Patents for C23F 1 - Etching metallic material by chemical means (16,062)
05/2006
05/04/2006US20060090848 Laser processing apparatus and laser processing method
05/04/2006US20060090700 Gas-introducing system and plasma CVD apparatus
05/04/2006DE102004053135A1 Process for removing a coating containing a chromium and/or chromium oxide compound from a component comprises placing the component in a bath containing an alkanol-amine compound as inhibitor and removing after a treatment time
05/04/2006DE10006990B4 Anlage zur Rückgewinnung von Säuren aus metallhaltigen Lösungen dieser Säuren Plant for recovery of acids from metal-containing solutions of these acids
05/03/2006EP1651794A1 Method of manufacturing vacuum plasma treated workpieces and system for vacuum plasma treating workpieces
05/03/2006CN1768005A Potassium hydrogen peroxymonosulfate solutions
05/03/2006CN1767145A Vacuum treatment device
05/03/2006CN1254860C Manufacturing method of circuit device
05/03/2006CN1254561C Aqueous solution composition with metal surface treatment
05/02/2006US7037849 Process for patterning high-k dielectric material
04/2006
04/27/2006WO2006044724A1 Method and system for wafer temperature control
04/27/2006WO2006044722A2 Apparatus and methods for improving the stability of rf power delivery to a plasma load
04/27/2006WO2006044198A2 Heat transfer system for improved semiconductor processing uniformity
04/27/2006WO2006043696A1 Filter for purifying hydrogen and method for manufacture thereof
04/27/2006US20060088774 Photomask blank, photomask and fabrication method thereof
04/27/2006US20060086692 Plasma etching method
04/27/2006US20060086691 Porous material and production process thereof
04/27/2006US20060086690 Dielectric etching method to prevent photoresist damage and bird's beak
04/27/2006US20060086689 Method of fabricating microneedles
04/27/2006US20060086463 Substrate processing apparatus and substrate processing method
04/27/2006US20060086460 Developing treatment apparatus
04/27/2006US20060086459 Laser processing apparatus and laser processing method
04/27/2006US20060086319 Processing gas supply mechanism, film forming apparatus and method, and computer storage medium storing program for controlling same
04/27/2006DE10248481B4 Verfahren und Vorrichtung zur nasschemischen Behandlung von Silicium Method and apparatus for wet-chemical treatment of silicon
04/26/2006EP1649503A2 Process sequence for photoresist stripping and/or cleaning of photomasks for integrated circuit manufacturing
04/26/2006CN1764739A Solution for etching copper surfaces and method of depositing metal on copper surfaces
04/26/2006CN1253527C Etching liquid composition
04/25/2006US7034688 Selective metal removal process for metallized retro-reflective and holographic films and radio frequency devices made therewith
04/25/2006US7034319 Electron beam irradiation apparatus, electron beam irradiation method, original disk, stamper, and recording medium
04/25/2006US7033943 Etching solution, etching method and method for manufacturing semiconductor device
04/25/2006US7033942 Chemical mechanical polishing composition and process
04/25/2006US7033516 Inexpensive fabrication of large-area pixel arrays for displays and sensors
04/25/2006US7033444 Plasma processing apparatus, and electrode structure and table structure of processing apparatus
04/25/2006US7033442 System and method for ventilation in the fabrication of integrated circuits
04/25/2006CA2264908C Method for anisotropic etching of structures in conducting materials
04/20/2006WO2006041656A2 Methods and apparatus for monitoring a process in a plasma processing system by measuring a plasma frequency
04/20/2006WO2006041153A1 Method for manufacturing electroconductive pattern and electronic device, and electronic device
04/20/2006US20060084275 Etch stop structure and method of manufacture, and semiconductor device and method of manufacture
04/20/2006US20060084271 Systems, methods and slurries for chemical mechanical polishing
04/20/2006US20060081559 Plasma processing apparatus and plasma processing method
04/20/2006US20060081558 Plasma immersion ion implantation process
04/20/2006US20060081338 Spinning apparatus
04/20/2006US20060081337 Capacitive coupling plasma processing apparatus
04/20/2006US20060081336 Atmospheric pressure non-thermal plasma device to clean and sterilize the surfaces of probes, cannulas, pin tools, pipettes and spray heads
04/20/2006US20060081335 Semiconductor substrate processing apparatus and semiconductor device fabrication method
04/20/2006US20060081327 Belt and method of marking
04/20/2006DE102004049825A1 To remove the protective coating from the surface of an aircraft engine gas turbine vane, for surface repair, the coating is broken down by a chemical for removal by blasting while untreated surfaces are shrouded against chemical attack
04/19/2006CN1253059C Chemical-corrosive process for substrate
04/19/2006CN1252802C Method for etching bismuth-containing oxide films
04/19/2006CN1252320C Composition for removing aluminium surface stain
04/18/2006US7030035 Prevention of electrostatic wafer sticking in plasma deposition/etch tools
04/18/2006US7030034 Methods of etching silicon nitride substantially selectively relative to an oxide of aluminum
04/18/2006US7029597 Anodized aluminum etching process and related apparatus
04/18/2006US7029596 Computer integrated manufacturing control system for oxide chemical mechanical polishing
04/18/2006US7029591 Planarization with reduced dishing
04/13/2006WO2006039193A2 Rf ground switch for plasma processing system
04/13/2006WO2006038990A2 Method for treating a substrate
04/13/2006WO2006038975A2 Method and system for improving coupling between a surface wave plasma source and a plasma space
04/13/2006US20060076315 Semiconductor device manufacturing method and semiconductor device manufacturing apparatus
04/13/2006US20060076313 Etching process and patterning process
04/13/2006US20060076312 Method of modifying an etched trench
04/13/2006US20060076109 Method and apparatus for controlling temperature of a substrate
04/13/2006US20060076108 Method and apparatus for controlling temperature of a substrate
04/13/2006US20060075971 Heated substrate support and method of fabricating same
04/13/2006US20060075969 Heat transfer system for improved semiconductor processing uniformity
04/13/2006US20060075968 Leak detector and process gas monitor
04/13/2006US20060075626 Electroplating a small quantity of noble metal on the apex of a single crystal metal wire that has been etched to form a tip in low concentration noble metal electrolyte in a base aqueous liquid; annealing in vacuum or in inert gas ambient to diffuse the additional electroplated noble metal atoms
04/12/2006EP1646091A2 Etching liquid composition
04/12/2006CN1759205A Method for manufacturing utensil for drinking water system made from lead-containing copper alloy, cast and lead-removed utensil for drinking water system, and utensil for drinking water system
04/12/2006CN1758420A Preparation method of deep groove and its etching mixing liquid
04/12/2006CN1757795A Special hot state silicon washing film forming agent for high parameter boiler
04/12/2006CN1757794A Chemical etching preparation technology of titanium alloy and etching agent used in said technology
04/12/2006CN1251331C 半导体器件 Semiconductor devices
04/12/2006CN1250772C Electroplating pretreatment solution and electroplating pretreatment method
04/11/2006US7027703 Method for forming and apparatus comprising optical waveguides leading to a free space coupler region
04/11/2006US7026253 Method for fabricating semiconductor device using ArF photolithography capable of protecting tapered profile of hard mask
04/11/2006US7026173 Method and apparatus for detecting end point
04/11/2006US7025896 Process for treating solid surface and substrate surface
04/11/2006US7025895 Plasma processing apparatus and method
04/11/2006US7025892 Method for creating gated filament structures for field emission displays
04/11/2006US7025857 Plasma treatment apparatus, matching box, impedance matching device, and coupler
04/11/2006US7025856 Processing materials inside an atmospheric-pressure radiofrequency nonthermal plasma discharge
04/11/2006US7025854 Method and apparatus for aligning and setting the axis of rotation of spindles of a multi-body system
04/11/2006US7025831 Apparatus for surface conditioning
04/06/2006WO2006036820A2 Methods and apparatus for monitoring a process in a plasma processing system by measuring impedance
04/06/2006WO2006036753A2 Methods and apparatus for tuning a set of plasma processing steps
04/06/2006US20060073627 Probe for a scanning probe microscope and method for fabricating same
04/06/2006US20060073619 Semiconductor fabricating apparatus and method and apparatus for determining state of semiconductor fabricating process
04/06/2006US20060070703 Method & apparatus to improve plasma etch uniformity
04/06/2006US20060070702 Substrate processing system for performing exposure process in gas atmosphere
04/06/2006US20060070522 Desublimator for aluminum chloride
04/06/2006DE10308134B4 Verfahren zur Verringerung der Bleiauslaugung in Trinkwasserversorgungssystemen A method of reducing lead release in water supply systems
04/06/2006DE102005005229A1 Electronic component e.g. CMOS-transistor, producing process, involves isolating dielectric layer from another layer on basis of oxide-containing material and etching former layer with etching solution from aqueous sulfuric acid
04/06/2006DE102004045956A1 Etching holder for use in etching system, has fixing unit that is adjustable, so that substrate is inserted into holder to form etching medium free area, and integrated radiation guidance beginning/ending at upper surface that limits area
04/05/2006EP1643817A1 Etching solution, method of etching and printed wiring board
04/05/2006CN1249521C Mask and method for mfg. same, and method for manufacturing electric light emitting apparatus
04/04/2006US7022612 Method of removing etch residues
04/04/2006US7022254 Chromate-free method for surface etching of titanium
04/04/2006US7022251 Methods for forming a conductor on a dielectric
03/2006
03/30/2006WO2005065433A3 Electrochemical fabrication methods incorporating dielectric materials and/or using dielectric substrates