| Patents for C23F 1 - Etching metallic material by chemical means (16,062) |
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| 07/20/2006 | US20060156983 Low temperature, atmospheric pressure plasma generation and applications |
| 07/20/2006 | DE102005007743A1 Druckfähiges Medium zur Ätzung von Siliziumdioxid- und Siliziumnitridschichten Printable medium for etching silicon dioxide and silicon nitride layers |
| 07/19/2006 | EP1681716A1 Jig for heat treating semiconductor substrate and method for heat treating semiconductor substrate |
| 07/19/2006 | EP1681373A1 Composition for increasing the adhesion of polymeric materials to metal surfaces |
| 07/19/2006 | EP1680810A2 Methods and apparatus for optimizing a substrate in a plasma processing system |
| 07/19/2006 | CN1806066A Atmospheric pressure non-thermal plasma device to clean and sterilize the surface of probes, cannulas, pin tools, pipettes and spray heads |
| 07/19/2006 | CN1804536A Surface treatment process for heat sink of air conditioner |
| 07/19/2006 | CN1804153A Process for treating a semiconductor wafer with a gaseous medium, and semiconductor wafer treated by this process |
| 07/18/2006 | US7078809 Chemical leadframe roughening process and resulting leadframe and integrated circuit package |
| 07/18/2006 | US7078350 Methods for the optimization of substrate etching in a plasma processing system |
| 07/18/2006 | US7077975 Using mixture of mineral acids |
| 07/18/2006 | US7077974 Fine-dimension masks and related processes |
| 07/18/2006 | US7077973 Methods for substrate orientation |
| 07/18/2006 | US7077929 Apparatus for manufacturing a semiconductor device |
| 07/18/2006 | US7077918 Stripping apparatus and method for removal of coatings on metal surfaces |
| 07/18/2006 | CA2204812C Method for removing a diffusion coating from a nickel base alloy |
| 07/13/2006 | WO2006072479A1 Method for producing a turbine part and a turbine part |
| 07/13/2006 | US20060154151 Method for quartz photomask plasma etching |
| 07/13/2006 | US20060151433 Method for removing and recoating of diamond-like carbon films and its products thereof |
| 07/13/2006 | US20060151431 Surface treatment of concrete |
| 07/13/2006 | US20060151429 Plasma processing method |
| 07/13/2006 | US20060151428 Method for roughening a surface of a body, and optoelectronic component |
| 07/13/2006 | US20060151117 Semiconductor producing device and semiconductor producing method |
| 07/13/2006 | US20060151116 Focus rings, apparatus in chamber, contact hole and method of forming contact hole |
| 07/13/2006 | US20060151115 Dry stripping equipment comprising plasma distribution shower head |
| 07/13/2006 | US20060151114 Plasma processing system and baffle assembly for use in plasma processing system |
| 07/13/2006 | US20060151112 Substrate treating system, substrate treating device, program, and recording medium |
| 07/13/2006 | US20060151110 Method and apparatus for controlled slurry distribution |
| 07/13/2006 | US20060150914 Plasma process device |
| 07/13/2006 | US20060150911 Plasma generating electrode, plasma generator, and exhaust gas cleaner |
| 07/12/2006 | CN1802456A Method for regenerating etching solutions containing iron for the use in etching or pickling copper or copper alloys and an apparatus for carrying out said method |
| 07/11/2006 | US7075701 micro electro mechanical systems(MEMS) mirror layouts monolithically integrated with complementary metal oxides semiconductors (CMOS) for controlling microelectronics; integrated circuits; heat resistance |
| 07/11/2006 | US7074342 Method of manufacturing optical crystal element of laser |
| 07/06/2006 | WO2006071816A2 Window protector for sputter etching of metal layers |
| 07/06/2006 | WO2006071556A2 Methods for removing black silicon and black silicon carbide from surfaces of silicon and silicon carbide electrodes for plasma processing apparatuses |
| 07/06/2006 | WO2006071544A2 Methods for silicon electrode assembly etch rate and etch uniformity recovery |
| 07/06/2006 | WO2004114461A3 Plasma production device and method and rf driver circuit with adjustable duty cycle |
| 07/06/2006 | US20060144825 Dual reduced agents for barrier removal in chemical mechanical polishing |
| 07/06/2006 | US20060144824 Method of polishing a silicon-containing dielectric |
| 07/06/2006 | US20060144823 Etching solution for D-defect evaluation in silicon wafer and evaluation method using the same |
| 07/06/2006 | US20060144822 Apparatus and method for wet-etching |
| 07/06/2006 | US20060144821 Method for engraving irreproducible pattern on the surface of a diamond |
| 07/06/2006 | US20060144820 Remote chamber methods for removing surface deposits |
| 07/06/2006 | US20060144819 Remote chamber methods for removing surface deposits |
| 07/06/2006 | US20060144818 System for detecting film quality variation and method using the same |
| 07/06/2006 | US20060144815 Treatment method for surface of photoresist layer and method for forming patterned photoresist layer |
| 07/06/2006 | US20060144814 Imprint lithography |
| 07/06/2006 | US20060144778 Low stress, ultra-thin, uniform membrane, methods of fabricating same and incorporation into detection devices |
| 07/06/2006 | US20060144520 Viewing window cleaning apparatus |
| 07/06/2006 | US20060144519 Coaxial type impedance matching device and impedance detecting method for plasma generation |
| 07/06/2006 | US20060144518 Plasma processing apparatus and plasma processing method |
| 07/06/2006 | US20060144517 Plasma producing apparatus and doping apparatus |
| 07/06/2006 | US20060144516 Apparatus for spatial and temporal control of temperature on a substrate |
| 07/06/2006 | US20060144427 Plasma cleansing apparatus that eliminates organic and oxidative contaminant and may effectively dissipate heat and eliminate exhaust gas and integrated system for the same |
| 07/06/2006 | US20060144336 Heater of chemical vapor deposition apparatus for manfuacturing a thin film |
| 07/05/2006 | EP1676938A1 Method of manufacturing a component part of a turbine and a component of a turbine |
| 07/05/2006 | EP1676931A2 Aluminium alloy for lithographic sheet |
| 07/05/2006 | EP1676294A2 Thermal processing system with cross flow injection system with rotatable injectors |
| 07/05/2006 | CN1798874A 蚀刻剂和蚀刻方法 Etchant and etching method |
| 07/05/2006 | CN1798864A Plasma uniformity |
| 07/05/2006 | CN1798862A Disk coating system |
| 07/05/2006 | CN1796604A Chemical corrosion liquid in high selection ratio of gallium arsenide in aluminum arsenide / gallium arsenide |
| 07/04/2006 | US7072743 Semiconductor manufacturing gas flow divider system and method |
| 07/04/2006 | US7070699 Bistable microelectromechanical system based structures, systems and methods |
| 07/04/2006 | US7070657 Method and apparatus for depositing antireflective coating |
| 06/29/2006 | WO2006069085A2 An in-situ chamber clean process to remove by-product deposits from chemical vapor etch chamber |
| 06/29/2006 | WO2006068971A2 Sequentially alternating plasma process parameters to optimize a substrate |
| 06/29/2006 | WO2006068958A2 Non-contact discrete removal of substrate surface contaminants/coatings, and method, apparatus, and system for implementing the same |
| 06/29/2006 | WO2006068091A1 Fine treatment agent and fine treatment method using same |
| 06/29/2006 | WO2005076814A3 Injector for plasma mass filter |
| 06/29/2006 | US20060141794 Plasma system and method for anisotropically etching structures into a substrate |
| 06/29/2006 | US20060138086 Planarizing the silica with an aqueous mixture of a carboxy polymer, abrasive, polyvinylpyrrolidone, and optionally a cationic compound, phthalic acid or salts, and a zwitterionic compound; followed by cleaning with a aqueous quaternary ammonium compound, phthalic acid, carboxy polymer and abrasive |
| 06/29/2006 | US20060138085 Plasma etching method with reduced particles production |
| 06/29/2006 | US20060138084 Selective reactive ion etching of wafers |
| 06/29/2006 | US20060138083 Patterning and alteration of molecules |
| 06/29/2006 | US20060138082 Method and apparatus for determining consumable lifetime |
| 06/29/2006 | US20060138081 Methods for silicon electrode assembly etch rate and etch uniformity recovery |
| 06/29/2006 | US20060138078 Semiconductor device fabrication method |
| 06/29/2006 | US20060138077 Method of making an angled tip for a scanning force microscope |
| 06/29/2006 | US20060137822 Lateral temperature equalizing system for large area surfaces during processing |
| 06/29/2006 | US20060137821 Window protector for sputter etching of metal layers |
| 06/29/2006 | US20060137820 Plasma processing apparatus |
| 06/29/2006 | US20060137712 Cleaning apparatus and method for electronic device |
| 06/29/2006 | US20060137710 Method for controlling corrosion of a substrate |
| 06/29/2006 | US20060137612 Methods and apparatus for downstream dissociation of gases |
| 06/29/2006 | US20060137611 Plasma apparatus |
| 06/29/2006 | US20060137607 Combination of showerhead and temperature control means for controlling the temperature of the showerhead, and deposition apparatus having the same |
| 06/29/2006 | DE102004060507A1 Verfahren zur elektrochemischen Abtragung von Refraktärmetallen oder -legierungen und Lösung zur Durchführung dieses Verfahrens Method for the electrochemical removal of refractory metals and alloys and solution for implementing this method |
| 06/28/2006 | EP1674598A1 Solution for the selective removal of metal from aluminium substrates |
| 06/27/2006 | USRE39143 Method for making a wafer-pair having sealed chambers |
| 06/27/2006 | US7067351 Selectively-etched nanochannel electrophoretic and electrochemical devices |
| 06/27/2006 | US7067178 flame spraying ceramics on substrate to form electrostatic chucks including electrodes, then sealing apertures on the surfaces with polymethyl methacrylate; supports for semiconductor wafers |
| 06/27/2006 | US7067068 Method for preventing lead from dissolving from a lead-containing copper-based alloy |
| 06/27/2006 | US7067034 Method and apparatus for plasma forming inner magnetic bucket to control a volume of a plasma |
| 06/27/2006 | US7067033 Chemical liquid processing apparatus for processing a substrate |
| 06/22/2006 | US20060134921 Plasma etching process |
| 06/22/2006 | US20060134919 Processing system and method for treating a substrate |
| 06/22/2006 | US20060134917 Reduction of etch mask feature critical dimensions |
| 06/22/2006 | US20060131790 Plasma process for removing excess molding material from a substrate |
| 06/22/2006 | US20060131277 comprises hydrofluoric acid (buffered), ammonium fluoride, potassium fluoride, sodium fluoride, ethylene glycol, and water, for removal of tantalum or tantalum nitride; semiconductors, photoresists |