| Patents for C23F 1 - Etching metallic material by chemical means (16,062) |
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| 04/04/2007 | CN1943003A Method and apparatus for in-situ film stack processing |
| 04/04/2007 | CN1942984A Method of manufacturing aluminum material for electrolytic capacitor electrodes, aluminum material for electrolytic capacitor electrodes, anode material for aluminum electrolytic capacitors, and alumi |
| 04/04/2007 | CN1942606A Liquid treatment device and liquid treatment method |
| 04/04/2007 | CN1309027C Nano etching method based on nano material disposition |
| 04/04/2007 | CN1309024C Grid structure and production method of high dielectric constant dielectric layer |
| 04/04/2007 | CN1308486C Chemical agent supplier |
| 04/03/2007 | US7198725 Method for making a surface acoustic wave device package |
| 04/03/2007 | US7198694 Integrated tool with interchangeable wet processing components for processing microfeature workpieces and automated calibration systems |
| 04/03/2007 | US7198678 Apparatus for performing at least one process on a substrate |
| 03/29/2007 | WO2007035880A2 Method and apparatus for forming device features in an integrated electroless deposition system |
| 03/29/2007 | WO2005111267A3 Gas distribution member supplying process gas and rf power for plasma processing |
| 03/29/2007 | US20070072434 Method and system for operating a physical vapor deposition process |
| 03/29/2007 | US20070072429 Pattern enhancement by crystallographic etching |
| 03/29/2007 | US20070072427 Method for fabricating semiconductor device and polishing method |
| 03/29/2007 | US20070072426 Chemical mechanical polishing process and apparatus therefor |
| 03/29/2007 | US20070071888 Method and apparatus for forming device features in an integrated electroless deposition system |
| 03/29/2007 | US20070068900 Apparatus and methods to remove films on bevel edge and backside of wafer |
| 03/29/2007 | US20070068899 Apparatus for the removal of an edge polymer from a substrate and methods therefor |
| 03/29/2007 | US20070068629 Actively heated aluminum baffle component having improved particle performance and methods of use and manufacture thereof |
| 03/29/2007 | US20070068627 Electrical Open/Short Contact Alignment Structure for Active Region vs. Gate Region |
| 03/29/2007 | US20070068626 Vacuum processing apparatus |
| 03/29/2007 | US20070068624 Apparatus to treat a substrate and method thereof |
| 03/29/2007 | US20070068623 Apparatus for the removal of a set of byproducts from a substrate edge and methods therefor |
| 03/29/2007 | US20070068456 Monitoring processing of a substrate in a processing chamber |
| 03/29/2007 | US20070068455 Adjustable electrode assembly for use in processing substrates of differing widths in a plasma processing system |
| 03/28/2007 | EP1766669A1 Reactive fluid systems for removing deposition materials and methods for using same |
| 03/28/2007 | EP1766665A2 Improved method and apparatus for the etching of microstructures |
| 03/28/2007 | CN1938661A Semiconductor manufacturing gas flow divider system and method |
| 03/28/2007 | CN1937179A Etching method of single wafer |
| 03/27/2007 | US7196449 Two-axis device and manufacturing method therefor |
| 03/27/2007 | US7195693 Lateral temperature equalizing system for large area surfaces during processing |
| 03/22/2007 | US20070066038 Fast gas switching plasma processing apparatus |
| 03/22/2007 | US20070062910 Complex CMP process and fabricating methods of STI structure and interconnect structure |
| 03/22/2007 | US20070062909 cleaning with a detergent, then deionized water, then treating with a nitric acid solution; useful for gas distribution in semiconductor processing equipment; leakproof |
| 03/22/2007 | US20070062647 Method and apparatus for isolative substrate edge area processing |
| 03/22/2007 | US20070062455 Gas driven rotation apparatus and method for forming crystalline layers |
| 03/22/2007 | US20070062454 Method for dechucking a substrate |
| 03/22/2007 | US20070062450 Production apparatus for magnetic recording medium |
| 03/22/2007 | US20070062449 Enhanced magnetic shielding for plasma-based semiconductor processing tool |
| 03/21/2007 | CN1306568C Terminal testing method and device |
| 03/21/2007 | CN1306526C Method for forming noble metal film pattern |
| 03/21/2007 | CN1306065C Controllable type etching equipment of microbe |
| 03/20/2007 | US7192886 Method for using additives in the caustic etching of silicon for obtaining improved surface characteristics |
| 03/20/2007 | US7192883 Method of manufacturing semiconductor device |
| 03/20/2007 | US7192529 Plurality of protrusions of different heights; protrusions of larger height having a stack structure formed of layers of at least two types of materials, allowing transfer of a number of patterns at the same time. |
| 03/20/2007 | US7192510 Fluid control device and method of manufacturing the same |
| 03/20/2007 | US7192487 Semiconductor substrate processing chamber and accessory attachment interfacial structure |
| 03/15/2007 | WO2005098091A3 A method of plasma etch endpoint detection using a v-i probe diagnostics |
| 03/15/2007 | US20070056930 Polysilicon etching methods |
| 03/15/2007 | US20070056929 Plasma etching apparatus and plasma etching method |
| 03/15/2007 | US20070056928 Plasma processing method and plasma processing device |
| 03/15/2007 | US20070056927 Process and system for etching doped silicon |
| 03/15/2007 | US20070056926 Process and system for etching doped silicon using SF6-based chemistry |
| 03/15/2007 | US20070056925 Selective etch of films with high dielectric constant with H2 addition |
| 03/14/2007 | EP1761947A1 Method and apparatus for reducing aspect ratio dependent etching in time division multiplexed etch processes |
| 03/14/2007 | EP1761659A1 Electrolytically recoverable etching solution |
| 03/14/2007 | CN1928159A Green high efficient restrainer and its application |
| 03/14/2007 | CN1928158A Method for constructing super-drainage structure on metal copper surface |
| 03/14/2007 | CN1304643C Method of plating and pretreating aluminium workpieces |
| 03/13/2007 | US7190119 Methods and apparatus for optimizing a substrate in a plasma processing system |
| 03/13/2007 | US7189449 Metal/ceramic bonding substrate and method for producing same |
| 03/13/2007 | US7189336 Etchant, method for roughening copper surface and method for producing printed wiring board |
| 03/13/2007 | US7189305 Gas-assist systems for applying and moving ozonated resist stripper to resist-bearing surfaces of substrates |
| 03/08/2007 | US20070054493 Methods of forming patterns using phase change material and methods for removing the same |
| 03/08/2007 | US20070052322 Micromachined polymer beam structure method and resulting device for spring applications |
| 03/08/2007 | US20070051874 Method of manufacturing solid state imaging device, solid state imaging device, and camera using solid state imaging device |
| 03/08/2007 | US20070051700 Composition for cleaning substrates and method of forming gate using the composition |
| 03/08/2007 | US20070051699 Methods of removing metal contaminants from a component for a plasma processing apparatus |
| 03/08/2007 | US20070051698 Photoresist trimming process |
| 03/08/2007 | US20070051696 Method for reducing critical dimension and semiconductor etching method |
| 03/08/2007 | US20070051693 Microetching solution |
| 03/08/2007 | US20070051471 Methods and apparatus for stripping |
| 03/08/2007 | US20070051470 Plasma processing apparatus and method |
| 03/08/2007 | US20070051412 Method and apparatus for the mechanical actuation of valves in fluidic devices |
| 03/08/2007 | US20070051314 Movable transfer chamber and substrate-treating apparatus including the same |
| 03/08/2007 | US20070051312 Perimeter partition-valve with protected seals and associated small size process chambers and multiple chamber systems |
| 03/07/2007 | CN1924076A Method of manufacturing corrosive-resistant single-body hydraulic supporter by salt bath nitriding |
| 03/07/2007 | CN1303655C Polishing method for base copper-layer |
| 03/07/2007 | CN1303251C Special hot state silicon washing film forming agent for high parameter boiler |
| 03/06/2007 | US7186480 Subjecting the chrome-containing layer of a photomask to a wet etch process using deionized water and ozone; length of exposure is directly proportional to the degree of adjustment desired |
| 03/06/2007 | US7186350 Providing a substrate with an alignment mark;forming a color resist layer over the substrate and the alignment mark;injecting a solvent to contact the color resist over the alignment mark and dissolve the color resist; removal of the dissolved color resist by vacuum suction to expose alignment mark |
| 03/06/2007 | US7186314 Plasma processor and plasma processing method |
| 03/06/2007 | US7186298 Wafer support system |
| 03/01/2007 | WO2007024556A2 Methods and compositions for acid treatment of a metal surface |
| 03/01/2007 | WO2006031452A3 Apparatus for the optimization of atmospheric plasma in a plasma processing system |
| 03/01/2007 | WO2006023637A3 In situ surface contaminant removal for ion implanting |
| 03/01/2007 | US20070050076 Method and apparatus for determining an operation status of a plasma processing apparatus, program and storage medium storing same |
| 03/01/2007 | US20070049040 Multiple deposition for integration of spacers in pitch multiplication process |
| 03/01/2007 | US20070045234 Compositions and methods for chemical mechanical polishing silicon dioxide and silicon nitride |
| 03/01/2007 | US20070045232 Wafer polishing method and polished wafer |
| 03/01/2007 | US20070045230 Methods for independently controlling one or more etching parameters in the manufacture of microfeature devices |
| 03/01/2007 | US20070045229 System and method for the manufacture of surgical blades |
| 03/01/2007 | US20070045227 Method of stripping photoresist |
| 03/01/2007 | US20070045226 Technique for reducing silicide defects by reducing deleterious effects of particle bombardment prior to silicidation |
| 03/01/2007 | US20070044916 Vacuum processing system |
| 03/01/2007 | US20070044915 Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same |
| 03/01/2007 | US20070044718 Wafer Holder and Semiconductor Manufacturing Apparatus |
| 02/28/2007 | EP1756331A1 Container for holding and storing liquids as well as viscous substances, and method for the production thereof |
| 02/28/2007 | CN1922463A Method and apparatus for measuring film thickness by means of coupled eddy sensors |
| 02/28/2007 | CN1922344A Apparatus for electroless deposition |