C23F 1 - Etching metallic material by chemical means

Patents for C23F 1 - Etching metallic material by chemical means (16,062)
09/2006
09/05/2006	US7101517 Processing solution preparation and supply method and apparatus
09/05/2006	US7101245 Stable electrode design and method
09/05/2006	US7100532 Plasma production device and method and RF driver circuit with adjustable duty cycle
08/2006
08/31/2006	WO2006091909A2 Etching and cleaning bpsg material using supercritical processing
08/31/2006	WO2006091316A2 Improved rinsing step in supercritical processing
08/31/2006	WO2006091312A2 Improved cleaning step in supercritical processing
08/31/2006	US20060194441 Method for etching a silicon wafer and method for performing differentiation between the obverse and the reverse of a silicon wafer using the same method
08/31/2006	US20060194437 Use of pulsed grounding source in a plasma reactor
08/31/2006	US20060191872 Polishing a wafer having a first silicon dioxide region and a second silicon nitride region by moving the wafer and a fixed abrasive article in an aqueous solution containing 1.5 to 4 % by weight of a polymethacrylic acid and/or a polysulfonic acid having a pH of 6 to 8
08/31/2006	US20060191871 Cmp slurry delivery system and method of mixing slurry thereof
08/31/2006	US20060191870 Extended kalman filter incorporating offline metrology
08/31/2006	US20060191869 Method for roughening copper surfaces for bonding to substrates
08/31/2006	US20060191868 Concept for the wet-chemical removal of a sacrificial material in a material structure
08/31/2006	US20060191867 Ionization; deuterium compounds; lamination
08/31/2006	US20060191865 Method of processing substrate, method of manufacturing solid-state imaging device, method of manufacturing thin film device, and programs for implementing the methods
08/31/2006	US20060191864 Mask, mask manufacturing method, pattern forming apparatus, and pattern formation method
08/31/2006	US20060191863 Method for fabricating etch mask and patterning process using the same
08/31/2006	US20060191862 Ink jet recording head, manufacturing method therefor, and substrate for ink jet recording head manufacture
08/31/2006	US20060191861 Embossing plate with a three-dimensional structure for the production of documents by a hot-cold laminating press
08/31/2006	US20060191639 Substrate holding structure and substrate processing device
08/31/2006	US20060191638 Etching apparatus for semiconductor fabrication
08/31/2006	US20060191637 Etching Apparatus and Process with Thickness and Uniformity Control
08/31/2006	US20060191635 Wafer treating apparatus
08/31/2006	US20060191484 Chuck pedestal shield
08/31/2006	US20060191480 Plasma processing apparatus and semiconductor device manufactured by the same apparatus
08/30/2006	CN1825600A Semiconductor device
08/30/2006	CN1824835A Method for recovering hydrochloric acid and copper sulfate from acidic etching liquid
08/30/2006	CN1824834A Etching solution composition for titanium and aluminium cascade metal films
08/30/2006	CN1824833A Porous indium phosphide barrier layer, corrosion liquid of porous indium phosphide and use method
08/30/2006	CN1824832A Surface treatment method of Mg alloy
08/30/2006	CN1272835C Dry etching method for gallium nitride materials
08/29/2006	US7098047 Wafer reuse techniques
08/29/2006	US7097948 Method for repair of photomasks
08/29/2006	US7097783 Method for inspecting a titanium-based component
08/29/2006	US7097781 Method for manufacturing porous structure and method for forming pattern
08/29/2006	US7097780 Aluminum composite material and method of producing the same
08/29/2006	US7097776 Method of fabricating microneedles
08/29/2006	US7097713 Method for removing a composite coating containing tantalum deposition and arc sprayed aluminum from ceramic substrates
08/24/2006	WO2006088738A2 Application of in-situ plasma measurements to performance and control of a plasma processing system
08/24/2006	WO2006088697A2 Methods of making gas distribution members for plasma processing apparatuses
08/24/2006	WO2006055984A3 Substrate processing apparatus using a batch processing chamber
08/24/2006	WO2005101100A3 Method and apparatus for in-situ film stack processing
08/24/2006	US20060189498 Aqueous composition for the chemical removal of metallic surfacing present on turbine blades, and its use
08/24/2006	US20060189168 Plasma generator, ozone generator, substrate processing apparatus and manufacturing method of semiconductor device
08/24/2006	US20060189145 Method of manufacturing a semiconductor device from which damage layers and native oxide films in connection holes have been removed
08/24/2006	US20060189142 Method for making a sub-micron solid oxide electrolyte membrane
08/24/2006	US20060189141 Solution for etching copper surfaces and method of depositing metal on copper surfaces
08/24/2006	US20060189132 Method for forming porous thin film
08/24/2006	US20060189123 Etchant and method of etching
08/24/2006	US20060189006 Method and apparatus for detecting end point
08/24/2006	US20060187063 Selective metal removal process for metallized retro-reflective and holographic films and radio frequency devices made therewith
08/24/2006	US20060186089 Chemical mechanical polishing method
08/24/2006	US20060186088 Etching and cleaning BPSG material using supercritical processing
08/24/2006	US20060186086 Composition for forming a polymer layer and method of forming a pattern using the same
08/24/2006	US20060186085 Method for the production of a micromechanical part preferably used for fluidic applications, and micropump comprising a pump membrane made of a polysilicon layer
08/24/2006	US20060185794 Porous films and bodies with enhanced mechanical strength
08/24/2006	US20060185792 Substrate processing apparatus of and substrate processing method for treating substrate with predetermined processing by supplying processing liquid to rim portion of rotating substrate
08/23/2006	EP1289678B1 Process for improving the adhesion of polymeric materials to metal surfaces
08/23/2006	EP0738160B1 Process for treating an implant of titanium or an alloy of titanium
08/23/2006	CN1822915A Method of making a thin die to be used in a press
08/23/2006	CN1822350A Method of manufacturing thin film transistor
08/23/2006	CN1821446A Acid corrosion solution for preparing multicrystal silicon pile surface and its using method
08/23/2006	CN1271689C Wet-anisotropic etching of silicon
08/23/2006	CN1270946C Semiconductor substrate processing system and throughput enhancement method of the same
08/22/2006	US7094316 Externally excited torroidal plasma source
08/22/2006	US7094314 Atmospheric pressure non-thermal plasma device to clean and sterilize the surfaces of probes, cannulas, pin tools, pipettes and spray heads
08/22/2006	US7094313 Universal mid-frequency matching network
08/22/2006	US7094312 Focused particle beam systems and methods using a tilt column
08/17/2006	WO2006085881A1 Elevator load bearing member having a jacket with at least one traction-enhancing exterior surface
08/17/2006	WO2006038990A3 Method for treating a substrate
08/17/2006	US20060183337 Post high voltage gate dielectric pattern plasma surface treatment
08/17/2006	US20060183333 Methods of fabricating semiconductor device using sacrificial layer
08/17/2006	US20060183297 Etching solution for removal of oxide film, method for preparing the same, and method of fabricating semiconductor device
08/17/2006	US20060183060 Nano-imprint lithography method involving substrate pressing
08/17/2006	US20060183056 Method for isotropic etching of copper
08/17/2006	US20060180952 Imprint lithography
08/17/2006	US20060180787 Cerium oxide abrasive and method of polishing substrates
08/17/2006	US20060180574 Thin film support substrate for use in hydrogen production filter and production method of hydrogen production filter
08/17/2006	US20060180572 Removal of post etch residue for a substrate with open metal surfaces
08/17/2006	US20060180571 Plasma etching method and apparatus, control program for performing the etching method, and storage medium storing the control program
08/17/2006	US20060180570 Application of in-situ plasma measurements to performance and control of a plasma processing system
08/17/2006	US20060180569 Method of manufacturing step contact window of flat display panel
08/17/2006	US20060180275 Methods of making gas distribution members for plasma processing apparatuses
08/17/2006	US20060180173 System and method for removal of materials from an article
08/17/2006	US20060180084 Substrate susceptor for receiving a substrate to be deposited upon
08/17/2006	US20060180083 Positioning board for positioning heater lines during plasma enhanced CVD (PECVD)
08/16/2006	EP1690136A2 A method of forming a patterned layer on a substrate
08/16/2006	EP1689907A2 Plasma production device and method and rf driver circuit with adjustable duty cycle
08/16/2006	EP1332241A4 Electrostatically clamped edge ring for plasma processing
08/16/2006	EP1212202B1 Non-ferrous/ferromagnetic laminated graphic arts impression dies and method of producing same
08/16/2006	CN1819748A Etching liquid, bulking liquid and forming method of conductive image using same
08/16/2006	CN1819119A Silicon member and method of manufacturing the same
08/16/2006	CN1818146A Weak corrosive agent of external lead wire of electronic device
08/16/2006	CN1818137A Production of hinge thin-sheet paper cameo module
08/16/2006	CN1269996C Selectively removing braze composition from conneted assembly
08/16/2006	CN1269994C Apparatus for spraying printed circuit-board
08/15/2006	US7090784 Method for manufacturing porous structure and method for forming pattern
08/15/2006	US7090742 Device for producing inductively coupled plasma and method thereof
08/15/2006	US7090727 Heated gas line body feedthrough for vapor and gas delivery systems and methods for employing same
08/15/2006	US7090716 Single phase fluid imprint lithography method

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