Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/2012
10/02/2012US8277891 Method for suppressing particle generation during semiconductor manufacturing
10/02/2012US8277890 Transport device, in particular for transporting sheet-like substrates through a coating installation
10/02/2012US8277889 Film formation method and film formation apparatus
10/02/2012US8277888 Dual path gas distribution device
10/02/2012US8277887 Delivery device
10/02/2012US8277886 Delivery device
10/02/2012US8277872 Methods of making multi-scale carbon structures
10/02/2012US8277869 Heating for buffer layer deposition
10/02/2012US8277630 Tin electroplating solution and a method for tin electroplating
10/02/2012US8277604 Antenna for plasma processor and apparatus
10/02/2012US8277603 Move mechanism for moving target object and charged particle beam writing apparatus
10/02/2012US8277561 Chemical vapor deposition apparatus
10/02/2012US8277560 CVD apparatus and method of cleaning the CVD apparatus
10/02/2012US8276604 Peripherally engaging electrode carriers and assemblies incorporating the same
10/02/2012US8276540 Method and system for introducing process fluid through a chamber component
10/02/2012CA2527262C Method for preparation of alpha, beta-unsaturated cyclic ketones by dehydrogenation of secondary allylic cyclic alcohols
09/2012
09/27/2012WO2012129358A1 Method of depositing zinc oxide coatings by chemical vapor deposition
09/27/2012WO2012128821A1 Fluid distribution members and/or assemblies
09/27/2012WO2012128789A1 Multiple level showerhead design
09/27/2012WO2012128044A1 Semiconductor device manufacturing method, substrate processing method, and substrate processing device
09/27/2012WO2012128029A1 Gate valve unit, substrate processing device and substrate processing method thereof
09/27/2012WO2012127759A1 Sliding component and method for manufacturing same
09/27/2012WO2012127738A1 COMPOUND GaN SUBSTRATE AND METHOD FOR PRODUCING SAME, AND GROUP III NITRIDE SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SAME
09/27/2012WO2012127708A1 Thin film forming apparatus and thin film forming method
09/27/2012WO2012127305A1 Gas supply for a processing furnace
09/27/2012WO2012126854A1 Tool for harvesting polycrystalline silicon-coated rods from a chemical vapor deposition reactor
09/27/2012WO2012126520A1 Apparatus and method for coating using a hot wire
09/27/2012WO2012126031A1 Coated body, use thereof, and method for production of same
09/27/2012WO2012126030A1 Coated body and method for the production thereof
09/27/2012WO2011153228A3 Reduction of copper or trace metal contaminants in plasma electrolytic oxidation coatings
09/27/2012US20120244721 Film forming method, film forming apparatus, and storage medium
09/27/2012US20120244704 Method for removing oxides
09/27/2012US20120244703 Tray for cvd and method for forming film using same
09/27/2012US20120244701 Method for forming nisi film, method for forming silicide film, method for forming metal film for use in silicide-annealing, apparatus for vacuum processing and film-forming apparatus
09/27/2012US20120244687 Method of manufacturing a base substrate for a semi-conductor on insulator type substrate
09/27/2012US20120244685 Manufacturing Apparatus and Method for Semiconductor Device
09/27/2012US20120244684 Film-forming apparatus and method
09/27/2012US20120244441 Silicon film and lithium secondary battery
09/27/2012US20120244342 CVD COATED POLYCRYSTALLINE c-BN CUTTING TOOLS
09/27/2012US20120244290 Deposition Substrate Temperature and Monitoring
09/27/2012US20120244282 Vapor deposition source
09/27/2012US20120244281 Low work function diamond surface and radiation energy converters using same
09/27/2012US20120243573 Plasma processing apparatus and temperature measuring method
09/27/2012US20120242217 Organic electroluminescence display and method of manufacturing the same
09/27/2012US20120241632 Nano Structural Anodes for Radiation Detectors
09/27/2012US20120241459 Demisable fuel supply system
09/27/2012US20120241192 Microfiber supported metal silicide nanowires
09/27/2012US20120241069 Direct Synthesis of Patterned Graphene by Deposition
09/27/2012US20120240859 Wafer susceptor and chemical vapor deposition apparatus
09/27/2012US20120240858 Substrate processing apparatus and solid raw material replenishing method
09/27/2012US20120240857 Vertical heat treatment apparatus
09/27/2012US20120240856 Plasma enhanced chemical vapor deposition apparatus and method for controlling the same
09/27/2012US20120240855 Transmission mechanism and the deposition apparatus using the same
09/27/2012US20120240854 Apparatus for producing laminated body
09/27/2012US20120240853 Liner assembly for chemical vapor deposition chamber
09/27/2012US20120240627 Apparatus for depositing thin film coatings and method of deposition utilizing such apparatus
09/27/2012US20120240348 Substrate processing apparatus
09/27/2012DE102012004809A1 CVD-Beschichtete Polykristalline c-BN-Schneidwerkzeuge CVD-coated polycrystalline CBN cutting tools
09/27/2012DE102008060923B4 Verwendung einer Schicht Use of a layer
09/27/2012DE102004017241B4 Verbundmaterial und Verfahren zu seiner Herstellung Composite material and process for its preparation
09/26/2012EP2503024A1 Apparatus for Producing Laminated Body
09/26/2012EP2503023A2 Processing gas supply member for a microwave plasma processing device
09/26/2012EP2503022A1 Formation of high quality dielectric films of silicon dioxide for STI: usage of different siloxane-based precursors for HARP II - remote plasma enhanced deposition processes
09/26/2012EP2502888A1 Glass pane for a photovoltaic module
09/26/2012EP2501839A2 Gas delivery for beam processing systems
09/26/2012EP2501838A2 Fluid bed reactor
09/26/2012EP2501837A1 Method of plasma etching and plasma chamber cleaning using f2 and cof2
09/26/2012CN202450156U Spray header used for chemical vapor deposition technology
09/26/2012CN202450155U Reaction chamber for chemical vapor deposition equipment
09/26/2012CN202450154U Refractory metal wire device for growing diamond film
09/26/2012CN102695817A Multilayer growth by gas phase deposition
09/26/2012CN102695816A Materials and methods for thermal and electrical conductivity
09/26/2012CN102693927A Dynamic system for variable heating or cooling of linearly conveyed substrates
09/26/2012CN102693893A Method for improving uniformity of high-frequency discharge plasma through frequency modulation
09/26/2012CN102691054A Transmission mechanism and the deposition apparatus using the same
09/26/2012CN102691053A Plate PECVD heating carrier
09/26/2012CN102691052A Wafer susceptor and chemical vapor deposition apparatus
09/26/2012CN102691051A Spray head of MOCVD (metal organic chemical vapor deposition) equipment reactor and connection structure thereof
09/26/2012CN102691050A Cleaning method for tungsten chemical vapor deposition system
09/26/2012CN102691049A Dynamic system for variable heating or cooling of linearly conveyed substrates
09/26/2012CN102691048A Film deposition method and film deposition apparatus
09/26/2012CN102691041A Substrate processing apparatus and solid raw material replenishing method
09/26/2012CN102689027A CVD coated polycrystalline c-BN cutting tools
09/26/2012CN102115878B Preparation method of single crystal cubic carbon nitride thin film
09/26/2012CN102071406B Method for preparing thin film from ternary compound semiconductor material Si1-X-YCXNY
09/26/2012CN101996878B Method for depositing low-dielectric constant insulating material layer
09/26/2012CN101981226B Deposition of ternary oxide films containing ruthenium and alkali earth metals
09/26/2012CN101959631B Surface coated member and cutting tool
09/26/2012CN101949009B Temperature control method of plasma chemical vapor deposition base
09/26/2012CN101918611B Thermalization of gaseous precursors in CVD reactors
09/26/2012CN101864554B Hard alloy blade for improving cutting edge structure
09/26/2012CN101845618B Manufacturing method of silicon nitride film window for imaging of X-ray microlens
09/26/2012CN101522942B Filming method for III-group nitride semiconductor laminated structure
09/26/2012CN101466873B Etching process
09/26/2012CN101067986B High temperature capacitors and method of manufacturing the same
09/25/2012US8274075 Crosslinked polymeric dielectric materials and electronic devices incorporating same
09/25/2012US8273410 Process for manufacturing hydrophobized microporous film
09/25/2012US8273409 Method for film formation, apparatus for film formation, and computer-readable recording medium
09/25/2012US8273407 Systems and methods for forming magnetic nanocomposite materials
09/25/2012US8273211 Flat panel display manufacturing apparatus
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