Patents for C23F 1 - Etching metallic material by chemical means (16,062)
07/2007
07/19/2007US20070163992 Method and device for contacting semiconductor chips
07/19/2007US20070163716 Gas distribution apparatuses and methods for controlling gas distribution apparatuses
07/19/2007US20070163714 Etch chamber
07/19/2007US20070163713 Gas supply system and processing system
07/19/2007US20070163617 Method for cleaning treatment chamber iIn substrate treating apparatus and method for detecting endpoint of cleaning
07/19/2007US20070163501 Plasma processing apparatus
07/17/2007US7245416 Fabrication of a high fill ratio reflective spatial light modulator with hidden hinge
07/17/2007US7245358 Substrate support system
07/17/2007US7244475 Plasma treatment apparatus and control method thereof
07/17/2007US7244367 Metal alloy elements in micromachined devices
07/17/2007US7244336 Temperature controlled hot edge ring assembly for reducing plasma reactor etch rate drift
07/17/2007US7244335 Substrate processing system and substrate processing method
07/17/2007US7244311 Heat transfer system for improved semiconductor processing uniformity
07/17/2007US7243610 Plasma device and plasma generating method
07/12/2007WO2007078572A2 Apparatus and method for controlling plasma density profile
07/12/2007WO2007078355A2 Microetching composition and method of using the same
07/12/2007WO2007077612A1 Porous valve metal thin film, method for production thereof and thin film capacitor
07/12/2007WO2007038321A3 Ultrapure colloidal silica for use in chemical mechanical polishing applications
07/12/2007WO2006081149A3 Novel polishing slurries and abrasive-free solutions having a multifunctional activator
07/12/2007US20070161253 Method of fabricating a trench isolation layer in a semiconductor device
07/12/2007US20070160454 Substrate carrying device, substrate carrying method and computer-readable storage medium
07/12/2007US20070158307 Method for selective etching
07/12/2007US20070158306 Method of forming a metal line and method of manufacturing display substrate having the same
07/12/2007US20070158305 Apparatus and method for plasma treating a substrate
07/12/2007US20070158304 Etch selectivity enhancement in electron beam activated chemical etch
07/12/2007US20070158303 Structural modification using electron beam activated chemical etch
07/12/2007US20070158302 Systems and methods for gas assisted resist removal
07/12/2007US20070158027 Plasma treatment device
07/12/2007US20070158026 Processing apparatus
07/12/2007US20070157957 Substrate transfer robot and apparatus having the substrate transfer robot for cleaning a substrate
07/12/2007US20070157886 Substrate support assembly with thermal isolating plate
07/12/2007US20070157845 Containing an optionally substituted bis(1H-tetrazole), e.g., 5,5'-bi(1H-tetrazole); 5,5'-azobis(mercaptotetrazole); and 5,5'-dithiobis(1-chlorotetrazole); improved heat resistance, adhesion to resin and solder wettability
07/11/2007CN1998069A Method of plasma etch endpoint detection using a V-I probe diagnostics
07/11/2007CN1997771A Methods for the optimization of substrate etching in a plasma processing system
07/11/2007CN1995459A Solution for removing printing board surface adhesion palladium and removing method
07/11/2007CN1995458A Method for promoting rustless steel surface hydrophilicity
07/11/2007CN1994759A Process for producing patterns on surface of metal faucet
07/11/2007CN1994486A 'I' structured three-dimensional micro solid/hollow silicon needle and silicon knife
07/11/2007CN1326224C Interferometric endpoint detection in a substrate etching process
07/11/2007CN1325697C Etching agent composition and method for producing reflective plate using the same etching liquid composition
07/10/2007CA2227873C Method for removal of surface layers of metallic coatings
07/05/2007WO2007075586A2 Flexible circuit
07/05/2007WO2006036820A3 Methods and apparatus for monitoring a process in a plasma processing system by measuring impedance
07/05/2007US20070155181 Method and system for etching high-k dielectric materials
07/05/2007US20070155178 Slurry for chemical mechanical polishing process and method of manufacturing semiconductor device using the same
07/05/2007US20070151950 Etching apparatus for use in manufacture of flat panel display device and manufacturing method using the same
07/05/2007US20070151949 Semiconductor processes and apparatuses thereof
07/05/2007US20070151948 Method of selectively stripping a metallic coating
07/05/2007US20070151947 Method for setting plasma chamber having an adaptive plasma source, plasma etching method using the same and manufacturing method for adaptive plasma source
07/05/2007US20070151946 Method for monitoring edge bead removal process of copper metal interconnection
07/05/2007US20070151669 Vacuum processing apparatus
07/05/2007US20070151515 Multi-chamber semiconductor device fabrication apparatus comprising wafer-cooling blade
07/04/2007EP1803838A2 Method of selectively stripping a metallic coating
07/04/2007EP1601471A4 Gas gate for isolating regions of differing gaseous pressure
07/04/2007EP0860867B1 Surface treatment for micromachining
07/04/2007CN1993786A Process for producing aluminum electrode foil for capacitor and aluminum foil for etching
07/04/2007CN1992152A Etching apparatus for use in manufacture of flat panel display device and manufacturing method using the same
07/04/2007CN1992150A Film etching method
07/04/2007CN1324662C Method for etching side wall and method for forming semiconductor structure
07/04/2007CN1324164C Copper or copper alloy corrodent and corrosion method
07/04/2007CN1324114C Plasma-assisted joining
07/04/2007CN1324105C Multiple process polishing solution for chemical mechanical planarization
07/03/2007US7238295 Regeneration process of etching solution, etching process, and etching system
07/03/2007US7238294 Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface
07/03/2007US7238092 Low-force electrochemical mechanical processing method and apparatus
06/2007
06/28/2007WO2006020424A3 Multi-gas distribution injector for chemical vapor deposition reactors
06/28/2007US20070149001 Flexible circuit
06/28/2007US20070148985 Method of manufacturing trench structure for device
06/28/2007US20070148980 Method for fabricating semiconductor device with bulb-shaped recess gate
06/28/2007US20070148979 Method for fabricating semiconductor device having top round recess pattern
06/28/2007US20070148978 Slurry compositions, methods of polishing polysilicon layers using the slurry compositions and methods of manufacturing semiconductor devices using the slurry compositions
06/28/2007US20070148974 Hardmask compositions for resist underlayer films
06/28/2007US20070145900 RF Plasma Supply Device
06/28/2007US20070145584 Printed wiring board, method for manufacturing same, and circuit device
06/28/2007US20070145362 Passive electronic devices
06/28/2007US20070145013 Method for polishing workpiece, polishing apparatus and method for manufacturing semiconductor device
06/28/2007US20070145011 Chemical mechanical polishing system and process
06/28/2007US20070145008 Techniques Of Anisotropic Wet Etch Micromachining For Comb Drive Transducers And Resonance Frequency Reduction
06/28/2007US20070145007 Semiconductor structure
06/28/2007US20070145006 Plasma etching apparatus
06/28/2007US20070145005 Controlling system and method for operating the same
06/28/2007US20070145004 Method for fabricating thin film pattern and method for fabricating flat panel display device using the same
06/28/2007US20070145003 Method of etching semiconductor device
06/28/2007US20070145002 Multi-printed etch mask process to pattern features
06/28/2007US20070144673 Apparatus for fabricating flat panel display and method for preventing substrate damage using the same
06/28/2007US20070144672 Plasma producing method and apparatus as well as plasma processing apparatus
06/28/2007US20070144671 Shower plate, plasma processing apparatus, and product manufacturing method
06/28/2007US20070144441 Methods and arrangement for implementing highly efficient plasma traps
06/28/2007US20070144439 Cartesian cluster tool configuration for lithography type processes
06/28/2007US20070144435 Adjusting mechanism and adjusting method thereof
06/27/2007EP1800067A1 Method and system for wafer temperature control
06/27/2007EP1799446A2 System for thinning a semiconductor workpiece
06/27/2007CN1989587A Blocker plate bypass to distribute gases in a chemical vapor deposition system
06/27/2007CN1989274A Electrolytically recoverable etching solution
06/27/2007CN1323424C Chip protection device
06/27/2007CN1323423C Chip protection device
06/27/2007CN1323191C Metal surface treatment method and metal structure unit with surface formed by using said method
06/26/2007US7235138 Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpieces
06/26/2007US7235137 Conductor treating single-wafer type treating device and method for semi-conductor treating
06/26/2007US7234413 Plasma processing apparatus
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