Patents for C23F 1 - Etching metallic material by chemical means (16,062)
03/2006
03/07/2006US7008553 Method for removing aluminide coating from metal substrate and turbine engine part so treated
03/07/2006US7008551 Low loss optical waveguide device
03/07/2006US7008548 Etchant for etching metal wiring layers and method for forming thin film transistor by using the same
03/07/2006US7008484 Method and apparatus for deposition of low dielectric constant materials
03/02/2006WO2006023637A2 In situ surface contaminant removal for ion implanting
03/02/2006WO2005095108A3 Method for the production of surface and depth variable embossing tools
03/02/2006US20060045987 Localized plasma processing
03/02/2006US20060043073 Substrate treating method and apparatus
03/02/2006US20060043068 Microlens forming method
03/02/2006US20060043064 Plasma processing system and method
03/02/2006US20060043063 Electrically floating diagnostic plasma probe with ion property sensors
03/02/2006US20060043061 Method for manufacturing bipolar plate and direct methanol fuel cell
03/02/2006US20060043060 Removal of amine components on the sidewalls of a via or contact hole or trench opening by treatment with Cl2 and/or CxCly plasma before the aperture is filled with a photoresist to prevent reaction of amines with the photoresist which forms residues
03/02/2006US20060042757 Wafer processing apparatus capable of controlling wafer temperature
03/02/2006US20060042756 Semiconductor manufacturing apparatus and chemical exchanging method
03/02/2006US20060042755 Large surface area dry etcher
03/01/2006EP1629527A2 Adjustable gas distribution system
03/01/2006EP1629522A2 Gas distribution system
03/01/2006EP1252028A4 Temporary bridge for micro machined structures
03/01/2006CN1740396A Etchant solutions and methods of forming semiconductor devices formed by processes including the same
03/01/2006CN1243849C A method for wet etching
02/2006
02/28/2006US7005193 attachment of the appendage by way of a stem prevents stresses arising from CTE differentials in the appendage from being transmitted to the base, where they could contribute to temperature errors
02/28/2006US7005080 For improved metal finishing; surface treatment
02/28/2006US7004107 Method and apparatus for monitoring and adjusting chamber impedance
02/23/2006US20060040499 In situ surface contaminant removal for ion implanting
02/23/2006US20060040415 Method and apparatus for nitride spacer etch process implementing in situ interferometry endpoint detection and non-interferometry endpoint monitoring
02/23/2006US20060037943 Integrated circuits ; using chelate compounds as etchants; overcoating dielectric with patterned mask
02/23/2006US20060037940 Apparatus and method for shielding a wafer from charged particles during plasma etching
02/23/2006US20060037933 Mirror process using tungsten passivation layer for preventing metal-spiking induced mirror bridging and improving mirror curvature
02/23/2006US20060037932 Method and micromechanical component
02/23/2006US20060037705 Temperature control assembly for use in etching processes and an associated retrofit method
02/23/2006US20060037704 Plasma Processing apparatus and method
02/23/2006US20060037703 Plasma processing apparatus and method
02/23/2006US20060037702 Plasma processing apparatus
02/23/2006US20060037701 Plasma processing apparatus and method
02/23/2006US20060037700 Method and apparatus for removing material from a substrate surface
02/23/2006US20060037699 Polishing pad and method for manufacturing semiconductor device
02/23/2006US20060037698 Systems and methods for processing microfeature workpieces
02/23/2006US20060037627 Process for treating solid surface and substrate surface
02/22/2006CN1739066A Electron beam processing technology for mask repair
02/22/2006CN1738928A Compositions for copper, tantalum and tantalum nitride chemical mechanical method complanation
02/22/2006CN1738927A Metal photo-etching product and production method therefor
02/22/2006CN1738926A Film-forming apparatus component and method for cleaning same
02/22/2006CN1737199A Cleaning and servicing technology for turbine blade basal body surface by strong current pulsed ionizing beam
02/22/2006CN1737186A Plasma arc processing apparatus
02/21/2006US7001843 Methods of forming metal lines in semiconductor devices
02/21/2006US7001838 Method of wet etching an inorganic antireflection layer
02/21/2006US7001533 Chromate-free method for surface etching of aluminum and aluminum alloys
02/21/2006US7001482 Method and apparatus for improved focus ring
02/21/2006US7001481 Method and system providing high flux of point of use activated reactive species for semiconductor processing
02/21/2006US7001468 Pressure energized pressure vessel opening and closing device and method of providing therefor
02/21/2006US7000298 Method a quartz sensor
02/16/2006WO2006017217A2 Integrated lc-esi on a chip
02/16/2006US20060036312 Flexible stent and method of manufacture
02/16/2006US20060033201 Systems and methods for wafer bonding by localized induction heating
02/16/2006US20060032834 Method of manufacturing semiconductor wafer and method of manufacturing semiconductor device
02/16/2006US20060032832 Shadow mask and method of fabricating vertically tapered structure using the shadow mask
02/16/2006US20060032811 Transition radiation apparatus and method therefor
02/16/2006US20060032585 Plasma processing method and apparatus
02/16/2006US20060032584 Plasma processing apparatus capable of suppressing variation of processing characteristics
02/16/2006US20060032445 Substrate processing apparatus and method, and gas nozzle for improving purge efficiency
02/15/2006EP1626098A2 Process of dissolving zinc in alkaline brines
02/15/2006CN1734711A Vacuum processing device
02/15/2006CN1733976A Sheet metal having decorative pattern and method for manufacturing the same
02/15/2006CN1733974A Chemical process of nickel-titanium alloy material
02/14/2006US6998204 patterning the non-transparent film using the etch stop layer to expose areas of the transparent substrate, forming a mask on the non-transparent film to protect selected areas of the transparent substrate and forming a phase shift oxide
02/14/2006US6998063 Method of forming microporous membranes
02/14/2006US6998060 Flexible stent and method of manufacture
02/14/2006US6998059 Method for manufacturing a silicon sensor and a silicon sensor
02/14/2006US6998014 Apparatus and method for plasma assisted deposition
02/09/2006WO2006013812A1 Process for producing aluminum electrode foil for capacitor and aluminum foil for etching
02/09/2006WO2005080633A3 Method for zinc coating aluminum
02/09/2006US20060027533 System for dynamic slurry delivery in a CMP process
02/09/2006US20060027531 Base material cutting method, base material cutting apparatus, ingot cutting method, ingot cutting apparatus and wafer producing method
02/09/2006US20060027528 Ion bombardment of electrical lapping guides to decrease noise during lapping process
02/09/2006US20060027527 Method of producing perpendicular magnetic recording disk
02/09/2006US20060027525 Cantilever-type near-field probe for optical data storage and method of manufacturing the same
02/09/2006US20060027524 Microfabricated two-pin liquid sample dispensing system
02/09/2006US20060027523 Micromachined fluidic device and method for making same
02/09/2006US20060027522 Method of producing a MEMS device
02/09/2006US20060027329 Multi-frequency plasma enhanced process chamber having a torroidal plasma source
02/09/2006US20060027328 Hollow anode plasma reactor and method
02/09/2006US20060027327 Apparatus and methods for a low inductance plasma chamber
02/09/2006US20060027326 Semiconductor substrate processing chamber and substrate transfer chamber interfacial structure
02/09/2006US20060027325 Method and apparatus for photomask fabrication
02/09/2006US20060027020 Tungsten coated silicon fingers
02/08/2006EP1624520A1 Thin film solid oxide fuel cell (SOFC) and its method of production
02/08/2006EP1623608A2 Method for coating blanks for the production of printed circuit boards (pcb)
02/08/2006EP1622699A1 Method and reactor arrangement for reducing the emission of nitrogen oxides
02/08/2006CN1730728A Copper or copper alloy surface tiny-etching treatment fluid for smoothing
02/08/2006CN1730164A Outdoor metal surface double coating antiseptic chromatic spray painting method
02/08/2006CN1240879C Method and system for recovering and removing copper from fluid
02/08/2006CN1240874C Method for producing conductor pattern on dielectric substrate
02/07/2006US6995089 Method to remove copper without pattern density effect
02/07/2006US6994769 In-situ cleaning of a polymer coated plasma processing chamber
02/02/2006WO2006012297A1 Method and apparatus for reducing aspect ratio dependent etching in time division multiplexed etch processes
02/02/2006WO2006012021A2 Methods and apparatus for optimal temperature control in a plasma processing system
02/02/2006WO2006011954A2 Diagnostic plasma measurement device having patterned sensors and features
02/02/2006WO2005048301A3 Methods and apparatus for optimizing a substrate in a plasma processing system
02/02/2006US20060024969 Method for purifying silicon carbide coated structures