| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
|---|
| 07/05/2012 | WO2012088571A1 Piston assembly for alernative compressor |
| 07/05/2012 | US20120172232 Nanorod-containing precursor powder, nanorod-containing superconductor bulk and method for manufacturing the same |
| 07/05/2012 | US20120171870 Wafer processing with carrier extension |
| 07/05/2012 | US20120171852 Remote hydrogen plasma source of silicon containing film deposition |
| 07/05/2012 | US20120171849 Apparatus for forming deposited film and method for forming deposited film |
| 07/05/2012 | US20120171845 Chuck for chemical vapor deposition systems and related methods therefor |
| 07/05/2012 | US20120171815 Cvd apparatus and method of forming semiconductor superlattice structure using the same |
| 07/05/2012 | US20120171509 Tool Coating |
| 07/05/2012 | US20120171453 Barrier coated thermo-mechanically stable, heat sealable film, a packaging laminate comprising the film, a packaging container formed from the packaging laminate and a method for the production of the film |
| 07/05/2012 | US20120171418 Low dielectric constant nano-zeolite thin film and manufacturing method thereof |
| 07/05/2012 | US20120171391 Thin film deposition using microwave plasma |
| 07/05/2012 | US20120171389 Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces |
| 07/05/2012 | US20120171378 Binary and Ternary Metal Chalcogenide Materials and Method of Making and Using Same |
| 07/05/2012 | US20120171377 Wafer carrier with selective control of emissivity |
| 07/05/2012 | US20120171376 Method of applying atomic layer deposition coatings onto porous non-ceramic substrates |
| 07/05/2012 | US20120171375 Method of densifying thin porous substrates by chemical vapor infiltration, and a loading device for such substrates |
| 07/05/2012 | US20120171371 Atomic layer deposition method for coating flexible substrates |
| 07/05/2012 | US20120171365 Film forming apparatus, film forming method and storage medium |
| 07/05/2012 | US20120171359 Organic el device manufacturing method and apparatus |
| 07/05/2012 | US20120171354 Implantable medical devices |
| 07/05/2012 | US20120170170 Method for manufacturing a polycrystalline dielectric layer |
| 07/05/2012 | US20120168082 Plasma generating apparatus |
| 07/05/2012 | US20120168034 Process for surface treating aluminum or aluminum alloy and article made with same |
| 07/05/2012 | US20120167824 Cvd apparatus |
| 07/05/2012 | US20120167573 Thermal Barrier Coatings and Methods of Application |
| 07/05/2012 | DE112010003142T5 Vorrichtung zur Atomschichtabscheidung Apparatus for atomic layer deposition |
| 07/05/2012 | DE112010000724T5 Plasmaverarbeitungsvorrichtung und Plasma-CVD-Filmbildungsverfahren The plasma processing apparatus and plasma CVD film forming method |
| 07/05/2012 | DE112010000717T5 Plasmaverarbeitungsvorrichtung Plasma processing apparatus |
| 07/05/2012 | DE102011112434A1 Treating workpieces in vacuum treatment system comprises applying negative bias to workpiece, avoiding damage such that if current flowing via workpieces from measured average current deviates more than specific value interrupts treatment |
| 07/05/2012 | DE102010056344A1 Device for holding and transporting tubular substrates for coating in evacuated chambers for thin layer preparation, comprises coupling elements comprising a pipe connection for connecting two pipes |
| 07/05/2012 | DE102006042328B4 Verfahren zur Ausbildung dünner Schichten auf Substratoberflächen A method for forming thin films on substrate surfaces |
| 07/05/2012 | CA2822599A1 Gas-barrier plastic molded product and manufacturing process therefor |
| 07/05/2012 | CA2822597A1 Method for producing gas barrier plastic molded body |
| 07/04/2012 | EP2472576A1 Vacuum treatment device and vacuum treatment factory |
| 07/04/2012 | EP2472575A2 Heat treatment apparatus |
| 07/04/2012 | EP2472568A1 Silicon carbide epitaxial wafer and manufacturing method therefor |
| 07/04/2012 | EP2472567A2 Semiconductor layer |
| 07/04/2012 | EP2471973A1 Apparatus for forming deposited film and method for forming deposited film |
| 07/04/2012 | EP2470685A1 Cvd reactor and method for depositing a coating |
| 07/04/2012 | EP2470684A1 Cvd method and cvd reactor |
| 07/04/2012 | EP1625243B1 Cvd coating device |
| 07/04/2012 | EP1515362B1 Plasma processing system, plasma processing method, plasma film deposition system, and plasma film deposition method |
| 07/04/2012 | CN202308005U 一种石墨舟 Graphite boat |
| 07/04/2012 | CN202297776U 一种cvd镀膜装置 One kind cvd coating apparatus |
| 07/04/2012 | CN202297775U 带有活性粒子检测部件的等离子薄膜沉积装置 A plasma film deposition apparatus having an active particle detection member |
| 07/04/2012 | CN202297774U 一种实时监控成膜气体的cvd镀膜装置 A real-time monitoring of deposition gas cvd coating apparatus |
| 07/04/2012 | CN202297773U 一种带有活性粒子检测部件的等离子成膜装置 Plasma deposition apparatus having an active component of particle detection |
| 07/04/2012 | CN202297772U 纳米级高精度控制热丝化学气相沉积生长薄膜材料设备 Nanoscale precision control hot filament chemical vapor deposition growth of thin films of materials and equipment |
| 07/04/2012 | CN202297771U 一种等离子成膜装置 A plasma film-forming apparatus |
| 07/04/2012 | CN202297770U 一种等离子薄膜沉积装置 A plasma film deposition apparatus |
| 07/04/2012 | CN202297769U 喷头可拆式特气管 Detachable nozzle special trachea |
| 07/04/2012 | CN202297768U 具有复合气路的气相沉积炉 Vapor deposition furnace having a composite gas path |
| 07/04/2012 | CN202297767U 一种平板式pecvd的进气结构 Intake of a flatbed pecvd |
| 07/04/2012 | CN202297766U 嵌入式pecvd载片器 Embedded pecvd slide device |
| 07/04/2012 | CN202297765U 用于太阳能电池沉积夹具的放电电极装置 The discharge electrode of the solar cell deposition means for fixture |
| 07/04/2012 | CN202297764U 氮化硅膜成长炉管装置中减少氯化铵堵塞的结构 Silicon nitride film to reduce the growth furnace tube apparatus chloride plugging structure |
| 07/04/2012 | CN202297763U 一种金属有机气相化学沉积装置 Metal organic chemical vapor deposition apparatus |
| 07/04/2012 | CN202297756U 真空式物理、化学混合气相沉积设备 Vacuum physical, chemical vapor deposition apparatus mixing |
| 07/04/2012 | CN202297140U 一种可连续制备石墨烯膜的装置 Means a graphene film can be continuously prepared |
| 07/04/2012 | CN1908228B Method and apparatus for forming silicon-containing insulating film |
| 07/04/2012 | CN1795287B Thin film forming device and thin film forming method |
| 07/04/2012 | CN102550130A A multi-peripheral ring arrangement for performing plasma confinement |
| 07/04/2012 | CN102549727A Method for forming silicon nitride film, and method for producing semiconductor memory device |
| 07/04/2012 | CN102549717A Method for forming crystalline silicon film and plasma CVD device |
| 07/04/2012 | CN102549203A Method for production of laminate |
| 07/04/2012 | CN102549194A Surface-wave plasma cvd device and film-forming method |
| 07/04/2012 | CN102549193A Fluid distribution manifold including bonded plates |
| 07/04/2012 | CN102549192A Film formation and vacuum processing method for performing cleaning |
| 07/04/2012 | CN102544230A Method for growing variable forbidden bandwidth cadmium (Cd1)-x zinc (Zn) x tellurium (Te) film |
| 07/04/2012 | CN102544190A Method and device for conveying control, conveying device and processing equipment |
| 07/04/2012 | CN102543884A Method for manufacturing one time programmable (OTP) device |
| 07/04/2012 | CN102543831A System and apparatus for flowable deposition in semiconductor fabrication |
| 07/04/2012 | CN102543800A Substrate processing apparatus, substrate processing method and manufacture method for semiconductor device |
| 07/04/2012 | CN102543795A Film formation apparatus |
| 07/04/2012 | CN102543787A Method for monitoring the growing of the semiconductor layer |
| 07/04/2012 | CN102543780A Manufacturing method of package substrate |
| 07/04/2012 | CN102543756A High-density plasma deposition method with less plasma damage |
| 07/04/2012 | CN102543689A Substrate processing apparatus, method of manufacturing substrate, and method of manufacturing semiconductor device |
| 07/04/2012 | CN102538568A Product having functional layer and method for fabricating the same |
| 07/04/2012 | CN102534766A Device for quickly and continuously preparing large-size graphene film and application thereof |
| 07/04/2012 | CN102534615A Film-forming method for forming silicon oxide film on tungsten film or tungsten oxide film |
| 07/04/2012 | CN102534614A Coating method for DLC (diamond-like carbon) coating on spinning reed and equipment |
| 07/04/2012 | CN102534573A Plasma enhanced chemical vapor deposition vacuum equipment |
| 07/04/2012 | CN102534572A Offset generation method and device |
| 07/04/2012 | CN102534571A Method for preparing magnesium oxide nanoribbon by radio-frequency plasma enhanced CVD (Chemical Vapor Deposition) |
| 07/04/2012 | CN102534570A Method for preparing microcrystalline silicon film by plasma-enhanced chemical vapor deposition |
| 07/04/2012 | CN102534569A Atmospheric pressure glow plasma enhanced atom layer deposition device |
| 07/04/2012 | CN102534568A Plasma-enhanced chemical vapor deposition equipment |
| 07/04/2012 | CN102534567A Device and method for controlling basal heating in chemical gaseous phase sedimentary chamber |
| 07/04/2012 | CN102534566A Apparatus for amorphous silicon film even deposition of solar-cell panel |
| 07/04/2012 | CN102534565A Load boat for production of coating knife and application thereof |
| 07/04/2012 | CN102534564A Graphite boat with electrode holes formed on double sides for PECVD (Plasma Enhanced Chemical Vapor Deposition) |
| 07/04/2012 | CN102534563A Inclined entering gas spray header applied to metal organic chemical vapor deposition reactor |
| 07/04/2012 | CN102534562A Susceptor for CVD apparatus, CVD apparatus and substrate heating method using the same |
| 07/04/2012 | CN102534561A Industrial atomic layer deposition chamber structure |
| 07/04/2012 | CN102534560A Pallet support device of metal-organic chemical vapor deposition equipment |
| 07/04/2012 | CN102534559A Air inlet spray nozzle of metal organic chemical vapor deposition (MOCVD) equipment |
| 07/04/2012 | CN102534558A Chemical vapor deposition furnace capable of realizing upper and lower air inlet switching and application thereof |
| 07/04/2012 | CN102534557A Showerhead integrating intake and exhaust |
| 07/04/2012 | CN102534556A Normal-pressure multi-cavity atomic layer deposition equipment |