| Patents for C23F 1 - Etching metallic material by chemical means (16,062) |
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| 02/05/2008 | US7325511 Microwave plasma processing apparatus, microwave processing method and microwave feeding apparatus |
| 01/31/2008 | WO2008014196A2 Inductively coupled plasma system with internal coil |
| 01/31/2008 | WO2008011870A1 Method of, and apparatus for, the accelerated wet-chemical treatment of surfaces |
| 01/31/2008 | WO2006073896A3 Selective surface texturing through the use of random application of thixotropic etching agents |
| 01/31/2008 | US20080026488 Method and apparatus for detecting endpoint in a dry etching system by monitoring a superimposed DC current |
| 01/31/2008 | US20080023444 Substrate processing apparatus and substrate processing method |
| 01/31/2008 | US20080023443 Alternating asymmetrical plasma generation in a process chamber |
| 01/31/2008 | US20080023441 Method of deep etching |
| 01/31/2008 | US20080023440 Method and system for controlling the uniformity of a ballistic electron beam by RF modulation |
| 01/31/2008 | US20080023435 Method for self-assembling microstructures |
| 01/31/2008 | US20080023147 Plasma processing apparatus |
| 01/31/2008 | US20080023146 Inductively coupled plasma system with internal coil |
| 01/31/2008 | US20080023141 Substrate processing apparatus |
| 01/31/2008 | US20080023140 Dry etcher including etching device and cleaning device |
| 01/31/2008 | US20080023139 Plasma processing apparatus and plasma processing method |
| 01/31/2008 | US20080022509 Method for manufacturing thin-film magnetic head |
| 01/31/2008 | DE102006059046A1 Wet treatment of substrates, e.g. circuit boards, uses spray of treating agent in direction of transport of substrate, perforated interrupter plate being used so that spray only contacts substrate intermittently |
| 01/31/2008 | DE102006035749A1 Verfahren zur Herstellung mindestens eines Bauteils sowie Bauteil A process for preparing at least one component, and component |
| 01/30/2008 | CN101115631A Elevator load bearing member having a jacket with at least one traction-enhancing exterior surface |
| 01/30/2008 | CN101113524A Cleaning antirust agent and preparation method thereof |
| 01/30/2008 | CN101113523A Etching liquid injection apparatus and etching method |
| 01/30/2008 | CN101113522A Spraying device for printed circuit board etching |
| 01/30/2008 | CN100365174C Process for treating a semiconductor wafer with a gaseous medium, and semiconductor wafer treated by this process |
| 01/29/2008 | US7323111 Angle control of multi-cavity molded components for MEMS and NEMS group assembly |
| 01/29/2008 | US7323080 Apparatus for treating substrate |
| 01/29/2008 | US7322368 Plasma cleaning gas and plasma cleaning method |
| 01/24/2008 | WO2008011306A2 Substrate support with adjustable lift and rotation mount |
| 01/24/2008 | WO2008010943A2 Hybrid rf capacitively and inductively coupled plasma source using multifrequency rf powers and methods of use thereof |
| 01/24/2008 | WO2007127294A3 Exhaust system |
| 01/24/2008 | US20080020585 Semiconductor device fabricating method, plasma processing system and storage medium |
| 01/24/2008 | US20080020584 Method of manufacturing semiconductor device and plasma processing apparatus |
| 01/24/2008 | US20080020574 Hybrid RF capacitively and inductively coupled plasma source using multifrequency RF powers and methods of use thereof |
| 01/24/2008 | US20080020493 Apparatus for supplying chemical, semiconductor manufacturing apparatus having the same, and method for supplying chemical |
| 01/24/2008 | US20080020240 Method to reduce corner shunting during fabrication of CPP read heads |
| 01/24/2008 | US20080020198 Method for performing chemical shrink process over barc (bottom anti-reflective coating) |
| 01/24/2008 | US20080020146 Diffuser plate with slit valve compensation |
| 01/24/2008 | US20080017611 Etching apparatus and method |
| 01/24/2008 | US20080017318 Semiconductor device manufacturing apparatus capable of reducing particle contamination |
| 01/24/2008 | US20080017317 Substrate processing apparatus |
| 01/24/2008 | US20080017316 Clean ignition system for wafer substrate processing |
| 01/24/2008 | US20080017315 Plasma processing apparatus |
| 01/24/2008 | US20080017117 Substrate support with adjustable lift and rotation mount |
| 01/24/2008 | US20080017116 Substrate support with adjustable lift and rotation mount |
| 01/24/2008 | US20080017111 Semiconductor Manufacturing Device and Method for Manufacturing Semiconductor Devices |
| 01/23/2008 | CN101110376A Method for forming soldering projection and its etchant |
| 01/22/2008 | US7320734 Plasma immersion ion implantation system including a plasma source having low dissociation and low minimum plasma voltage |
| 01/22/2008 | US7320170 Xenon ion beam to improve track width definition |
| 01/17/2008 | WO2008008259A2 Apparatus and method for controlling plasma potential |
| 01/17/2008 | WO2007064812A3 Pulsed-continuous etching |
| 01/17/2008 | WO2006108108A3 Superfinishing of high density carbides |
| 01/17/2008 | WO2006061741A3 Etchant solutions and additives therefor |
| 01/17/2008 | US20080011982 A Method And Composition For Selectively Stripping Nickel From A Substrate |
| 01/17/2008 | US20080011981 Etchant and replenishment solution therefor, and etching method and method for producing wiring board using the same |
| 01/17/2008 | US20080011934 Imprint lithography |
| 01/17/2008 | US20080011717 Chemical etch solution and technique for imaging a device's shallow junction profile |
| 01/17/2008 | US20080011716 Plasma Processing Apparatus And Method |
| 01/17/2008 | US20080011713 Substrate processing apparatus, substrate processing method and substrate manufacturing method |
| 01/17/2008 | US20080011426 Plasma reactor with inductively coupled source power applicator and a high temperature heated workpiece support |
| 01/17/2008 | US20080011425 Plasma Processing Apparatus And Method |
| 01/17/2008 | US20080011424 Multi-station decoupled reactive ion etch chamber |
| 01/17/2008 | US20080011423 Device and method for etching flash memory gate stacks comprising high-k dielectric |
| 01/17/2008 | US20080011421 Processing chamber having labyrinth seal |
| 01/17/2008 | DE102006031506A1 Verfahren zur Herstellung von Mikronadeln in einem Si-Halbleitersubstrat A process for the production of micro-needles in a Si semiconductor substrate |
| 01/17/2008 | DE102004063066B4 Vorrichtung und Verfahren zur Waferplanierung Apparatus and method for Waferplanierung |
| 01/16/2008 | EP1878405A2 Expandable stents and method for making same |
| 01/16/2008 | CN101106083A Processing method for silicon sheet surface |
| 01/16/2008 | CN101104935A Metallographic etching agent |
| 01/16/2008 | CN101104747A Mica-base ultra-black material and its preparation method and application |
| 01/16/2008 | CN100362633C Plasma cleaning method for removing silicon chip surface particle after etching process |
| 01/16/2008 | CN100362624C Device for controlling D.C. bias on wafer |
| 01/16/2008 | CN100362620C Loading umloading device of semiconductor processing piece and its loading and unloading method |
| 01/16/2008 | CN100362134C New process for separating metal fiber copper protective layer by catalytic ammonia leaching method |
| 01/15/2008 | US7318903 Photonic sensor particles and fabrication methods |
| 01/10/2008 | US20080006604 Devices and methods for using electrofluid and colloidal technology |
| 01/10/2008 | US20080006205 Apparatus and Method for Controlling Plasma Potential |
| 01/10/2008 | DE102006030680A1 Improving the desludging and precipitating characteristics of unwanted substances, ions or sludges during treatment of metallic work-pieces comprises separating the sludge by filtration, sedimentation or other sludge separation equipments |
| 01/10/2008 | DE102006030588A1 Flüssigkeitsstrahlgeführtes Ätzverfahren zum Materialabtrag an Festkörpern sowie dessen Verwendung Liquid jet-guided etching process for removing material from solid bodies, and its use |
| 01/09/2008 | EP1875003A2 Superfinishing of high density carbides |
| 01/09/2008 | CN201003069Y Copper etching solution regeneration and circulating device |
| 01/09/2008 | CN101102909A Methods for removing black silicon and black silicon carbide from surfaces of silicon and silicon carbide electrodes for plasma processing apparatuses |
| 01/09/2008 | CN100360714C Chemical etching solution for aluminium and aluminium alloy |
| 01/08/2008 | US7316783 Method of wiring formation and method for manufacturing electronic components |
| 01/08/2008 | CA2171606C Metal treatment with acidic, rare earth ion containing cleaning solution |
| 01/03/2008 | WO2007130489A3 Plasma reactor with a dynamically adjustable plasma source power applicator |
| 01/03/2008 | US20080003836 Substrate processing method and substrate processing apparatus |
| 01/03/2008 | US20080003402 Fine pitch microcontacts and method for forming thereof |
| 01/03/2008 | US20080000876 Plasma etching apparatus and plasma etching method using the same |
| 01/03/2008 | US20080000871 molding thin film; cost efficiency; carbon nanotubes |
| 01/03/2008 | US20080000585 Apparatus for monitoring electron density and electron temperature of plasma and method thereof |
| 01/03/2008 | US20080000497 Removal of organic-containing layers from large surface areas |
| 01/03/2008 | DE102006029831A1 Verfahren zur Herstellung strukturierter Schichten aus Titan und Nickel A process for the production of structured layers of titanium and nickel |
| 01/02/2008 | EP1656242A4 Capillary imprinting technique |
| 01/02/2008 | CN101099188A TFT substrate and production method therefor, and transparent conductive film laminate substrate provided with al wiring and production method therefor, and transparent conductive film laminate circui |
| 01/02/2008 | CN101098989A Copper etchant and method of etching |
| 01/02/2008 | CN101097971A Monocrystaline silicon solar battery texture etching tank |
| 01/02/2008 | CN100359664C Etching method of metal capacitance |
| 01/02/2008 | CN100359643C Method of manufacturing semiconductor device |
| 01/01/2008 | US7314823 Chemical mechanical polishing composition and process |
| 01/01/2008 | US7314537 Method and apparatus for detecting a plasma |
| 01/01/2008 | US7314527 Reactor system |