| Patents for C23F 1 - Etching metallic material by chemical means (16,062) |
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| 09/14/2005 | EP1573771A2 System and method for removal of materials from an article |
| 09/14/2005 | CN1669128A High temperature anisotropic etching of multi-layer structures |
| 09/14/2005 | CN1667159A Silver coin blank surface deep corrosion process |
| 09/14/2005 | CN1219113C Multiple etching technique for imitating cast copper, and its products |
| 09/13/2005 | US6943448 Multi-metal layer MEMS structure and process for making the same |
| 09/13/2005 | US6943068 Method for fabricating nanometer gate in semiconductor device using thermally reflowed resist technology |
| 09/13/2005 | US6942816 Methods of reducing photoresist distortion while etching in a plasma processing system |
| 09/13/2005 | US6942811 Method for achieving improved selectivity in an etching process |
| 09/09/2005 | WO2005082774A2 Method for making a planar cantilever mems switch |
| 09/08/2005 | US20050196962 Method for forming a self-aligned germanide and devices obtained thereof |
| 09/08/2005 | US20050194564 Remove titanium thin film formed on a semiconductor wafer; acidic aqueous solution of sodium fluoride, trivalent titanium or divalent iron ions, copper corrosion inhibitor; high etching rate for titanium while suppressing corrosion of solder alloy, tin |
| 09/08/2005 | US20050194358 Alumina abrasive for chemical mechanical polishing |
| 09/08/2005 | US20050194357 useful for polishing tantalum barrier material and copper from semiconductor wafer, comprising by weight percent 0.1 to 30 oxidizer, 0.01 to 3 inorganic salt or acid, 0.01 to 4 inhibitor, 0.1 to 30 abrasive, 0 to 15 complexing agent, balance water |
| 09/08/2005 | US20050194355 Method for adjusting voltage on a powered faraday shield |
| 09/08/2005 | US20050194258 Electrochemical fabrication methods incorporating dielectric materials and/or using dielectric substrates |
| 09/08/2005 | US20050194099 Inductively coupled plasma source using induced eddy currents |
| 09/08/2005 | US20050194098 Cast design for plasma chamber cooling |
| 09/08/2005 | US20050194097 Plasma processing apparatus and method of designing the same |
| 09/08/2005 | US20050194096 Method and apparatus for semiconductor processing |
| 09/08/2005 | US20050194095 Semiconductor production apparatus |
| 09/08/2005 | US20050194093 Plasma processing apparatus |
| 09/08/2005 | US20050193951 Plasma processing apparatus |
| 09/08/2005 | US20050193946 Apparatus and method for preventing corrosion of a vacuum gauge |
| 09/08/2005 | DE10039558B4 Vorrichtung zur Sprühbehandlung von Leiterplatten Apparatus for spraying of printed circuit boards |
| 09/07/2005 | EP1571236A1 Process for surface conversion of an article |
| 09/07/2005 | CN1666322A Plasma processing device |
| 09/07/2005 | CN1666316A Method and apparatus for non-invasive measurement and analysis of semiconductor process parameters |
| 09/07/2005 | CN1666315A Method and apparatus for non-invasive measurement and analysis of semiconductor process parameters |
| 09/07/2005 | CN1664996A Plasma processing apparatus and method of designing the same |
| 09/07/2005 | CN1664995A Plasma processing method and plasma processing device |
| 09/07/2005 | CN1218373C Inhibition of titanium corrosion |
| 09/06/2005 | US6939472 Etching method in fabrications of microstructures |
| 09/06/2005 | US6939435 Plasma processing apparatus and processing method |
| 09/06/2005 | US6939409 Cleaning method and etching method |
| 09/01/2005 | WO2005080633A2 Method for zinc coating aluminum |
| 09/01/2005 | WO2005080007A1 Substrate processing apparatus and method |
| 09/01/2005 | WO2005079476A2 Method of dry plasma etching semiconductor materials |
| 09/01/2005 | US20050192663 Expandable stents and method for making same |
| 09/01/2005 | US20050191861 Using supercritical fluids and/or dense fluids in semiconductor applications |
| 09/01/2005 | US20050190322 Etching composition for laminated film including reflective electrode and method for forming laminated wiring structure |
| 09/01/2005 | US20050189319 One step copper damascene CMP process and slurry |
| 09/01/2005 | US20050189318 Method for forming macropores in a layer and products obtained thereof |
| 09/01/2005 | US20050189315 Method for manufacturing gratings in semiconductor materials |
| 09/01/2005 | US20050189074 Gas processing apparatus and method and computer storage medium storing program for controlling same |
| 09/01/2005 | US20050189073 Gas delivery device for improved deposition of dielectric material |
| 09/01/2005 | US20050189070 Plasma processing apparatus and processing method |
| 09/01/2005 | US20050189069 Plasma processing system and method |
| 09/01/2005 | US20050188548 Silicon blades for surgical and non-surgical use |
| 08/31/2005 | EP1569268A1 Plasma processing system and method and electrode plate of plasma processing system |
| 08/31/2005 | EP1568797A2 In-situ dry clean chamber for front end of line fabrication |
| 08/31/2005 | CN1661650A Apparatus for manufacturing flat-panel display |
| 08/31/2005 | CN1661130A Plasma processing apparatus, semiconductor manufacturing apparatus and electrostatic chucking unit used thereof |
| 08/30/2005 | US6936133 Method and apparatus for fixed abrasive substrate preparation and use in a cluster CMP tool |
| 08/25/2005 | WO2005078751A1 Method of manufacturing aluminum material for electrolytic capacitor electrodes, aluminum material for electrolytic capacitor electrodes, anode material for aluminum electrolytic capacitors, and aluminum electrolytic capacitors |
| 08/25/2005 | WO2005038094A3 Apparatus for electroless deposition |
| 08/25/2005 | US20050186359 Method for manufacturing conductive element substrate, conductive element substrate, method for manufacturing liquid crystal display, liquid crystal display and electronic information equipment |
| 08/25/2005 | US20050184836 Microelectromechanical device having a common ground plane layer and a set of contact teeth and method for making the same |
| 08/25/2005 | US20050183938 Head electrode region for a reliable metal-to-metal contact micro-relay MEMS switch |
| 08/25/2005 | US20050183828 Plasma processing apparatus, semiconductor manufacturing apparatus and electrostatic chucking unit used thereof |
| 08/25/2005 | US20050183827 Showerhead mounting to accommodate thermal expansion |
| 08/25/2005 | US20050183826 Showerheads for providing a gas to a substrate and apparatus and methods using the showerheads |
| 08/25/2005 | US20050183824 Apparatus for manufacturing flat-panel display |
| 08/25/2005 | US20050183821 Method and apparatus for non-invasive measurement and analysis of semiconductor process parameters |
| 08/25/2005 | US20050183819 Etching system using a deionized water adding device |
| 08/24/2005 | CN1659312A Acidic solution for silver deposition and method for silver layer deposition on metal surfaces |
| 08/24/2005 | CN1658737A Surface processing device of substrate material |
| 08/24/2005 | CN1658032A Conductive element substrate, liquid crystal display method for manufacturing liquid crystal display, and electronic information equipment |
| 08/24/2005 | CN1657921A Preparation method of X-ray diffraction sample rack |
| 08/18/2005 | WO2005075706A1 Surface-treating agent for metal |
| 08/18/2005 | WO2005074661A2 Rf sensor clamp assembly |
| 08/18/2005 | WO2005000363A3 Atmospheric pressure non-thermal plasma device to clean and sterilize the surface of probes, cannulas, pin tools, pipettes and spray heads |
| 08/18/2005 | WO2004102307A3 Method and system for monitoring and control of a chamber process |
| 08/18/2005 | US20050181590 Process for patterning high-k dielectric material |
| 08/18/2005 | US20050179744 Liquid discharge head and method of manufacturing the same |
| 08/18/2005 | US20050178742 Compositions and methods for rapidly removing overfilled substrates |
| 08/18/2005 | US20050178741 Method of etching porous dielectric |
| 08/18/2005 | US20050178740 Sequentially providing a plurality of dry plasma reaction gas mixtures; dividing the semiconductor structure into a masked portion and an unmasked portion; sequentially exposing the unmasked portion of the semiconductor structure to the dry plasma reaction gas mixtures |
| 08/18/2005 | US20050178669 Method of electroplating aluminum |
| 08/18/2005 | US20050178505 Electrode for dry etching a wafer |
| 08/18/2005 | US20050178409 Object processing apparatus and processing method |
| 08/18/2005 | DE10247499B4 Verfahren und Vorrichtung zum partiellen chemischen Abtragen einer Innenkontur eines Hohlkörpers Method and apparatus for partial chemical ablating an inner contour of a hollow body |
| 08/18/2005 | DE102004004140A1 Beizverfahren und Beizprodukt für Aluminium Pickling and pickling product for aluminum |
| 08/17/2005 | CN1655660A Power supply unit for generating plasma and plasma apparatus including the same |
| 08/17/2005 | CN1215503C Variable capacitor and method for mfg. metallic rotator of same |
| 08/17/2005 | CN1215198C Etching method and etching appts. |
| 08/16/2005 | US6930834 Method of manufacturing diffractive optical element |
| 08/16/2005 | US6930749 depositing metals on glass substrate, then etching over mask pattern (photoresists) with acid solution |
| 08/16/2005 | US6929713 In-situ photoresist removal by an attachable chamber with light source |
| 08/11/2005 | WO2005073433A1 Method for removing a coating and single-chamber device for carrying out said method |
| 08/11/2005 | WO2005073432A1 Pickling method and pickling product for aluminum surfaces |
| 08/11/2005 | US20050176238 Electrochemical fabrication methods incorporating dielectric materials and/or using dielectric substrates |
| 08/11/2005 | US20050175780 Acidic solution for silver deposition and method for silver layer deposition on metal surfaces |
| 08/11/2005 | US20050173374 Electrochemical fabrication methods incorporating dielectric materials and/or using dielectric substrates |
| 08/11/2005 | US20050173070 Power supply unit for generating plasma and plasma apparatus including the same |
| 08/11/2005 | US20050173069 Plasma generating apparatus and plasma processing apparatus |
| 08/11/2005 | US20050173067 Plasma etching chamber and plasma etching system using same |
| 08/10/2005 | CN1652661A Plasma generating apparatus and plasma processing apparatus |
| 08/10/2005 | CN1651608A Etching solution composition for metal films |
| 08/09/2005 | US6926801 Laser machining method and apparatus |
| 08/04/2005 | WO2005071721A1 Plasma etching process |