| Patents for C23F 1 - Etching metallic material by chemical means (16,062) |
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| 08/04/2005 | WO2005027729A3 Silicon blades for surgical and non-surgical use |
| 08/04/2005 | US20050170077 Adhesion method |
| 08/04/2005 | US20050169096 PAA- based etchant, methods of using same, and resultant structures |
| 08/04/2005 | US20050167395 Mask, method of fabricating the same, and method of fabricating organic electro-luminescence device using the same |
| 08/04/2005 | US20050167393 Cleaning process and apparatus for silicate materials |
| 08/04/2005 | US20050167281 Production method of suspension board with circuit |
| 08/03/2005 | EP1560263A2 Method for forming macropores in a layer and products obtained thereof |
| 08/03/2005 | EP1560262A1 Plasma etching chamber and plasma etching system using same |
| 08/03/2005 | CN1649473A Production method of suspension board with circuit |
| 08/03/2005 | CN1213342C Method of controlling metallic layer etching process and regenerating etchant for metallic layer etching process based on near infrared spectrometer |
| 08/02/2005 | US6924069 Depositing a negative photoresist over the light blocking layer to include filling a portion of the opening exposing the negative photoresist layer through the quartz substrate; developing and dry etching; accuracy |
| 07/28/2005 | WO2005069705A1 Metal pattern and process for producing the same |
| 07/28/2005 | WO2005067634A2 Advanced multi-pressure worpiece processing |
| 07/28/2005 | WO2005037446A3 Applying imprinting material to substrates employing electromagnetic fields |
| 07/28/2005 | US20050165474 Flexible stent |
| 07/28/2005 | US20050161439 applying caustic solution then nitric acid; without damage to base metal |
| 07/28/2005 | US20050161438 Method for chemically removing aluminum-containing materials from a substrate |
| 07/28/2005 | US20050161437 Manufacture and method for obtaining accurately dimensioned features from a metal-containing web processed with a continuous etch process |
| 07/28/2005 | US20050161435 using a hard mask of metal nitride, by generating a plasma from a mixture of nitrogen, carbon tetrafluoride (CF4) and a fluorocarbon CxFy (X >== 2); will not form hard to remove metal oxide deposits in the etching holes when etching silicon oxide, silicon oxycarbide or silicon carbide |
| 07/28/2005 | US20050161428 Patterning the surface of a metal substrate using a mask to pattern microcavities to be etched using photolithography techniques, wet-etching to form the microcavities; efficient, economical rainbow holograms for e.g. counterfeiting prevention |
| 07/28/2005 | US20050161250 Printed circuit board, method and apparatus for fabricating the same, wiring circuit pattern, and printed wiring board |
| 07/28/2005 | US20050161157 Substrate treating apparatus and method |
| 07/28/2005 | US20050160987 Plasma processing apparatus |
| 07/28/2005 | DE102004014680B3 Demetallizing solution for removing tin-bismuth layers, e.g. from electronic or electrical components, containing acid (e.g. alkylsulfonic acid), nitroaromatic compound and aminopolycarboxylic acid |
| 07/27/2005 | EP1311714A4 Surface treatments to improve corrosion resistance of austenitic stainless steels |
| 07/27/2005 | CN2713646Y Grid structure having high dielectric constant dielectric layer |
| 07/27/2005 | CN1646731A Process for producing aluminum material for electrolytic capacitor electrode, aluminum material for electrolytic capacitor electrode and process for producing electrode material for electrolytic capac |
| 07/27/2005 | CN1646245A System and method for the manufacture of surgical blades |
| 07/27/2005 | CN1645987A Printed circuit board, method and apparatus for fabricating the same, wiring circuit pattern, and printed wiring board |
| 07/27/2005 | CN1645574A Etching liquid recovering system and method |
| 07/27/2005 | CN1644764A Chemical etching method for zinc oxide material |
| 07/27/2005 | CN1212652C Photoetching method for nanoparticle pattern based on self organization |
| 07/27/2005 | CN1212650C Method by using wet etching with non-equivalence in directions to carry out even process |
| 07/27/2005 | CN1212549C Making method of micro text and pattern mold |
| 07/27/2005 | CN1212426C Method for suspension etching one face of film |
| 07/26/2005 | US6921493 Method of processing substrates |
| 07/26/2005 | US6921437 Gas distribution system |
| 07/21/2005 | WO2005067354A1 Printed wiring board, method for manufacturing same, and circuit device |
| 07/21/2005 | WO2005066579A1 Method and apparatus for measuring fillm thickness by means of coupled eddy sensors |
| 07/21/2005 | WO2005065433A2 Electrochemical fabrication methods incorporating dielectric materials and/or using dielectric substrates |
| 07/21/2005 | WO2005065186A2 Showerhead electrode assembly for plasma processing apparatuses |
| 07/21/2005 | US20050156140 Tungsten metal removing solution and method for removing tungsten metal by use thereof |
| 07/21/2005 | US20050155950 Method of forming a micro pattern on a substrate |
| 07/21/2005 | DE10358025A1 Etching of tungsten involves using a gas mixture that contains nitrogen trifluoride, hydrogen bromide, and oxygen |
| 07/20/2005 | CN1643666A Plasma processor electrode and plasma processor |
| 07/20/2005 | CN1643665A Method of plasma etching |
| 07/20/2005 | CN1641840A Chip protection device |
| 07/20/2005 | CN1641839A Chip protection device |
| 07/20/2005 | CN1211504C Nickel-containing iron trichloride etching effluent extraction and separation method |
| 07/20/2005 | CN1211503C Recovery of tin from waste liquid of tin and lead |
| 07/19/2005 | USRE38760 Controlled etching of oxides via gas phase reactions |
| 07/19/2005 | US6918989 Apparatus for manufacturing printed wiring board and method for manufacturing printed wiring board using the same |
| 07/19/2005 | US6918988 Semiconductor processing device |
| 07/14/2005 | US20050151544 Sensor array for measuring plasma characteristics in plasma processing environments |
| 07/13/2005 | EP1552552A2 Method for eliminating voiding in plated solder |
| 07/13/2005 | EP1552037A1 Method for removing a layer area of a component |
| 07/13/2005 | CN1639476A Dynamic pressure bearing manufacturing method, dynamic pressure bearing, and dynamic pressure bearing manufacturing device |
| 07/13/2005 | CN1638598A Plasma treatment device and substrate surface treatment device |
| 07/13/2005 | CN1637438A Etching method, a substrate with a plurality of concave portions, a microlens substrate, a transmission screen and a rear projection |
| 07/07/2005 | WO2005061378A2 Equipment and process for creating a custom sloped etch in a substrate |
| 07/07/2005 | US20050145602 Test patterns and methods of controlling CMP process using the same |
| 07/07/2005 | US20050145336 Plasma processor electrode and plasma processor |
| 07/07/2005 | US20050145334 Method and apparatus for non-invasive measurement and analysis of semiconductor process parameters |
| 07/06/2005 | EP1549784A2 Compositions of transition metal species in dense phase carbon dioxide and methods of use thereof |
| 07/06/2005 | EP1549783A1 Aqueous composition for the chemical removal of metallic surfacing present on turbine blades, and its use |
| 07/06/2005 | EP1549780A2 Substrate processing apparatus and related systems and methods |
| 07/06/2005 | CN1634713A Method for forming multilayered patterns on aluminium composite board surface |
| 07/06/2005 | CN1209500C Method for removing copper stannous and lead ions from used tin soldering liquid |
| 07/06/2005 | CN1209499C Etching agent and application for improving etching selective ratio |
| 07/05/2005 | US6914039 Etching liquid composition |
| 07/05/2005 | US6913653 Prior to cleaning with XeF2, contacting XeF2 gas with an article to be cleaned, such as a semiconductor, in a reduced-pressure or vacuum atmosphere containing a required amount of water to form HFto be |
| 06/30/2005 | WO2004084287A9 Material for purification of semiconductor polishing slurry, module for purification of semiconductor polishing slurry and process for producing semiconductor polishing slurry |
| 06/30/2005 | WO2004066027A3 Electron beam processing for mask repair |
| 06/30/2005 | US20050141085 Etching method, a substrate with a plurality of concave portions, a microlens substrate, a transmission screen and a rear projection |
| 06/30/2005 | US20050139968 Chemical leadframe roughening process and resulting leadframe and integrated circuit package |
| 06/30/2005 | US20050139939 Wafer protection device |
| 06/30/2005 | US20050139575 Phase shift mask and fabricating method thereof |
| 06/30/2005 | US20050139322 Plasma processing device |
| 06/30/2005 | US20050139321 Plasma processing apparatus |
| 06/30/2005 | US20050139229 Atmospheric pressure non-thermal plasma device to clean and sterilize the surfaces of probes, cannulas, pin tools, pipettes and spray heads |
| 06/30/2005 | US20050138803 Stamper for pattern transfer and manufacturing method thereof |
| 06/30/2005 | DE10355990A1 Differential etching technique for plate shaped components e.g. electronic circuit board, comprises using an etching unit with a horizontal or vertical transport system |
| 06/29/2005 | EP1548808A1 High frequency plasma generator and high frequency plasma generating method |
| 06/29/2005 | EP1548155A1 Method for preventing elution of lead and/or nickel from copper alloy piping material such as valve or pipe joint and copper alloy piping material, and fluid for use in cleaning piping material |
| 06/29/2005 | EP1432847B8 Method for removing at least one area of a layer of a component consisting of metal or a metal compound |
| 06/29/2005 | CN1208813C Transfer type substrate treating device |
| 06/29/2005 | CN1208139C Low etch alkaline zincate composition and process for zincating aluminum |
| 06/28/2005 | US6911249 Surface for use on implantable device |
| 06/23/2005 | WO2005013002A3 Process sequence for photoresist stripping and/or cleaning of photomasks for integrated circuit manufacturing |
| 06/23/2005 | US20050137029 Golf Club Striking Plate wtih Variable Thickness |
| 06/23/2005 | US20050136672 Etching solution composition for metal films |
| 06/23/2005 | US20050133479 Equipment and process for creating a custom sloped etch in a substrate |
| 06/23/2005 | US20050133165 Apparatus for the prevention of arcing in a CVD-TiN chamber |
| 06/23/2005 | US20050133160 Showerhead electrode assembly for plasma processing apparatuses |
| 06/23/2005 | DE102004050358A1 Etching composition hydrogen fluoride useful for selectively etching oxide layer and for manufacturing semiconductor device comprises ammonium fluoride, non-ionic polymer surfactant and water |
| 06/22/2005 | CN1630917A Etching solution for forming an embedded resistor |
| 06/22/2005 | CN1630038A Etching solution and method for manufacturing conducting lug by selectively removing barrier layer with the same |
| 06/22/2005 | CN1629357A Surface coarsening agent for copper or copper alloys |
| 06/22/2005 | CN1207442C Method of reducing elution of lead in lead-containing copper alloy, and method of reducing elution plate of lead in lead-containing copper alloy |
| 06/21/2005 | US6908569 Ruthenium silicide wet etch |