus, substrate processing method, and substrate holding apparatus
02/17/2005WO2005015623A2 Reduction of defects in conductive layers during electroplating
02/17/2005US20050037620 Method for achieving wafer contact for electro-processing
02/17/2005US20050037580 Manufacturing method for semiconductor device
02/17/2005US20050035347 Probe card assembly
02/17/2005US20050034994 Method and apparatus for full surface electrotreating of a wafer
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