Patents for C23F 1 - Etching metallic material by chemical means (16,062)
12/2008
12/17/2008CN101323955A Wool-making agent for monocrystalline silicon solar cell surface treatment and manufacturing method thereof
12/17/2008CN101322985A Warm state drawing method for processing medical magnesium alloy fine-radial thin-wall pipes
12/17/2008CN100443636C Oxygen charging device of sal ammoniac etching liquid
12/17/2008CN100443635C Etching method of copper-coated electronic circuit board
12/17/2008CN100443145C Perfluoride treatment appts.
12/16/2008US7466022 Wafer-level seal for non-silicon-based devices
12/16/2008US7465408 Solutions for controlled, selective etching of copper
12/16/2008US7465358 Measurement techniques for controlling aspects of a electroless deposition process
12/16/2008US7464663 Roll-vortex plasma chemical vapor deposition system
12/16/2008US7464662 Compact, distributed inductive element for large scale inductively-coupled plasma sources
12/11/2008WO2008109207A3 Methods and devices for biomolecular arrays
12/11/2008WO2007140426A3 Process chamber for dielectric gapfill
12/11/2008US20080302762 Method for Analyzing Quartz Member
12/11/2008US20080302761 Plasma processing system and use thereof
12/11/2008US20080302760 Method of forming a metal layer pattern having a nanogap and method of manufacturing a molecule-sized device using the same
12/11/2008US20080302482 Substrate processing apparatus
12/11/2008DE102007025136A1 Verfahren zum nasschemischen Ätzenvon TiO2-Dünnschichten und TiO2-Partikeln sowie Ätzmittel A method for wet chemical Ätzenvon TiO2 thin films and TiO2 particles and etchant
12/11/2008DE102004045956B4 Ätzhalterung für ein Substrat und Ätzsystem mit einer Ätzhalterung Ätzhalterung for a substrate and etching system with a Ätzhalterung
12/10/2008CN201162047Y Etching tank bubble apparatus and etching tank
12/10/2008CN101322448A Process for producing metal wiring board
12/10/2008CN100441745C Solid-phase flow settling separation
12/10/2008CN100441744C Method for manufacturing utensil for drinking water system made from lead-containing copper alloy, cast and lead-removed utensil for drinking water system, and utensil for drinking water system
12/10/2008CN100441743C Lifting device and method for processing alloy wire with continuous or step taper at end
12/10/2008CN100441742C Production of hinge thin-sheet paper cameo module
12/09/2008US7461445 Method of manufacturing a magnetic head with a deposited shield
12/04/2008WO2008147804A1 Plasma immersion ion processing for coating of hollow substrates
12/04/2008WO2008146833A1 Steel product composite and process for producing the steel product composite
12/04/2008WO2008024392A3 Inductive plasma source with high coupling efficiency
12/04/2008US20080299299 Plating method of electrode can of flat alkaline cell and plating apparatus thereof
12/04/2008US20080297801 Method for calculating optical constants and substrate processing system
12/04/2008US20080296261 Apparatus and methods for improving treatment uniformity in a plasma process
12/04/2008US20080296260 Method For the Fabrication of High Surface Area Ratio and High Aspect Ratio Surfaces on Substrates
12/04/2008US20080296258 Plenum reactor system
12/04/2008US20080296254 Multilayer wiring board for an electronic device
12/04/2008US20080295966 Electrode Assembly For The Removal Of Surface Oxides By Electron Attachment
12/04/2008US20080295965 Plasma processing apparatus
12/04/2008US20080295964 Exhaust assembly for a plasma processing system
12/04/2008US20080295963 Gas supply system and gas supply accumulation unit of semiconductor manufacturing apparatus
12/03/2008EP1358044B1 Chemical mechanical machining and surface finishing
12/03/2008CN101316949A RF ground switch for plasma processing system
12/03/2008CN101315889A Silicon film dry etching method
12/03/2008CN101315870A Semiconductor processing platform
12/03/2008CN101314852A Etching solution, method of surface modification of semiconductor substrate and method of forming shallow trench isolation
12/03/2008CN101314851A Fine aluminium sheet material corrosive agent
12/03/2008CN100440447C Method of making inclined-planes used in semiconductor preparing process
12/02/2008US7459100 Methods and apparatus for sequentially alternating among plasma processes in order to optimize a substrate
12/02/2008US7459094 Method for making a surface acoustic wave device package
12/02/2008US7459093 MEMS mirror made from topside and backside etching of wafer
12/02/2008US7459057 Substrate retainer
12/02/2008US7459056 Pad conditioning head for CMP process
11/2008
11/27/2008WO2008144666A1 Method for metallizing liquid crystal and polymer
11/27/2008WO2007143476A3 Apparatus and method for single substrate processing
11/27/2008US20080293244 Methods of Positioning and/or Orienting Nanostructures
11/27/2008US20080292840 Electrically and thermally conductive carbon nanotube or nanofiber array dry adhesive
11/27/2008US20080290066 Method of Fabricating Polymer Modulators With Etch Stop Clads
11/27/2008US20080290064 Method for forming sapphire micro-lens in led process
11/27/2008US20080289764 End point detection electrode system and etch station
11/26/2008EP1995351A1 Device and method for re-extracting bases in an alkaline corrosive solution
11/26/2008EP1125315B1 Method for hf-hf cleaning
11/26/2008CN201154988Y Single-faced floating corrosion unit for silicon wafer
11/26/2008CN101312121A Base plate treating device
11/26/2008CN101311316A Metallic aluminum material detergent
11/26/2008CN101311315A Metallic copper material detergent
11/26/2008CN101311311A Technological process for dying red antique bronze color on surface of brass products
11/26/2008CN101311310A Technological process for dying black antique bronze color on surface of brass products
11/26/2008CN100437931C Electric liquid chamber and method of processing substrate in the chamber
11/26/2008CN100437925C Material for purification of semiconductor polishing slurry, module for purification of semiconductor polishing slurry and process for producing semiconductor polishing slurry
11/26/2008CN100437665C Name plate and processing method thereof
11/26/2008CN100436645C Etching solution of copper or copper alloy and method for producing electronic substrate using the solution
11/25/2008US7455884 Atomic layer deposition with point of use generated reactive gas species
11/25/2008US7455789 Stamper, lithographic method of using the stamper and method of forming a structure by a lithographic pattern
11/25/2008US7455787 Etching of solar cell materials
11/25/2008US7455748 Magnetic enhancement for mechanical confinement of plasma
11/25/2008US7455735 Width adjustable substrate support for plasma processing
11/20/2008WO2008141118A1 Laser activated fluorine treatment of silicon substrates
11/20/2008WO2008139021A1 Metthod of regeneration method of acid cupper(ii)chloride etching waste
11/20/2008WO2008016747A3 Method and system for controlling the uniformity of a ballistic electron beam by rf modulation
11/20/2008US20080286974 Etching solution for multiple layer of copper and molybdenum and etching method using the same
11/20/2008US20080286563 Probe used for surface enhanced vibrational spectroscopic analysis and method of manufacturing the same
11/20/2008US20080286554 Ceramic substrate material, method for the production and use thereof, and antenna or antenna array
11/20/2008US20080283501 Process for Manufacturing Micro-and Nano-Devices
11/20/2008US20080283500 Plasma processing apparatus and plasma processing method
11/20/2008US20080283498 Plasma Processing Device and Plasma Processing Method
11/20/2008US20080283495 Micro electro mechanical system device and method of manufacturing the same
11/20/2008US20080283487 Process for producing three-dimensional photonic crystal and the three-dimensional photonic crystal
11/19/2008EP1992720A1 Etchant and method for fabricating electric device including thin film transistor using the same
11/19/2008EP1747303A4 Improved micro-fluid ejection assemblies
11/19/2008CN201151223Y Metal slide fastener with environment-protecting dye layer
11/19/2008CN101308789A Air flow guiding device for vacuum process
11/19/2008CN101307453A Technology of silicon nano-wires without electrodeposit nickel and thermoelectric power device based on the technology
11/19/2008CN101307446A Recovery technology for etching waste liquid and device thereof
11/19/2008CN101307445A Recovery method for etching waste liquid and device thereof
11/19/2008CN101307444A Etchant and method for fabricating electric device including thin film transistor using the same
11/19/2008CN101307443A Chemical treatment method and chemical treatment apparatus
11/19/2008CN100435292C Non-selective etched process for GaAs/AlGaAs crystal material
11/19/2008CN100435288C Process for producing silicon wafer
11/19/2008CN100435276C Vacuum processing apparatus
11/19/2008CN100434568C Corrosion liquid for InGaP/ AIGaInP crystal material
11/18/2008US7452477 Procedure for etching of materials at the surface with focussed electron beam induced chemical reaction at said surface
11/18/2008US7452475 Cleaning process and apparatus for silicate materials
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