| Patents for C23F 1 - Etching metallic material by chemical means (16,062) |
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| 08/16/2007 | WO2005022602A3 A method and apparatus for semiconductor processing |
| 08/16/2007 | US20070192057 Method and apparatus for repairing shape, and method for manufacturing semiconductor device using those |
| 08/16/2007 | US20070187363 Substrate processing apparatus and substrate processing method |
| 08/16/2007 | US20070187362 Dry etching method, fine structure formation method, mold and mold fabrication method |
| 08/16/2007 | US20070187361 forming photoresist coating, etching, inspecting for defects, forming repairing photoresist coating, etching |
| 08/16/2007 | US20070187360 Method for making a surface acoustic wave device package |
| 08/16/2007 | US20070187359 Dry etching tungsten carbide with a plasma generated from a mixed gas including fluorine and a gas including a carbon-nitrogen bond, such as mono- di- and trialkylamine, and hydrogen; produces a vertical etching shape by preventing the side face of a pattern from being etched |
| 08/16/2007 | US20070187358 Device manufacturing method and computer program product |
| 08/16/2007 | US20070187357 Method for etching a workpiece |
| 08/16/2007 | US20070187039 Wafer carrying apparatus |
| 08/16/2007 | US20070187038 Sealed elastomer bonded Si electrodes and the like for reduced particle contamination in dielectric etch |
| 08/16/2007 | US20070187037 Semiconductor development apparatus and method using same |
| 08/16/2007 | US20070186952 Method of cleaning substrate processing chamber, storage medium, and substrate processing chamber |
| 08/16/2007 | US20070186856 Plasma processing apparatus having high frequency power source with sag compensation function and plasma processing method |
| 08/16/2007 | US20070186855 Plasma processing reactor with multiple capacitive and inductive power sources |
| 08/16/2007 | US20070186851 Vacuum chamber system for semiconductor processing |
| 08/16/2007 | DE10338422B4 Selektiver Plasmaätzprozess zur Aluminiumoxid-Strukturierung und dessen Verwendung Selective plasma etching of alumina structure and its use |
| 08/15/2007 | CN1332436C Bilayered metal hardmasks for using in dual damascene etch schemes |
| 08/15/2007 | CN1332068C Wet chemical processing method and device of silicon |
| 08/15/2007 | CN1331736C Potassium hydrogen peroxymonosulfate solutions |
| 08/15/2007 | CN1331575C Implementation of microfluidic components in a microfluidic system |
| 08/15/2007 | CN101018884A Apparatus including gas distribution member supplying process gas and radio frequency (RF) power for plasma processing |
| 08/15/2007 | CN101018734A A method for making MEMS switch, and MEM device and its making method |
| 08/14/2007 | US7256138 Method and composition for selectively etching against cobalt silicide |
| 08/14/2007 | US7255771 Multiple zone carrier head with flexible membrane |
| 08/14/2007 | US7255748 Apparatus for integrated monitoring of wafers and for process control in semiconductor manufacturing and a method for use thereof |
| 08/09/2007 | WO2007024556A3 Methods and compositions for acid treatment of a metal surface |
| 08/09/2007 | WO2004062477A3 Improved surface for use on implantable device |
| 08/09/2007 | US20070184354 Process for etching photomasks |
| 08/09/2007 | US20070181532 Cmp clean process for high performance copper/low-k devices |
| 08/09/2007 | US20070181531 Plasma processing apparatus and plasma processing method |
| 08/09/2007 | US20070181530 Reducing line edge roughness |
| 08/09/2007 | US20070181529 Corona discharge plasma source devices, and various systems and methods of using same |
| 08/09/2007 | US20070181528 Method of etching treatment |
| 08/09/2007 | US20070181430 Contact substrate with conformation masking pattern on substrate; multilayer; three-dimensional structure; cyclic process; electroplating; etching; electropolishing |
| 08/09/2007 | US20070181257 Faraday Shield Disposed Within An Inductively Coupled Plasma Etching apparatus |
| 08/09/2007 | US20070181256 Plasma processing unit |
| 08/09/2007 | US20070181255 Gas supply system, substrate processing apparatus and gas supply method |
| 08/09/2007 | US20070181254 Plasma processing apparatus with resonance countermeasure function |
| 08/09/2007 | US20070181150 Cleaning Solution and Cleaning Method of a Semiconductor Device |
| 08/09/2007 | US20070181145 Method for cleaning process chamber of substrate processing apparatus, substrate processing apparatus, and method for processing substrate |
| 08/09/2007 | US20070181064 Plasma source assembly and method of manufacture |
| 08/09/2007 | DE102006004826A1 Etching solution, useful for wet-chemical structuring of metal layers e.g. silver layers, in production of semiconductor components, comprises oxidizing agent and chelating agent |
| 08/08/2007 | CN1331198C Use of ammonia for etching organic low-K dielectrics |
| 08/08/2007 | CN101011651A Silicon powder surface etching device |
| 08/07/2007 | US7253107 Pressure control system |
| 08/07/2007 | US7252774 Selective chemical etch method for MRAM soft layers |
| 08/07/2007 | US7252737 Pedestal with integral shield |
| 08/07/2007 | US7252716 Gas injection apparatus for semiconductor processing system |
| 08/02/2007 | US20070178698 Substrate processing apparatus and fabrication process of a semiconductor device |
| 08/02/2007 | US20070178610 Semiconductor Production Apparatus |
| 08/02/2007 | US20070175865 Process for the fabrication of an inertial sensor with failure threshold |
| 08/02/2007 | US20070175863 Single Wafer Etching Apparatus and Single Wafer Etching Method |
| 08/02/2007 | US20070175861 Methods and apparatus for in-situ substrate processing |
| 08/02/2007 | US20070175860 3d lithography with laser beam writer for making hybrid surfaces |
| 08/02/2007 | US20070175859 Annealing is carried out to effectuate phase separation between the two or more immiscible polymeric block components in the block copolymer layer, thereby forming periodic patterns that are defined by repeating structural units; semiconductor structures |
| 08/02/2007 | US20070175856 Notch-Free Etching of High Aspect SOI Structures Using A Time Division Multiplex Process and RF Bias Modulation |
| 08/02/2007 | US20070175588 High throughput plasma treatment system |
| 08/02/2007 | US20070175586 Plasma Processing Apparatus And Plasma Processing Method |
| 08/02/2007 | US20070175495 Apparatus for Treating Plasma and Method for Cleaning the Same |
| 08/02/2007 | US20070175395 Semiconductor device manufacturing equipment including a vacuum apparatus and a method of operating the same |
| 08/01/2007 | EP1812190A2 Electrode array device having an adsorbed porous reaction layer |
| 08/01/2007 | CN1329961C Plasma processor electrode and plasma processor |
| 08/01/2007 | CN101009976A Method for improving the line precision in the etching technology |
| 08/01/2007 | CN101007304A Processing method of aluminum and aluminum alloy super hydrophobic surface |
| 07/31/2007 | US7250112 Method of making an X-Y axis dual-mass tuning fork gyroscope with vertically integrated electronics and wafer-scale hermetic packaging |
| 07/26/2007 | WO2006091285A3 Method and apparatus for cleaning and surface conditioning objects using plasma |
| 07/26/2007 | US20070173064 Manufacturing process for a transistor made of thin layers |
| 07/26/2007 | US20070170867 Plasma Immersion Ion Source With Low Effective Antenna Voltage |
| 07/26/2007 | US20070170150 Process for removing a layer |
| 07/26/2007 | US20070170149 Vacuum Processing Apparatus And Vacuum Processing Method Of Sample |
| 07/26/2007 | US20070170147 Etching method and method of fabricating opening |
| 07/26/2007 | US20070169891 Focus ring and plasma processing apparatus |
| 07/26/2007 | US20070169889 Methods and apparatus for selectively coupling process tools to abatement reactors |
| 07/26/2007 | US20070169888 Dry etching apparatus capable of monitoring motion of wap ring thereof |
| 07/26/2007 | DE102006003606A1 Method for structuring a surface layer on a substrate used in micro-structuring comprises guiding a liquid jet directed onto the surface layer over the regions of the layer to be removed |
| 07/25/2007 | CN1328413C Method for removing at least one area of a layer of a component consisting of metal or a metal compound |
| 07/25/2007 | CN1328196C Etching solution for forming an embedded resistor |
| 07/25/2007 | CN1327918C Golf club head |
| 07/25/2007 | CN101006565A Method for providing uniform removal of organic material |
| 07/25/2007 | CN101006198A In situ surface contaminant removal for ion implanting |
| 07/25/2007 | CN101003902A Etching liquor for laminated film of aluminium metal film and molybdenum metal film |
| 07/25/2007 | CN101003736A Etching liquid for preparing IT0 transparent electrodes in flat panel display |
| 07/24/2007 | US7247250 Method for manufacturing a fast heat rise resistor |
| 07/24/2007 | US7247249 Method of treating razor blade cutting edges |
| 07/24/2007 | US7247246 Vertical integration of a MEMS structure with electronics in a hermetically sealed cavity |
| 07/24/2007 | US7247218 Plasma density, energy and etch rate measurements at bias power input and real time feedback control of plasma source and bias power |
| 07/24/2007 | US7247207 Vacuum processing apparatus |
| 07/19/2007 | WO2007081653A2 Apparatus for an optimized plasma chamber grounded electrode assembly |
| 07/19/2007 | WO2000045421A3 Wafer edge engineering method and device |
| 07/19/2007 | US20070167025 Etchant and method for fabricating liquid crystal display using the same |
| 07/19/2007 | US20070167023 Manufacturing method for wiring |
| 07/19/2007 | US20070167015 Polishing method |
| 07/19/2007 | US20070166652 Digital Mold Texturizing Methods, Materials, and Substrates |
| 07/19/2007 | US20070164680 Plasma generation and processing with multiple radiation sources |
| 07/19/2007 | US20070163997 Poly etch without separate oxide decap |
| 07/19/2007 | US20070163996 Plasma processing apparatus and plasma processing method |
| 07/19/2007 | US20070163995 Plasma processing method, apparatus and storage medium |
| 07/19/2007 | US20070163994 Charge-free layer by layer etching of dielectrics |
| 07/19/2007 | US20070163993 Planarization with reduced dishing |