| Patents for C23F 1 - Etching metallic material by chemical means (16,062) |
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| 03/30/2006 | US20060068590 Transistor formed on a heavily doped substrate is described. Metal gates are used in low temperature processing to prevent doping from the substrate from diffusing into the channel region of the transistor |
| 03/30/2006 | US20060068127 Depositing a catalyst particle on a substrate to define a deterministically located position; growing an aligned elongated nanostructure on the substrate; removing a portion of the conduit material to expose the catalyst particle; and removing catalyst particle and nanostructure to define a nanoconduit |
| 03/30/2006 | US20060065636 Method and system for controlling a velocity field of a supercritical fluid in a processing system |
| 03/30/2006 | US20060065633 Semiconductor substrate polishing methods and equipment |
| 03/30/2006 | US20060065632 Methods and apparatus for monitoring a process in a plasma processing system by measuring a plasma frequency |
| 03/30/2006 | US20060065631 Methods and apparatus for monitoring a process in a plasma processing system by measuring impedance |
| 03/30/2006 | US20060065630 Plasma processing method and apparatus, and storage medium |
| 03/30/2006 | US20060065629 Method for treating a substrate |
| 03/30/2006 | US20060065628 Methods and apparatus for tuning a set of plasma processing steps |
| 03/30/2006 | US20060065627 Processing electronic devices using a combination of supercritical fluid and sonic energy |
| 03/30/2006 | US20060065622 Method and system for xenon fluoride etching with enhanced efficiency |
| 03/30/2006 | US20060065621 Method and system for improving coupling between a surface wave plasma source and a plasma space |
| 03/30/2006 | US20060065369 RF ground switch for plasma processing system |
| 03/30/2006 | US20060065368 Gas delivery device for improved deposition of dielectric material |
| 03/30/2006 | DE10313517B4 Lösung zum Ätzen von Kupfer, Verfahren zum Vorbehandeln einer Schicht aus Kupfer sowie Anwendung des Verfahrens Solution for etching copper, method for pretreating a layer of copper as well as application of the method |
| 03/30/2006 | DE102004046231A1 Component for a drive element has a lipophilic surface formed as a coating for rejecting a lubricant, oil and/or grease in a partial region |
| 03/29/2006 | CN1753154A Method of removing chip oxide film edge and its device |
| 03/29/2006 | CN1752288A Quantitative monitoring method and structure for plasma etching |
| 03/29/2006 | CN1247815C Surface treatment apparatus |
| 03/28/2006 | US7018783 Fine structure and devices employing it |
| 03/28/2006 | US7018556 removing chrome from the surface of a calcium fluoride (CaF2) object by etching the chrome a first amount in a first chrome etchant, and etching the chrome a second amount beyond the first amount in second selective chrome etchant, such that the CaF2 object maintains a micro-roughness. |
| 03/28/2006 | US7018554 Method to reduce stacking fault nucleation sites and reduce forward voltage drift in bipolar devices |
| 03/28/2006 | US7018550 Method for fabricating an isolated microelectromechanical system (MEMS) device using an internal void |
| 03/28/2006 | US7018505 Apparatus including chuck and matching box |
| 03/28/2006 | US7018504 Loadlock with integrated pre-clean chamber |
| 03/28/2006 | US7018418 Textured surface having undercut micro recesses in a surface |
| 03/28/2006 | US7018015 Substrate and method of forming substrate for fluid ejection device |
| 03/28/2006 | US7017594 Atmospheric pressure non-thermal plasma device to clean and sterilize the surfaces of probes, cannulas, pin tools, pipettes and spray heads |
| 03/28/2006 | US7017514 Method and apparatus for plasma optimization in water processing |
| 03/23/2006 | WO2006031270A1 System and methods for surface cleaning |
| 03/23/2006 | WO2006029823A2 Method for the treatment of metallic surfaces using formulations based on methanesulfonic acid having a low water content |
| 03/23/2006 | WO2005111268A3 Apparatus including showerhead electrode and heater for plasma processing |
| 03/23/2006 | US20060063280 Lamp heating apparatus and method for producing semiconductor device |
| 03/23/2006 | US20060060966 Selectively-etched nanochannel electophoretic and electrochemical devices |
| 03/23/2006 | US20060060566 Method and device for substrate etching with very high power inductively coupled plasma |
| 03/23/2006 | US20060060565 Method of etching metals with high selectivity to hafnium-based dielectric materials |
| 03/23/2006 | US20060060564 Micromachined structures made by combined wet and dry etching |
| 03/23/2006 | US20060060563 Ink composition for etching resist, method of forming etching resist pattern using the same, and method of forming microchannel using the ink composition |
| 03/23/2006 | US20060060562 depositing a memory material on a semiconductor substrate; protecting an edge during undercutting etching for image transfer |
| 03/23/2006 | US20060060559 Thin film forming method and system |
| 03/23/2006 | US20060060558 Method of fabricating package substrate using electroless nickel plating |
| 03/23/2006 | US20060060302 RF grounding of cathode in process chamber |
| 03/23/2006 | US20060060301 Substrate processing using molecular self-assembly |
| 03/23/2006 | US20060060300 Plasma treatment method |
| 03/23/2006 | US20060060232 Liquid treatment device and liquid treatment method |
| 03/22/2006 | EP1635988A2 Integrated tool with interchangeable wet processing components for processing microfeature workpieces and automated calibration systems |
| 03/22/2006 | EP1446237A4 Manufacture having double sided features in a metal-containing web formed by etching |
| 03/22/2006 | CN1751138A Gas gate for isolating regions of differing gaseous pressure |
| 03/22/2006 | CN1750941A A door skin, a method of etching a plate for forming a wood grain pattern in the door skin, and an etched plate formed therefrom |
| 03/22/2006 | CN1749354A Etchant composition for indium oxide layer and etching method using the same |
| 03/22/2006 | CN1246498C Method for etching poly crystal silicon based on inductively coupled plasma and for preparing superfine lines |
| 03/22/2006 | CN1246108C Method for extruding and precision roller forging thermal strength titanium alloy blades |
| 03/21/2006 | US7015146 for die or wafer backside thinning prior to electrical probing and/or characterization of a site specific MOSFET device; using collimated ion plasma; avoids damaging or rupturing the gate film |
| 03/21/2006 | US7015136 Method for preventing formation of photoresist scum |
| 03/21/2006 | US7014732 Etching apparatus |
| 03/21/2006 | US7014570 Golf club striking plate with variable thickness |
| 03/21/2006 | US7013834 Plasma treatment system |
| 03/16/2006 | WO2006028779A2 Electrically floating diagnostic plasma probe with ion property sensors |
| 03/16/2006 | WO2005093116A3 Replacing chamber components in a vacuum environment |
| 03/16/2006 | US20060057472 Method for making chrome photo mask |
| 03/16/2006 | US20060054596 Multifrequency plasma reactor and method of etching |
| 03/16/2006 | US20060054594 Method for the manufacture of a display |
| 03/16/2006 | US20060054588 Method of Manufacturing Double-Sided Printed Circuit Board |
| 03/16/2006 | US20060054281 Hydrocarbon dielectric heat transfer fluids for microwave plasma generators |
| 03/16/2006 | US20060054280 Apparatus of manufacturing display substrate and showerhead assembly equipped therein |
| 03/16/2006 | US20060054278 Plasma processing apparatus |
| 03/16/2006 | US20060054091 Support system for a treatment apparatus |
| 03/16/2006 | DE112004000659T5 Ultraphobe Oberfläche für Hochdruckflüssigkeiten Ultraphobic surface for high pressure fluids |
| 03/16/2006 | DE102004041434A1 Prägeblech mit dreidimensionaler Struktur zur Herstellung von Dokumenten mittels Heiß-Kalt-Laminierpresse Embossing plate having a three dimensional structure for the production of documents by means of hot-cold-laminating press |
| 03/15/2006 | EP1634977A1 Process for inhibiting the formation of a secondary reaction zone (SRZ) and coating system therefor |
| 03/15/2006 | EP1633906A1 Method for regenerating etching solutions containing iron for the use in etching or pickling copper or copper alloys and an apparatus for carrying out said method |
| 03/15/2006 | EP1633823A1 Process |
| 03/15/2006 | EP1341942B1 Aluminium alloy for lithographic sheet |
| 03/14/2006 | US7012051 Using mixture containing hydroxylamine compound |
| 03/14/2006 | US7011762 Metal bridging monitor for etch and CMP endpoint detection |
| 03/14/2006 | US7011710 Concentration profile on demand gas delivery system (individual divert delivery system) |
| 03/09/2006 | WO2006025077A1 Treatment method of an exhausted pickling bath |
| 03/09/2006 | US20060051967 Ferromagnetic; resitivities similar to semiconducting and insulating materials, and Curie temperatures greater than room temperature |
| 03/09/2006 | US20060051966 In-situ chamber clean process to remove by-product deposits from chemical vapor etch chamber |
| 03/09/2006 | US20060049141 Method of manufacturing metal cover with blind holes therein |
| 03/09/2006 | US20060049140 Method and apparatus for liquid etching |
| 03/09/2006 | US20060049139 Method and system for etching a gate stack |
| 03/09/2006 | US20060049138 Plasma generation device, plasma control method, and substrate manufacturing method |
| 03/09/2006 | US20060049137 Multi-step process for etching photomasks |
| 03/09/2006 | US20060049129 Making printed circuits by by ink jet printing on dielectric a plate-resistant solvent-free acrylate ink with acid-free acrylic ester monomers and acrylates containing acid groups; polymerizing; electrolytic or electroless depositing metal layers, the upper layer of which is etch-resistant; removing ink |
| 03/09/2006 | US20060048894 Dry etching apparatus, etching method, and method of forming a wiring |
| 03/09/2006 | US20060048893 Atmospheric pressure plasma processing reactor |
| 03/09/2006 | US20060048892 Plasma processing method for working the surface of semiconductor devices |
| 03/09/2006 | US20060048891 Method and apparatus for determining an etch property using an endpoint signal |
| 03/09/2006 | US20060048710 Substrate processing apparatus |
| 03/09/2006 | DE10217096B4 Vorrichtung und Verfahren zur Reinigung alkalischer Lösung Apparatus and method for cleaning alkaline solution |
| 03/08/2006 | EP1631701A2 Atmospheric pressure non-thermal plasma device to clean and sterilize the surface of probes, cannulas, pin tools, pipettes and spray heads |
| 03/08/2006 | CN1744248A Variable frequency corrosion method of low-voltage anode foil for electrolytic capacitor |
| 03/08/2006 | CN1743509A Chemical etching solution for molybdenum |
| 03/08/2006 | CN1743508A Chemical etching solution for titanium and titanium alloy |
| 03/08/2006 | CN1743507A Chemical etching solution for aluminium and aluminium alloy |
| 03/08/2006 | CN1743506A Comprehensive utilization method of corrosive liquid for producing breastplate |
| 03/08/2006 | CN1743505A Method for monitoring plasma etching platform after prevention and maintenance process |
| 03/08/2006 | CN1743504A Method for improving reaction room performance |
| 03/07/2006 | US7008879 Isolation chamber arrangement for serial processing of semiconductor wafers for the electronic industry |