Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
09/2012
09/04/2012US8257779 Viscous material noncontact jetting system
09/04/2012US8257548 Electrode orientation and parallelism adjustment mechanism for plasma processing systems
09/04/2012US8257547 Surface activation device
09/04/2012US8257501 Plasma doping device with gate shutter
09/04/2012US8257500 Transport apparatus for elongate substrates
09/04/2012US8257499 Vapor phase deposition apparatus and vapor phase deposition method
09/04/2012US8257497 Insitu post atomic layer deposition destruction of active species
09/04/2012CA2765645A1 Coated substrates and methods of making same
08/2012
08/30/2012WO2012116281A1 System for and method of fast pulse gas delivery
08/30/2012WO2012115170A1 Substrate processing device, method for producing substrate, and method for producing semiconductor device
08/30/2012WO2012114611A1 Cleaning gas and remote plasma cleaning method using same
08/30/2012WO2012113968A1 Method for manufacturing thermal absorber for solar thermal collector
08/30/2012WO2012113761A1 Metal complexes with n-aminoamidinate ligands
08/30/2012WO2011061113A3 New intrinsic absorber layer for photovoltaic cells
08/30/2012US20120220138 Thin film deposition apparatus and method for the same
08/30/2012US20120220137 Method of manufacturing semiconductor device and method of processing substrate and substrate processing apparatus
08/30/2012US20120220109 Plasma cvd device and method of manufacturing silicon thin film
08/30/2012US20120220108 Substrate processing apparatus, and method of manufacturing substrate
08/30/2012US20120220067 Furnace and method of forming thin film using the same
08/30/2012US20120219860 Hetero-nanostructure materials for use in energy-storage devices and methods of fabricating same
08/30/2012US20120219822 Housing and method for making the same
08/30/2012US20120219819 Housing and method for making the same
08/30/2012US20120219803 Weatherable & Abrasion Resistant Coating Systems for Polymeric Substrates
08/30/2012US20120219789 Coated bodies made of metal, hard metal, cermet, or ceramic, and method(s) for coating of such bodies
08/30/2012US20120219727 Method of surface treating microfluidic devices
08/30/2012US20120219724 Method for forming metal oxide film, method for forming manganese oxide film, and computer-readable storage medium
08/30/2012US20120219714 Stabilization of bicycloheptadiene
08/30/2012US20120219713 Parallel batch chemical vapor deposition system
08/30/2012US20120219712 Delivery device for deposition
08/30/2012US20120219711 Method for applying layers
08/30/2012US20120219710 Method of forming titanium nitride film, apparatus for forming titanium nitride film, and program
08/30/2012US20120219708 Atomic layer deposition method utilizing multiple precursor zones for coating flexible substrates
08/30/2012US20120219699 Graphical application system
08/30/2012US20120218638 Method for forming a decorative coating, a coating, and uses of the same
08/30/2012US20120218621 Materials and device stack for market viable electrochromic devices
08/30/2012US20120217874 Plasma Source with Vertical Gradient
08/30/2012US20120217618 Silicon-Germanium Hydrides and Methods for Making and Using Same
08/30/2012US20120217222 Plasma processing systems including side coils and methods related to the plasma processing systems
08/30/2012US20120217221 System, method and apparatus for controlling ion energy distribution of a projected plasma
08/30/2012US20120216954 Apparatus and method for fabricating semiconductor devices and substrates
08/30/2012US20120216747 Chemical vapor deposition device and temperature control method of chemical vapor deposition device
08/30/2012DE102011004749A1 Plasma processing device comprises vacuum system for processing substrates and microwave resonator for inductively producing plasma, exhibiting electrically conductive base with continuous opening, which receives plasma
08/30/2012DE102009023471B4 Beschichtungsanlage und -verfahren Coating system and method
08/29/2012EP2492369A1 Cvd film forming device
08/29/2012CN202401129U Water cooling device for surface treatment of silicon carbide
08/29/2012CN1839216B Ceramic article having corrosion-resistant layer, semiconductor processing apparatus incorporating same, and method for forming same
08/29/2012CN1823404B Process for producing semiconductor device and substrate treating apparatus
08/29/2012CN102652186A PECVD multi-step processing with continuous plasma
08/29/2012CN102650053A Manufacturing method for CVD (Chemical Vapor Deposition) diamond/diamond-like composite coating tool with complex shape
08/29/2012CN102650046A Device for largely and continuously preparing two-dimensional nanometer films in large
08/29/2012CN102649331A Tool with super-hard film coating and preparation method thereof
08/29/2012CN102220565B Chemical vapor deposition equipment used for studying light trapping structure of silicon thin-film cell
08/29/2012CN101979315B Preparation method of monoatomic-layer graphene film
08/29/2012CN101914760B Producing method of semiconductor device and substrate processing apparatus
08/29/2012CN101851749B Method for preparing vanadium nitride coating by using low-temperature flowing layer and device thereof
08/29/2012CN101622698B Plasma processing apparatus, and plasma processing method
08/29/2012CN101473064B Silicon thin-film and method of forming silicon thin-film
08/29/2012CN101460655B Reduced contaminant gas injection system and method of using
08/29/2012CN101443487B Source container of a VPE reactor
08/29/2012CN101397654B Hot filament and heat evaporation vapor deposition membrane equipment
08/29/2012CN101311336B Film formation apparatus and method for using the same
08/28/2012US8252704 Additives to prevent degradation of cyclic alkene derivatives
08/28/2012US8252378 heating an organic layer by applying an electric current to conductive surfaces on substrates, to evaporate the organic material and form a layer on electrodes; vapor deposition; surface uniformity;efficiency
08/28/2012US8252377 Organoruthenium compound for use in chemical vapor deposition and chemical vapor deposition using the same
08/28/2012US8252376 Method for restoring the microstructure of a textured article and for refurbishing a gas turbine blade or vane
08/28/2012US8252375 Apparatus for the efficient coating of substrates including plasma cleaning
08/28/2012US8252118 Substrate support device and plasma processing apparatus
08/28/2012US8252117 Automatic feed system and related process for introducing source material to a thin film vapor deposition system
08/28/2012US8252116 Perimeter partition-valve with protected seals and associated small size process chambers and multiple chamber systems
08/28/2012US8252115 System and method for growing nanotubes with a specified isotope composition via ion implantation using a catalytic transmembrane
08/28/2012US8252114 Gas distribution system and method for distributing process gas in a processing system
08/28/2012US8252113 Method for producing component for vacuum apparatus, resin coating forming apparatus and vacuum film forming system
08/28/2012US8251013 Vapor deposition device
08/28/2012US8251012 Substrate processing apparatus and semiconductor device producing method
08/28/2012US8251011 Plasma processing apparatus
08/23/2012WO2012112584A2 Atomic layer deposition using radicals of gas mixture
08/23/2012WO2012112334A2 Method of operating filament assisted chemical vapor deposition system
08/23/2012WO2012112120A1 Inorganic nanorods and a method of forming the same, and a photoelectrode and a photovoltaic device comprising the inorganic nanorods
08/23/2012WO2012111295A1 Atomic layer deposition apparatus and atomic layer deposition method
08/23/2012WO2012110746A1 Method for producing a photocatalytic material
08/23/2012WO2012084659A3 A microwave plasma reactor for manufacturing synthetic diamond material
08/23/2012US20120214317 Substrate processing apparatus and method, and semiconductor device manufacturing method
08/23/2012US20120213947 Depositing thin layer of material on permeable substrate
08/23/2012US20120213946 Doping Control by ALD Surface Functionalization
08/23/2012US20120213945 Enhanced deposition of layer on substrate using radicals
08/23/2012US20120213941 Ion-assisted plasma treatment of a three-dimensional structure
08/23/2012US20120213929 Method of operating filament assisted chemical vapor deposition system
08/23/2012US20120213928 Forming reactive element modified aluminide coatings with low reactive element content using vapor phase techniques
08/23/2012US20120213927 Surface coating method and device for exterior part
08/23/2012US20120211468 System and Method for Cleaning Semiconductor Fabrication Equipment Parts
08/23/2012US20120211165 Sample table and microwave plasma processing apparatus
08/23/2012US20120211164 Systems for plasma enhanced chemical vapor deposition and bevel edge etching
08/23/2012US20120211074 Coated Nanoparticles and Quantum Dots for Solution-Based Fabrication of Photovoltaic Cells
08/23/2012US20120210937 Substrate processing apparatus using a batch processing chamber
08/23/2012US20120210718 Plating of ceramic matrix composite parts as joining method in gas turbine hardware
08/23/2012DE112009004405T5 Filmausbildevorrichtung und Filmausbildeverfahren Film forming apparatus and film forming method
08/22/2012EP2488679A1 Cvd reactor having a substrate holder resting on a gas cushion comprising a plurality of zones
08/22/2012EP2488678A2 Inhibiting excess precursor transport between separate precursor zones in an atomic layer deposition system
08/22/2012EP1920456B1 Method of fabricating low resistance titanium nitride films
08/22/2012EP1607498B1 Method for forming oxide coating film, oxide coating film and coating film structure
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