Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/2012
10/18/2012US20120264020 Method of depositing silicon on carbon nanomaterials
10/18/2012US20120263888 Film formation apparatus for semiconductor process and method for using the same
10/18/2012US20120263887 Technique and apparatus for ion-assisted atomic layer deposition
10/18/2012US20120263886 Thin Film Deposition via a Spatially-Coordinated and Time-Synchronized Process
10/18/2012US20120263877 CVD Reactor Having Gas Inlet Zones that Run in a Strip-Like Manner and a Method for Deposition of a Layer on a Substrate in a CVD Reactor of this Kind
10/18/2012US20120263876 Deposition of silicon dioxide on hydrophobic surfaces
10/18/2012US20120263875 Method and Apparatus For Depositing A Material Layer Originating From Process Gas On A Substrate Wafer
10/18/2012US20120263874 Fluid bed reactor
10/18/2012US20120263865 Dual lane coating
10/18/2012US20120263569 Substrate holders and methods of substrate mounting
10/18/2012US20120262809 Thermally-resilient, broadband optical absorber from uv-to-ir derived from carbon nanostructures and method of making the same
10/18/2012US20120262790 Anti-reflective lenses and methods for manufacturing the same
10/18/2012US20120261773 Semiconductor device, method of manufacturing semiconductor device and system of processing substrate
10/18/2012US20120261735 Semiconductor device having a thin film capacitor and method for fabricating the same
10/18/2012US20120260857 Heat treatment apparatus
10/18/2012US20120260856 Plasma enhanced chemical vapor deposition apparatus and method for controlling the same
10/18/2012US20120260855 Depositing apparatus for forming thin film
10/18/2012DE112010003496T5 Filmkassette für Gasaufdampfung Film cassette for Gasaufdampfung
10/18/2012DE102011017404A1 Verfahren zum Abscheiden eines transparenten Barriereschichtsystems A process for depositing a transparent barrier layer system
10/18/2012DE102011017403A1 Verfahren zum Abscheiden eines transparenten Barriereschichtsystems A process for depositing a transparent barrier layer system
10/18/2012DE102011007557A1 Verfahren zur Steigerung der Wischfestigkeit bzw. Kratzfestigkeit von Kunststoffoberflächen A method for increasing the smudge resistance and scratch resistance of plastic surfaces
10/18/2012DE102011007349A1 Labeling substrate e.g. transparent container, comprises depositing luminescent dye as first identification feature in transparent oxide marker layer, and setting roughness of marker layer as second identification feature
10/18/2012DE102011002146A1 Vorrichtung und Verfahren zum Abscheiden von Halbleiterschichten mit HCI-Zugabe zur Unterdrückung parasitären Wachstums An apparatus and method for depositing semiconductor layers with HCI addition to suppress parasitic growth
10/18/2012DE102011002145A1 Vorrichtung und Verfahren zum großflächigen Abscheiden von Halbleiterschichten mit gasgetrennter HCI-Einspeisung Apparatus and method for large-area deposition of semiconductor layers with separate HCI gas feed
10/18/2012DE10083204B3 Plasmaprozesskammer und Bearbeitungsverfahren darin Plasma processing chamber and processing method is
10/17/2012EP2511947A1 P-type algan layer, method for producing same and group iii nitride semiconductor light-emitting element
10/17/2012EP2511946A1 Method for cleaning film forming apparatus, film forming method, and film forming apparatus
10/17/2012EP2511764A1 Method for processing an object with miniaturized structures
10/17/2012EP2511280A1 Germanium amidinate complexes useful for CVD/ALD of metal thin films
10/17/2012CN202492576U Chemical vapor deposition device
10/17/2012CN202492575U Graphite plate for chemical vapor deposition method
10/17/2012CN202492574U Support and support assembly for growing of graphene and graphene film growing assembly
10/17/2012CN202492573U Multi-technological-cavity double-sided coating PECVD (Plasma Enhanced Chemical Vapor Deposition) device
10/17/2012CN202492572U Device for smoothly laminating film on target substrate without clearance
10/17/2012CN202492565U Coating clamp of ultra-thin filter
10/17/2012CN102741452A Chemical vapor deposition coating, article, and method
10/17/2012CN102741451A Method for manufacturing a solar panel
10/17/2012CN102738325A Metal substrate vertical GaN-based LED (Light-Emitting Diode) chip and manufacturing method thereof
10/17/2012CN102738299A Method for producing copper, indium, gallium and selenium thin-film solar cell absorbing layer
10/17/2012CN102737957A Method of depositing silicon oxide film and silicon nitride film, film forming apparatus, and method of manufacturing semiconductor device
10/17/2012CN102737949A RF choke for gas delivery to an RF driven electrode in a plasma processing apparatus
10/17/2012CN102732956A MO source supply system for GaN epitaxy of MOCVD equipment
10/17/2012CN102732861A Pallet and chemical vapor deposition equipment with pallet
10/17/2012CN102732860A Reaction chamber and chemical vapor deposition equipment with reaction chamber
10/17/2012CN102732859A Gas transmission apparatus and substrate processing device therewith
10/17/2012CN102732858A Multi-cavity film deposition device and air exhaust module thereof
10/17/2012CN102732857A Erosion resistant yttrium comprising metal with oxidized coating for plasma chamber components
10/17/2012CN102732856A Vertical batch-type film forming apparatus
10/17/2012CN102732855A Method for cleaning thin film forming apparatus, thin film forming method, and thin film forming apparatus
10/17/2012CN102732854A Film deposition apparatus and film deposition method
10/17/2012CN102732853A Chamber device and substrate-processing device therewith
10/17/2012CN102732852A Silicon nitride film preparation device
10/17/2012CN102732851A Method for preparing diamond-like carbon film by pulsed discharge deposition
10/17/2012CN102732850A Conditioning method, computer readable storage medium and substrate processing apparatus
10/17/2012CN102732834A Apparatus for preparing two-dimensional nanometer film
10/17/2012CN102732037A Graphene foam/polymer high-conductivity composite material preparation method and application thereof
10/17/2012CN102728870A Cutting tool
10/17/2012CN102127754B Plasma film forming apparatus
10/17/2012CN101994099B Method for forming fluorine-doped silicon oxide thin film
10/17/2012CN101967627B Charging chamber for chemical vapor phase deposition device
10/17/2012CN101831621B Chemical vapor densification furnace body
10/17/2012CN101768731B Atomic layer deposition apparatus
10/17/2012CN101348900B Organometallic compounds
10/17/2012CN101180420B Method for growth of GaN single crystal, method for preparation of GaN substrate, process for producing GaN-based element, and GaN-based element
10/16/2012US8290553 Device and method for fabricating thin films by reactive evaporation
10/16/2012US8288685 Thermal flux processing by scanning a focused line beam
10/16/2012US8288161 Articles of manufacture containing increased stability low concentration gases and methods of making and using the same
10/16/2012US8287967 Method and apparatus for processing workpiece
10/16/2012US8287956 Crack and residue free conformal deposited silicon oxide with predictable and uniform etching characteristics
10/16/2012US8287955 Coating method for forming pattern on workpiece
10/16/2012US8287689 Plasma processing apparatus and feeder rod used therein
10/16/2012US8287650 Low sloped edge ring for plasma processing chamber
10/16/2012US8287649 Vertical boat for heat treatment and method for heat treatment of silicon wafer using the same
10/16/2012US8287648 Method and apparatus for minimizing contamination in semiconductor processing chamber
10/16/2012US8287647 Apparatus and method for atomic layer deposition
10/16/2012US8287646 Gas treatment systems
10/16/2012US8286582 Vapor deposition of dissimilar materials
10/16/2012US8286581 High frequency power source and its control method, and plasma processing apparatus
10/16/2012US8286579 Mask assembly for thin film vapor deposition of flat panel display
10/16/2012US8286576 Substrate processing apparatus
10/16/2012CA2595829C High yield spray application
10/11/2012WO2012138332A1 Hafnium-containing or zirconium-containing precursors for vapor deposition
10/11/2012WO2012137949A1 Method for producing nitride semiconductor, nitride semiconductor, and method for forming group iii-v nitride film
10/11/2012WO2012137783A1 Semiconductor laminate and process for production thereof, and semiconductor element
10/11/2012WO2012137781A1 Semiconductor stacked body, method for manufacturing same, and semiconductor element
10/11/2012WO2012137776A1 Chemical vapor deposition device
10/11/2012WO2012137408A1 Processing apparatus
10/11/2012WO2012136888A1 Method for depositing one or more polycrystalline silicon layers on substrate
10/11/2012WO2012136876A1 Atomic layer deposition with plasma source
10/11/2012WO2012136875A1 Deposition reactor with plasma source
10/11/2012WO2012136586A1 Substrate carrier
10/11/2012WO2012136052A1 Gas transmission device and substrate treatment apparatus having same
10/11/2012WO2012112584A3 Atomic layer deposition using radicals of gas mixture
10/11/2012US20120258863 Metalorganic chemical vapor deposition (mocvd) process and apparatus to produce multi-layer high-temperature superconducting (hts) coated tape
10/11/2012US20120258587 Method of Forming Graphene on a Surface
10/11/2012US20120258581 Mocvd fabrication of group iii-nitride materials using in-situ generated hydrazine or fragments there from
10/11/2012US20120258580 Plasma-assisted mocvd fabrication of p-type group iii-nitride materials
10/11/2012US20120258566 Substrate processing apparatus, method for manufacturing solar battery, and method for manufacturing substrate
10/11/2012US20120258565 Substrate processing apparatus and method for forming coating film on surface of reaction tube used for the substrate processing apparatus
10/11/2012US20120258295 Multilayer component for the encapsulation of a sensitive element
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