| Patents for C23F 1 - Etching metallic material by chemical means (16,062) |
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| 06/26/2007 | CA2286326C Article, method, and apparatus for electrochemical fabrication |
| 06/21/2007 | WO2007068193A1 A process for recovering and recycling of waste ammoniacal alkaline copper etchant by using metallic aluminum |
| 06/21/2007 | US20070141843 Substrate peripheral film-removing apparatus and substrate peripheral film-removing method |
| 06/21/2007 | US20070141729 Apparatus and method for controlling plasma density profile |
| 06/21/2007 | US20070141321 Fluid control device and method of manufacturing the same |
| 06/21/2007 | US20070138142 Microetching composition and method of using the same |
| 06/21/2007 | US20070138141 Method of polishing a semiconductor-on-insulator structure |
| 06/21/2007 | US20070138138 formed by dipping, picking; high silicon content, high strength; free from bald spots; conversion coatings with improved adhesion, corrosion resistance; for automobile chassis parts |
| 06/21/2007 | US20070138137 Method for patterning low dielectric layer of semiconductor device |
| 06/21/2007 | US20070138136 Method for etching photolithographic substrates |
| 06/21/2007 | US20070138133 Flexible fuel cell |
| 06/21/2007 | US20070138131 Method of forming a patterned layer on a substrate |
| 06/21/2007 | US20070138129 Method for manufacturing field emission cathode |
| 06/21/2007 | US20070137793 Processing apparatus |
| 06/21/2007 | US20070137677 Substrate cleaning method and substrate cleaning apparatus |
| 06/21/2007 | US20070137575 Plasma processing apparatus |
| 06/21/2007 | US20070137573 Apparatus for an optimized plasma chamber grounded electrode assembly |
| 06/21/2007 | US20070137572 Plasma processing apparatus |
| 06/20/2007 | EP1797220A2 Rf ground switch for plasma processing system |
| 06/20/2007 | CN1984523A Plasma processing apparatus and method |
| 06/20/2007 | CN1983646A Production of monocrystalline silicon solar battery suede |
| 06/20/2007 | CN1983645A Production of polycrystalline silicon solar battery suede |
| 06/20/2007 | CN1983644A Production of monocrystalline silicon solar battery suede |
| 06/20/2007 | CN1982505A Method for recovering and reutilizing copper etching agent containing amino-soda by metal aluminum |
| 06/20/2007 | CN1322797C Improved adhesion of polymeric materials to metal surfaces |
| 06/20/2007 | CN1322556C Work treating method and treating device |
| 06/20/2007 | CN1321747C Outdoor metal surface double coating antiseptic chromatic spray painting method |
| 06/19/2007 | US7232917 Cyclic fluorine compounds, polymerizable fluoromonomers, fluoropolymers, and resist materials containing the fluoropolymers and method for pattern formation |
| 06/19/2007 | US7232761 Method of chemical mechanical polishing with high throughput and low dishing |
| 06/19/2007 | US7232528 Surface treatment agent for copper and copper alloy |
| 06/19/2007 | US7232502 Sheet-fed treating device |
| 06/19/2007 | US7232478 Adhesion promotion in printed circuit boards |
| 06/19/2007 | US7232286 Seal device and method for operating the same and substrate processing apparatus comprising a vacuum chamber |
| 06/19/2007 | US7231705 Method for forming a resist pattern of magnetic device |
| 06/14/2007 | WO2007067254A1 Chamber dry cleaning |
| 06/14/2007 | WO2007044798A3 Optical metrological scale and laser-based manufacturing method therefor |
| 06/14/2007 | US20070134929 Etching method and etching apparatus |
| 06/14/2007 | US20070134417 decomposing the precursor of indium, and chemical vapor depositing iridium on the substrate in an oxidizing ambient environment which contain an oxidizing gas such as oxygen, ozone, air, and nitrogen oxide; precursors include Lewis base stabilized Ir(I) beta -diketonates |
| 06/14/2007 | US20070131652 Plasma etching method |
| 06/14/2007 | US20070131647 Semiconductor device and support method for designing the same |
| 06/14/2007 | US20070131645 Method of making an electronic device cooling system |
| 06/14/2007 | US20070131354 Plasma processing apparatus |
| 06/14/2007 | US20070131255 Method for removing a layer area of a component |
| 06/14/2007 | US20070131245 Method of cleaning plasma etching apparatus, and thus-cleanable plasma etching apparatus |
| 06/14/2007 | US20070131173 Wafer support system |
| 06/14/2007 | DE102005058869A1 Verfahren und Vorrichtung zur Beschichtung von Bändern Method and apparatus for coating of strips |
| 06/14/2007 | DE102005058713A1 Verfahren zur trockenchemischen Behandlung von Substraten, sowie dessen Verwendung A process for the dry-chemical treatment of substrates, and the use thereof |
| 06/13/2007 | EP1794351A2 Melamine-formaldehyde post-dip composition for improving adhesion of metal to polymer |
| 06/12/2007 | US7229569 For manufacturing a wiring using low resistance copper |
| 06/12/2007 | US7229565 Chemically assisted surface finishing process |
| 06/12/2007 | US7229564 Method for manufacturing bipolar plate and direct methanol fuel cell |
| 06/12/2007 | US7229563 Providing a nickel-containing layer overlying a substrate;introducing gas comprising a carbonyl gas and a hydrogen halide gas;forming plasma from said process gas; etching nickel-containing layer by exposing nickel-containing layer to plasma |
| 06/12/2007 | US7229522 Substrate processing apparatus and substrate processing method |
| 06/12/2007 | US7229521 Etching system using a deionized water adding device |
| 06/12/2007 | CA2280470C Novel demetallizing apparatus |
| 06/07/2007 | WO2007043688A9 FUNCTIONAL MEMBER FROM Co-BASED ALLOY AND PROCESS FOR PRODUCING THE SAME |
| 06/07/2007 | WO2006055937A3 Systems and methods for achieving isothermal batch processing of substrates used for the production of micro-electro-mechanical systems |
| 06/07/2007 | US20070128871 Etching apparatus and etching method |
| 06/07/2007 | US20070126773 Low ejction energy micro-fluid ejection heads |
| 06/07/2007 | US20070125751 Stripping device and stripping apparatus |
| 06/07/2007 | US20070125750 Method for removing post-etch residue from wafer surface |
| 06/07/2007 | US20070125749 Apparatus and method for removing protective film on article |
| 06/07/2007 | US20070125748 Method for controlling a thickness of a first layer and method for adjusting the thickness of different first layers |
| 06/07/2007 | US20070125747 Process for polishing glass substrate |
| 06/07/2007 | US20070125745 Method of making an ignition device |
| 06/07/2007 | US20070125494 Method and apparatus for an improved bellows shield in a plasma processing system |
| 06/06/2007 | EP1793016A1 Polishing and deburring composition for workpieces of carbon steel and method of chemical polishing and deburring |
| 06/06/2007 | CN1977364A Method and apparatus for reducing aspect ratio dependent etching in time division multiplexed etch processes |
| 06/06/2007 | CN1977068A Showerhead electrode assembly for plasma processing apparatuses |
| 06/06/2007 | CN1976789A Etch rate control |
| 06/06/2007 | CN1974849A Combined treating process of sludge from Cu and Sn electroplating and circuit board etching solution |
| 06/06/2007 | CN1974420A Method of treating and utilizing chromium containing waste electroplating solution |
| 06/06/2007 | CN1320608C Etching agent and etching method |
| 06/05/2007 | US7226640 Decomposing an iridium precursor, especially a Lewis base stabilized Ir(I) B-diketonates, in an oxidizing atmosphere |
| 06/05/2007 | US7226524 Plasma processing apparatus |
| 05/31/2007 | WO2007061112A1 Circuit member, method for manufacturing circuit member, and semiconductor device comprising circuit member |
| 05/31/2007 | WO2007059730A2 Method for the pre-treatment of titanium components for the subsequent coating thereof |
| 05/31/2007 | US20070123052 Process sequence for photoresist stripping and cleaning of photomasks for integrated circuit manufacturing |
| 05/31/2007 | US20070123050 Etch process used during the manufacture of a semiconductor device and systems including the semiconductor device |
| 05/31/2007 | US20070123049 Semiconductor process and method for removing condensed gaseous etchant residues on wafer |
| 05/31/2007 | US20070123047 Polishing machine, workpiece supporting table pad, polishing method and manufacturing method of semiconductor device |
| 05/31/2007 | US20070122920 Method for improved control of critical dimensions of etched structures on semiconductor wafers |
| 05/31/2007 | US20070122723 Process |
| 05/31/2007 | US20070120222 Method for manufacturing semiconductor silicon substrate and apparatus for manufacturing the same |
| 05/31/2007 | US20070119817 Manufacturing method of silicon wafer |
| 05/31/2007 | US20070119813 Gate patterning method for semiconductor processing |
| 05/31/2007 | US20070119546 Plasma immersion ion implantation apparatus including a capacitively coupled plasma source having low dissociation and low minimum plasma voltage |
| 05/31/2007 | US20070119544 Apparatus and method for single substrate processing using megasonic-assisted drying |
| 05/31/2007 | US20070119376 Matching device and plasma processing apparatus |
| 05/31/2007 | CA2628623A1 Method for the pre-treatment of titanium components for the subsequent coating thereof |
| 05/30/2007 | EP1285310A4 Method of controlling metallic layer etching process and regenerating etchant for metallic layer etching process based on near infrared spectrometer |
| 05/30/2007 | EP1261752B1 Method for repairing lithography masks using a charged particle beam system |
| 05/30/2007 | CN2906904Y Sealing device for flat mask etching nozzle for CRT |
| 05/30/2007 | CN1971950A Anti-reflecting layer base plate and its manufacturing method |
| 05/30/2007 | CN1970838A Bright acid etching technology for aluminium alloy |
| 05/30/2007 | CN1970837A Method for etching metal layer of display panel |
| 05/30/2007 | CN1970477A Mould core of moulded glass and method for removing protective layer of the mould core |
| 05/30/2007 | CN1319141C Method and system for monitoring etch process |
| 05/30/2007 | CN1318917C Method for producing semiconductor device using argon fluoride exposure light source |
| 05/24/2007 | WO2007058954A1 Method of enhancing biocompatibility of elastomeric materials by microtexturing using microdroplet patterning |