Patents for C23F 1 - Etching metallic material by chemical means (16,062)
12/2005
12/29/2005US20050284576 Method and apparatus for treating wafer edge region with toroidal plasma
12/29/2005US20050284574 Plasma processing apparatus and processing method
12/29/2005US20050284573 Bare aluminum baffles for resist stripping chambers
12/29/2005US20050284572 Heating system for load-lock chamber
12/29/2005US20050284571 Dry-etching method and apparatus
12/29/2005US20050284570 Diagnostic plasma measurement device having patterned sensors and features
12/29/2005US20050284568 Removing unwanted film from wafer edge region with reactive gas jet
12/29/2005DE102004031834A1 Treating circuit boards comprises preparing pure or treated etching solution from a process solution container of the etching machine, feeding the consumed etching solution to a treatment station and returning to the container
12/28/2005EP1610365A1 Material for purification of semiconductor polishing slurry, module for purification of semiconductor polishing slurry and process for producing semiconductor polishing slurry
12/28/2005EP1609847A1 Cleaning composition for semiconductor components and process for manufacturing semiconductor device
12/28/2005EP1608591A1 Potassium hydrogen peroxymonosulfate solutions
12/28/2005CN1713078A Bare aluminum baffles for resist stripping chambers
12/28/2005CN1712567A Regeneration device and method for acid etching liquid
12/28/2005CN1712506A Cleaning composition for semiconductor components and process for manufacturing semiconductor device
12/28/2005CN1233874C Laser electrochemical micromanufacturing apparatus
12/27/2005US6979652 Etching multi-shaped openings in silicon
12/27/2005US6979647 Method for chemical etch control of noble metals in the presence of less noble metals
12/27/2005US6979408 Method and apparatus for photomask fabrication
12/27/2005CA2483224C Bipolar plate assembly, fuel cell stacks and fuel cell systems incorporating the same
12/22/2005WO2005120675A1 Method for treating of etching acid waste containing phosphoric acid, acetic acid and nitric acid
12/22/2005WO2005082774A3 Method for making a planar cantilever mems switch
12/22/2005US20050280331 Two-axis device and manufacturing method therefor
12/22/2005US20050279732 Methods for sidewall etching and etching during filling of a trench
12/22/2005US20050279729 Probes for use in scanning probe microscopes and methods of fabricating such probes
12/22/2005US20050279458 Plasma processing method and apparatus
12/22/2005US20050279457 Plasma processing apparatus and method, and plasma control unit
12/22/2005US20050279456 Plasma reactor with high productivity
12/22/2005US20050279454 Pressure control system
12/22/2005US20050279453 System and methods for surface cleaning
12/22/2005US20050279452 Etching reaction device with protrusions
12/22/2005US20050279380 Method for surface cleaning
12/22/2005US20050279284 Temperature control system
12/22/2005US20050279282 Method and apparatus for processing a semiconductor substrate
12/22/2005US20050279281 Substrate processing apparatus
12/21/2005EP1606431A1 Solution for etching copper surfaces and method of depositing metal on copper surfaces
12/21/2005CN1710147A Etching reactive tank
12/21/2005CN1710146A Single-acid micro adding device and method
12/21/2005CN1710145A Method for direct forming tool die by multiple etchig and apparatus thereof
12/15/2005WO2005119733A1 Blocker plate bypass to distribute gases in a chemical vapor deposition system
12/15/2005WO2005118914A2 Substrate support system and method
12/15/2005WO2005118907A1 Variable quadruple electromagnet array, particularly used in a multi-step process for forming a metal barrier in a sputter reactor
12/15/2005WO2005036596A3 Method and apparatus of etch process control in fabrications of microstructures
12/15/2005US20050274695 Method of forming a molding surface for a shingle mold
12/15/2005US20050274459 Slit valve door seal
12/15/2005DE102004023286A1 Behälter zum Aufnehmen und Speichern von Flüssigkeiten sowie viskosen Stoffen, insbesondere von Trink- und Abwasser oder Kraftstoff, ein Verfahren zu dessen Herstellung und dessen Verwendung Container for receiving and storing liquids and viscous materials, in particular of drinking water and waste water, or fuel, a process for its preparation and its use
12/14/2005EP0852615B1 Chemical mechanical polishing composition and process
12/14/2005CN1706986A Etching liquid fot titanium or titanium alloy
12/14/2005CN1231814C 激光加工设备 Laser processing equipment
12/14/2005CN1231613C Pickling agent containing urea and method for producing it
12/14/2005CN1231612C Etching system and method for using different etching time according to accumulative treating number
12/08/2005WO2005117084A1 Reactive fluid systems for removing deposition materials and methods for using same
12/08/2005US20050272621 Composition and method for removing copper-compatible resist
12/08/2005US20050269294 Etching method
12/08/2005US20050269293 Seasoning method for etch chamber
12/08/2005US20050269292 Plasma processing apparatus and method, and electrode plate for plasma processing apparatus
12/08/2005US20050269285 Method for fabricating a nanopattern and a carbon nanotube bio-nanoarray using the self-assembly of supramolecules and UV etching
12/08/2005US20050269032 Dust cleaner
12/08/2005US20050269031 Plasma treatment system
12/08/2005US20050269025 In-line demetallization process for flexible metallized substrates
12/08/2005DE202005014917U1 Doppelgeätzte Messerform Doppelgeätzte knife shape
12/07/2005EP1602749A1 Metal photo-etching product and production method therefor
12/07/2005EP1601471A2 Gas gate for isolating regions of differing gaseous pressure
12/06/2005US6971945 Multi-step polishing solution for chemical mechanical planarization
12/01/2005WO2005113853A1 Methods and apparatuses for transferring articles through a load lock chamber under vacuum
12/01/2005US20050266695 Novel aqueous based metal etchant
12/01/2005US20050266689 Chemical mechanical polishing composition and process
12/01/2005US20050266683 Remover compositions for dual damascene system
12/01/2005US20050266587 Substrate support method
12/01/2005US20050263743 Etching with organic ammonium compound and/or oxoammonium compound, water, and solvent
12/01/2005US20050263489 Ruthenium silicide wet etch
12/01/2005US20050263390 A tantalum nitride/Ta barrier is first sputter deposited with high target power and wafer bias, argon etching is performed with even higher wafer bias. a flash step is applied with reduced target power and wafer bias; different magnetic field distributions
12/01/2005US20050263249 Substrate support system
12/01/2005US20050263248 Blocker plate bypass to distribute gases in a chemical vapor deposition system
12/01/2005US20050263247 Plasma processing apparatus and plasma processing method
12/01/2005US20050263066 Apparatus for electroless deposition of metals onto semiconductor substrates
12/01/2005DE102004022297A1 Verfahren und System zum selektiven Beschichten oder Ätzen von Oberflächen A method and system for selectively coating or etching surfaces
11/2005
11/30/2005EP1392888B1 Method for operating an aluminium pickling bath
11/30/2005CN1703327A Method of stripping silver from a printed circuit board
11/30/2005CN1230045C Plasma processing apparatus
11/30/2005CN1230044C Plasma processing apparatus
11/30/2005CN1229520C Device and method for reproducing etching solution containing metal compounds
11/30/2005CN1229519C Honeycomb blind hole shell manufacturing method
11/30/2005CN1229278C Process and plant for extraction or recovery of acids from solutions these acids
11/25/2005CA2506908A1 Method of forming a molding surface for a shingle mold
11/24/2005WO2005112072A2 Segmented baffle plate assembly for a plasma processing system
11/24/2005WO2005111269A1 Container for holding and storing liquids as well as viscous substances, and method for the production thereof
11/24/2005WO2005111268A2 Apparatus including showerhead electrode and heater for plasma processing
11/24/2005WO2005111267A2 Gas distribution member supplying process gas and rf power for plasma processing
11/24/2005WO2005091974A9 Methods for the optimization of substrate etching in a plasma processing system
11/24/2005US20050261152 Cleaning composition
11/24/2005US20050261150 Reactive fluid systems for removing deposition materials and methods for using same
11/24/2005US20050258138 Wafer recovering method, wafer, and fabrication method
11/24/2005US20050257891 Plasma processing apparatus
11/24/2005US20050257889 Etching and cleaning methods and etching and cleaning apparatuses used therefor
11/23/2005EP1597035A1 Microedged shaving surface and a method for making the same
11/23/2005CN1701136A Low-force electrochemical mechanical processing method and apparatus
11/23/2005CN1228472C Method for wet cleaning metal copper back
11/23/2005CN1228111C Golf club made of multiple materials
11/22/2005US6967177 Temperature control system
11/17/2005WO2005108040A1 Etch rate control