Patents for C23F 1 - Etching metallic material by chemical means (16,062)
06/2006
06/01/2006US20060113038 Gas distribution system for improved transient phase deposition
06/01/2006US20060113037 Plasma processing apparatus and method for controlling the same
06/01/2006US20060113036 Computer integrated manufacturing control system for oxide chemical mechanical polishing
06/01/2006US20060112878 System and method for controlling plasma with an adjustable coupling to ground circuit
06/01/2006US20060112876 Semiconductor processing apparatus
06/01/2006US20060112729 Encoding tracking information into glass using single screen and laser ablation
05/2006
05/31/2006CN1780931A Pre-plating surface treatments for enhanced galvanic-corrosion resistance
05/31/2006CN1780732A Method of adding mass to MEMS structures
05/31/2006CN1779941A Etching method of metal capacitance
05/31/2006CN1778992A Solid-phase flow settling separation
05/31/2006CN1778991A Selective silicon nitrogen oxide sculpturing liquid by wetting method
05/31/2006CN1258117C Film transistor for LCD and making method
05/30/2006US7054052 integrated device with a component on a first surface of a sacrificial substrate, and a second component on a first surface of a non-sacrificial substrate; bonding the substrates so the surfaces face one another and then interconnected to form the integrated device
05/30/2006US7052627 Mixture of fluoride, or hydrogen fluoride salt, acid and solvent
05/30/2006US7052621 Bilayered metal hardmasks for use in Dual Damascene etch schemes
05/30/2006US7052620 Polishing slurry for aluminum-based metal, and method of manufacturing semiconductor device
05/30/2006US7052616 Fabrication of molecular scale devices using fluidic assembly
05/30/2006US7052576 Pressure control apparatus and method of establishing a desired level of pressure within at least one processing chamber
05/30/2006US7052575 System and method for active control of etch process
05/26/2006WO2006055810A2 Electrode array device having an adsorbed porous reaction layer
05/26/2006WO2005045524A3 A method of forming a patterned layer on a substrate
05/26/2006WO2005022592A3 Novel aqueous based metal etchant
05/25/2006US20060110629 Magnetic recording medium and manufacturing method thereof, magnetic storage apparatus, substrate and texture forming apparatus
05/25/2006US20060108327 Method of manufacturing a microstructure
05/25/2006US20060108325 Polishing process for producing damage free surfaces on semi-insulating silicon carbide wafers
05/25/2006US20060108323 Dry etching method
05/25/2006US20060108320 Molecular self-assembly in substrate processing
05/25/2006US20060108069 Plasma reaction chamber and captive silicon electrode plate for processing semiconductor wafers
05/25/2006US20060108068 Substrate processing apparatus and substrate processing method
05/25/2006US20060108067 Controlled use of photochemically susceptible chemistries for etching, cleaning and surface conditioning
05/24/2006DE10215044B4 Verfahren zum Ätzen und Trocknen von Substraten A method for etching and drying substrates
05/24/2006CN1777696A Methods and apparatus for atomic layer deposition
05/24/2006CN1777691A Method and apparatus for reducing substrate backside deposition during processing
05/24/2006CN1776028A New process for separating metal fiber copper protective layer by catalytic ammonia leaching method
05/24/2006CN1257538C Wet etching method for lead zirconate titanate ferroelectric film
05/24/2006CN1257313C Etchant and substrate with etched copper wire array
05/23/2006US7048870 Metallic implant and process for treating a metallic implant
05/23/2006US7048869 Etching silicon oxide with fluorohydrocarbon or fluorine; controlling temperature
05/18/2006WO2006051018A2 Method for finishing a through hole
05/18/2006WO2005065186A3 Showerhead electrode assembly for plasma processing apparatuses
05/18/2006US20060105579 Etchant for etching metal wiring layers and method for forming thin film transistor by using the same
05/18/2006US20060105574 Process for defining integrated circuits in semiconductor electronic devices
05/18/2006US20060103051 Microfluidic array devices and methods of manufacture thereof
05/18/2006US20060102589 Plasma etching method and plasma etching apparatus
05/18/2006US20060102588 Method of processing an object and method of controlling processing apparatus to prevent contamination of the object
05/18/2006US20060102587 supplying plasma excitation power to a dry etching gas comprising Cl2 and O2 to excite plasma in chamber so that a chemical species is generated, etching a light-shielding film; add He to the dry etching gas in order to stabilize the plasma; used in semiconductor device
05/18/2006US20060102586 High selectivity BPSG to TEOS etchant
05/18/2006US20060102471 Electrode array device having an adsorbed porous reaction layer
05/18/2006US20060102289 Substrate processing apparatus, substrate processing method, substrate position correcting apparatus, and substrate position correcting method
05/18/2006US20060102288 Focus ring, plasma etching apparatus and plasma etching method
05/18/2006US20060102286 Plasma processing apparatus
05/18/2006US20060102283 Apparatus to manufacture semiconductor
05/18/2006US20060102282 Method and apparatus for selectively filtering residue from a processing chamber
05/18/2006US20060102196 Atmospheric pressure non-thermal plasma device to clean and sterilize the surfaces of probes, cannulas, pin tools, pipettes and spray heads
05/18/2006DE10232612B4 Vorrichtung und Verfahren zur Überwachung eines elektrolytischen Prozesses Apparatus and method for monitoring an electrolytic process
05/17/2006EP1656242A2 Capillary imprinting technique
05/17/2006CN1256169C Fog-remover and air purifier
05/16/2006US7045393 Method for manufacturing circuit devices
05/16/2006US7045073 Pre-etch implantation damage for the removal of thin film layers
05/16/2006US7045072 Cleaning process and apparatus for silicate materials
05/16/2006US7045069 Microfabrication method based on metal matrix composite technology
05/16/2006US7045052 Method of manufacturing a spectral filter for green and longer wavelengths
05/16/2006US7044078 Layer forming method, product comprising the layer, optical film, dielectric-coated electrode and plasma discharge apparatus
05/11/2006WO2006039293A3 Localized control of thermal properties on microdevices and applications thereof
05/11/2006WO2004108353A3 Integrated tool with interchangeable wet processing components and automated calibration systems
05/11/2006US20060097355 Method and apparatus for leveling a semiconductor wafer, and semiconductor wafer with improved flatness
05/11/2006US20060096952 Plasma processing method
05/11/2006US20060096951 Apparatus and method for controlling process non-uniformity
05/11/2006US20060096949 Method of forming a compliant template for UV imprinting
05/11/2006US20060096946 Encapsulated wafer processing device and process for making thereof
05/11/2006US20060096945 Method for making a surface acoustic wave device package
05/11/2006US20060096944 Method for the production of a micromechanical device, particularly a micromechanical oscillating mirror device
05/11/2006US20060096707 Processing materials inside an atmospheric-pressure radiofrequency nonthermal plasma discharge
05/11/2006US20060096706 Dry etching apparatus and a method of manufacturing a semiconductor device
05/11/2006US20060096703 Components for substrate processing apparatus and manufacturing method thereof
05/11/2006US20060096702 Apparatus for monitoring and controlling force applied on workpiece surface during electrochemical mechanical processing
05/11/2006US20060096538 Method, apparatus and magnet assembly for enhancing and localizing a capacitively coupled plasma
05/11/2006DE10342441B4 Verfahren und Vorrichtung zum chemischen Bearbeiten von Bohrungen sowie deren Verwendungen Method and apparatus for chemical machining of bores and their uses
05/10/2006EP1655093A1 Method for finish machining a through hole.
05/10/2006CN1771586A Material for purification of semiconductor polishing slurry, module for purification of semiconductor polishing slurry and process for producing semiconductor polishing slurry
05/10/2006CN1771581A Methods of reducing photoresist distortion while etching in a plasma processing system
05/10/2006CN1770404A Cleaning solution and method for cleaning semiconductor device by using the same
05/10/2006CN1769528A Etchant for conductive materials and method of manufacturing a thin film transistor array panel using the same
05/10/2006CN1255864C Etching process and etching liquid
05/10/2006CN1255492C Binding-aid composition, multilayer printed circuit making method and rotary coating copper surface
05/09/2006US7041528 Method for forming a micro-mechanical component in a semiconductor wafer, and a semiconductor wafer comprising a micro-mechanical component formed therein
05/09/2006US7041232 Selective etching of substrates with control of the etch profile
05/09/2006US7041231 Method of refurbishing a transition duct for a gas turbine system
05/09/2006US7041225 Micromechanical component and method for producing the same
05/09/2006US7041224 Method for vapor phase etching of silicon
05/04/2006US20060091111 Anodized aluminum etching process and related apparatus
05/04/2006US20060091110 Cleaning solution and method for cleaning semiconductor device by using the same
05/04/2006US20060091108 Method and apparatus for controlling etch processes during fabrication of semiconductor devices
05/04/2006US20060091107 etching the silica layer using octafluoropropane and stopping at the titanium layer, then etching the titanium layer using boron chloride and stopping at the indium oxide layer; ferroelectric random access memory (FeRAM)
05/04/2006US20060091106 Printing plate and method for fabricating the same
05/04/2006US20060091105 Method for constraining a thin pattern
05/04/2006US20060090855 Substrate mounting table, substrate processing apparatus and substrate temperature control method
05/04/2006US20060090854 RF supply system and plasma processing apparatus
05/04/2006US20060090851 Diffuser and method for using a diffuser in equipment for manufacturing semiconductor devices
05/04/2006US20060090849 Substrate processing apparatus