Patents for C23F 1 - Etching metallic material by chemical means (16,062)
10/2006
10/04/2006CN1840739A Regeneration of cupric etchants and recovery of copper sulfate
10/04/2006CN1840738A Refining method for copper chloride etching waste liquid and refined copper chloride solution
10/04/2006CN1840323A Disk templet manufacturing method
10/04/2006CN1278394C Equipment and method for etching silicon nitride thin film
10/03/2006US7115214 Method of forming barrier layer
10/03/2006US7115212 Method for etching
10/03/2006US7115185 Pulsed excitation of inductively coupled plasma sources
10/03/2006US7114532 Liner for use in processing chamber
10/03/2006US7114448 Method for large-area patterning dissolved polymers by making use of an active stamp
09/2006
09/28/2006WO2006101897A2 Method and apparatus for monitoring plasma conditions in an etching plasma processing facility
09/28/2006WO2006101638A2 Printed circuit patterned embedded capacitance layer
09/28/2006US20060216941 Method for removing silicon oxide film and processing apparatus
09/28/2006US20060213871 Method for producing a laser marking on reflective material
09/28/2006US20060213869 Method for controlling a CMP process and polishing cloth
09/28/2006US20060213867 Plasma etching method and apparatus therefor
09/28/2006US20060213866 Plasma etching method, plasma etching apparatus, control program and computer storage medium
09/28/2006US20060213865 Method and device for plasma-etching organic material film
09/28/2006US20060213617 Load bearing insulator in vacuum etch chambers
09/28/2006US20060213616 Plasma etching method, plasma etching apparatus, control program, computer recording medium and recording medium having processing recipe recorded thereon
09/27/2006EP1704586A1 System and method for selective etching of silicon nitride during substrate processing
09/27/2006CN1839219A Adhesion promotion in printed circuit boards
09/27/2006CN1839023A Capillary imprinting technique
09/27/2006CN1838387A Etching method and apparatus
09/27/2006CN1276736C Molding of fastening hooks and other assembly
09/26/2006US7112795 Method of controlling metallic layer etching process and regenerating etchant for metallic layer etching process based on near infrared spectrometer
09/21/2006WO2005094404A3 Semiconductor manufacturing gas flow divider system and method
09/21/2006WO2005091974A3 Methods for the optimization of substrate etching in a plasma processing system
09/21/2006US20060211253 Method and apparatus for monitoring plasma conditions in an etching plasma processing facility
09/21/2006US20060211251 Removal of copper oxides from integrated interconnects
09/21/2006US20060211248 Purifier for chemical reactor
09/21/2006US20060211158 Method and apparatus for perforating printed circuit board
09/21/2006US20060208611 Micro movable device and method of making the same using wet etching
09/21/2006US20060207973 Apparatus adapted to engrave a label and related method
09/21/2006US20060207972 Method for realizing microchannels in an integrated structure
09/21/2006US20060207971 Atmospheric transfer chamber, processed object transfer method, program for performing the transfer method, and storage medium storing the program
09/21/2006US20060207970 forming multilayers of dielectric ceramic, electroconductive metals and circuit substrates, then perforating the ceramic, removing the ceramic and metal layer in the perforated region by etching, breaking and washing away the ceramic layer, to form capacitors integrated with multilayer circuit boards
09/21/2006US20060207969 Substrate treating apparatus and substrate treating method
09/21/2006US20060207964 Method for releasing a micromechanical structure
09/21/2006US20060207725 Substrate mounting table, substrate processing apparatus and substrate processing method
09/21/2006US20060207724 Method of removing oxide film on a substrate with hydrogen and fluorine radicals
09/21/2006US20060207630 Device for cleaning cvd device and method of cleaning cvd device
09/21/2006DE19810810B4 Verfahren zum Nassätzen eines LCD-Glassubstrats sowie Ätzvorrichtung zur Durchführung des Verfahrens A method of wet etching of an LCD glass substrate, and etching apparatus for performing the method
09/20/2006CN1836061A Etching solution for titanium-containing layer and method for etching titanium-containing layer
09/20/2006CN1835188A Micro movable device and method of making the same using wet etching
09/20/2006CN1834292A Method for releasing a micromechanical structure
09/20/2006CN1276128C Medicament capable of making diamond tool bit sharp
09/19/2006US7108798 Defect repair method, in particular for repairing quartz defects on alternating phase shift masks
09/19/2006US7108795 surface treatment with adhesion promoters, then with acid resistance promoters, and with post-dip solutions, to form surfaces suitable for subsequent multilayer lamination; printed circuits having bonding strength
09/19/2006US7108751 Method and apparatus for determining consumable lifetime
09/19/2006CA2214523C Purification of metal containing solutions
09/14/2006WO2005103333A3 Wafer heater assembly
09/14/2006US20060205325 Material for purification of semiconductor polishing slurry, module for purification of semiconductor polishing slurry and process for producing semiconductor polishing slurry
09/14/2006US20060205217 Method and system for reducing wafer edge tungsten residue utilizing a spin etch
09/14/2006US20060205216 Etching method and apparatus
09/14/2006US20060205188 Plasma igniting method and substrate processing method
09/14/2006US20060201913 Methods and compositions for removing Group VIII metal-containing materials from surfaces
09/14/2006US20060201911 Methods of etching photoresist on substrates
09/14/2006US20060201909 Roller with microstructure and the manufacturing method thereof
09/14/2006US20060201908 Liquid ejection head and method of producing same
09/14/2006US20060201625 Apparatus for manufacturing semiconductor
09/14/2006US20060201624 Method of in-situ chamber cleaning
09/14/2006US20060201623 Low temperature wafer backside cleaning
09/14/2006US20060201428 Shower head and method of fabricating the same
09/14/2006DE10049579B4 Verfahren zur Herstellung einer dekorativen Oberfläche A process for producing a decorative surface
09/13/2006CN1833050A Method of manufacturing vacuum plasma treated workpieces and system for vacuum plasma treating workpieces
09/13/2006CN1274881C Method for removing lead from plated cylindrical article made of lead-containing copper alloy and metal fitting for hydrant, and method for preventing leaching of lead from article made of lead-contai
09/13/2006CN1274880C Stripping liquid nickel or nickel alloy
09/12/2006USRE39273 Hard masking method for forming patterned oxygen containing plasma etchable layer
09/12/2006US7105475 Cleaning solution and cleaning method of a semiconductor device
09/12/2006US7105454 Use of ammonia for etching organic low-k dielectrics
09/12/2006US7105103 System and method for the manufacture of surgical blades
09/12/2006US7105097 Substrate and method of forming substrate for fluid ejection device
09/12/2006US7105080 Digital, programmable unit with storage means for the operating programs
09/12/2006US7105075 DC power supply utilizing real time estimation of dynamic impedance
09/12/2006US7104476 Multi-sectored flat board type showerhead used in CVD apparatus
09/08/2006WO2005042794A3 Triangular nanoframes and methods of making same
09/07/2006US20060199394 Cupric chloride solution and triazole compound; capable of forming an etching-inhibiting coating; nonuniform irregularities formed on the side wall of the circuit pattern by the etching improves the adhesion between the circuit pattern and an insulating resin layer covering the circuit pattern
09/07/2006US20060199109 Phase Shift Photomask and Method for Improving Printability of a Structure on a Wafer
09/07/2006US20060199082 Mask repair
09/07/2006US20060196850 Polishing slurry composition and method of using the same
09/07/2006US20060196848 Use of a chemical-mechanical polishing system comprising an inorganic abrasive, a polishing additive such as aniline, and a liquid carrier, pH of 4 to 6; polishing silicon dioxide; Shallow Trench Isolation (STI); does not contain significant amounts of crosslinked polymer abrasives
09/07/2006US20060196847 Plasma processing method and apparatus
09/07/2006US20060196846 Plasma processing method and apparatus, and method for measuring a density of fluorine in plasma
09/07/2006US20060196845 Quartz Tuning-Fork Resonators and Production Method
09/07/2006US20060196843 Process for fabricating monolithic membrane substrate structures with well-controlled air gaps
09/07/2006US20060196605 Method and apparatus for plasma processing
09/07/2006US20060196604 Gas supply member and plasma processing apparatus
09/07/2006US20060196603 Gas baffle and distributor for semiconductor processing chamber
09/07/2006US20060196527 Method of surface processing substrate, method of cleaning substrate, and programs for implementing the methods
09/07/2006US20060196425 Reflectors, substrate processing apparatuses and methods for the same
09/07/2006US20060196422 Gate valve for semiconductor treatment system and vacuum container
09/07/2006DE102004063857A1 Wafer cutting process comprises treating a workpiece surface on its stretching table
09/06/2006EP1698215A1 Method of manufacturing an electrical component
09/06/2006EP1490191A4 System and method for the manufacture of surgical blades
09/06/2006CN1830069A Adjustable gas distribution system
09/06/2006CN1829823A Integrated tool with interchangeable processing components for processing microfeature workpieces and automated calibration systems
09/06/2006CN1827855A Liquid treating apparatus
09/05/2006US7101809 Method of manufacturing a substrate for an electronic device by using etchant and electronic device having the substrate
09/05/2006US7101808 Chromate-free method for surface etching of stainless steel
09/05/2006US7101724 Method of fabricating semiconductor devices employing at least one modulation doped quantum well structure and one or more etch stop layers for accurate contact formation