Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23F - Non-mechanical removal of metallic material from surfaces; Inhibiting corrosion of metallic material; Inhibiting incrustation in general; Multi-step processes for surface treatment of metallic material involving at least one process provided for in class and at least one process covered by subclass  or or class › C23F 1 - Etching metallic material by chemical means
Patents for C23F 1 - Etching metallic material by chemical means (16,062)
11/2005
11/17/2005US20050255705 Prevention of electrostatic wafer sticking in plasma deposition/etch tools
11/17/2005US20050252884 Method and system for predicting process performance using material processing tool and sensor data
11/17/2005US20050252609 Apparatus and method for demetallizing a metallized film
11/17/2005US20050251990 Plasma uniformity control by gas diffuser hole design
11/17/2005DE102004020768A1 Plasmareaktor mit hoher Produktivität Plasma reactor with high productivity
11/16/2005EP1595976A1 Film-forming apparatus component and method for cleaning same
11/16/2005EP1595974A2 Plasma uniformity control by gas diffuser hole design
11/16/2005CN1697153A Multiple zone carrier head with flexible membrane
11/16/2005CN1696349A Etching liquid for removing oxyde film, and its prepn. method and method of mfg. semiconductor device
11/16/2005CN1696348A Etching solution for silver alloy
11/16/2005CN1696347A Controllable type etching equipment of microbe
11/16/2005CN1696346A Wet etching equipment
11/15/2005US6964724 Etching and cleaning methods and etching and cleaning apparatuses used therefor
11/15/2005CA2292381C Method of removing hot corrosion products from a diffusion aluminide coating
11/10/2005WO2005106081A1 Method and system for selectively coating or etching surfaces
11/10/2005WO2005061378A3 Equipment and process for creating a custom sloped etch in a substrate
11/10/2005US20050247675 Treatment of dies prior to nickel silicide formation
11/10/2005US20050247672 Plasma etching method
11/10/2005US20050247667 Apparatus and method for treating substrate
11/09/2005CN1694228A Electric liquid chamber and method of processing substrate in the chamber
11/09/2005CN1226456C Hydrogen peroxide soaking process for separating waste zinc containing nickel alloy sheet
11/09/2005CN1226455C Method for reeliminating residual polymer by carbon fluoride reaction gas etching technology
11/09/2005CN1226454C Method and device of monitoring ion concentration in etching cavity body in sputtering etching process
11/09/2005CN1226453C Technology for generating vein on Al alloy surface by direct chemical etching
11/08/2005US6962823 Methods of making, positioning and orienting nanostructures, nanostructure arrays and nanostructure devices
11/08/2005US6961981 electrically connecting electrodes formed on a resonator piece; short circuit prevention; layering the resonator piece with two electrodes, a dielectric, noble metal and metal under layers; etching a resistive mask; surface coating
11/03/2005WO2005103333A2 Wafer heater assembly
11/03/2005WO2005103332A2 Improved micro-fluid ejection assemblies
11/03/2005WO2005021156A3 Capillary imprinting technique
11/03/2005WO2005000363B1 Atmospheric pressure non-thermal plasma device to clean and sterilize the surface of probes, cannulas, pin tools, pipettes and spray heads
11/03/2005US20050244756 Etch rate control
11/03/2005US20050244274 Method for removing aluminide coating from metal substrate and turbine engine part so treated
11/03/2005US20050242062 Substrate processing method, substrate processing apparatus, and semiconductor device manufacturing method
11/03/2005US20050242060 Plasma processing method
11/03/2005US20050241955 Substrate processing apparatus and substrate processing method
11/03/2005US20050241770 Substrate cleaning apparatus and method
11/03/2005US20050241769 Plasma processing apparatus and plasma processing method
11/03/2005US20050241768 High frequency plasma generator and high frequency plasma generating method
11/03/2005US20050241767 Multi-piece baffle plate assembly for a plasma processing system
11/03/2005US20050241766 Apparatus including gas distribution member supplying process gas and radio frequency (RF) power for plasma processing
11/03/2005US20050241765 Apparatus including showerhead electrode and heater for plasma processing
11/03/2005US20050241764 Baffle to reduce azimuthal etch asymmetry
11/03/2005US20050241762 Alternating asymmetrical plasma generation in a process chamber
11/03/2005US20050241760 Wet etching system
11/03/2005US20050241679 Applying a chromous or aluminum ferrous material; using alkaline solution and oxidizer; spraying
11/03/2005DE102004018817A1 Removing material substrate surface for manufacturing semiconductor integrated circuits and devices by introducing pressurized processing solution in vessel to expose surface to processing solution
11/02/2005EP1592050A1 Method for manufacturing semi-transparent semi-reflective electrode substrate, reflective element substrate, method for manufacturing same, etching composition used for the method for manufacturing the reflective electrode substrate
11/02/2005EP1591545A1 Eco-friendly stripping of chromium-plated plastic materials and extension to Cr-plated passivatable metallic substrates
11/02/2005EP1590188A2 A door skin, a method of etching a plate for forming a wood grain pattern in the door skin, and an etched plate formed therefrom
11/02/2005CN1692475A Plasma etching chamber and plasma etching system using same
11/01/2005US6960536 Method for producing integrated microsystems
11/01/2005US6960521 Method and apparatus for polishing metal and dielectric substrates
11/01/2005US6960413 Multi-step process for etching photomasks
11/01/2005US6960314 Molding of fastening hooks and other devices
11/01/2005US6960305 Methods for forming and releasing microelectromechanical structures
10/2005
10/27/2005WO2005101100A2 Method and apparatus for in-situ film stack processing
10/27/2005WO2005100638A1 Etching method and etching liquid
10/27/2005WO2005100637A1 Liquid treatment device and liquid treatment method
10/27/2005WO2005100636A2 Techniques for packaging and encapsulating components of diagnostic plasma measurement devices
10/27/2005US20050238811 Composition and method for preparing chemically-resistant roughened copper surfaces for bonding to substrates
10/27/2005US20050236359 Copper/copper alloy surface bonding promotor and its usage
10/27/2005US20050236275 Method of using an etchant solution for removing a thin metallic layer
10/27/2005US20050236111 Processing apparatus
10/27/2005US20050236109 Plasma etching apparatus and plasma etching method
10/27/2005DE102005012356A1 Wet-etch composition for manufacturing e.g. electrode of a capacitor for semiconductor device comprises peracetic acid and fluorinated acid
10/26/2005CN2736371Y Device for removing aluminum layer on the back of nano alumina template
10/26/2005CN1689150A Method for eliminating voiding in plated solder
10/26/2005CN1688749A Method for removing a layer area of a component
10/26/2005CN1688748A Compositions of transition metal species in dense phase carbon dioxide and methods of use thereof
10/25/2005US6958312 No corrosion of copper
10/20/2005WO2005098091A2 A method of plasma etch endpoint detection using a v-i probe diagnostics
10/20/2005WO2005074661A3 Rf sensor clamp assembly
10/20/2005US20050233588 Semiconductor constructions
10/20/2005US20050233477 Substrate processing apparatus, substrate processing method, and program for implementing the method
10/20/2005US20050231851 Manufacturing method of magnetic head slider, magnetic head slider and magnetic device
10/20/2005US20050231557 Micro-fluid ejection assemblies
10/20/2005US20050230356 Methods of making, positioning and orienting nanostructures, nanostructure arrays and nanostructure devices
10/20/2005US20050230351 Plasma processing method and apparatus
10/20/2005US20050230350 In-situ dry clean chamber for front end of line fabrication
10/20/2005US20050230261 Electrochemical fabrication methods incorporating dielectric materials and/or using dielectric substrates
10/20/2005US20050230049 Method and apparatus for plasma processing
10/20/2005US20050230048 Liner for use in processing chamber
10/20/2005US20050230045 Etching apparatus, a method of controlling an etching solution, and a method of manufacturing a semiconductor device
10/19/2005EP1587131A2 Plasma reactor with high productivity
10/19/2005EP1586007A2 Electron beam processing for mask repair
10/19/2005CN1684224A Methods and array for creating a mathematical model of a plasma processing system
10/19/2005CN1683589A Surface contact improver for copper and copper alloy and its usage
10/19/2005CN1224298C Electric plasma processing device
10/13/2005WO2005095673A1 Stripping solution and use thereof
10/13/2005WO2005095108A2 Method for the production of surface and depth variable embossing tools
10/13/2005WO2005094404A2 Semiconductor manufacturing gas flow divider system and method
10/13/2005US20050224462 Method of etching a glass substrate
10/13/2005US20050224459 Etching solution, etched article and method for etched article
10/13/2005US20050224457 Method and apparatus for repairing shape, and method for manufacturing semiconductor device using those
10/13/2005US20050224456 Anisotropic dry etching of cu-containing layers
10/13/2005US20050224454 Method for manufacturing a fast heat rise resistor
10/13/2005US20050224182 Plasma processing apparatus
10/13/2005US20050224181 Method and apparatus for in-situ film stack processing
10/12/2005EP1583669A2 Improved surface for use on implantable device
10/12/2005EP0766820B1 The production of electrodes for electrochemical sensing
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