Patents for C23F 1 - Etching metallic material by chemical means (16,062)
06/2005
06/21/2005US6908479 Expandable stents and method for making same
06/16/2005WO2005054543A1 Cleaning method
06/16/2005WO2005034596A3 Improved method for micro-roughening treatment of copper and mixed-metal circuitry
06/16/2005WO2004087281A3 Implementation of microfluidic components, including molecular fractionation devices, in a microfluidic system
06/16/2005US20050130046 Subjecting the chrome-containing layer of a photomask to a wet etch process using deionized water and ozone; length of exposure is directly proportional to the degree of adjustment desired
06/16/2005US20050127447 Method of manufacturing a substrate for an electronic device by using etchant and electronic device having the substrate
06/16/2005US20050127036 Method of cleaning a reaction chamber
06/16/2005US20050127032 Master for concavo-convex pattern transfer and method for manufacturing stamp for manufacturing information recording medium
06/16/2005US20050127030 Applying liquid solution containing carbon nanotubes having functional groups and an additive for bonding to a surface of a base body; crosslinking; anhydriding, carbonylation, sulfonation, etherification, amidation, amination, carbamylation, sulfiding, sulfonation, esterification, alkylation
06/16/2005US20050126711 Plasma processing apparatus
06/16/2005US20050126707 Manufacture having double sided features in a metal-containing web and manufacture and method for forming same in a liquid-based etch process
06/15/2005EP1541714A1 Method for repairing components using environmental bond coatings and resultant repaired components
06/15/2005EP1541221A1 Thin film supporting substrate used in filter for hydrogen production and method for manufacturing filter for hydrogen production
06/15/2005CN1626699A Removing liquid for tungsten metal and method for removing tungsten metal using such liquid
06/15/2005CN1626567A Polishing compound for chemimachanical polishing and method for polishing substrate
06/15/2005CN1206707C Chip protector
06/15/2005CN1206388C Nickel ion separated from ferric chloride solution by using iron substitution method
06/14/2005US6905975 Methods of forming patterned compositions
06/14/2005US6905628 Preapplying passivation layer before etching; electrochemical wet etching
06/14/2005US6905624 Interferometric endpoint detection in a substrate etching process
06/14/2005US6905617 Etching method for making fluid bearings
06/14/2005US6905616 Method of releasing devices from a substrate
06/09/2005WO2005017937A3 Sensor array for measuring plasma characteristics in plasma processing enviroments
06/09/2005WO2004103040A3 Method for coating blanks for the production of printed circuit boards (pcb)
06/09/2005US20050121145 Thermal processing system with cross flow injection system with rotatable injectors
06/09/2005DE102004053336A1 Ätzmittel und Ergänzungsmittel dafür sowie ein Ätzmittelverfahren und ein Verfahren zur Herstellung einer Schaltplatte unter dessen Verwendung And etchant supplements therefor, and a Ätzmittelverfahren and a method of manufacturing a circuit board in its use
06/08/2005CN1625590A An etchant for a wiring, a method for manufacturing the wiring using the etchant, a thin film transistor array panel including the wiring, and a method for manufacturing the same
06/08/2005CN1624198A Acidless metal etching method and its etching machine
06/08/2005CN1205325C Stabilized alkaline compositions for cleaning microelectronic substrates
06/08/2005CN1204940C Method for making surface component of head of golf club
06/07/2005US6902824 Copper foil and metal foil with carrier foil for printed wiring board, and semi-additive process for producing printed wiring board using the same
06/07/2005US6902646 Sensor array for measuring plasma characteristics in plasma processing environments
06/07/2005US6902628 Immersing ceramics or metals having coatings in acidic, then in basic solutions to remove deposits and optionally blasting for smoothness
06/07/2005US6902627 Cleaning chamber surfaces to recover metal-containing compounds
06/07/2005US6902626 A liquid etchant used for etching of a copper foil or a copper plate
06/02/2005WO2005026410A3 Petroleum-free, ammonia-free cleaner for firearms and ordnance
06/02/2005US20050118334 Multistage process for multilayer forming of alloy diffusion coating on article with vapor or vacuum deposition on surface for protection of surface using nickel, aluminum
06/02/2005US20050115926 contacting the coating with an aqueous composition which comprises a fluorine-containing acid such as hexafluorosilicic acid. and a second acid, such as phosphoric acid or nitric acid
06/02/2005US20050115925 Method for selective removal of high-k material
06/02/2005US20050115679 Surface treatment apparatus
06/02/2005US20050115677 Plasma etching apparatus
06/02/2005US20050115676 Plasma processing method, plasma processing apparatus and computer storage medium
06/01/2005EP1535317A1 High temperature anisotropic etching of multi-layer structures
06/01/2005CN1621555A Mask and container and manufacturing apparatus
05/2005
05/31/2005US6899787 Plasma processing apparatus and plasma processing system with reduced feeding loss, and method for stabilizing the apparatus and system
05/31/2005US6899785 Method of stabilizing oxide etch and chamber performance using seasoning
05/26/2005WO2005048663A2 Improved methods of cleaning copper surfaces in the manufacture of printed circuit boards
05/26/2005WO2005048301A2 Methods and apparatus for optimizing a substrate in a plasma processing system
05/26/2005WO2005035090A3 An etching method in fabrications of microstructures
05/26/2005WO2005031803A9 Thermal processing system with cross flow injection system with rotatable injectors
05/26/2005US20050109734 Etchant and replenishment solution therefor, and etching method and method for producing wiring board using the
05/26/2005US20050109733 Cleaning and etching methods and their apparatuses
05/26/2005US20050109636 Generation. conditioning , reuse of metal containing electrolytes; surface treatment; ion exchanging
05/26/2005US20050109462 Apparatus for generating inductively-coupled plasma and antenna coil structure thereof for generating inductive electric fields
05/26/2005US20050109460 Adjustable gas distribution system
05/26/2005US20050109088 Integrated tool with automated calibration system and interchangeable wet processing components for processing microfeature workpieces
05/25/2005EP1533398A1 Process for producing an electrolyte ready for use out of waste products containing metal ions
05/25/2005CN1620231A Process for manufacturing a wiring substrate
05/25/2005CN1619013A Detin liquid and its preparation technology and use
05/25/2005CN1203529C Polishing compound for chemimachanical polishing and method for polishing substrate
05/24/2005US6896737 Gas delivery device for improved deposition of dielectric material
05/19/2005WO2005045524A2 A method of forming a patterned layer on a substrate
05/19/2005WO2005045099A1 Process of maintaining hybrid etch
05/19/2005WO2005045098A1 Process for etching metal and alloy surfaces
05/19/2005US20050107012 Method and apparatus for polishing a substrate while washing a polishing pad of the apparatus with at least one free-flowing vertical stream of liquid
05/19/2005US20050106881 Wafer reuse techniques
05/19/2005US20050106867 Method and device for treating objects by means of a liquid
05/19/2005US20050106472 patterning the non-transparent film using the etch stop layer to expose areas of the transparent substrate, forming a mask on the non-transparent film to protect selected areas of the transparent substrate and forming a phase shift oxide
05/19/2005US20050106315 Method for repairing components using environmental bond coatings and resultant repaired components
05/19/2005US20050103750 Chemical vapor deposition of a Ti/TiN barrier film onto the inner walls of a plug hole with exposed cobalt silicide; examining the film and if particles are detected, then an acid wet etching rework procedure is performed to remove the barrier layer and to reform a new Ti/TiN barrier layer
05/19/2005US20050103268 Method and apparatus for an improved baffle plate in a plasma processing system
05/19/2005US20050102830 Electrolessly plating a thin copper film onto a dielectric, forming plated resists, electrolytically plating copper, removing the plated resists and thin copper film layers, etching the wiring pattern layers, and forming another dielectric layer; high performance; miniaturization
05/19/2005DE10344351A1 Verfahren zum anisotropen Ätzen von Silizium A method for anisotropic etching of silicon
05/18/2005CN1616714A Polycrystal silicon etching process with reduced micro channel effect
05/17/2005US6893969 Use of ammonia for etching organic low-k dielectrics
05/12/2005WO2005043701A1 Method for manufacturing gratings in semiconductor materials
05/12/2005WO2005042658A1 Abrasive-free che.mical mechanical polishing composition and polishing process containing same
05/12/2005US20050101150 Methods of enhancing selectivity of etching silicon dioxide relative to one or more organic substances; and plasma reaction chambers
05/12/2005US20050101149 Dry etching method and apparatus for use in the LCD device
05/12/2005US20050101136 Etching method and method of manufacturing circuit device using the same
05/12/2005US20050101134 Method for etching a thin metal layer
05/12/2005US20050098899 Structure and method of forming an enlarged head on a plug to eliminate the enclosure requirement
05/12/2005US20050098538 Methods of cleaning copper surfaces in the manufacture of printed circuit boards
05/12/2005US20050098537 Method for large-area patterning dissolved polymers by making use of an active stamp
05/12/2005US20050098264 Molecular airborne contaminants (MACs) film removal and wafer surface sustaining system and method
05/12/2005US20050098108 Gas delivery device for improved deposition of dielectric material
05/11/2005CN1614789A Method for preparing polycrystalline silicon suede
05/11/2005CN1614093A Etchant and replenishment solution therefor, and etching method and method for producing wiring board using them
05/11/2005CN1201033C Treatment method of copper containing waste liquid from alkali etching of printed circuit board
05/10/2005US6890447 Method of forming noble metal thin film pattern
05/05/2005US20050095871 Process of maintaining hybrid etch
05/05/2005US20050095811 Method for surface treatment
05/05/2005US20050092436 System and method for ventilation in the fabrication of integrated circuits
05/05/2005US20050092435 Processing device, electrode, electrode plate, and processing method
05/05/2005US20050092433 Etching apparatus of glass substrate
05/05/2005US20050092432 Ion beam processing system and ion beam processing method
05/05/2005US20050092431 Chemical processing method, and method of manufacturing semiconductor device
05/04/2005CN1613036A Method and device for treating objects by means of a liquid
05/04/2005CN1611639A Mask forming method, mask forming functional layer, dry etching method, and method of manufacturing an information recording medium
05/04/2005CN1200141C Acid detinning and deleading agent