Patents for C23F 1 - Etching metallic material by chemical means (16,062)
01/2007
01/30/2007CA2396936C Method of surface treatment for stainless steel product for fuel cell
01/30/2007CA2228489C Low lead release plumbing components made of copper based alloys containing lead, and a method for obtaining the same
01/25/2007WO2006036753A3 Methods and apparatus for tuning a set of plasma processing steps
01/25/2007US20070020944 Selective etch process of a sacrificial light absorbing material (slam) over a dielectric material
01/25/2007US20070020936 Methods of etching features into substrates
01/25/2007US20070017903 Method for Treating an Etching Solution
01/25/2007US20070017901 Method and apparatus for etching disk-like member
01/25/2007US20070017900 edge region with no defects larger than or equal to 0.3 .mu.m
01/25/2007US20070017898 Method and apparatus for photomask plasma etching
01/25/2007US20070017897 Multi-frequency plasma enhanced process chamber having a toroidal plasma source
01/25/2007US20070017895 Mask, mask chip, manufacturing method of mask, manufacturing method of mask chip, and electronic device
01/25/2007US20070017637 Inductively coupled plasma processing apparatus
01/25/2007US20070017636 Plasma source and plasma processing apparatus
01/25/2007US20070017635 Device for controlling dispensing error in photo spinner equipment
01/25/2007US20070017446 Apparatus to treat a substrate
01/25/2007DE112005000485T5 System und Verfahren zur Aufteilung einer Gasströmung bei der Halbleiter-Herstellung System and method for dividing a flow of gas in the semiconductor manufacturing
01/24/2007EP1322550B1 Metal bearing membranes
01/24/2007CN2861181Y Regeneration and copper recovery device for copper chloride acid etching liquid
01/23/2007US7166186 Laser decapsulation apparatus and method
01/23/2007US7166185 Forming system for insulation film
01/23/2007US7166165 Barrier coating for vitreous materials
01/23/2007US7166017 Slurry for CMP, polishing method and method of manufacturing semiconductor device
01/23/2007US7165560 Oxidizing an incompletely oxidized compound containing at least a metal and silicon and formed on a surface of a substrate; removing the oxidized compound by wet etching,wherein first step includes irradiating the compound with ultraviolet light in an oxygen-containing atmosphere
01/18/2007WO2007008677A2 Load port module
01/18/2007US20070015364 Method for avoiding exposure of void caused by dielectric gap-filling, and fabricating process and structure of dielectric film
01/18/2007US20070012661 Silicon nitride passivation layers having oxidized interface
01/18/2007US20070012659 High aspect ratio etch using modulation of RF powers of various frequencies
01/18/2007US20070012658 Pvd component and coil refurbishing methods
01/18/2007US20070012657 Plasma spraying liquid crystalline polymer on surface of component by feeding liquid crystalline polymer powder into plasma flame to form molten or heat-softened particles, where liquid crystalline polymer particles form plasma sprayed coating on outermost surface of component; minimizes contamination
01/18/2007US20070012656 Selective chemical etch method for MRAM soft layers
01/18/2007US20070012654 MEMS switch and method for manufacturing the same
01/18/2007US20070012653 Method of making an X-Y axis dual-mass tuning fork gyroscope with vertically integrated electronics and wafer-scale hermetic packaging
01/18/2007US20070012652 Imprint lithography utilizing silated acidic polymers
01/18/2007US20070012403 Neutral beam etching device for separating and accelerating plasma
01/18/2007US20070012401 Plasma processing apparatus
01/17/2007CN1899003A Etching solution, method of etching and printed wiring board
01/17/2007CN1897334A Magnesium-polar board surface chemical corrosion treatment for seawater battery
01/17/2007CN1897228A Anisotropic wet etching of silicon
01/17/2007CN1896324A Extraction of copper from waste etching liquid in chloride system circuit board
01/17/2007CN1896314A Stabilized decoating liquid
01/17/2007CN1896313A Decoating liquid
01/16/2007US7164571 Wafer stage with a magnet
01/16/2007US7164236 Method and apparatus for improved plasma processing uniformity
01/16/2007US7164209 Methods of positioning and/or orienting nanostructures
01/16/2007US7163639 Metallic building element for optoelectronics
01/16/2007US7163587 Reactor assembly and processing method
01/16/2007US7163017 Polysilicon etch useful during the manufacture of a semiconductor device
01/11/2007WO2007004431A1 Method of forming high-resolution pattern and apparatus therefor
01/11/2007WO2006091588A3 Etching chamber with subchamber
01/11/2007WO2005112093A3 Gas distribution system having fast gas switching capabilities
01/11/2007US20070010095 Surface treatment method using ion beam and surface treating device
01/11/2007US20070009345 Load port module
01/11/2007US20070007245 Silicon wafer reclamation method and reclaimed wafer
01/11/2007US20070007244 Detection of loss of plasma confinement
01/11/2007US20070007243 Ion beam etching method and ion beam etching apparatus
01/11/2007US20070007242 Method and system for producing crystalline thin films with a uniform crystalline orientation
01/11/2007US20070007237 Method for self-assembling microstructures
01/11/2007US20070006972 Wafer pre-clean reactor cable termination for selective suppression/reflection of source and bias frequency cross products
01/11/2007US20070006971 Plasma generation and control using a dual frequency rf source
01/10/2007EP1741128A2 Gas distribution system having fast gas switching capabilities
01/10/2007EP1741124A2 Segmented baffle plate assembly for a plasma processing system
01/10/2007CN1892994A Etching apparatus and technology thereof
01/10/2007CN1892834A Method for manufacturing substrate for discrete track recording media and method for manufacturing discrete track recording media
01/10/2007CN1891862A Composition for removing conductive materials and manufacturing method of array substrate using the same
01/10/2007CN1891142A Microelectrode making method and apparatus
01/10/2007CN1294631C Etching agent
01/10/2007CN1294294C Chemical etching method for zinc oxide material
01/10/2007CN1294016C Base of liquid jet device and method for producing substrate-penetrating opening
01/09/2007US7160847 Water solution using in metal surface treating process and process for removing oxidized film and burred edge using the same
01/09/2007US7160493 Retaining ring for use on a carrier of a polishing apparatus
01/09/2007US7160417 Cassette for a load-lock
01/09/2007US7160416 Substrate treating apparatus
01/04/2007WO2006071556A3 Methods for removing black silicon and black silicon carbide from surfaces of silicon and silicon carbide electrodes for plasma processing apparatuses
01/04/2007WO2005110699A3 Method of patterning a conductive layer on a substrate
01/04/2007US20070004213 Method for fabricating semiconductor device with gate
01/04/2007US20070004208 Plasma etching apparatus and plasma etching method
01/04/2007US20070003844 Method for adjusting dimensions of photomask features
01/04/2007US20070000875 Method and apparatus for assisting laser material processing
01/04/2007US20070000874 Method and apparatus for polishing a substrate
01/04/2007US20070000873 Substrate processing method and semiconductor device manufacturing method
01/04/2007US20070000870 Plasma processing method
01/04/2007US20070000869 Etching method in a semiconductor processing and etching system for performing the same
01/04/2007US20070000868 Dry etching method
01/04/2007US20070000867 Plasma processing method and apparatus thereof
01/04/2007US20070000866 Patterning and alteration of molecules
01/04/2007US20070000865 Printing substrate for liquid crystal display, and manufacturing method thereof
01/04/2007US20070000864 Piezoelectric material working method
01/04/2007US20070000863 Method for dry etching fluid feed slots in a silicon substrate
01/04/2007US20070000862 Low loss SOI/CMOS compatible silicon waveguide and method of making the same
01/04/2007US20070000861 Method and apparatus for manufacturing magnetic recording media
01/04/2007US20070000860 Method for fabricating semiconductor device
01/04/2007US20070000613 Electric field mediated chemical reactors
01/04/2007US20070000611 Plasma control using dual cathode frequency mixing
01/04/2007US20070000610 Etching method in a semiconductor processing and etching system for performing the same
01/04/2007US20070000609 Etching apparatus
01/04/2007US20070000608 Chamber isolation valve RF grounding
01/03/2007EP1739196A1 Rare earth metal member of high surface purity and making method
01/03/2007CN1889812A Etching removing method and etching solution in manufacturing print wiring substrate using semi-additive process
01/03/2007CN1293618C Rotary etcher with thickness measuring system
01/03/2007CN1293612C Gaseous diffusion plate used in induction coupling plasma etching apparatus
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