Patents for C23F 1 - Etching metallic material by chemical means (16,062)
10/2008
10/08/2008CN100424227C Aqueous solution composition for treating metal surface
10/08/2008CN100423828C Silicon powder surface etching device
10/07/2008US7431861 Using aqueous solution of cupric ions, hydrochloride acid and azole compound; fine, high density wiring pattern
10/07/2008US7431859 Plasma etch process using polymerizing etch gases with different etch and polymer-deposition rates in different radial gas injection zones with time modulation
10/07/2008US7431858 For microstructuring electronic components, which yields high resolutions ( <== 200 nm) at a good aspect ratio while being significantly less expensive than photolithographic methods; semiconductors
10/07/2008US7431853 Selective etching of oxides from substrates
10/07/2008US7431796 Method and apparatus for low energy electron enhanced etching of substrates in an AC or DC plasma environment
10/07/2008US7431795 Cluster tool and method for process integration in manufacture of a gate structure of a field effect transistor
10/07/2008US7431773 Atomic layer deposition apparatus and method
10/07/2008US7431772 Gas distributor having directed gas flow and cleaning method
10/07/2008US7430985 Plasma processing equipment
10/07/2008US7430984 Method to drive spatially separate resonant structure with spatially distinct plasma secondaries using a single generator and switching elements
10/07/2008CA2407591C Surface treatments to improve corrosion resistance of austenitic stainless steels
10/02/2008WO2008116285A1 Coating removal from vane rings via tumble strip
10/02/2008WO2008084224A3 Liquid treatment apparatus
10/02/2008WO2007143301A3 Controlled zone microwave plasma system
10/02/2008US20080242562 Apparatus and methods for detecting nucleic acid in biological samples
10/02/2008US20080242103 Method of manufacturing semiconductor device and semiconductor manufacturing apparatus
10/02/2008US20080241595 Magnetic recording medium
10/02/2008US20080241517 Aluminum-plated components of semiconductor material processing apparatuses and methods of manufacturing the components
10/02/2008US20080241512 Articles with super-hydrophobic and-or super-hydrophilic surfaces and method of formation
10/02/2008US20080237714 Manufacturing Process for Zero-Capacitor Random Access Memory Circuits
10/02/2008US20080237190 Surface cleaning method of semiconductor wafer heat treatment boat
10/02/2008US20080237189 Method for laser scribing of solar panels
10/02/2008US20080237188 Substrate processing apparatus and substrate processing method
10/02/2008US20080237186 Plasma processing apparatus and method thereof
10/02/2008US20080237183 Method of etching an organic low-k dielectric material
10/02/2008US20080237182 Substrate processing apparatus and substrate processing method
10/02/2008US20080236754 Plasma processing apparatus
10/02/2008US20080236753 Plasma processing apparatus
10/02/2008US20080236750 Plasma processing apparatus
10/02/2008US20080236747 Gas analyzing apparatus and substrate processing system
10/02/2008US20080236745 Method and apparatus for fabricating or altering microstructures using local chemical alterations
10/02/2008US20080236486 Detachable detection window and detecting system
10/02/2008CA2676827A1 Coating removal from vane rings via tumble strip
10/01/2008EP1975275A1 Porous valve metal thin film, method for production thereof and thin film capacitor
10/01/2008EP1366510B1 Ruthenium silicide wet etch
10/01/2008CN201125266Y Corroded solution regeneration and copper recycling preprocess apparatus
10/01/2008CN101276789A Method and ink for etching amorphous silicon solar battery aluminum membrana
10/01/2008CN101276756A Etching method and apparatus for a single wafer
10/01/2008CN101275229A Composite etchant for 409L ferritic stainless steel and use method thereof
10/01/2008CN100423188C Fault detection method in chip etching technology
10/01/2008CN100423187C Silicon-chip separating process
10/01/2008CN100423182C Methods of reducing photoresist distortion while etching in a plasma processing system
09/2008
09/30/2008US7429337 Method for removing at least one area of a layer of a component consisting of metal or a metal compound
09/30/2008US7429306 Plasma processing system
09/25/2008WO2008114669A1 Aluminum alloy composite and method of bonding therefor
09/25/2008WO2008021668A3 Heating and cooling of substrate support
09/25/2008WO2007131094A3 Method and apparatus for chemical mechanical polishing of large size wafer with capability of polishing individual die
09/25/2008WO2007046853A3 Systems for discretized processing of substrate regions
09/25/2008WO2007038514A3 Apparatus and method for substrate edge etching
09/25/2008US20080233755 Method of Removing Metallic, Inorganic and Organic Contaminants from Chip Passivation Layer Surfaces
09/25/2008US20080233748 Etch depth determination for sgt technology
09/25/2008US20080233664 Semiconductor integrated circuit production method and device
09/25/2008US20080230519 Method and system for dry etching a metal nitride
09/25/2008US20080230518 Gas flow diffuser
09/25/2008US20080230516 Method for forming fine patterns using etching slope of hard mask layer in semiconductor device
09/25/2008US20080230515 Power module member manufactured by wet treatment, and wet treatment method and wet treatment equipment thereof
09/25/2008US20080230514 Method of producing nanopatterned templates
09/25/2008US20080230390 Contact substrate with conformation masking pattern on substrate; multilayer; three-dimensional structure; cyclic process; electroplating
09/25/2008US20080230180 Processing Equipment for Object to be Processed
09/25/2008US20080230097 Methods for Processing Wafer Surfaces Using Thin, High Velocity Fluid Layer
09/24/2008EP1972600A1 Carrier device for plating
09/24/2008EP1972373A1 Production method of hydrogen production filter
09/24/2008CN100421216C Etching solution and method for manufacturing conducting lug by selectively removing barrier layer with the same
09/23/2008US7428094 Fabrication of a high fill ratio reflective spatial light modulator with hidden hinge
09/23/2008US7427360 Process and ink for making electronic devices
09/23/2008US7427359 Self-filling wet electrochemical cells by laser processing
09/23/2008US7427333 Resist removing method and resist removing apparatus
09/23/2008US7426900 Integrated electrostatic inductive coupling for plasma processing
09/18/2008WO2008112068A1 Multilayer printed wiring boards with copper filled through-holes
09/18/2008WO2008111389A1 Etching solution and etching method
09/18/2008WO2008111163A1 Method of surface treatment for metal glass part, and metal glass part with its surface treated by the method
09/18/2008WO2008070181A3 Mid-chamber gas distribution plate, tuned plasma control grid and electrode
09/18/2008US20080227301 Integrated circuits; cleaning a bevel edge of a semiconductor; eliminates contamination by byproduct layer
09/18/2008US20080227225 Method and apparatus for manufacturing a semiconductor device
09/18/2008US20080224115 Fabricating a Set of Semiconducting Nanowires, and Electric Device Comprising a Set of Nanowires
09/18/2008US20080223873 Dynamic control of process chemistry for improved within-substrate process uniformity
09/18/2008US20080223826 Reagent Delivery using a Membrane-Mediated Process
09/18/2008US20080223825 Substrate processing apparatus, substrate processing method and storage medium
09/18/2008US20080223717 Wettability Switch
09/18/2008US20080223523 Substrate processing apparatus and electrode structure
09/18/2008US20080223298 Recovery processing method to be adopted in substrate processing apparatus, substrate processing apparatus and program
09/17/2008EP1969162A2 Method for the pre-treatment of titanium components for the subsequent coating thereof
09/17/2008CN201117639Y Wet method immersion type equipment medical liquor treating trough
09/17/2008CN101265579A Etchant for thin film transistor liquid crystal display device
09/17/2008CN101265578A Multi-angle perpendicular reflector preparation method and product
09/17/2008CN101265577A Quick assembling and maintenance type vertically conveyed lamella etching conveyer device
09/17/2008CN100419122C Spraying type aluminium alloy chemical etching liquid
09/17/2008CN100419121C Wet etching equipment
09/16/2008US7425276 Method for etching microchannel networks within liquid crystal polymer substrates
09/12/2008WO2008108850A1 Plasma reaction apparatus having pre-seasoned showerheads and methods for manufacturing the same
09/11/2008US20080220281 Copper alloy plumbing hardware, such as valves and tube couplings, and the treatment method for reducing elution of lead
09/11/2008US20080217296 Etching apparatus for semiconductor processing apparatus and method thereof for recycling etchant solutions
09/11/2008US20080217295 Plasma processing apparatus and plasma processing method
09/11/2008US20080217293 Processing system and method for performing high throughput non-plasma processing
09/11/2008US20080217291 Substrate mounting stage and surface treatment method therefor
09/11/2008US20080217048 Wired circuit board and producing method thereof
09/11/2008US20080216958 Plasma Reaction Apparatus Having Pre-Seasoned Showerheads and Methods for Manufacturing the Same
09/11/2008US20080216956 Plasma processing apparatus
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