Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/2012
11/06/2012US8303764 Apparatus and methods for transporting and processing substrates
11/06/2012US8303763 Measuring and controlling wafer potential in pulsed RF bias processing
11/06/2012US8303714 Continuous film forming apparatus
11/06/2012US8303713 Chemical vapor deposition flow inlet elements and methods
11/06/2012US8303712 Substrate processing apparatus, method for manufacturing semiconductor device, and process tube
11/06/2012US8302554 Apparatus and method for rapid cooling of large area substrates in vacuum
11/05/2012CA2776063A1 Roofing granules including base particles and a coating
11/01/2012WO2012149327A2 Method and apparatus for gas delivery
11/01/2012WO2012148880A2 A method for the preparation of doped single graphene sheets
11/01/2012WO2012148571A1 Low reflectance fingerprint resistant surface for displays
11/01/2012WO2012148085A2 Antimony amino alkoxide compound and method for preparing same, and method for forming a thin film containing antimony using the antimony amino alkoxide compound and an atomic layer deposition technique
11/01/2012WO2012147680A1 Film forming method
11/01/2012WO2012147251A1 Material vaporization supply device
11/01/2012US20120276752 Hardmask materials
11/01/2012US20120276397 Vacuum film formation method and laminate obtained by the method
11/01/2012US20120276396 Vacuum film formation method and laminate obtained by the method
11/01/2012US20120276335 Porous medium with increased hydrophobicity and method of manufacturing the same
11/01/2012US20120276332 Functional Composite Garment Materials
11/01/2012US20120276327 Electrothermal interface material enhancer
11/01/2012US20120276306 Atomic Layer Deposition For Controlling Vertical Film Growth
11/01/2012US20120276305 Atomic layer deposition of metal phosphates and lithium silicates
11/01/2012US20120276299 Coating Method and Coating Apparatus
11/01/2012US20120276292 Method of forming silicon oxide containing films
11/01/2012US20120276291 Methods and Apparatuses for Reducing Gelation of Glass Precursor Materials During Vaporization
11/01/2012US20120276285 Barrier laminate and device sealed with it, and method of sealing device
11/01/2012US20120275026 Low reflectance fingerprint resistant surface for displays
11/01/2012US20120274273 Integrated-circuit battery devices
11/01/2012US20120273976 Moisture barrier coatings for organic light emitting diode devices
11/01/2012US20120273459 Strip passing apparatus, apparatus for treating surface of strip with the same, and method for treating surface of strip
11/01/2012US20120273458 Method and apparatus for processing a substrate with a focused particle beam
11/01/2012US20120273229 Method of making and using a functionally gradient composite tool
11/01/2012US20120273136 Plasma Processing Apparatus
11/01/2012US20120272900 Lateral flow atomic layer deposition device
11/01/2012US20120272898 Method and apparatus for gas delivery
10/2012
10/31/2012EP2518763A1 A grounding assembly for vacuum processing apparatus
10/31/2012EP2518180A2 Apparatus and method for treating substrate
10/31/2012EP2518102A2 Device and method for producing coated packaging moulded parts
10/31/2012EP2516701A1 Synthetic cvd diamond
10/31/2012EP2516695A1 Coated tool
10/31/2012EP2516694A2 Strip passing apparatus, apparatus for treating surface of strip with the same, and method for treating surface of strip
10/31/2012DE112010004710T5 Verfahren und Vorrichtung zum Steuern bzw. Regeln des Druckes in mehreren Zonen eines Prozesswekzeuges Method and apparatus for controlling the pressure in a plurality of zones of a Prozesswekzeuges
10/31/2012DE102011100025A1 Component useful e.g. as radial shaft sealing ring, toothed belt, conveyor belt, rotor blade or plastic component, comprises a surface, on which partially a film with wear protection and/or anti-adhesion effect is applied
10/31/2012DE102011100024A1 Verfahren zum ausbilden einer schicht auf einem substrat A method for forming a layer on a substrate
10/31/2012DE102011081627A1 Poröses Medium mit erhöhter Hydrophobizität und Verfahren zum Herstellen desselben Of the same porous medium with increased hydrophobicity, and methods for preparing
10/31/2012DE102011050016A1 Vorrichtung und Verfahren zur Herstellung von beschichteten Spritzgussteilen Apparatus and method for producing coated injection moldings
10/31/2012DE102011050015A1 Apparatus, useful for coating packaging mold parts produced by injection molding, comprises a receiving area for receiving packaged goods, a supply unit for feeding the mold parts to a feeding position, and an extraction unit
10/31/2012CN202513194U Substrate conveying system
10/31/2012CN102763212A Methods and apparatus for deposition processes
10/31/2012CN102763193A Semiconductor device manufacturing method, substrate manufacturing method, and substrate processing apparatus
10/31/2012CN102762767A Atomic layer deposition chamber with multi inject
10/31/2012CN102762766A Heating system for a vapor-phase deposition source
10/31/2012CN102762765A Constant volume closure valve for vapor phase deposition source
10/31/2012CN102762764A Parallel plate reactor for uniform thin film deposition with reduced tool foot-print
10/31/2012CN102762763A Vapor deposition methods of SICOH low-K films
10/31/2012CN102762761A Devices and method for precipitating a layer on a substrate
10/31/2012CN102758192A Semiconductor epitaxial wafer substrate-bearing disk, supporting device thereof and metal organic chemical vapor deposition (MOCAD) reaction chamber
10/31/2012CN102758191A Apparatus and method for treating substrate
10/31/2012CN102061457B Gas phase reaction device
10/31/2012CN102017078B Heat treatment apparatus
10/31/2012CN101974738B Plasma enhanced chemical vapor deposition device
10/31/2012CN101960040B Corrosion resistant object with alloying zone
10/31/2012CN101906621B Asymmetric grounding of rectangular susceptor
10/31/2012CN101892466B Offline large-area coating film production line
10/31/2012CN101886254B Method of improving initiation layer for low-k dielectric film by digital liquid flow meter
10/31/2012CN101809191B Process of making an optical film by atomic layer deposition (ALD) at atmospheric pressure
10/31/2012CN101632329B Plasma processing apparatus and plasma processing method
10/31/2012CN101512042B Plasma deposition apparatus and method for making polycrystalline silicon
10/31/2012CN101392367B Semiconductor processing parts having apertures with deposited coatings and methods for forming the same
10/31/2012CN101253283B Sensor for pulsed deposition monitoring and control
10/31/2012CN101151115B Replacement cutter tip and method of manufacturing the same
10/30/2012US8298629 High throughput multi-wafer epitaxial reactor
10/30/2012US8298628 Low temperature deposition of silicon-containing films
10/30/2012US8298627 Method and apparatus of plasma treatment
10/30/2012US8298625 Multiple phase RF power for electrode of plasma chamber
10/30/2012US8298615 Rapid generation of carbon filament structures of controlled geometries at low temperatures
10/30/2012US8298614 Method of depositing a multilayer coating with a variety of oxide adhesion layers and organic layers
10/30/2012US8298609 Method and system for interrogating the thickness of a carbon layer
10/30/2012US8298433 Methods for removing an edge polymer from a substrate
10/30/2012US8298371 Plasma processing apparatus
10/30/2012US8298370 Apparatus for chemical vapor deposition (CVD) with showerhead
10/30/2012US8298340 Organic thin film deposition device, organic EL element manufacturing device, and organic thin film deposition method
10/30/2012US8298339 Roll-to-roll continuous thin film PV manufacturing process and equipment with real time online IV measurement
10/30/2012US8298338 Chemical vapor deposition apparatus
10/30/2012US8298337 Gas inlet element for a CVD reactor
10/30/2012US8298336 High strip rate downstream chamber
10/30/2012US8297226 Deposition box for silicon-based thin film solar cell
10/30/2012US8297225 Capacitive CVD reactor and methods for plasma CVD process
10/30/2012US8297224 Substrate processing apparatus
10/30/2012US8297223 Method and apparatus for particle filtration and enhancing tool performance in film deposition
10/30/2012US8297221 Apparatus for slot die setup and control during coating
10/26/2012WO2012144614A1 Epitaxial silicon carbide single-crystal substrate and process for producing same
10/26/2012WO2012144580A1 Amorphous carbon film and method for forming same
10/26/2012WO2012144523A1 Plasma evaluation method, plasma processing method and plasma processing apparatus
10/26/2012WO2012144455A1 Organic platinum compound for chemical vapor deposition, and chemical vapor deposition method using organic platinum compound
10/26/2012WO2012144088A1 Surface-coated cutting tool and method for manufacturing same
10/26/2012WO2012143707A1 Method for coating substrates
10/26/2012WO2012143334A1 Method for increasing wipe resistance and scratch resistance of plastic surfaces
10/26/2012WO2012143262A1 Device and method for large-scale deposition of semi-conductor layers with gas-separated hcl-feeding
10/26/2012WO2012143257A1 Device and method for depositing semi-conductor layers while adding hcl for surpressing parasitic growth
10/26/2012WO2012143150A1 Method for depositing a transparent barrier layer system
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