Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
07/2012
07/18/2012CN101469411B Chemical vapor deposition apparatus
07/18/2012CN101443476B High crystalline quality synthetic diamond
07/18/2012CN101365823B Film forming apparatus and film forming method
07/18/2012CN101298668B Plasma generating device
07/18/2012CN101297061B Surface-coated member, method for manufacture thereof, and cutting tool
07/18/2012CN101295639B Method of manufacturing a semiconductor film and method of manufacturing a photovoltaic element
07/18/2012CN101268209B Duplex surface treatment of metal objects
07/18/2012CN101257079B Semiconductor layer
07/18/2012CN101177782B System and method for shielding during PECVD deposition processes
07/18/2012CN101133186B Self-cooling gas delivery apparatus under high vacuum for high density plasma applications
07/17/2012USRE43508 Plasma confinement by use of preferred RF return path
07/17/2012US8222574 Temperature measurement and control of wafer support in thermal processing chamber
07/17/2012US8222570 System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy
07/17/2012US8222138 Method and structure of a thick metal layer using multiple deposition chambers
07/17/2012US8222125 Plasma deposition of amorphous semiconductors at microwave frequencies
07/17/2012US8221852 Methods of atomic layer deposition using titanium-based precursors
07/17/2012US8221838 Method of making a CVD coating scheme including alumina and/or titanium-containing materials
07/17/2012US8221837 Organometallic compounds and processes for preparation thereof
07/17/2012US8221836 Method of fabricating a thermostructural composite material part, and a part obtained thereby
07/17/2012US8221835 Method of manufacturing semiconductor device and apparatus for processing substrate
07/17/2012US8221832 Method of making heat treated coated article having carbon layer and utilizing removable zinc oxide inclusive protective film
07/17/2012US8221830 Method of manufacturing cellulose electrode for fuel cells, cellulose electrode manufactured thereby, and use of cellulose fibers as fuel cell electrodes
07/17/2012US8221828 Surface coating process
07/17/2012US8221825 Comprehensive method for local application and local repair of thermal barrier coatings
07/17/2012US8221823 Method for fabricating material
07/17/2012US8221581 Gas supply mechanism and substrate processing apparatus
07/17/2012US8221580 Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loops
07/17/2012US8221557 Systems and methods for exposing semiconductor workpieces to vapors for through-hole cleaning and/or other processes
07/17/2012US8221551 Apparatus for producing a reflector
07/17/2012US8221535 Tin-doped indium oxide fine particle dispersion, method for manufacturing the same, interlayer film for laminated glass with heat ray blocking properties formed by using said dispersion, and laminated glass therewith
07/12/2012WO2012094182A2 Chuck for chemical vapor deposition systems and related methods therefor
07/12/2012WO2012093847A2 Polycrystalline cuprous oxide nanowire array production method using low-temperature electrochemical growth
07/12/2012WO2012093467A1 Organic el display device and method for manufacturing same
07/12/2012WO2012093182A1 Barrier coat and production method thereof
07/12/2012WO2012093142A1 Filament for hot wire chemical vapour deposition
07/12/2012WO2012067439A3 Diazadiene-based metal compound, method for preparing same and method for forming a thin film using same
07/12/2012US20120178972 Process and apparatus for depositing nanostructured material onto a substrate material
07/12/2012US20120178953 Solution based precursors
07/12/2012US20120178321 Method for producing a metallised fabric, and resulting fabric
07/12/2012US20120178267 Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride
07/12/2012US20120178264 Method and apparatus for forming silicon nitride film
07/12/2012US20120178256 Formation of a tantalum-nitride layer
07/12/2012US20120178200 Integrated in-line processing system for selective emitter solar cells
07/12/2012US20120178015 Method of processing a ceramic electrolyte, and related articles
07/12/2012US20120177846 Radical steam cvd
07/12/2012US20120177845 High molecular weight alkyl-allyl cobalttricarbonyl complexes and use thereof for preparing dielectric thin films
07/12/2012US20120177844 Method and device for chemical vapor deposition of polymer film onto a substrate
07/12/2012US20120177841 Low Temperature Silicon Carbide Deposition Process
07/12/2012US20120177824 Method and device for coating substrates from the vapor phase
07/12/2012US20120177823 Method for forming a protective coating containing aluminum on the surface of a metal part
07/12/2012US20120177813 Chemical annealing method for fabrication of organic thin films for optoelectronic devices
07/12/2012US20120177810 In-situ identification and control of microstructures produced by phase transformation of a material
07/12/2012US20120177808 System and method for low-power nanotube growth using direct resistive heating
07/12/2012US20120176681 Nanostructured anti-reflective coatings for substrates
07/12/2012US20120175270 Electrode for Electrolytic Processes with Controlled Crystalline Structure
07/12/2012US20120175062 Cam-locked showerhead electrode and assembly
07/12/2012US20120175060 Detection of arcing events in wafer plasma processing through monitoring of trace gas concentrations
07/12/2012US20120174866 Apparatus for chemical vapor deposition
07/12/2012US20120174865 Deposition source and organic layer deposition apparatus including the same
07/12/2012US20120174864 Plasma cvd apparatus
07/12/2012US20120174823 Composition for coating film to prevent conspicuous fingerprints, coating film to prevent conspicuous fingerprints using the composition, and article having the coating film
07/12/2012DE112010003214T5 Epitaxiesubstrat für ein halbleiterelement, verfahrenzur herstellung eines epitaxiesubstrats für einhalbleiterelement, und halbleiterelement Epitaxial substrate for semiconductor element, verfahrenzur making an epitaxial substrate for a half head of element and semiconductor element
07/12/2012DE102008028542B4 Verfahren und Vorrichtung zum Abscheiden einer Schicht auf einem Substrat mittels einer plasmagestützten chemischen Reaktion Method and apparatus for depositing a layer on a substrate by a plasma enhanced chemical reaction
07/11/2012EP2474644A1 Gas supply system
07/11/2012EP2474643A1 Method for direct deposition of a germanium layer
07/11/2012EP2474370A1 Method and device for producing process gases for vapour deposition
07/11/2012EP2473651A1 Process and apparatus for controlling coating deposition
07/11/2012EP2473650A2 Plasma enhanced chemical vapor deposition apparatus
07/11/2012EP2473649A1 Method for applying layers
07/11/2012EP2473648A2 Methods and systems for making battery electrodes and devices arising therefrom
07/11/2012EP2249379B1 Batch-type atomic layer vapour-deposition device
07/11/2012EP2233491B1 Metal compound, chemical vapor deposition material containing the same, and method for producing metal-containing thin film
07/11/2012EP1893785B1 Method for feeding powdered or granular material
07/11/2012CN202332927U 分体式pecvd及扩散设备架 Split pecvd and diffusion equipment rack
07/11/2012CN202329179U 一种炉门脱落的防砸装置 One kind of door off the anti-smashing device
07/11/2012CN202323024U 一种化学气相沉积炉用沉积室 A chemical vapor deposition furnace deposition chamber
07/11/2012CN202323023U 具有新结构石墨舟的pecvd设备 With the new structure of the graphite boat pecvd equipment
07/11/2012CN202323022U Gas distribution system for base plate type coating equipment
07/11/2012CN202323021U 一种双腔室或多腔室薄膜沉积设备的混气进气结构 One kind of dual chamber or chambers of thin film deposition equipment mixed gas intake structure
07/11/2012CN202323020U 一种实现mocvd喷淋均匀性的装置 A mocvd device to achieve uniformity of the spray
07/11/2012CN202323019U Multi-point gas inlet multi-area adjustable device for PECVD (Plasma Enhanced Chemical Vapor Deposition)
07/11/2012CN202323018U Maze air inlet device for vacuum chamber of large-sized plate type PECVD (Plasma Enhanced Chemical Vapor Deposition) equipment
07/11/2012CN202323017U Novel liquid gasifier
07/11/2012CN202323016U 一种大型环形气相沉积炉 A large, ring-shaped vapor deposition furnace
07/11/2012CN202323015U 一种三料柱气相沉积炉 A three-column feed vapor deposition furnace
07/11/2012CN202323014U 一种气相沉积炉 A gas phase deposition furnace
07/11/2012CN202323013U Bidirectional magnetic field enhancement device
07/11/2012CN202323012U 一种加热盘与真空机械手定位装置 A heating plate and vacuum manipulator positioning device
07/11/2012CN202323008U 卷绕真空镀膜机用的卷辊架移动定位装置 Roll holder mobile positioning device with vacuum coating machine winding
07/11/2012CN102577629A Plasma generation device
07/11/2012CN102576787A Iii nitride semiconductor substrate, epitaxial substrate, and semiconductor device
07/11/2012CN102576668A Catalytic CVD device, film forming method and solar cell manufacturing method
07/11/2012CN102576666A Silicon carbide epitaxial wafer and manufacturing method therefor
07/11/2012CN102575349A Plasma CVD device
07/11/2012CN102575348A Thin film deposition apparatus and method for the same
07/11/2012CN102575347A Film-forming device, film-forming head, and film-forming method
07/11/2012CN102575346A Method of applying atomic layer deposition coatings onto porous non-ceramic substrates
07/11/2012CN102575345A Multilayer coating, method for fabricating a multilayer coating, and uses for the same
07/11/2012CN102575344A Pulsed chemical vapor deposition of metal-silicon-containing films
07/11/2012CN102575343A Catalytic CVD device, method for formation of film, process for production of solar cell, and substrate holder