| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 08/07/2012 | US8236134 Gas distributor and apparatus using the same |
| 08/07/2012 | US8236108 Inertial masking assembly |
| 08/07/2012 | US8236107 Rubbing apparatus of liquid crystal display device |
| 08/07/2012 | US8236106 Shower head and substrate processing apparatus |
| 08/07/2012 | US8236105 Apparatus for controlling gas flow in a semiconductor substrate processing chamber |
| 08/07/2012 | US8236103 Group III nitride semiconductor crystal, production method thereof and group III nitride semiconductor epitaxial wafer |
| 08/07/2012 | US8236097 Composition and method for low temperature deposition of silicon-containing films |
| 08/07/2012 | US8235002 Plasma assisted apparatus for organic film deposition |
| 08/07/2012 | US8235001 Substrate processing apparatus and method for manufacturing semiconductor device |
| 08/02/2012 | WO2012103248A1 Heat source door for a thermal diffusion chamber |
| 08/02/2012 | WO2012101891A1 Atmospheric plasma processing apparatus and atmospheric plasma processing method |
| 08/02/2012 | WO2012101326A1 Apparatus, method and reaction chamber |
| 08/02/2012 | WO2012075017A3 Apparatus and process for atomic layer deposition |
| 08/02/2012 | WO2012047695A3 Mechanically fluidized reactor systems and methods, suitable for production of silicon |
| 08/02/2012 | WO2011124642A3 Method for the manufacture of electronic devices with purified fluorine |
| 08/02/2012 | US20120197364 Photoelectrical devices for stimulating neurons |
| 08/02/2012 | US20120196449 Zirconium, hafnium and titanium precursors for atomic layer deposition of corresponding metal-containing films |
| 08/02/2012 | US20120196437 Methods of forming copper wiring and copper film, and film forming system |
| 08/02/2012 | US20120196155 Resist fortification for magnetic media patterning |
| 08/02/2012 | US20120196137 Protective coating, a coated member having a protective coating as well as method for producing a protective coating |
| 08/02/2012 | US20120196074 Graphene sheet and method for producing the same |
| 08/02/2012 | US20120196052 Method of forming copper wiring and method and system for forming copper film |
| 08/02/2012 | US20120196051 Deposition Apparatus and Methods |
| 08/02/2012 | US20120196050 Apparatus and method for atomic layer deposition |
| 08/02/2012 | US20120196049 Manufacturing method of magnetic recording medium |
| 08/02/2012 | US20120196048 Method of depositing film by atomic layer deposition with pulse-time-modulated plasma |
| 08/02/2012 | US20120196038 Jig for semiconductor production and method for producing same |
| 08/02/2012 | US20120196030 Coating Methods and Apparatus |
| 08/02/2012 | US20120193543 Radiological image detection apparatus and method for manufacturing the same |
| 08/02/2012 | US20120193232 Preparation method of anti-bacterial coating on plastic surface |
| 08/02/2012 | US20120192794 Source supplying apparatus and film forming apparatus |
| 08/02/2012 | US20120192793 Film forming apparatus |
| 08/02/2012 | US20120192792 Plasma, uv and ion/neutral assisted ald or cvd in a batch tool |
| 08/02/2012 | US20120192791 Cvd apparatus with electrode |
| 08/02/2012 | US20120192789 Deposition systems and processes |
| 08/02/2012 | US20120192750 Methods of producing countermeasure decoys having tailored emission signatures |
| 08/02/2012 | DE112010001642T5 Material auf titanbasis, verfahren zum herstellen eines materials auf titanbasis und brenstoffzellenseparator Titanium-base material, method for producing a titanium-based material and brenstoffzellenseparator |
| 08/02/2012 | DE112009002455T5 Plasma-CVD-Vorrichtung, Verfahren zum Herstellen einer Halbleiterschicht, Verfahren zum Herstellen einer Dünnschichtsolarzelle und Verfahren zum Reinigen einer Plasma-CVD-Vorrichtung Plasma CVD apparatus, method of manufacturing a semiconductor layer, A method of manufacturing a thin film solar cell and method of cleaning a plasma CVD apparatus |
| 08/02/2012 | DE102011003254A1 Gleitelement, insbesondere Kolbenring, mit einer Beschichtung sowie Verfahren zur Herstellung eines Gleitelements Sliding element, in particular piston ring with a coating and methods of producing a sliding member |
| 08/02/2012 | DE102005034764B4 Verfahren zur Herstellung von funktionalen Fluor-Kohlenstoff-Polymerschichten mittels Plasmapolymerisation von Perfluorocycloalkanen und damit beschichtete Substrate Process for the preparation of functional fluorocarbon polymer layers by means of plasma polymerization of Perfluorocycloalkanen and thus coated substrates |
| 08/01/2012 | EP2481833A1 Apparatus for atomic layer deposition |
| 08/01/2012 | EP2481832A1 Apparatus for atomic layer deposition |
| 08/01/2012 | EP2481831A1 Deposited film formation device and deposited film formation method |
| 08/01/2012 | EP2481830A1 Apparatus for atomic layer deposition. |
| 08/01/2012 | EP2481829A2 Beam-induced deposition of low-resistivity material |
| 08/01/2012 | EP2481828A1 Method of depositing material |
| 08/01/2012 | EP2481082A2 Hybrid gas injector |
| 08/01/2012 | EP2480703A1 Method of applying atomic layer deposition coatings onto porous non-ceramic substrates |
| 08/01/2012 | EP2257654B1 Piston ring |
| 08/01/2012 | EP2134884B1 Method for the application of a high-strength coating to workpieces and/or materials |
| 08/01/2012 | EP2089232B1 Non-wetting coating on a fluid ejector |
| 08/01/2012 | EP1882052B1 Method for modifying a silicone rubber surface |
| 08/01/2012 | EP1566835B1 Insulating film material containing organic silane or organic siloxane compound, method for producing same, and semiconductor device |
| 08/01/2012 | CN202363507U Film-forming detection machine tray |
| 08/01/2012 | CN202359198U Graphite frame hook |
| 08/01/2012 | CN202359197U Zinc oxide thin film deposition device |
| 08/01/2012 | CN202359196U Gas flow control device for metal organic chemical vapor deposition (MOCVD) reaction chamber |
| 08/01/2012 | CN202359195U Graphite boat sticking point for film coating |
| 08/01/2012 | CN202359194U Device for producing nano oxide powder |
| 08/01/2012 | CN202359193U Graphite frame for plate-type PECVD (Plasma Enhanced Chemical Vapor Deposition) equipment |
| 08/01/2012 | CN202355972U Chemical vapor deposition tail gas treating device |
| 08/01/2012 | CN102625866A Menthol-derivative compounds and use thereof as oral and systemic active agents |
| 08/01/2012 | CN102625861A Systems and methods for thin-film deposition of metal oxides using excited nitrogen-oxygen species |
| 08/01/2012 | CN102625860A Apparatus and methods to form a patterned coating on an OLED substrate |
| 08/01/2012 | CN102625737A Surface-coated cutting tool |
| 08/01/2012 | CN102623572A Method for producing deposition anti-reflection film of crystalline silicon solar cell |
| 08/01/2012 | CN102623551A Manufacturing process for reducing corrosion thickness of solar silicon wafer |
| 08/01/2012 | CN102619081A Preparation technology for preparing interface layer of boron nitride fabric through CVD (Chemical Vapor Deposition) |
| 08/01/2012 | CN102618852A Beam-induced deposition of low-resistivity material |
| 08/01/2012 | CN102618851A Tool for compacting thick-walled hollow carbon/carbon (C/C) composite product |
| 08/01/2012 | CN102618850A Nozzle assembly and chemical vapor deposition reactor |
| 08/01/2012 | CN102618849A Method for preparing one-dimensional ZnO/SnO2 core/shell structure nano heterojunction semiconductor material |
| 08/01/2012 | CN102618848A Vertical-type atomic layer deposition device |
| 08/01/2012 | CN102618847A Metal organic chemical vapor deposition reaction system |
| 08/01/2012 | CN102618846A Method and device for depositing super-hard film through multi-torch plasma spray CVD (Chemical Vapor Deposition) method |
| 08/01/2012 | CN102618845A Reactor with baffle plate device |
| 08/01/2012 | CN102618844A Method of depositing material |
| 08/01/2012 | CN102618843A Method for producing amorphous indium gallium zinc oxide thin film by atomic layer deposition |
| 08/01/2012 | CN102618842A Forming method of silicon nitride film |
| 08/01/2012 | CN102618841A Boron-doped glass carbon material and preparation method thereof |
| 08/01/2012 | CN102618840A Floating slit valve for transfer chamber interface |
| 08/01/2012 | CN102618839A Roll-to-roll continuous vacuum coating production machine |
| 08/01/2012 | CN102618827A Device for continuously preparing two-dimensional nano films |
| 08/01/2012 | CN102615490A Preparation method of complex CVD (chemical vapor deposition) diamond cutter |
| 08/01/2012 | CN102046840B Processing apparatus and processing method |
| 08/01/2012 | CN101887852B Method for filling deep trench |
| 08/01/2012 | CN101504983B Corrosion resistant metal composite for electrochemical devices and methods of producing the same |
| 07/31/2012 | US8232216 Semiconductor manufacturing apparatus and method for manufacturing a semiconductor |
| 07/31/2012 | US8231940 Wafer processing method with carrier hub removal |
| 07/31/2012 | US8231800 Plasma processing apparatus and method |
| 07/31/2012 | US8231799 Plasma reactor apparatus with multiple gas injection zones having time-changing separate configurable gas compositions for each zone |
| 07/31/2012 | US8231759 Plasma processing apparatus |
| 07/31/2012 | US8231731 Substrate processing apparatus |
| 07/31/2012 | US8231730 Combustion deposition burner and/or related methods |
| 07/31/2012 | US8230807 Coatings, and methods and devices for the manufacture thereof |
| 07/31/2012 | US8230806 Heat treatment method and heat treatment apparatus wherein the substrate holder is composed of two holder constituting bodies that move relative to each other |
| 07/31/2012 | CA2358215C Methods utilizing scanning probe microscope tips and products therefor or produced thereby |
| 07/26/2012 | WO2012099687A1 Thermal diffusion chamber with heat exchanger |
| 07/26/2012 | WO2012099547A1 Method for a dynamic control of density of neutral atoms in a plasma vacuum chamber and a device for the processing of solid materials by using this method |
| 07/26/2012 | WO2012099209A1 Silicon carbide single crystal substrate and method for producing semiconductor element |