| Patents for C23F 1 - Etching metallic material by chemical means (16,062) |
|---|
| 08/15/2006 | US7090339 Liquid discharge head and method of manufacturing the same |
| 08/10/2006 | WO2006083693A2 Etchant treatment processes for substrate surfaces and chamber surfaces |
| 08/10/2006 | WO2006029823A3 Method for the treatment of metallic surfaces using formulations based on methanesulfonic acid having a low water content |
| 08/10/2006 | US20060175296 Method of manufacturing semiconductor device |
| 08/10/2006 | US20060175295 Abrasive partilcle for chemical mechanical polishing |
| 08/10/2006 | US20060175294 Chemical mechanical polishing method and apparatus |
| 08/10/2006 | US20060175293 Semiconductor device and method for manufacturing multilayered substrate for semiconductor device |
| 08/10/2006 | US20060175292 System and method for anisotropically etching a recess in a silicon substrate |
| 08/10/2006 | US20060175291 Control of process gases in specimen surface treatment system |
| 08/10/2006 | US20060175290 Photo resist stripping and de-charge method for metal post etching to prevent metal corrosion |
| 08/10/2006 | US20060175289 Method of fabricating semiconductor device |
| 08/10/2006 | US20060175288 Manufacturing method of quartz crystal vibrating piece, quartz crystal vibrator, oscillator, electronic device, and electric wave clock |
| 08/10/2006 | US20060175286 Making a thin film transistor panel of liquid crystal display by wet etching a multilayer metallic structure including a high melting metal film and an Al or alloy film using side etching technique with a photoresist mask; hot water washing to form a protective oxide film and dry etching using the mask |
| 08/10/2006 | US20060175204 Electrolyltic cell channels etching solution to cathode, anode, and exits; closed system which prevents gas from leaking; electrodeposition of copper at cathode; oxidizing Fe(II) to Fe (III); removing copper deposits; applying potential to prevent re-dissolving; returning; free of ion exchange membrane |
| 08/10/2006 | US20060175016 Plasma processing apparatus |
| 08/10/2006 | US20060175015 Etch chamber with dual frequency biasing sources and a single frequency plasma generating source |
| 08/10/2006 | US20060175014 Specimen surface treatment system |
| 08/10/2006 | US20060175013 Specimen surface treatment system |
| 08/10/2006 | US20060175010 Apparatus and a method for controlling the depth of etching during alternating plasma etching of semiconductor substrates |
| 08/10/2006 | US20060174834 Side RF coil and side heater for plasma processing apparatus |
| 08/09/2006 | CN1815689A Plasma processing apparatus |
| 08/08/2006 | US7087996 Etchant formulation for selectively removing thin films in the presence of copper, tin, and lead |
| 08/08/2006 | US7087183 Method of using an etchant solution for removing a thin metallic layer |
| 08/08/2006 | US7087122 Wafer backside plate for use in a spin, rinse, and dry module and methods for making and implementing the same |
| 08/08/2006 | CA2380683C Expandable stents and method for making same |
| 08/03/2006 | WO2006081290A2 Apparatus for electroless deposition of metals onto semiconductor substrates |
| 08/03/2006 | WO2006081233A2 Confinement ring drive |
| 08/03/2006 | WO2006081149A2 Novel polishing slurries and abrasive-free solutions having a multifunctional activator |
| 08/03/2006 | WO2006080977A2 Method and apparatus for cleaning and surface conditioning objects with plasma |
| 08/03/2006 | WO2005100636A3 Techniques for packaging and encapsulating components of diagnostic plasma measurement devices |
| 08/03/2006 | US20060172545 Purge process conducted in the presence of a purge plasma |
| 08/03/2006 | US20060172544 Member for plasma etching device and method for manufacture thereof |
| 08/03/2006 | US20060172542 Method and apparatus to confine plasma and to enhance flow conductance |
| 08/03/2006 | US20060170738 Ink-Jet Head and Connecting Structure |
| 08/03/2006 | US20060170076 Apparatus, system, and method for reducing integrated circuit peeling |
| 08/03/2006 | US20060169673 Plasma processing method and apparatus |
| 08/03/2006 | US20060169672 Film pattern forming method, film pattern, resist film, insulation film, circuit board, semiconductor device, surface elastic wave device, surface elastic wave oscillation device, electro-optic device, and electronic device |
| 08/03/2006 | US20060169671 Plasma etching apparatus and plasma etching method |
| 08/03/2006 | US20060169670 Method for etching a sample and etching system |
| 08/03/2006 | US20060169668 Low temperature etchant for treatment of silicon-containing surfaces |
| 08/03/2006 | US20060169667 Etching liquid for controlling silicon wafer surface shape and method for manufacturing silicon wafer using the same |
| 08/03/2006 | US20060169410 Plasma processing apparatus capable of controlling plasma emission intensity |
| 08/03/2006 | DE10244399B4 Defekt-Reparatur-Verfahren zur Reparatur von Masken-Defekten Defect repair method for repairing mask defects |
| 08/02/2006 | EP1685280A2 Apparatus for electroless deposition |
| 08/02/2006 | EP1345842B1 Method for producing a semiconductor component having a movable mass in particular, and semiconductor component produced according to this method |
| 08/02/2006 | EP1038046A4 Plasma reactor with a deposition shield |
| 08/02/2006 | CN1813081A Method for manufacturing water appliance made from copper alloy containing lead |
| 08/02/2006 | CN1812056A Method of machining substrate and method of manufacturing element |
| 08/02/2006 | CN1811013A Manufacture of single-side zinc plated steel plate |
| 08/02/2006 | CN1267582C Process for compensation of potassium hydroxide solution corrosion (100) silicon earth (110) crystal direction convex angle |
| 08/01/2006 | US7083741 Process and device for the wet-chemical treatment of silicon |
| 08/01/2006 | US7083700 Methods and apparatuses for planarizing microelectronic substrate assemblies |
| 07/27/2006 | WO2006078851A2 End point detection method for plasma etching of semiconductor wafers with low exposed area |
| 07/27/2006 | WO2005112072A3 Segmented baffle plate assembly for a plasma processing system |
| 07/27/2006 | WO2005079476B1 Method of dry plasma etching semiconductor materials |
| 07/27/2006 | US20060166506 Mask material for reactive ion etching, mask and dry etching method |
| 07/27/2006 | US20060166107 Method for plasma etching a chromium layer suitable for photomask fabrication |
| 07/27/2006 | US20060166106 Including a film stack having a chromium layer and a patterned photoresist; depositing a conforming polymethylene protective layer on the patterned photoresist; etching the polymer to expose chromium and etching the chromium layer; patterns with small features; improves trenches |
| 07/27/2006 | US20060163531 slurries containing hydrogen peroxide as an oxidizer and glycine as a corrosion inhibitor, used for planishing semiconductors |
| 07/27/2006 | US20060163209 Laser machining |
| 07/27/2006 | US20060163208 Photoresist stripping composition and methods of fabricating semiconductor device using the same |
| 07/27/2006 | US20060163207 Substrate treating apparatus and substrate treating method using the same |
| 07/27/2006 | US20060163206 Novel polishing slurries and abrasive-free solutions having a multifunctional activator |
| 07/27/2006 | US20060163205 Substrate processing method and substrate processing apparatus |
| 07/27/2006 | US20060163204 Tape removal in semiconductor structure fabrication |
| 07/27/2006 | US20060163203 Methods and apparatus for etching metal layers on substrates |
| 07/27/2006 | US20060163202 Plasma etching method |
| 07/27/2006 | US20060163201 Plasma processing system and plasma treatment process |
| 07/27/2006 | US20060163200 Plasmaless dry contact cleaning method using interhalogen compounds |
| 07/27/2006 | US20060163198 Pattern formation method |
| 07/27/2006 | US20060163197 Electromagnetic shielding sheet, front plate for display, and method for producing electromagnetic shielding sheet |
| 07/27/2006 | US20060163196 Method for producing magnetic memory device |
| 07/27/2006 | US20060163195 Method for making a contact magnetic transfer template |
| 07/27/2006 | US20060162863 Semiconductor plasma-processing apparatus and method |
| 07/27/2006 | US20060162741 Method and apparatus for cleaning and surface conditioning objects with plasma |
| 07/27/2006 | US20060162661 Mixing energized and non-energized gases for silicon nitride deposition |
| 07/27/2006 | US20060162660 Recovery processing method to be adopted in substrate processing apparatus, substrate processing apparatus and program |
| 07/27/2006 | US20060162657 Confinement ring drive |
| 07/27/2006 | US20060162656 Reduced volume, high conductance process chamber |
| 07/27/2006 | DE10321590B4 Verfahren zur Mikrostrukturierung von Pd-haltigen Funktionsschichten A method for microstructuring by Pd-containing functional layers |
| 07/26/2006 | CN1808691A Vacuum processing apparatus |
| 07/25/2006 | US7081623 Wafer-based ion traps |
| 07/25/2006 | US7081415 Method of dry plasma etching semiconductor materials |
| 07/25/2006 | US7081182 Method and apparatus for automatically measuring the concentration of TOC in a fluid used in a semiconductor manufacturing process |
| 07/20/2006 | WO2006076392A2 Polishing slurries and methods for chemical mechanical polishing |
| 07/20/2006 | WO2006076253A2 Plasma processing system and baffle assembly for use in plasma processing system |
| 07/20/2006 | WO2006075483A1 TFT SUBSTRATE AND PRODUCTION METHOD THEREFOR, AND TRANSPARENT CONDUCTIVE FILM LAMINATE SUBSTRATE PROVIDED WITH Al WIRING AND PRODUCTION METHOD THEREFOR, AND TRANSPARENT CONDUCTIVE FILM LAMINATE CIRCUIT BOARD PROVIDED WITH Al WIRING AND PRODUCTION METHOD THEREFOR, AND OXIDE TRANSPARENT CONDUCTIVE FILM MATERIAL |
| 07/20/2006 | WO2006051018A3 Method for finishing a through hole |
| 07/20/2006 | US20060157450 Method for improving hss cmp performance |
| 07/20/2006 | US20060157449 Plasma processing apparatus and a plasma processing method |
| 07/20/2006 | US20060157448 Methods for removing black silicon and black silicon carbide from surfaces of silicon and silicon carbide electrodes for plasma processing apparatuses |
| 07/20/2006 | US20060157446 End point detection method for plasma etching of semiconductor wafers with low exposed area |
| 07/20/2006 | US20060157443 Pattern reversal process for self aligned imprint lithography and device |
| 07/20/2006 | US20060157442 Method and apparatus for forming surface shape, method and apparatus for forming flying surface shape of magnetic head |
| 07/20/2006 | US20060157440 Semiconductor probe with resistive tip and method of fabricating the same |
| 07/20/2006 | US20060157201 Capacitively coupled plasma reactor with magnetic plasma control |
| 07/20/2006 | US20060157200 Method and apparatus for forming surface shape, method and apparatus for forming flying surface shape of magnetic head |
| 07/20/2006 | US20060157199 Substrate processing system for performing exposure process in gas atmosphere |
| 07/20/2006 | US20060157198 Member for plasma processing apparatus and plasma processing apparatus |
| 07/20/2006 | US20060157197 Substrate processing apparatus |