| Patents for C23F 1 - Etching metallic material by chemical means (16,062) |
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| 01/21/2009 | CN100453154C Metal bearing membranes |
| 01/20/2009 | US7479461 Method of etching silicon anisotropically |
| 01/20/2009 | US7479235 Method for etching a workpiece |
| 01/20/2009 | US7479233 Mask blank for charged particle beam exposure, method of forming mask blank and mask for charged particle beam exposure |
| 01/20/2009 | US7479207 Adjustable height PIF probe |
| 01/20/2009 | US7478609 Plasma process apparatus and its processor |
| 01/15/2009 | WO2009009611A2 Systems for plasma enhanced chemical vapor deposition and bevel edge etching |
| 01/15/2009 | WO2009008801A1 A method for etching copper and recovery of the spent etching solution |
| 01/15/2009 | WO2009008273A1 Process for producing printed wiring board and printed wiring board produced by the production process |
| 01/15/2009 | WO2009007373A1 Nanosurface |
| 01/15/2009 | US20090017635 Apparatus and method for processing a substrate edge region |
| 01/15/2009 | US20090017259 Dry etching method, fine structure formation method, mold and mold fabrication method |
| 01/15/2009 | US20090015160 Plasma-Generating Structures, Display Devices, Plasma-Enhanced Treatments, Methods Of Forming Plasma-Generating Structures; Methods Of Plasma-Assisted Etching, And Methods Of Plasma-Assisted Deposition |
| 01/15/2009 | US20090014416 Transparent textured substrate and methods for obtaining same |
| 01/15/2009 | US20090014415 Compositions and methods for rapidly removing overfilled substrates |
| 01/15/2009 | US20090014414 Substrate processing method, substrate processing system, and computer-readable storage medium |
| 01/15/2009 | US20090014412 Film forming apparatus and method for manufacturing light emitting element |
| 01/15/2009 | US20090014409 Endpoint detection for photomask etching |
| 01/15/2009 | US20090014127 Systems for plasma enhanced chemical vapor deposition and bevel edge etching |
| 01/15/2009 | CA2693478A1 Nanosurface |
| 01/14/2009 | EP2014796A1 Etching solutions, method for regeneration of waste etching solutions and method for the recovery of valuable metals from waste etching solutions |
| 01/14/2009 | EP2013378A2 Exhaust system |
| 01/14/2009 | EP1255797A4 Method for roughening copper surfaces for bonding to substrates |
| 01/14/2009 | CN201180156Y Automatic ditcher for silicon slice |
| 01/14/2009 | CN101345395A Method for wet method corrosion of Terahertz quantum cascaded laser crestiform structure |
| 01/14/2009 | CN101345194A Silicon groove forming method and device |
| 01/14/2009 | CN101343746A Titanium oxide nano wire film on metallic titanium surface and manufacture method thereof |
| 01/14/2009 | CN100452290C Plasma processing apparatus |
| 01/13/2009 | US7476291 High chamber temperature process and chamber design for photo-resist stripping and post-metal etch passivation |
| 01/08/2009 | WO2008116222A3 A modular cluster tool |
| 01/08/2009 | US20090011597 Mass production method of semiconductor integrated circuit device and manufacturing method of electronic device |
| 01/08/2009 | US20090011585 Methods of Etching Nanodots, Methods of Removing Nanodots From Substrates, Methods of Fabricating Integrated Circuit Devices, Methods of Etching a Layer Comprising a Late Transition Metal, and Methods of Removing a Layer Comprising a Late Transition Metal From a Substrate |
| 01/08/2009 | US20090011343 Microstructure and manufacturing method thereof |
| 01/08/2009 | US20090011120 Plasma Treating Apparatus, Electrode Member for Plasma Treating Apparatus, Electrode Member Manufacturing Method and Recycling Method |
| 01/08/2009 | US20090009200 Method for Providing Alignment of a Probe |
| 01/08/2009 | US20090008433 Conductor ball mounting apparatus, conductor ball mounting method, mask used for mounting conductor ball, and mask manufacturing method |
| 01/08/2009 | US20090008365 Microtextured Implants and Methods of Making Same |
| 01/08/2009 | US20090008363 Plasma processing apparatus and a plasma processing method |
| 01/08/2009 | US20090008362 Plasma processing apparatus and plasma processing method |
| 01/08/2009 | US20090008035 Plasma processing apparatus |
| 01/08/2009 | US20090008033 Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor |
| 01/07/2009 | EP2011903A2 Etching solution and method of its manufacturing as well as method of etching metal surfaces and microtextured implants made using such a method |
| 01/07/2009 | EP2011897A2 Methods and apparatus for cleaning deposition chamber parts using selective spray etch |
| 01/07/2009 | EP2010695A2 Recyclable etching solution |
| 01/07/2009 | EP1631701A4 Atmospheric pressure non-thermal plasma device to clean and sterilize the surface of probes, cannulas, pin tools, pipettes and spray heads |
| 01/07/2009 | CN201178093Y Temperature controlled etching trough |
| 01/07/2009 | CN201178091Y Sheeting loading apparatus for etching machine |
| 01/07/2009 | CN101339900A Method for surface modification of semiconductor layer and method of manufacturing semiconductor device |
| 01/07/2009 | CN101338435A Reusable microetch agent for copper and copper alloy |
| 01/07/2009 | CN100449035C Silver coin blank surface deep corrosion process |
| 01/06/2009 | US7473380 Etching liquid |
| 01/01/2009 | US20090004436 for production of liquid crystal displays; organosilanes |
| 01/01/2009 | US20090003770 Vertical optical coupling structure |
| 01/01/2009 | US20090003754 Silicon structure and method of manufacturing the same |
| 01/01/2009 | US20090001524 Generation and distribution of a fluorine gas |
| 01/01/2009 | US20090001052 Plasma processing apparatus and plasma processing method |
| 01/01/2009 | US20090001051 Slurry compositions for polishing metal, methods of polishing a metal object and methods of forming a metal wiring using the same |
| 01/01/2009 | US20090001044 Method for manufacturing a semiconductor device using a spacer as an etch mask for forming a fine pattern |
| 01/01/2009 | US20090000942 Pulse plasma matching systems and methods including impedance matching compensation |
| 01/01/2009 | US20090000741 Vacuum prcessing apparatus and vacuum processing method of sample |
| 01/01/2009 | US20090000549 Substrate processing method and apparatus |
| 12/31/2008 | WO2007140421A9 Process chamber for dielectric gapfill |
| 12/31/2008 | EP2009146A1 A microporous coating or structure and a process for producing it |
| 12/31/2008 | EP2007467A2 Method and apparatus for recycling process fluids |
| 12/31/2008 | EP0871795B1 A scalable helicon wave plasma processing device with a non-cylindrical source chamber |
| 12/31/2008 | CN101336312A Pulsed-continuous etching |
| 12/31/2008 | CN101333660A Anti-corrosive film, method of preparing the film and pressure transmitter with the film |
| 12/31/2008 | CN101333658A Apparatus and method for high-temperature in-situ thinning silicon substrate |
| 12/31/2008 | CN100447303C Method for direct forming tool die by multiple etchig and apparatus thereof |
| 12/30/2008 | US7470919 Substrate support assembly with thermal isolating plate |
| 12/30/2008 | US7470631 Methods for fabricating residue-free contact openings |
| 12/30/2008 | US7470374 uses ion beam etching as a dry etching technique for a continuous recording layer, which can suppress misalignment of a processed shape of a divided recording element and avoid magnetic degradation, good magnetic characteristics |
| 12/30/2008 | US7470329 Method and system for nanoscale plasma processing of objects |
| 12/25/2008 | US20080318005 Crosslinkable Graft Polymer Non-Preferentially Wetted by Polystyrene and Polyethylene Oxide |
| 12/25/2008 | US20080318003 Nanostructures and Method of Making the Same |
| 12/25/2008 | US20080317965 Plasma processing apparatus and method |
| 12/25/2008 | US20080317423 Embedded Channels, Embedded Waveguide And Methods Of Manufacturing And Using The Same |
| 12/25/2008 | US20080314870 Substrate Processing Method, Substrate Processing Apparatus, and Control Program |
| 12/25/2008 | US20080314868 Methods of forming semiconductor devices formed by processes including the use of specific etchant solutions |
| 12/25/2008 | US20080314864 Method for manufacturing image sensor |
| 12/25/2008 | US20080314863 Printed circuit board including embedded capacitor and method of fabricating same |
| 12/25/2008 | US20080314522 Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor |
| 12/25/2008 | US20080314321 Plasma processing apparatus |
| 12/24/2008 | WO2008154926A1 A microporous coating or structure and a process for producing it |
| 12/24/2008 | WO2008154925A1 A microporous layer for lowering friction in metal-forming processes |
| 12/24/2008 | WO2008011306A3 Substrate support with adjustable lift and rotation mount |
| 12/24/2008 | WO2007142690A3 Apparatus and process for plasma-enhanced atomic layer deposition |
| 12/24/2008 | EP2006420A1 A microporous layer for lowering friction in metal forming processes |
| 12/24/2008 | CN101327710A Method for decorating surface of metal |
| 12/23/2008 | US7468104 Chemical vapor deposition apparatus and deposition method |
| 12/23/2008 | US7467598 System for, and method of, etching a surface on a wafer |
| 12/23/2008 | CA2342232C Method for producing etched circuits |
| 12/18/2008 | WO2007146803B1 Methods and apparatus for preventing plasma un-confinement events in a plasma processing chamber |
| 12/18/2008 | US20080311347 Alternating Self-Assembling Morphologies of Diblock Copolymers Controlled by Variations in Surfaces |
| 12/18/2008 | US20080310808 Photonic waveguide structure with planarized sidewall cladding layer |
| 12/18/2008 | US20080308530 Substrate treating apparatus |
| 12/18/2008 | US20080308525 R-plane sapphire substrate; forming buffer layer; potassium niobate or potassium niobate solid solution layer that epitaxially grows in a in a pseudo cubic system expression, and a plane tilts with a direction vector as a rotation axis with respect to the R-plane of the sapphire; and electrode layer |
| 12/18/2008 | US20080308524 Electrochemical Fabrication Methods With Enhanced Post Deposition Processing |
| 12/17/2008 | EP2001603A2 Process for creating a pattern on a copper surface |
| 12/17/2008 | CN101325148A Substrate etching apparatus |