Patents for C23F 1 - Etching metallic material by chemical means (16,062) |
---|
09/11/2008 | DE102008010038A1 Verfahren zum Verbessern der Haftung zwischen einer Formgedächtnislegierung und einem Polymer A method for improving the adhesion between a shape memory alloy and a polymer |
09/10/2008 | EP1967613A1 Apparatus for satinizing and finishing manufactured articles preferably made of aluminum |
09/10/2008 | EP1966410A2 Ultrapure colloidal silica for use in chemical mechanical polishing applications |
09/10/2008 | EP1667850A4 Methods for cleaning a set of structures comprising yttrium oxide in a plasma processing system |
09/10/2008 | CN101263092A Methods and apparatus for the optimization of etch resistance in a plasma processing system |
09/10/2008 | CN101262026A Method for making multi-crystal Hg iodide film room temperature nucleus emission detector |
09/10/2008 | CN101260193A Method for improving adhesion between a shape memory alloy and a polymer |
09/09/2008 | US7422980 Methods of positioning and/or orienting nanostructures |
09/09/2008 | US7422696 Multicomponent nanorods |
09/09/2008 | US7422656 Dry etching method and apparatus for use in the LCD device |
09/09/2008 | US7422654 Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor |
09/09/2008 | US7422653 Single-sided inflatable vertical slit valve |
09/09/2008 | US7422637 Processing chamber configured for uniform gas flow |
09/04/2008 | WO2008106222A1 Method of plasma etching transition metal oxides |
09/04/2008 | US20080211068 Method for manufacturing leadframe, packaging method for using the leadframe and semiconductor package product |
09/04/2008 | US20080210665 Polishing composition and polishing method |
09/04/2008 | US20080210664 Method of Surface Treatment and Surface-Treated Article |
09/04/2008 | US20080210660 Medium For Etching Oxidic, Transparent, Conductive Layers |
09/04/2008 | US20080210378 Plasma Reactor Having Multiple Antenna Structure |
09/04/2008 | US20080210377 Uniform etch system |
09/04/2008 | US20080210376 Plasma processing apparatus capable of controlling plasma emission intensity |
09/04/2008 | US20080210270 Removing unwanted film from wafer edge region with reactive gas jet |
09/04/2008 | US20080210269 Removing unwanted film from wafer edge region with reactive gas jet |
09/04/2008 | US20080209703 Piezoelectric vibrators, piezoelectric devices comprising same, and methods for producing same |
09/03/2008 | EP1332241B1 Electrostatically clamped edge ring for plasma processing |
09/03/2008 | CN101256953A Semiconductor substrate surface chemical processing method apparatus |
09/03/2008 | CN101254138A Micropore processing method of bone repairing body rough surface |
09/03/2008 | CN100416771C Combined wet etching method and system for stacked films |
09/03/2008 | CN100416758C Method for releasing chip static electricity thoroughly in chip etching equipment |
09/03/2008 | CN100415934C High-purity alkali etching solution for silicon wafers and alkali etching method for silicon wafers |
09/02/2008 | US7419911 high polishing efficiency, uniformity, and removal rate, and leaves a high quality polish with minimal surface defects; uses an oxidizer, preferably a per-type oxidizer such as a peroxide, periodic acid, and peracetic acid; abrasives |
08/28/2008 | WO2008103456A2 Pulsed plasma system with pulsed sample bias for etching semiconductor structures |
08/28/2008 | WO2008103454A2 Pulsed plasma system for etching semiconductor structures |
08/28/2008 | WO2008102172A1 Photovoltaic device and manufacturing method therefor |
08/28/2008 | US20080207468 Micro-fabricated stamp array for depositing biologic diagnostic testing samples on bio-bindable surface |
08/28/2008 | US20080206684 Method for forming ring pattern |
08/28/2008 | US20080206562 Methods of generating supported nanocatalysts and compositions thereof |
08/28/2008 | US20080204713 Methods and Apparatus for Label-Independent Monitoring of Biological Interactions on Sensitized Substrates |
08/28/2008 | US20080204693 Substrate Support Method |
08/28/2008 | US20080203060 etching silicon nitride using water, a phosphorus compound, a boron compound, a silicon compound and/or their fluorides, and optionally nitric acid, with no precipitation of silicon oxide |
08/28/2008 | US20080203058 Substrate developing method and developing apparatus |
08/28/2008 | US20080203056 Methods for etching high aspect ratio features |
08/28/2008 | US20080203053 Method for manufacturing magnetic recording medium, stamper, transferring apparatus, and method for forming resin mask |
08/28/2008 | US20080202562 for removing copper from a surface, comprising polyphosphonic acid, hydroxyl-substituted primary amine, and water; for cleaning gun bores; effective in removing copper and other deposits without flammable solvents or ammonia |
08/27/2008 | CN100413999C Method for regenerating etching solutions containing iron for the use in etching or pickling copper or copper alloys and an apparatus for carrying out said method |
08/26/2008 | US7416681 Etching solution for multiple layer of copper and molybdenum and etching method using the same |
08/26/2008 | US7416677 Exhaust assembly for plasma processing system and method |
08/26/2008 | US7416676 Plasma etching method and apparatus, control program for performing the etching method, and storage medium storing the control program |
08/26/2008 | US7416634 Method and apparatus for processing nanoscopic structures |
08/26/2008 | US7416633 Plasma processing apparatus |
08/26/2008 | US7416632 Substrate processing apparatus and substrate processing method |
08/26/2008 | US7415940 Plasma processor |
08/21/2008 | WO2008098593A1 Titanium etchant composition |
08/21/2008 | US20080200028 Methods of positioning and/or orienting nanostructures |
08/21/2008 | US20080199767 Corrosion-resistant interconnects for fuel cells |
08/21/2008 | US20080197110 Pulsed-plasma system with pulsed sample bias for etching semiconductor substrates |
08/21/2008 | US20080197109 Etch pattern definition using a CVD organic layer as an anti-reflection coating and hardmask |
08/20/2008 | EP1957207A1 Method of enhancing biocompatibility of elastomeric materials by microtexturing using microdroplet patterning |
08/20/2008 | CN101248215A Batch deposition tool and compressed boat |
08/20/2008 | CN101247700A Stirring type wet process machine and stirring type wet process |
08/20/2008 | CN101246780A Production method of low pressure formed foil |
08/20/2008 | CN101246779A Production method of medium and high pressure formed foil |
08/20/2008 | CN101245462A Etching liquid composition and etching method |
08/20/2008 | CN101244803A Method for producing alloy phase change material nano-dot matrix |
08/20/2008 | CN100412697C Method for manufacturing substrate for discrete track recording media and method for manufacturing discrete track recording media |
08/19/2008 | US7413673 Method for adjusting voltage on a powered Faraday shield |
08/19/2008 | US7413628 Substrate treatment method and substrate treatment apparatus |
08/19/2008 | US7413612 In situ substrate holder leveling method and apparatus |
08/19/2008 | CA2413640C Process for rejuvenating a diffusion aluminide coating |
08/19/2008 | CA2406430C Method for removing metal cladding from airfoil substrate |
08/14/2008 | WO2008097670A1 Multi-zone gas distribution system for a treatment system |
08/14/2008 | WO2008048240A3 Copper chelating agent, composition including the agent, and methods of forming and using the agent and composition |
08/14/2008 | US20080194111 Removal of process residues on the backside of a substrate |
08/14/2008 | US20080193739 Fabrication of composite materials using atomic layer deposition |
08/14/2008 | US20080190894 Chemical Mechanical Polishing Slurries, Their Applications and Method of Use Thereof |
08/14/2008 | US20080190893 Plasma processing method and plasma processing apparatus |
08/14/2008 | US20080190890 Method for forming mask for using dry-etching and method for forming fine structure pattern |
08/14/2008 | US20080190886 Differential etch rate control of layers deposited by chemical vapor deposition |
08/14/2008 | US20080190557 Apparatus for real-time dynamic chemical analysis |
08/14/2008 | US20080190482 Process for Manufacturing Pieces of a Foil Having an Inorganic Coating |
08/14/2008 | US20080190307 Pattern transcription device and method of fabricating cliche for the same |
08/14/2008 | DE102007006151A1 Verfahren zur Verringerung und Homogenisierung der Dicke einer Halbleiterschicht, die sich auf der Oberfläche eines elektrisch isolierenden Materials befindet A process for the reduction and homogenization of the thickness of a semiconductor layer which is located on the surface of an electrically insulating material |
08/13/2008 | EP1606431B1 Solution for etching copper surfaces and method of depositing metal on copper surfaces |
08/13/2008 | CN101241844A In-situ dry clean chamber for front end of line fabrication |
08/13/2008 | CN100410357C Cleaning composition for semiconductor components and process for manufacturing semiconductor device |
08/12/2008 | US7410590 Transferable micro spring structure |
08/12/2008 | US7410552 Electron cyclotron resonance equipment with variable flare angle of horn antenna |
08/12/2008 | CA2277048C Method of removing reactive metal from a metal-coated reactor system |
08/07/2008 | WO2008094752A1 Processing chamber with heated chamber liner |
08/07/2008 | WO2008063980A3 Independent radiant gas preheating for precursor disassociation control and gas reaction kinetics in low temperature cvd systems |
08/07/2008 | US20080188013 In-situ dose monitoring using optical emission spectroscopy |
08/07/2008 | US20080185364 Plasma etching method, plasma etching apparatus, control program and computer-readable storage medium |
08/07/2008 | US20080185286 Semiconductor wafers; rigid copper segment; exterior edge and carbon support film; thinning using ion beams; better adjustment of sample in carrier; transporting with electrically charging glass needle |
08/07/2008 | US20080185105 Apparatus for defining regions of process exclusion and process performance in a process chamber |
08/07/2008 | US20080185103 Control of Critical Dimensions of Etched Structures on Semiconductor Wafers |
08/07/2008 | US20080185102 Method and apparatus for real-time measurement of trace metal concentration in chemical mechanical polishing (cmp) slurry |
08/06/2008 | CN101238242A Stabilized etching solutions for cu and cu/ni layers |
08/06/2008 | CN101235503A Method for preparing natural gas conveying pipeline inner wall corrosion inhibitor |
08/06/2008 | CN101235502A Screen printing carbon electrode pretreatment method |
08/06/2008 | CN101235501A Corrosion solution for polycrystal ''carbon head material'' silicon carbon separation and preparation method thereof |