| Patents for C23F 1 - Etching metallic material by chemical means (16,062) |
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| 05/28/2008 | CN101187025A Dislocated double-sided etching flaking processing method |
| 05/28/2008 | CN100390931C Substrate processing device and method, and pattern forming method |
| 05/28/2008 | CN100390322C Chemical etching solution for titanium and titanium alloy |
| 05/27/2008 | US7378031 Liquid phase etching method and liquid phase etching apparatus |
| 05/27/2008 | US7377992 Method and apparatus for detecting end point |
| 05/27/2008 | US7377836 Versatile wafer refining |
| 05/22/2008 | WO2008060324A2 Nanopore electrode, nanopore membrane, methods of preparation and surface modification, and use thereof |
| 05/22/2008 | WO2008059907A1 Method for forming corrosion resistant plating layer and rotating machine |
| 05/22/2008 | US20080119049 Plasma etching method and apparatus |
| 05/22/2008 | US20080116170 Selective metal wet etch composition and process |
| 05/22/2008 | US20080115892 Plasma Processing Apparatus |
| 05/22/2008 | US20080115891 Laser beam machining system |
| 05/22/2008 | US20080115802 Cleaning method for improving wafer surface polluted by metal ions |
| 05/21/2008 | CN101184868A Superfinishing of high density carbides |
| 05/20/2008 | US7375874 Light modulator with integrated drive and control circuitry |
| 05/20/2008 | US7374635 Forming method and forming system for insulation film |
| 05/20/2008 | US7374620 Substrate processing apparatus |
| 05/15/2008 | US20080110861 Substrate Processing Apparatus and Method |
| 05/15/2008 | US20080110859 Plasma etching apparatus and method |
| 05/15/2008 | US20080110857 Method of Electrochemical Fabrication |
| 05/15/2008 | US20080110856 Manufacture of devices having complex structures by selective electroplating of layers that include both structural materials (metals) and support (sacrificial) materials; removal(etching, melting, or electrolytically dissolving) of the support defines a microscopicelement for an electrical device |
| 05/15/2008 | US20080110569 Plasma etching apparatus and plasma etching method |
| 05/15/2008 | US20080110568 Process chamber having gate slit opening and closing apparatus |
| 05/14/2008 | CN101180419A Etchant solutions and additives therefor |
| 05/14/2008 | CN101180418A Method and system for improving coupling between a surface wave plasma source and a plasma space |
| 05/14/2008 | CN101179613A Technique for manufacturing stainless push-button of mobile phone |
| 05/14/2008 | CN101179022A Gas injection apparatus |
| 05/14/2008 | CN100388575C Method for making structure of wedge chamber and parallel chamber in indium phosphide based photoelectronic device |
| 05/14/2008 | CN100388432C Preparation method of deep groove and its etching mixing liquid |
| 05/13/2008 | US7371485 Multi-step process for etching photomasks |
| 05/13/2008 | US7371426 lower growth environmental bond coating of an aluminum alloy applied to the remaining base metal substrate so that upon subsequent repair of the component, less of the remaining base metal substrate is removed because of less environmental coating growth into the substrate than prior bond coat |
| 05/13/2008 | US7371331 Method of creating a patterned monolayer on a surface |
| 05/13/2008 | US7371306 Integrated tool with interchangeable wet processing components for processing microfeature workpieces |
| 05/13/2008 | US7371287 Substrate handling system |
| 05/13/2008 | US7370515 Probes for use in scanning probe microscopes and methods of fabricating such probes |
| 05/08/2008 | WO2008055174A2 Peak-based endpointing for chemical mechanical polishing |
| 05/08/2008 | WO2008054954A2 High density lithographic process |
| 05/08/2008 | US20080107834 forming a bank layer on a substrate, laser removal of a part of bank layer to form recessese and banks, perfomring plasma treatment to the banks to provide color material phobic top surface, performing ink jet filling of color material, baking to harden color material |
| 05/08/2008 | US20080105650 Plasma processing device and plasma processing method |
| 05/08/2008 | US20080105646 Multi-step Release Method for Electrochemically Fabricated Structures |
| 05/08/2008 | US20080105379 Plasma processing apparatus |
| 05/08/2008 | US20080105378 Plasma processing method and apparatus, and storage medium |
| 05/07/2008 | EP1918093A1 Surface treatment for a thin titanium foil |
| 05/07/2008 | EP1917381A1 Stabilized etching solutions for cu and cu/ni layers |
| 05/07/2008 | EP1635988A4 Integrated tool with interchangeable wet processing components for processing microfeature workpieces and automated calibration systems |
| 05/07/2008 | CN101174509A Collecting electrode used in super capacitor and its surface treating method |
| 05/07/2008 | CN101173360A Stainless steel etching technique |
| 05/07/2008 | CN101173359A Methods for characterizing defects on silicon surfaces, etching composition for silicon surfaces and process of treating silicon surfaces with the etching composition |
| 05/07/2008 | CN101173358A Magnesium alloy etching technique |
| 05/07/2008 | CN101173357A Apparatus and method for pressure control of reaction chamber |
| 05/07/2008 | CN100387104C Apparatus for manufacturing printed wiring board and method for manufacturing printed wiring board using the same |
| 05/06/2008 | US7368065 Implants with textured surface and methods for producing the same |
| 05/06/2008 | US7368019 Washing the liquid-contacting part of a plumbing device plated with nickel alloy with a cleaning fluid including nitric acid and hydrochloric acid as inhibitors to remove nickel and to form a protective coating film |
| 05/06/2008 | US7368018 Chemical vapor deposition apparatus |
| 05/06/2008 | US7367344 Atmospheric pressure non-thermal plasma device to clean and sterilize the surfaces of probes, cannulas, pin tools, pipettes and spray heads |
| 05/06/2008 | US7367166 Door skin, a method of etching a plate, and an etched plate formed therefrom |
| 05/02/2008 | WO2008014196A3 Inductively coupled plasma system with internal coil |
| 05/02/2008 | WO2007103717A3 Methods for forming articles having apertures and articles having substantially reduced residual compressive stress |
| 05/02/2008 | CA2667278A1 Patterned printing plates and processes for printing electrical elements |
| 05/01/2008 | US20080102538 Apparatus and Method For Controlling Relative Particle Concentrations In A Plasma |
| 05/01/2008 | US20080102380 High density lithographic process |
| 05/01/2008 | US20080102294 Acid etched metallic powder particles dispersed in resin matrix; screen printed fine wiring patterns for high speed signals; keyboards, touch panels |
| 05/01/2008 | US20080102290 Ferroelectric recording medium and method of manufacturing the same |
| 05/01/2008 | US20080101206 Device for Recording Data Comprising Mirodots With Free Ends Forming a Convex Surface and Method for the Production Thereof |
| 05/01/2008 | US20080099718 Methods for characterizing defects on silicon surfaces and etchng composition and treatment process therefor |
| 05/01/2008 | US20080099443 Peak-based endpointing for chemical mechanical polishing |
| 05/01/2008 | US20080099440 Substrate processing method and substrate processing system |
| 05/01/2008 | US20080099439 Apparatus and Method For Controlling Relative Particle Speeds In A Plasma |
| 05/01/2008 | US20080099438 Wavefront modulation methods for EUV maskless lithography |
| 05/01/2008 | US20080099436 Endpoint detection for photomask etching |
| 05/01/2008 | US20080099435 Endpoint detection for photomask etching |
| 05/01/2008 | US20080099434 Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backside |
| 05/01/2008 | US20080099432 Process for etching a transparent workpiece including backside endpoint detection steps |
| 05/01/2008 | US20080099430 Method for connecting array of optical waveguides to an array of optical fibers with very small pitch |
| 05/01/2008 | US20080099425 New slotted guide structure |
| 05/01/2008 | US20080099338 Depositing a first pattern onto a substrate using the first mask to forming a first layer, removing the first mask, depositing a second material, building additional layers adjacent to and adhered to previously formed layers; removing undesired elements of material via etching or electropolishing |
| 05/01/2008 | US20080099147 Temperature controlled multi-gas distribution assembly |
| 05/01/2008 | US20080099146 Suspension for showerhead in process chamber |
| 05/01/2008 | US20080099145 Gas sealing skirt for suspended showerhead in process chamber |
| 04/30/2008 | CN101170063A Etching liquid management device |
| 04/30/2008 | CN100385503C Manufacturing method of magnetic head slider, magnetic head slider and magnetic device |
| 04/29/2008 | US7364665 Selective etching processes of SiO2 , Ti and In2 O3 thin films for FeRAM device applications |
| 04/29/2008 | US7364624 Wafer handling apparatus and method of manufacturing thereof |
| 04/29/2008 | US7364623 Confinement ring drive |
| 04/29/2008 | US7363876 Multi-core transformer plasma source |
| 04/24/2008 | WO2007098071A3 Process tuning gas injection from the substrate edge |
| 04/24/2008 | US20080096389 Copper damascene chemical mechanical polishing (CMP) for thin film head writer fabrication |
| 04/24/2008 | US20080096046 Method Of Treating The Surface Of Copper And Copper |
| 04/24/2008 | US20080093343 Method for treating the etching solution |
| 04/24/2008 | US20080093342 Etching apparatus for semicondutor fabrication |
| 04/24/2008 | US20080093341 RF Plasma Reactor Having a Distribution Chamber with at Least One Grid |
| 04/24/2008 | US20080093024 Plasma Treating Apparatus |
| 04/24/2008 | US20080092815 Gas distribution assembly for use in a semiconductor work piece processing reactor |
| 04/23/2008 | CN101165210A Acidic detergent for metal |
| 04/23/2008 | CN100383932C Silicon wet-etching technology |
| 04/23/2008 | CN100383928C Polycrystalline silicon etching process capable of removing residual gas |
| 04/23/2008 | CN100383282C Comprehensive utilization method of corrosive liquid for producing breastplate |
| 04/22/2008 | US7361610 Method of etching a glass substrate |
| 04/22/2008 | US7361602 CMP process |
| 04/22/2008 | US7361600 Semiconductor manufacturing apparatus having a built-in inspection apparatus and a device manufacturing method using said manufacturing apparatus |