| Patents for C23F 1 - Etching metallic material by chemical means (16,062) |
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| 03/17/2005 | WO2004055855B1 Gas distribution apparatus and method for uniform etching |
| 03/17/2005 | US20050059254 Methods and apparatus of etch process control in fabrications of microstructures |
| 03/17/2005 | US20050059253 Etching method in fabrications of microstructures |
| 03/17/2005 | US20050057004 Stainless steel plate, method of manufacturing the same, and rubber-coated stainless steel plate gasket |
| 03/17/2005 | US20050056616 using aqueous solutions comprising oxidizers, complexing agents and water, to form uniform and smooth surfaces |
| 03/17/2005 | US20050056615 Selective plasma etching process for aluminum oxide patterning |
| 03/17/2005 | US20050056221 Minimum volume oven for producing uniform pyrolytic oxide coatings on capacitor anodes |
| 03/16/2005 | CN1595616A Chemical corrosion method for 40Gb/s waveguide type PIN photo-detector tube core table |
| 03/16/2005 | CN1595615A Cleaning method, manufacturing method for metal inner connecting wire process and cleaning fluid thereof |
| 03/16/2005 | CN1594656A Medicament capable of making diamond tool bit sharp |
| 03/16/2005 | CN1192905C Method for making offset printing plate supporting body, offset printing plate supporting body and offset printing plate |
| 03/16/2005 | CN1192828C Adornment |
| 03/15/2005 | US6866791 Method of forming patterned nickel and doped nickel films via microcontact printing and uses thereof |
| 03/10/2005 | WO2005022602A2 A method and apparatus for semiconductor processing |
| 03/10/2005 | WO2005022592A2 Novel aqueous based metal etchant |
| 03/10/2005 | WO2005021156A2 Capillary imprinting technique |
| 03/10/2005 | WO2004033758A3 Compositions of transition metal species in dense phase carbon dioxide and methods of use thereof |
| 03/10/2005 | US20050054123 Method and apparatus for detecting end point |
| 03/10/2005 | US20050051269 Vacuum enclosure; plasma discharging; supplying signals; cleaning using fluorine gas |
| 03/10/2005 | US20050051098 Plasma processing apparatus |
| 03/09/2005 | EP1513144A2 Method for producing a master disk of a recording medium, method for producing a stamper, method for producing a recording medium, master disk of a recording medium, stamper of a recording medium, and recording medium |
| 03/09/2005 | EP1511882A1 Acidic solution for silver deposition and method for silver layer deposition on metal surfaces |
| 03/09/2005 | EP1432847B1 Method for removing at least one area of a layer of a component consisting of metal or a metal compound |
| 03/09/2005 | CN1592956A Etching method, etching apparatus, and method for manufacturing semiconductor device |
| 03/09/2005 | CN1592548A Method for mfg. printed circuitboard |
| 03/09/2005 | CN1591777A Unit cleaning method and substrate treater for depressurizing chamber |
| 03/09/2005 | CN1591630A Method for producing a master disk, stamper and recording medium, and master disk, stamper and recording medium |
| 03/09/2005 | CN1591191A Etching method and method for mfg circuit device thereby |
| 03/08/2005 | US6864176 Fabrication process for bonded wafer precision layer thickness control and its non-destructive measurement method |
| 03/08/2005 | US6863772 Dual-port end point window for plasma etcher |
| 03/08/2005 | US6863770 Method and apparatus for polishing a substrate while washing a polishing pad of the apparatus with at least one free-flowing vertical stream of liquid |
| 03/08/2005 | US6863626 Golf club striking plate with variable thickness |
| 03/03/2005 | WO2005019500A1 Method of recovery of metals from etching solutions |
| 03/03/2005 | WO2005019499A1 Liquid for removing degenerated metal layer and method for removing degenerated metal layer |
| 03/03/2005 | WO2004073025A3 Methods of reducing photoresist distortion while etching in a plasma processing system |
| 03/03/2005 | US20050049162 Composition for removing copper from a surface, comprising 0.5-15.0 wt. % polyphosphonic acid, 1.0-40.0 wt. % hydroxyl-substituted primary amine, and water, and having pH between 9.0 and 12.5; for cleaning gun bores; effective in removing copper and other deposits without flammable solvents or ammonia |
| 03/03/2005 | US20050048798 Method for chemical etch control of noble metals in the presence of less noble metals |
| 03/03/2005 | US20050045587 Method for producing a master disk of a recording medium, method for producing a stamper, method for producing a recording medium, master disk of a recording medium, stamper of a recording medium, and recording medium |
| 03/03/2005 | US20050045584 use of a "gas purge" on a photomask during steps to repair opaque defects on photomasks wherein the etching assist gas is minimized by reaction with styrene |
| 03/03/2005 | US20050045276 Method for making a micromechanical device by removing a sacrificial layer with multiple sequential etchants |
| 03/03/2005 | US20050045275 Plasma treatment apparatus and surface treatment apparatus of substrate |
| 03/02/2005 | EP1511074A2 A method for selective removal of high-K material |
| 03/02/2005 | EP1510864A2 Merged-mask micro-machining process |
| 03/02/2005 | CN1191391C Etching-fluorination plus reaction ion etching process for preparing 70-nm polysilicon grid |
| 03/01/2005 | US6861273 Grayscale exposure of curable photoresist with partially removal ofthe uncured material to control the surface roughness for the extreme ultraviolet (EUV) multilayer based diffuser; multilayer relief profiles; semiconductors |
| 02/24/2005 | WO2005017937A2 Sensor array for measuring plasma characteristics in plasma processing enviroments |
| 02/24/2005 | WO2005017230A1 Etching solution for titanium-containing layer and method for etching titanium-containing layer |
| 02/24/2005 | WO2005017229A1 Adhesion promotion in printed circuit boards |
| 02/24/2005 | US20050042156 Using an etching solution of ferric chloride to etch nickel and/or copper, placing iron particles in the spent etching solution to precipitate a metal powder of nickel and/or copper; regeneration of remaining etching solution; prevents sludge waste |
| 02/24/2005 | US20050040139 For etching an aluminum surface in the presence of solder bumps, containing phosphoric acid, nitric acid, acetic acid, an amine oxide surfactant, a Pb solubilizing additive, and deionized water; solder bumps are phosphate-free after etching. |
| 02/24/2005 | US20050039774 Method for removing a composite coating containing tantalum deposition and arc sprayed aluminum from ceramic substrates |
| 02/23/2005 | EP1508629A1 Method for removing a composite coating from a ceramic substrate |
| 02/23/2005 | EP1508161A2 Methods of positions and/or orienting nanostructures |
| 02/23/2005 | CN2680684Y Apparatus for etching steel plate |
| 02/23/2005 | CN1585835A Electropolishing assembly and methods for electropolishing conductive layers |
| 02/23/2005 | CN1584129A Method and apparatus for separating copper from copper-containing waste liquid |
| 02/23/2005 | CN1583393A Manufacture of light guiding mould cores |
| 02/22/2005 | US6858341 Bipolar plate assembly, fuel cell stacks and fuel cell systems incorporating the same |
| 02/17/2005 | WO2003085700A3 Methods of making, positioning and orienting nanostructures, nanostructure arrays and nanostructure devices |
| 02/17/2005 | US20050035046 Wet chemical processing chambers for processing microfeature workpieces |
| 02/17/2005 | US20050034977 Electrochemical deposition chambers for depositing materials onto microfeature workpieces |
| 02/17/2005 | US20050034811 Sensor array for measuring plasma characteristics in plasma processing enviroments |
| 02/17/2005 | US20050034810 Mask and container and manufacturing apparatus |
| 02/17/2005 | US20050034809 Integrated tool with interchangeable wet processing components for processing microfeature workpieces and automated calibration systems |
| 02/16/2005 | EP1506938A2 Carbon nanotube structure, method and liquid solution for manufacturing the same and carbon nanotube transfer body |
| 02/10/2005 | WO2005013002A2 Process sequence for photoresist stripping and/or cleaning of photomasks for integrated circuit manufacturing |
| 02/10/2005 | US20050032381 Method and apparatus for polishing metal and dielectric substrates |
| 02/10/2005 | US20050029230 Etching method, etching apparatus, and method for manufacturing semiconductor device |
| 02/10/2005 | US20050029229 Carbon dopes oxide; plasma gas mixture; dissociation; ionization |
| 02/10/2005 | US20050029228 Etch amount detection method, etching method, and etching system |
| 02/10/2005 | US20050029221 Deep trench etching using HDP chamber |
| 02/10/2005 | US20050028932 Method and apparatus for real-time dynamic chemical analysis |
| 02/10/2005 | US20050028929 Substrate processing apparatus and method thereof |
| 02/10/2005 | DE10330636A1 Verfahren zur Laugung von Aluminium-Metall-Legierungen A process for the leaching of aluminum metal alloys |
| 02/09/2005 | CN2677386Y Chemical auxiliary ion beam etching system sample stage |
| 02/09/2005 | CN1578547A Mask for vapour-deposition use and producing method thereof |
| 02/09/2005 | CN1577786A Interferometric endpoint detection in a substrate etching process |
| 02/09/2005 | CN1577748A Grid structure and production method of high dielectric constant dielectric layer |
| 02/09/2005 | CN1577732A Method of surface texturizing |
| 02/09/2005 | CN1576395A Etchant, replenishment solution and method for producing copper wiring using the same |
| 02/08/2005 | US6852242 Cleaning of multicompositional etchant residues |
| 02/03/2005 | WO2005010948A2 Cleaning process and apparatus for silicate materials |
| 02/03/2005 | WO2005010232A1 Method of manufacturing vacuum plasma treated workpieces and system for vacuum plasma treating workpieces |
| 02/03/2005 | WO2005009605A1 Microreactor including magnetic barrier |
| 02/03/2005 | WO2003028048A3 Low-force electrochemical mechanical processing method and apparatus |
| 02/03/2005 | US20050026455 Substrate processing apparatus and substrate processing method |
| 02/03/2005 | US20050026442 Method of chemical mechanical polishing with high throughput and low dishing |
| 02/03/2005 | US20050026435 Process sequence for photoresist stripping and/or cleaning of photomasks for integrated circuit manufacturing |
| 02/03/2005 | US20050025403 Dynamic pressure bearing manufacturing method, dynamic pressure bearing and dynamic pressure bearing manufacturing device |
| 02/02/2005 | EP1436142A4 Metal-containing web processed with a continuous etch process |
| 02/02/2005 | EP1326951B1 Stabilized alkaline compositions for cleaning microelectronic substrates |
| 02/02/2005 | CN1575509A Etching method for aluminum-molybdenum laminate film |
| 02/02/2005 | CN1574251A Substrate etching method and etching disposal device |
| 02/02/2005 | CN1574245A Terminal testing method and device |
| 02/02/2005 | CN1574243A Etch amount detection method, etching method, and etching system |
| 02/02/2005 | CN1574237A Chemical processing apparatus, chemical processing method, and method for manufacturing circuit substrate |
| 02/01/2005 | US6849865 Chemical processor |
| 02/01/2005 | US6849154 Plasma etching apparatus |
| 02/01/2005 | US6849138 Method for surface treatment of aluminum alloy high-temperature processed articles |
| 02/01/2005 | US6849134 Minimum volume oven for producing uniform pyrolytic oxide coatings on capacitor anodes |