Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/2012
11/14/2012CN102776490A Gas supply apparatus, thermal treatment apparatus, gas supply method and thermal treatment method
11/14/2012CN102776489A Gas inlet ring, gas inlet assembly, process chamber apparatus and CVD equipment
11/14/2012CN102776488A Chemical vapor deposition reaction chamber apparatus and chemical vapor deposition equipment having same
11/14/2012CN102776487A Semiconductor processing equipment and semiconductor processing method
11/14/2012CN102776486A Atomic layer deposition method of BiFeO3 film
11/14/2012CN102776485A Method for preparing high density diamond-like carbon film by two-step pulse deposition
11/14/2012CN102776483A Plasma assisted vapor transport deposition device and method
11/14/2012CN102776481A Method for preparing gradient transition layer between hard film and substrate
11/14/2012CN102773407A Method for improving metal casting mould demoulding effects
11/14/2012CN102080206B Mask plate bearing device
11/14/2012CN101838789B Method of reducing stress in coatings produced by physical vapour deposition
11/14/2012CN101681817B Compound-type thin film, method for compound-type thin film formation, and electronic apparatus using the thin film
11/14/2012CN101636523B Barrier-film forming apparatus, barrier-film forming method, and barrier-film coated container
11/14/2012CN101484512B Photochromatic effect for polycarbonate glazing applications
11/14/2012CN101378003B Alternate gas delivery and evacuation system for plasma processing apparatuses
11/14/2012CN101144154B Plasma uniformity control by gas diffuser hole design
11/13/2012US8310054 Semiconductor device manufacturing method and target substrate processing system
11/13/2012US8309175 Barrier film producing method for a semiconductor
11/13/2012US8309174 Heteroleptic iridium precursors to be used for the deposition of iridium-containing films
11/13/2012US8309173 System for controlling the sublimation of reactants
11/13/2012US8308916 Method for simultaneously coating a plurality of workpieces
11/13/2012US8308898 Tuner and microwave plasma source
11/13/2012US8308897 Plasma processing apparatus and plasma processing method
11/13/2012US8308867 Device for the temperature control of the surface temperatures of substrates in a CVD reactor
11/13/2012US8308866 Vapor deposition apparatus for an organic vapor deposition material and a method for producing an organic film
11/13/2012US8308865 Showerhead for chemical vapor deposition and chemical vapor deposition apparatus having the same
11/13/2012US8307783 Plasma booster for plasma treatment installation
11/13/2012US8307782 Deposition apparatus and deposition method
11/13/2012US8307781 Surface wave excitation plasma CVD system
11/08/2012WO2012150763A2 Method for manufacturing high quality graphene using continuous heat treatment chemical vapor deposition method
11/08/2012WO2012150761A1 Method for manufacturing graphene and device for manufacturing graphene
11/08/2012WO2012118953A3 Atomic layer deposition carousel with continuous rotation and methods of use
11/08/2012WO2012109523A3 Deposition of thin films on energy sensitive surfaces
11/08/2012WO2012093847A3 Polycrystalline cuprous oxide nanowire array production method using low-temperature electrochemical growth
11/08/2012WO2012007401A8 Coating for converting radiation energy
11/08/2012US20120283031 Propeller shaft
11/08/2012US20120282527 Composite materials for battery applications
11/08/2012US20120282489 Direct graphene growing method
11/08/2012US20120282471 Roofing granules including base particles and a coating
11/08/2012US20120282463 Continuous vapor grown carbon fiber, method for fabricating the same and applications thereof
11/08/2012US20120282418 SiCN FILM FORMATION METHOD AND APPARATUS
11/08/2012US20120282415 Methods For Using Porogens For Low K Porous Organosilica Glass Films
11/08/2012US20120282402 Coating Methods and Apparatus
11/08/2012US20120282401 Method of forming a partial deposition layer and apparatus of forming a partial deposition layer
11/08/2012US20120282400 Method for Making a Cemented Tungsten Carbide-Based Material
11/08/2012US20120282311 Pigments with improved sparkling effect
11/08/2012US20120281275 Systems and Methods for Determining One or More Characteristics of a Specimen Using Radiation in the Terahertz Range
11/08/2012US20120280369 Method for manufacturing semiconductor device, substrate processing apparatus, and semiconductor device
11/08/2012US20120279943 Processing chamber with cooled gas delivery line
11/08/2012US20120279658 Plasma treatment systems and methods for uniformly distributing radiofrequency power between multiple electrodes
11/08/2012US20120279452 Substrate processing apparatus
11/08/2012US20120279451 Film deposition apparatus, method of manufacturing a semiconductor device, and method of coating the film deposition apparatus
11/08/2012US20120279450 Coil section assembly for simulating circular coils for vacuum devices
11/08/2012US20120279448 Device for generating plasma by means of microwaves
11/08/2012US20120279445 Split mask and assembling apparatus for assembling a mask frame assembly including the split mask
11/08/2012US20120279443 Substrate support
11/08/2012DE112011100280T5 Steuerung für und Verfahren zur gepulsten Gaszuführung For control and method for pulsed gas supply
11/08/2012DE10080124B3 Substratverarbeitungssystem, dessen Verwendung sowie Verfahren zur Bearbeitung eines Substrates A substrate processing system, its use and method for processing a substrate
11/07/2012EP2520691A1 Tantalum carbide-coated carbon material and manufacturing method for same
11/07/2012EP2520690A1 Ruthenium complex mixture, method for producing same, composition for forming film, ruthenium-containing film and method for producing same
11/07/2012EP2519657A2 Oxygen radical generation for radical-enhanced thin film deposition
11/07/2012EP2519656A2 Vaporization apparatus and method for controlling the same
11/07/2012CN202519329U Plasma surface treatment device
11/07/2012CN202519328U Wafer heating device
11/07/2012CN202519327U Super-hard membrane depositing device utilizing multi-torch plasma ejection CVD (chemical vapor deposition)
11/07/2012CN102770801A Strengthened structural module and method of fabrication
11/07/2012CN102770588A CVD single crystal diamond material
11/07/2012CN102770582A Tantalum carbide-coated carbon material and manufacturing method for same
11/07/2012CN102770581A Cutting tool for processing metal materials
11/07/2012CN102770580A Ultra low dielectric materials using hybrid precursors containing silicon with organic functional groups by plasma-enhanced chemical vapor deposition
11/07/2012CN102770579A Conveyance device for film substrate
11/07/2012CN102770385A Device and method for substrate processing
11/07/2012CN102766857A Plasma treatment system and method for uniformly distributing radiofrequency power among multiple electrodes
11/07/2012CN102766856A Special flat plate type PECVD (Plasma Enhanced Chemical Vapor Deposition) coated pendant
11/07/2012CN102766855A Showerhead electrode assemblies and plasma processing chambers incorporating the same
11/07/2012CN102766854A Novel system for metal-organic chemical vapor deposition (MOCVD)
11/07/2012CN102766853A Vertical type depositing furnace tube
11/07/2012CN102766852A MOCVD reactor
11/07/2012CN102766851A Metal organic chemical vapor deposition reactor
11/07/2012CN102766850A Film deposition device
11/07/2012CN102764745A Baking furnace device of graphite disk for cleaning MOCVD (metal-organic chemical vapor deposition) device
11/07/2012CN101983256B Piston ring
11/07/2012CN101925690B Insulating film material, film forming method using insulating film material, and insulating film
11/07/2012CN101878320B Frame-based vacuum chamber for coating systems
11/07/2012CN101838800B Device and method for processing surface of material by atmospheric-pressure micro-discharge plasma
11/07/2012CN101827955B Workpiece carrier device
11/07/2012CN101694853B ZnO/SiC/Si heterojunction solar battery and preparation method thereof
11/07/2012CN101680090B Vacuum processing apparatus
11/07/2012CN101595245B Method and apparatus for stabilizing a coating
11/07/2012CN101512043B Low temperature method of making a zinc oxide coated article
11/07/2012CN101495675B Chemical vapor deposition reactor having multiple inlets
11/07/2012CN101423929B Amorphous ge/te deposition process
11/06/2012US8304567 Organoruthenium complex, and method for production of ruthenium thin film using the ruthenium complex
11/06/2012US8304350 Method of manufacturing a semiconductor device
11/06/2012US8304021 Vapor phase deposition apparatus, method for depositing thin film and method for manufacturing semiconductor device
11/06/2012US8304020 Adhesion promoting process, adhesion promoting device, coating and developing system and storage medium
11/06/2012US8304019 Roll-to-roll atomic layer deposition method and system
11/06/2012US8304014 Aligning OLED substrates to a shadow mask
11/06/2012US8303924 Production method for a low-dislocation bulk AlN single crystal and low-dislocation monocrystalline AlN substrate
11/06/2012US8303765 Plasma etching apparatus
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