Patents for C23F 1 - Etching metallic material by chemical means (16,062)
07/2008
07/02/2008CN100399515C Methods and apparatus for optimizing a substrate in a plasma processing system
07/02/2008CN100399513C Method for reducing etching uniformity influence by dry cleaning process
07/02/2008CN100399505C Air flow distribution equalized etching apparatus
07/02/2008CN100398699C Cleaning and servicing technology for turbine blade basal body surface by strong current pulsed ionizing beam
07/01/2008US7393461 Roughening a copper or copper alloy surface to provide improved adhesion for solder mask applications by contacting with a cupric ion source, a pyridine derivative, a polyethylenamine, and an acid
07/01/2008US7393433 Plasma processing apparatus, semiconductor manufacturing apparatus and electrostatic chucking unit used thereof
07/01/2008US7393432 RF ground switch for plasma processing system
07/01/2008US7393431 Bubble plate for etching and etching apparatus using the same
07/01/2008US7393395 Containing an optionally substituted bis(1H-tetrazole), e.g., 5,5'-bi(1H-tetrazole); 5,5'-azobis(mercaptotetrazole); and 5,5'-dithiobis(1-chlorotetrazole); improved heat resistance, adhesion to resin and solder wettability
07/01/2008US7392760 Microwave-excited plasma processing apparatus
06/2008
06/26/2008WO2008077012A2 Multi-step photomask etching with chlorine for uniformity control
06/26/2008WO2008075636A1 Process for regeneration of phosphoric acid containing etchant for metals or phosphoric acid
06/26/2008WO2008051512A3 Patterned printing plates and processes for printing electrical elements
06/26/2008US20080153306 Dry photoresist stripping process and apparatus
06/26/2008US20080149885 nitric acid, hydrochloric acid and a source of ferric ions; ferric chloride, ferric bromide, ferric iodide; sodium chlorate or potassium chlorate oxidizer; less etching time and forms less residue; less expensive since it can be recycled
06/26/2008US20080149598 Substrate processing apparatus, focus ring heating method, and substrate processing method
06/26/2008US20080149596 Methods and apparatuses for controlling gas flow conductance in a capacitively-coupled plasma processing chamber
06/26/2008US20080149590 Substrate-Holder, Etching Method of the Substrate, and the Fabrication Method of a Magnetic Recording Media
06/26/2008US20080149273 Plasma processing apparatus
06/26/2008US20080149272 Surface Microstructuring Device
06/26/2008DE102007017229A1 Monitoring etching of semiconductor substrate, for use in semiconductor devices, by measuring time-dependent concentration pattern for representative etching chemical
06/25/2008EP1935997A1 Functional member from co-based alloy and process for producing the same
06/25/2008EP1934387A1 Method for removing the coating from a gas turbine component
06/25/2008CN101208454A Wafer processing system and method of producing the wafer
06/25/2008CN101205618A Corrosion method of anode aluminum foil for middle-high voltage electrolytic capacitor
06/25/2008CN101205614A Chemical etching liquor for aluminium and aluminum alloy
06/25/2008CN101205613A Aluminum alloy chemical etching liquor
06/25/2008CN100397589C Plasma etching chamber and plasma etching system using same
06/25/2008CN100397588C Plasma processing device
06/25/2008CN100397587C Silicon gate etching process capable of avoiding microtrench phenomenon
06/25/2008CN100397586C Polycrystalline silicon pulse etching process for improving anisotropy
06/25/2008CN100396945C Dynamic pressure bearing manufacturing method, dynamic pressure bearing, and dynamic pressure bearing manufacturing device
06/24/2008US7390367 Housing assembly for an induction heating device including liner or susceptor coating
06/24/2008US7390366 Apparatus for chemical vapor deposition
06/19/2008WO2008073906A2 Dry photoresist stripping process and apparatus
06/19/2008US20080146801 Method of processing substrate and chemical used in the same
06/19/2008US20080145798 Method of processing substrate and chemical used in the same
06/19/2008US20080142484 Auxiliary method for wet etching by oscillation flow modification and device for the same
06/19/2008US20080142482 Multipurpose decapsulation holder and method for a ball grid array package
06/19/2008US20080142479 Micromachined titanium for high pressure microfluidic applications
06/19/2008US20080142478 Epoxy removal process for microformed electroplated devices
06/19/2008US20080142476 Multi-step photomask etching with chlorine for uniformity control
06/19/2008DE102006059045A1 Treatment of running surface of IC engine cylinder made from alloy containing magnesium silicide comprises selectively dissolving out magnesium silicide using acid, so that pores are formed in surface
06/18/2008EP1932948A1 Apparatus and method for recovering caustic soda from caustic solutions
06/18/2008EP1931817A2 Methods and compositions for acid treatment of a metal surface
06/17/2008US7387970 Method of using an aqueous solution and composition thereof
06/17/2008US7387742 Silicon blades for surgical and non-surgical use
06/17/2008US7387741 Power module member manufactured by wet treatment, and wet treatment method and wet treatment equipment thereof
06/17/2008US7387739 Mask and method of manufacturing the same, electroluminescent device and method of manufacturing the same, and electronic instrument
06/17/2008US7387737 Method for fabricating an isolated microelectromechanical system (MEMS) device using an internal void
06/17/2008US7387701 Etchant fume exhaust apparatus
06/12/2008WO2008069252A1 Process for production of highly corrosion-resistant composite
06/12/2008US20080138691 Separator for Fuel Cell and Method for Manufacturing Same
06/12/2008US20080135521 Implant surface preparation
06/12/2008US20080135519 Plasma processing apparatus and control method thereof
06/12/2008US20080135517 Carbon dioxide and optionally a passivation gas, such as a hydrocarbon gas, i.e., CxHy, wherein x, y represent integers greater than or equal to unity, is used to remove etch residue while reducing damage to underlying dielectric layers
06/12/2008US20080135515 Method of fabricating mirrors for liquid crystal on silicon display device
06/12/2008US20080135176 Apparatus for etching substrate and fabrication line for fabricating liquid crystal display using the same
06/12/2008DE10326273B4 Verfahren zur Reduzierung der Scheibenkontaminierung durch Entfernen von Metallisierungsunterlagenschichten am Scheibenrand Method for reducing the Scheibenkontaminierung by removing Metallisierungsunterlagenschichten at the wafer edge
06/12/2008DE102007045073A1 Lösung zum Ablösen von Metall und deren Verwendung in einem Verfahren zum Ablösen von Metall Solution for stripping the metal and their use in a method for stripping metal
06/11/2008EP1930477A1 Method for selectively removing coatings from metal substrates
06/11/2008CN201072762Y Texture surface etching tank of monocrystal silicon solar battery
06/11/2008CN101199043A Etching composition for metal material and method for manufacturing semiconductor device by using same
06/11/2008CN101195917A Method for etching copper or copper alloy
06/11/2008CN101195916A Method for producing porous surfaces on metal components
06/11/2008CN101195914A Method for selectively removing coatings from metal substrates
06/10/2008US7384570 Anodizing a web on both sides; sealing the anodic layer; and etching the first side but not the second side with sodium hydroxide to provide a web that with both a decorative side and a side with superior bonding capabilities.
06/10/2008US7384568 Method of forming a darkfield etch mask
06/07/2008CA2611819A1 Method for selectively removing coatings from metal substrates
06/05/2008US20080131325 Nanotipped device and method
06/05/2008US20080128089 Plasma processing apparatus
06/05/2008US20080128088 Etching apparatus for edges of substrate
06/05/2008US20080128087 High frequency power supply device and high frequency power supplying method
06/05/2008US20080128085 Surface Treating Apparatus For Square Wafer For Solar Battery
06/05/2008US20080127589 Door skin, a method of etching a plate for forming a wood grain pattern in the door skin, and an etched plate formed therefrom
06/05/2008US20080127482 High Isolation Tunable MEMS Capacitive Switch
06/05/2008US20080127479 Composite of aluminum alloy and resin and production method therefor
06/04/2008EP1038990B1 Method of reducing elution of lead in lead containing copper alloys for drinking water service
06/04/2008CN101192627A Silicon thin-film photocell electric pole pattern and etching method
06/04/2008CN101191227A Method for preparing ultra-hydrophobic surface on titanium-alloy
06/04/2008CN101191226A Schiff base heterocycle carbon steel pickling corrosion inhibitor and application thereof
06/04/2008CN100392152C Method for removing a layer area of a component
06/03/2008US7381291 Dual-chamber plasma processing apparatus
06/03/2008US7381290 Microwave plasma generator
06/03/2008US7381275 Apparatus and method for manufacturing semiconductor
06/03/2008US7381274 Gas valve assembly and apparatus using the same
06/03/2008US7380320 Piezoelectric device and method of manufacturing the device
05/2008
05/29/2008WO2008061911A1 Process for surface preparation of parts to be coated
05/29/2008US20080124932 Apparatus and method for surface treatment of substrate, and substrate processing apparatus and method
05/29/2008US20080123095 On-Chip Spectroscopy
05/29/2008US20080121623 Method of selectively stripping an engine-run ceramic coating
05/29/2008US20080121619 Method of cleaning wafer after etching process
05/29/2008US20080121618 Method of Electrochemical Fabrication
05/29/2008US20080121617 Etching method for metal layer of display panel
05/29/2008US20080121613 Method of manufacturing solar panel
05/29/2008US20080121610 Method of manufacturing fine patterns
05/29/2008US20080121534 Sealing conical tip of internal signal transduction element (ISTE); polishing to expose tip; monitoring extent of polishing using tester; termination when tester signifies that disk of desired radius is exposed; etching
05/29/2008US20080121344 Plasma processing apparatus
05/29/2008US20080121042 Improved system sensitivity and accuracy; improved performance of micro-machined devices
05/28/2008CN101189134A Selective surface texturing through the use of random application of thixotropic etching agents
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