C23F 1 - Etching metallic material by chemical means

Patents for C23F 1 - Etching metallic material by chemical means (16,062)
10/2006
10/31/2006	US7128846 Process for producing group III nitride compound semiconductor
10/31/2006	US7128844 Metal/ceramic circuit board and method for producing same
10/31/2006	US7128842 Polyimide as a mask in vapor hydrogen fluoride etching
10/31/2006	US7128806 Mask etch processing apparatus
10/31/2006	US7128803 Integration of sensor based metrology into semiconductor processing tools
10/26/2006	WO2006113443A2 Etching technique for the fabrication of thin (ai, in, ga)n layers
10/26/2006	WO2006112406A1 Metal laminate, method for manufacturing same and use thereof
10/26/2006	US20060240670 Etching of algainassb
10/26/2006	US20060237391 Vacuum processing apparatus and vacuum processing method of sample
10/26/2006	US20060237390 Combined Microscale Mechanical Topography and Chemical Patterns on Polymer Substrates for Cell Culture
10/26/2006	US20060237137 Semiconductor apparatus capable of reducing outgassing pollution and method of achieving the same
10/26/2006	US20060237030 Method and apparatus for cleaning and surface conditioning objects with plasma
10/26/2006	US20060236934 Plasma uniformity control by gas diffuser hole design
10/26/2006	US20060236932 Plasma processing apparatus
10/26/2006	US20060236931 Tilted Plasma Doping
10/25/2006	CN2830420Y Metal etching shaper
10/25/2006	CN1851883A Method for forming inclined conductive layer
10/25/2006	CN1851881A Semiconductor etching apparatus
10/25/2006	CN1851877A Plasma cleaning method for removing silicon chip surface particle after etching process
10/25/2006	CN1851876A Adsorption stripping process for removing exposed zone polymer
10/25/2006	CN1851873A Silicon gate etching process capable of avoiding microtrench phenomenon
10/25/2006	CN1851872A Polycrystalline silicon pulse etching process for improving anisotropy
10/25/2006	CN1851871A Polycrystalline silicon etching process capable of removing residual gas
10/25/2006	CN1851870A Method for reducing etching uniformity influence by dry cleaning process
10/25/2006	CN1851869A Particle-removing process before semiconductor etching
10/25/2006	CN1851864A Silicon chip unloading process
10/25/2006	CN1851858A Gas injection and diffusion system
10/25/2006	CN1851857A Silicon-chip separating process
10/25/2006	CN1851856A Reaction chamber for semiconductor treatment
10/25/2006	CN1851049A Polycrystalline silicon etching method for improving line roughness
10/24/2006	US7125496 Etching method using photoresist etch barrier
10/19/2006	US20060234509 Cerium oxide abrasives for chemical mechanical polishing
10/19/2006	US20060231528 Methods of forming semiconductor constructions
10/19/2006	US20060231526 System and method for determining the state of a film in a plasma reactor using an electrical property
10/19/2006	US20060231525 Forming microphase-separated structure in film of graft or block copolymer with a chain of polyacrylonitrile, polycyclohexadiene derivative, polybutadiene, polysilane, polysiloxane, polyamic acid or polyaniline and thermally decomposable polymer chain; heating to decompose the decomposable phase; etching
10/19/2006	US20060231524 Techniques for the use of amorphous carbon (apf) for various etch and litho integration schemes
10/19/2006	US20060231521 Technique for manufacturing micro-electro mechanical structures
10/19/2006	US20060231208 Plasma processing apparatus, plasma processing method and wave retardation plate
10/19/2006	US20060231207 System and method for surface treatment
10/19/2006	US20060231206 Exposure apparatus and device manufacturing method
10/19/2006	US20060231205 Method and apparatus for cleaning a cvd chamber
10/19/2006	US20060231204 Portable system for semiconductor manufacturing
10/19/2006	US20060231123 Method for removing a layer area of a component
10/18/2006	EP1712658A1 Method for surface treatment of metal material
10/18/2006	CN1849700A Multilayer substrate cleaning method, substrate bonding method, and bonded wafer manufacturing method
10/18/2006	CN1848389A Etching technology for reducing plasma damage
10/18/2006	CN1848388A Method for controlling key size deviation in chip etching technology
10/18/2006	CN1848384A Silicon gate etching method
10/18/2006	CN1848383A Method for removing residual polymer in polysilicon etching technology
10/18/2006	CN1848375A Method for releasing chip static electricity thoroughly in chip etching equipment
10/18/2006	CN1848373A Fault detection method in chip etching technology
10/18/2006	CN1848369A Silicon chip unloading technology capable of raising production volume and reducing silicon chip surface roughness
10/18/2006	CN1848322A Method for corroding controllable high-voltage positive electrode aluminium foil tunnel hole length
10/18/2006	CN1847457A Metal selective etching liquid
10/18/2006	CN1280449C Method of making hard alloy punching mould
10/17/2006	US7122126 Wet processing using a fluid meniscus, apparatus and method
10/17/2006	US7122124 Method of fabricating film carrier
10/17/2006	CA2173162C Spray nozzle and method of manufacturing same
10/12/2006	WO2006107703A1 Thermal oxidation of silicon using ozone
10/12/2006	US20060228889 Methods of removing resist from substrates in resist stripping chambers
10/12/2006	US20060228815 Inductively coupled plasma chamber attachable to a processing chamber for analysis of process gases
10/12/2006	US20060228490 Gas distribution uniformity improvement by baffle plate with multi-size holes for large size PECVD systems
10/12/2006	US20060226126 Polymeric inhibitors for enhanced planarization
10/12/2006	US20060226125 Chemical-mechanical polishing (CMP) slurry and method of planarizing computer memory disk surfaces
10/12/2006	US20060226124 Substrate and a method for polishing a substrate
10/12/2006	US20060226123 Profile control using selective heating
10/12/2006	US20060226121 Etching method
10/12/2006	US20060226120 Etch profile control
10/12/2006	US20060226119 Method for generating plasma method for cleaning and method for treating substrate
10/12/2006	US20060226118 Methods for forming backside alignment markers useable in semiconductor lithography
10/12/2006	US20060226116 Magnetic recording media and method of forming them
10/12/2006	US20060226115 surface treatment with adhesion promoters, then with acid resistance promoters, and with post-dip solutions, to form surfaces suitable for subsequent multilayer lamination; printed circuits having bonding strength
10/12/2006	US20060226114 Method for producing a micromechanical device and a micromechanical device
10/12/2006	US20060225654 Disposable plasma reactor materials and methods
10/12/2006	DE102006017995A1 Galvanisierungsverfahren für Aluminiumlegierungsmaterial Plating process for aluminum alloy material
10/12/2006	DE10154884B4 Vorrichtung zum Transport von flexiblem Flachmaterial, insbesondere Leiterplatten Device for the transport of flexible flat material, especially printed circuit boards
10/11/2006	EP1168899B1 Apparatus for manufacturing printed wiring board and method for manufacturing printed wiring board using the same
10/11/2006	CN1845299A Device for controlling D.C. bias on wafer
10/11/2006	CN1845298A Air flow distribution equalized etching apparatus
10/11/2006	CN1279155C Detergent
10/10/2006	US7118683 Methods of etching silicon-oxide-containing compositions
10/05/2006	WO2006103751A1 Copper etchant and method of etching
10/05/2006	US20060223317 Plasma processing method and plasma processing apparatus
10/05/2006	US20060219664 Core leaching
10/05/2006	US20060219662 Fabrication process of semiconductor device and polishing method
10/05/2006	US20060219660 Etching method
10/05/2006	US20060219659 Method for treatment of silicon-based target object to be processed, apparatus for treatment and method of manufacturing semiconductor device
10/05/2006	US20060219657 Etching method and apparatus, computer program and computer readable storage medium
10/05/2006	US20060219654 Silicon substrate comprising positive etching profiles with a defined slope angle, and production method
10/05/2006	US20060219653 Method for producing individual microlenses or a microlens array
10/05/2006	US20060219363 Capacitive coupling plasma processing apparatus and method for using the same
10/05/2006	US20060219362 Gas injector and apparatus including the same
10/05/2006	US20060219360 Device and method for controlling temperature of a mounting table, a program therefor, and a processing apparatus including same
10/05/2006	US20060219171 Substrate processing apparatus
10/05/2006	DE102005015271A1 Device for production of groove structure on cylindrical sliding surfaces in multicylinder engine block by photochemical etching useful for restructuring of the walls of cylinder combustion chambers
10/04/2006	EP1707830A2 Manufacturing process of a sliding bearing having a sliding surface of copper/multiple alloy
10/04/2006	EP1706898A2 Temperature controlled hot edge ring assembly for reducing plasma reactor etch rate drift
10/04/2006	EP1706892A2 Segmented radio frequency electrode apparatus and method for uniformity control
10/04/2006	EP1706704A1 Method and apparatus for measuring film thickness by means of coupled eddy sensors
10/04/2006	CN1843067A Metal pattern and process for producing the same

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