C23F 1 - Etching metallic material by chemical means

Patents for C23F 1 - Etching metallic material by chemical means (16,062)
11/2006
11/30/2006	US20060270306 Stable electrode design and method
11/30/2006	US20060270239 Reverse ALD
11/30/2006	US20060270230 Critical dimension control for integrated circuits
11/30/2006	US20060266736 Detecting particle agglomeration in chemical mechanical polishing slurries
11/30/2006	US20060266731 Etchant rinse method
11/30/2006	US20060266730 Microelectromechanical structure and a method for making the same
11/30/2006	US20060266478 Critical dimension reduction and roughness control
11/29/2006	EP1725700A1 Method for removing a coating and single-chamber device for carrying out said method
11/29/2006	CN1871373A Plasma production device and method and RF driver circuit with adjustable duty cycle
11/29/2006	CN1869285A Decoating liquid
11/29/2006	CN1869284A Chemical grooving technical process and device using rotation corrosion liquid spraying method
11/29/2006	CN1868862A Gravity liquid state etching method capable of controlling structure size
11/29/2006	CN1287009C Surface treatment to improve corrosion resistance of austenitic stainless steels
11/28/2006	US7141516 High frequency plasma generator and high frequency plasma generating method
11/28/2006	US7141180 Etchant for wire, method of manufacturing wire using etchant, thin film transistor array panel including wire and manufacturing method thereof
11/28/2006	US7141177 Etching method and composition for forming etching protective layer
11/28/2006	US7141138 Gas delivery system for semiconductor processing
11/28/2006	US7141120 Manufacturing apparatus of semiconductor device having introducing section and withdrawing section
11/28/2006	US7140321 Plasma processing apparatus and method
11/23/2006	WO2006124966A2 Low temperature absorption layer deposition and high speed optical annealing system
11/23/2006	WO2006124693A2 Method and composition for improving adhesion of organic polymer coatings with copper surface
11/23/2006	US20060264053 Method of aligning nanotubes and wires with an etched feature
11/23/2006	US20060264052 Method of forming a platinum pattern
11/23/2006	US20060261042 Forming a trench in the wafer of crystalline material on a first side of a crystalline material, the trench comprising blade profile of a blade; isotropically etching
11/23/2006	US20060261038 Single wafer cleaning method to reduce particle defects on a wafer surface
11/23/2006	US20060261037 Substrate processing method and substrate processing apparatus
11/23/2006	US20060261036 Method for patterning on a wafer having at least one substrate for the realization of an integrated circuit
11/23/2006	US20060261033 Alignment of multicomponent microfabricated structures
11/23/2006	US20060261032 Integrated optical MEMS devices
11/23/2006	US20060260750 Plasma processing apparatuses and methods
11/23/2006	US20060260749 Substrate processing apparatus and substrate processing method
11/23/2006	US20060260747 Gas introduction system for temperature adjustment of object to be processed
11/23/2006	US20060260545 Low temperature absorption layer deposition and high speed optical annealing system
11/23/2006	DE102006003604A1 Verfahren zur Mikrostrukturierung von Festkörperoberflächen Process for microstructuring of solid surfaces
11/22/2006	EP1421164B1 Surface treatment composition and method for removing si component and reduced metal salt produced on the aluminum dicast material in etching process
11/22/2006	EP1359865B1 Methods and apparatus for manufacturing an intravascular stent
11/22/2006	CN1285765C Acidic treatment liquid and method of treating copper surfaces
11/22/2006	CN1285757C Electrostatically clamped edge ring for plasma processing
11/21/2006	US7138342 Combined chemical cleaning and etching of parts made of aluminum or alloys by contacting with a solution of phosphoric acid, hydrogen fluoride, sulfamic acid, glycol ether, and water; periodically restoring etching rate by adding HF; adding sufficient sulfamic acid to prevent the formation of scale
11/21/2006	US7138069 immersion of martensite steels into solution comprising nitric acid, hydrofluoric acid and iron ions then rinsing in water, to obtain smooth, brigth and white surfaces
11/21/2006	US7138065 Method for removing at least one area of a layer of a component consisting of metal or a metal compound
11/21/2006	US7137354 Plasma immersion ion implantation apparatus including a plasma source having low dissociation and low minimum plasma voltage
11/16/2006	WO2006121563A2 Method and system for line-dimension control of an etch process
11/16/2006	WO2005103332A3 Improved micro-fluid ejection assemblies
11/16/2006	US20060258160 Method of manufacturing semiconductor device
11/16/2006	US20060258022 Method for the calibration of radio frequency generator output power
11/16/2006	US20060255315 Selective removal chemistries for semiconductor applications, methods of production and uses thereof
11/16/2006	US20060255015 Surface modified colloidal abrasives, including stable bimetallic surface coated silica sols for chemical mechanical planarization
11/16/2006	US20060255010 Method and system for line-dimension control of an etch process
11/16/2006	US20060255008 Photonic sensor particles and fabrication methods
11/16/2006	US20060254717 Plasma processing apparatus
11/16/2006	US20060254716 Processing system and method for chemically treating a tera layer
11/16/2006	US20060254680 Aluminium alloy for lithographic sheet
11/16/2006	DE112005000153T5 Erweiterte Multidruck-Werkstückprozessierung Advanced multi-pressure Werkstückprozessierung
11/15/2006	EP1721177A2 Rf sensor clamp assembly
11/15/2006	EP1273033B1 Trihydroxybenzene composition for inhibition of titanium corrosion
11/15/2006	CN1863940A Silicon blades for surgical and non-surgical use
11/15/2006	CN1862834A Zinc oxide based film transistor and chip preparing process
11/15/2006	CN1861846A Removing process of residual copper on cathode foil surface for improved aluminium electrolyzing capacitor
11/15/2006	CN1861425A Making method of cardboard craft New year pictures
11/15/2006	CN1285105C Chemical corrosion method for 40Gb/s waveguide type PIN photo-detector tube core table
11/14/2006	US7136150 Imprint lithography template having opaque alignment marks
11/14/2006	US7135124 Method for thinning wafers that have contact bumps
11/09/2006	WO2006118537A1 Method for adsorption of metal and an adsorption material directed thereto and method for re-use of the adsorption material
11/09/2006	WO2006072021A3 Processes for forming electronic devices and electronic devices formed by such processes
11/09/2006	WO2005098083A3 Miniature microwave plasma torch application and method of use thereof
11/09/2006	US20060252275 Gas delivery device method for improved deposition of dielectric material
11/09/2006	US20060252270 LIthographic apparatus and device manufacturing method utilizing a flat panel display handler
11/09/2006	US20060252265 Etching high-kappa dielectric materials with good high-kappa foot control and silicon recess control
11/09/2006	US20060249481 Plasma processing method
11/09/2006	US20060249480 Laser machining using an active assist gas
11/09/2006	US20060249252 Slurry for use in polishing semiconductor device conductive structures that include copper and tungsten and polishing methods
11/09/2006	US20060249079 Wafer heater and wafer chuck including the same
11/09/2006	DE102004049825B4 Verfahren zum Entschichten von beschichteten Bauteilen A method for stripping of coated components
11/08/2006	EP1718785A2 Method for zinc coating aluminum
11/08/2006	EP1718420A1 Substrate processing apparatus and method
11/08/2006	EP1552037B1 Method for removing a layer area of a component
11/08/2006	EP1188173B1 Method utilizing a magnetic assembly during etching thin shadow masks
11/08/2006	EP0882570B1 Process for manufacturing a thermoplastic polyester resin-coated aluminum alloy plate
11/08/2006	CN1860832A Improved method for micro-roughening treatment of copper and mixed-metal circuitry
11/08/2006	CN1859959A Single phase fluid imprint lithography method
11/08/2006	CN1283836C Etching solution of tetramethyl ammonium hydroxide in use for etching silicon, and preparation method
11/07/2006	US7132370 Method for selective removal of high-k material
11/07/2006	US7132218 Chemically amplified positive resist composition
11/07/2006	US7132040 Matching unit for semiconductor plasma processing apparatus
11/07/2006	US7132035 Methods, apparatuses, and substrate assembly structures for fabricating microelectronic components using mechanical and chemical-mechanical planarization processes
11/07/2006	US7132034 Apparatus for etching a glass substrate
11/07/2006	US7131391 Plasma reaction chamber liner comprising ruthenium
11/02/2006	WO2006115542A2 Method and apparatus for cleaning and surface conditioning objects with plasma
11/02/2006	US20060246731 Semiconductor device fabrication method
11/02/2006	US20060246722 Etching technique for the fabrication of thin (AI, In, Ga)N layers
11/02/2006	US20060243389 Substrate processing apparatus and method, and program and storage medium
11/02/2006	DE10225925B4 Ätzverfahren unter Verwendung einer Photolack-Ätzbarriere Etching processes using a photoresist etch
11/01/2006	CN1855422A Production of semiconductor component and plug
11/01/2006	CN1854343A Copper etching liquid and its circulative usage
11/01/2006	CN1854342A Method for controlling concentration of peroxide and copper in microetching liquid and its circulative usage
11/01/2006	CN1282983C Method utilizing magnetic assembly during etching thin shadow masks
11/01/2006	CN1282505C Process for improving adhesion of polymeric materials to metal surfaces
10/2006
10/31/2006	US7130103 Optical modulator and manufacturing method of optical modulator
10/31/2006	US7129182 Method for etching a thin metal layer

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