| Patents for C23F 1 - Etching metallic material by chemical means (16,062) |
|---|
| 03/13/2008 | US20080060759 Electron beam enhanced surface wave plasma source |
| 03/12/2008 | CN101139715A Metal scavenger composition and method for producing the same |
| 03/12/2008 | CN101139714A Copper etching liquid composition and production method thereof |
| 03/12/2008 | CN101139713A Etching liquid and method for manufacturing patterned conductive layer using the same |
| 03/12/2008 | CN101139712A Stripping method |
| 03/12/2008 | CN101139711A Method for producing improved radio-frequency cable inner conductor pipe |
| 03/12/2008 | CN100375247C Plasma processing method and plasma processing device |
| 03/12/2008 | CN100374624C Method for preventing elution of lead and/or nickel from copper alloy piping material such as valve or pipe joint and copper alloy piping material, and fluid for use in cleaning piping material |
| 03/12/2008 | CN100374622C Lithographic apparatus and method to determine beam size and divergence |
| 03/11/2008 | US7341633 Apparatus for electroless deposition |
| 03/06/2008 | WO2008026542A1 Etchant and etching process |
| 03/06/2008 | US20080057274 Micro-channel chip and a process for producing the same |
| 03/06/2008 | US20080053959 Method for low temperature bonding and bonded structure |
| 03/06/2008 | US20080053958 Plasma processing apparatus |
| 03/06/2008 | US20080053955 Method for enlarging a nano-structure |
| 03/06/2008 | US20080053614 Surface Processing Apparatus |
| 03/06/2008 | US20080053509 Combined thermal diodic and thermoenergy devices and methods for manufacturing same |
| 03/06/2008 | DE102006040830A1 Verfahren zur Aufarbeitung einer Ätzmischung, die bei der Herstellung von hochreinem Silicium anfällt A process for working up an etching mixture which is obtained in the production of high purity silicon |
| 03/05/2008 | EP1895577A1 Etching composition for metal material and method for manufacturing semiconductor device by using same |
| 03/05/2008 | EP1894900A2 Catalyst-aided chemical processing method and apparatus |
| 03/05/2008 | EP1177112A4 Remote plasma generator |
| 03/05/2008 | CN201031254Y Quick mounting type lolliconveying light sheet etching conveying device |
| 03/05/2008 | CN101137770A Segmented radio frequency electrode apparatus and method for uniformity control |
| 03/05/2008 | CN101134930A Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
| 03/05/2008 | CN100373557C Etch amount detection method, etching method, and etching system |
| 03/04/2008 | US7339758 Etching method, a substrate with a plurality of concave portions, a microlens substrate, a transmission screen and a rear projection |
| 03/04/2008 | US7338614 Vapor HF etch process mask and method |
| 03/04/2008 | US7338612 Door skin, a method of etching a plate for forming a wood grain pattern in the door skin, and an etched plate formed therefrom |
| 03/04/2008 | US7338576 Plasma processing device |
| 03/04/2008 | US7338575 Hydrocarbon dielectric heat transfer fluids for microwave plasma generators |
| 03/04/2008 | US7337745 Electrode, susceptor, plasma processing apparatus and method of making the electrode and the susceptor |
| 02/28/2008 | US20080050301 Silicon Carbide Single Crystal and Method of Etching the Same |
| 02/28/2008 | US20080048687 Probe, method of manufacturing the probe and probe card having the probe |
| 02/28/2008 | US20080047934 Silicon wafer etching method and apparatus, and impurity analysis method |
| 02/28/2008 | US20080047931 In-situ oxidized textured surface for prosthetic devices |
| 02/28/2008 | US20080047930 Method to form a pattern of functional material on a substrate |
| 02/28/2008 | DE10194846B4 Verfahren zur Oberflächenbehandlung eines rostfreien Stahlprodukts für eine Brennstoffzelle A process for surface treatment of a stainless steel product for a fuel cell |
| 02/27/2008 | CN101130871A Fluorine surface etchant for semiconductor and preparation method thereof |
| 02/27/2008 | CN101130870A Laminated film |
| 02/27/2008 | CN100372074C Method for monitoring plasma etching platform after prevention and maintenance process |
| 02/27/2008 | CN100371809C An etchant for a wire, a method for manufacturing the wire and a method for manufacturing a thin film transistor array panel including the method |
| 02/27/2008 | CN100371795C Conductive element substrate,liquid crystal display method for manufacturing liquid crystal display, and electronic information equipment |
| 02/27/2008 | CN100371491C Pulsed plasma processing method and apparatus |
| 02/26/2008 | US7335277 Vacuum processing apparatus |
| 02/26/2008 | US7335267 Heat treating apparatus having rotatable heating unit |
| 02/21/2008 | WO2008021668A2 Heating and cooling of substrate support |
| 02/21/2008 | WO2006039193A3 Rf ground switch for plasma processing system |
| 02/21/2008 | US20080044321 Power supply unit for generating plasma and plasma apparatus including the same |
| 02/21/2008 | US20080041824 Microetching composition and method of using the same |
| 02/21/2008 | US20080041821 Gas Distribution System for Improved Transient Phase Deposition |
| 02/21/2008 | US20080041818 Method for pattern formation |
| 02/21/2008 | US20080041816 Systems and methods for manufacturing wire grid polarizers |
| 02/21/2008 | US20080041527 Antenna of plasma processing apparatus |
| 02/20/2008 | CN101128622A Etching chamber with subchamber |
| 02/20/2008 | CN101126161A Method for etching super-thick polysilicon |
| 02/19/2008 | US7332440 Wet etching apparatus and method |
| 02/19/2008 | US7332098 Phase shift mask and fabricating method thereof |
| 02/19/2008 | US7332055 Substrate processing apparatus |
| 02/19/2008 | US7331751 Vacuum processing method |
| 02/19/2008 | US7331307 Thermally sprayed member, electrode and plasma processing apparatus using the electrode |
| 02/19/2008 | US7331306 Plasma processing method and apparatus |
| 02/14/2008 | US20080038930 Method of ashing an object and apparatus for performing the same |
| 02/14/2008 | US20080038925 Methods and apparatus for igniting a low pressure plasma |
| 02/14/2008 | US20080035610 Substrate processing apparatus and substrate processing method |
| 02/14/2008 | US20080035609 System And Method for Selective Etching Of Silicon Nitride During Substrate Processing |
| 02/14/2008 | US20080035607 Method and Apparatus for the Etching of Microstructures |
| 02/14/2008 | US20080035605 Exhaust Assembly for Plasma Processing System and Method |
| 02/14/2008 | US20080035603 Apparatus for spraying etchant and use method thereof |
| 02/14/2008 | US20080035306 Heating and cooling of substrate support |
| 02/14/2008 | DE102006037294A1 Etching device comprises reaction chamber in which a wafer substrate can be processed, light source, and a light detector comprising microscope optics, a camera and a filter, which is transparent for selective light of wavelength region |
| 02/13/2008 | EP1252358A4 System and method for depositing inorganic/organic dielectric films |
| 02/13/2008 | CN101124661A Carbon-doped-Si oxide etch using H2 additive in fluorocarbon etch chemistry |
| 02/13/2008 | CN101123173A Spraying and erosion local protection method and device for semiconductor part chip table |
| 02/13/2008 | CN101122027A Copper surface hydrophilic finishing agent and method |
| 02/13/2008 | CN101122026A Polysilicon planarization solution for planarizing low temperature polysilicon film panel |
| 02/13/2008 | CN101122025A Titanium alloying milling solution and milling technique used for the same |
| 02/13/2008 | CN101122024A Processing device for processing fluid and substrate processing device having the same |
| 02/13/2008 | CN101122021A Method for preparing nano titanium oxide film by medical nickel-titanium memory alloy surface in situ denickeling |
| 02/13/2008 | CN101122017A Chemical treatment method for aluminum alloy surface |
| 02/13/2008 | CN101121572A Die produced glass model core and regeneration method thereof |
| 02/13/2008 | CN101121108A Vacuum processing apparatus |
| 02/13/2008 | CN100369215C Adsorption stripping process for removing exposed zone polymer |
| 02/13/2008 | CN100368598C Copper or copper alloy surface tiny-etching treatment fluid for smoothing |
| 02/13/2008 | CN100367907C Microelectrode making method and apparatus |
| 02/12/2008 | US7329361 Method and apparatus for fabricating or altering microstructures using local chemical alterations |
| 02/07/2008 | WO2008016747A2 Method and system for controlling the uniformity of a ballistic electron beam by rf modulation |
| 02/07/2008 | WO2007096095A3 Etching solution and method for structuring a ubm layer system |
| 02/07/2008 | US20080032236 Method and apparatus for solid-state microbattery photolithographic manufacture, singulation and passivation |
| 02/07/2008 | US20080032109 Method for Coating Blanks for the Production of Printed Circuit Boards (Pcb) |
| 02/07/2008 | US20080029487 comprising at least one of hydrogen fluoride, nitric acid, ammonium fluoride and ammonium chloride; makes fine treatment on multilayer film, including tungsten film and a silicon oxide film, possible by controlling the etching rate |
| 02/07/2008 | US20080029486 Light collimating and diffusing film and system for making the film |
| 02/07/2008 | US20080029484 In-situ process diagnostics of in-film aluminum during plasma deposition |
| 02/07/2008 | US20080029483 Method of treating a mask layer prior to performing an etching process |
| 02/07/2008 | US20080029219 Apparatus for spraying etchant solution onto preformed printed circuit board |
| 02/06/2008 | EP1883718A2 Method and composition for improving adhesion of organic polymer coatings with copper surface |
| 02/06/2008 | CN101117714A Dry etcher including etching device and cleaning device |
| 02/06/2008 | CN101116858A Surface treating method of the aluminum alloy decorative sheet |
| 02/06/2008 | CN100367469C Method of plasma etching |
| 02/05/2008 | US7326359 Lacquer of metal dissolving etchant locally reacts with metallic layer and dissolved metal remains within multilayer structure, dissolution of the metal allows creation of window in metallic layer without washing, partial demetallization is suitable to be carried out on gravure or flexo printing presses |
| 02/05/2008 | US7326358 Plasma processing method and apparatus, and storage medium |