Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/2012
11/28/2012CN202558933U Accurate control device for gas-liquid mixing feeding
11/28/2012CN202558932U Rapid heat dissipation and dust removal device for plate PECVD discharge position
11/28/2012CN202558931U Multi-module system for manufacturing thin-film photovoltaic device
11/28/2012CN202558930U Device for sticking thin film and (on) substrate
11/28/2012CN202558924U Equipment for continuously preparing two-dimensional nano-film
11/28/2012CN1945807B Apparatus for controlling temperature of a substrate
11/28/2012CN102804932A Plasma processing device, plasma processing method, and method for manufacturing a semiconductor element
11/28/2012CN102804931A Plasma Processing Device And Cooling Device For Plasma Processing Devices
11/28/2012CN102804351A Barrier layer, film deposition method, and treating system
11/28/2012CN102804348A Starting material for use in forming silicone oxide film and method for forming silicone oxide film using same
11/28/2012CN102804346A Film forming device, film forming method, rotational frequency optimisation method, and storage medium
11/28/2012CN102804339A Vapor Deposition Device
11/28/2012CN102803581A Method for equipping an epitaxy reactor
11/28/2012CN102803558A Apparatus
11/28/2012CN102803557A Coating installation and coating method
11/28/2012CN102803556A Mounting for fixing a reactor in a vacuum chamber
11/28/2012CN102803555A Medicinal inhalation device
11/28/2012CN102803554A Dlc Film-forming Method And Dlc Film
11/28/2012CN102803553A Continuous patterned layer deposition
11/28/2012CN102803552A Plasma treatment method
11/28/2012CN102800749A Preparation method of noncrystalline/microcrystalline silicon thin-film material with silicon nanowire suede
11/28/2012CN102800419A Method for preparing graphene conductive film structure
11/28/2012CN102796998A Method for operating and controlling position of nano-grating deposition substrate in vacuum vessel and device therefor
11/28/2012CN102796997A Temperature measurement apparatus, method of measuring temperature and heat treatment apparatus
11/28/2012CN102796996A Vapor delivery device, methods of manufacture and methods of use thereof
11/28/2012CN102796995A Vapor deposition furnace and method for preparing pyrolytic boron nitride product
11/28/2012CN102796994A Method for preparing CoSb3 nanometer particle film
11/28/2012CN102796993A CVD (Chemical Vapor Deposition) equipment and control method thereof
11/28/2012CN102796992A Reaction chamber device and substrate processing equipment with same
11/28/2012CN102796991A Method for preparing graphene carbon nanotube composite membrane structure
11/28/2012CN102212878B Method for preparing acicular and fungiform Bi2O3 nano materials
11/28/2012CN102077319B Film deposition method
11/28/2012CN101928934B Method for improving uniformity of high-temperature oxide of wafer
11/28/2012CN101916715B In-situ dry clean chamber for front end of line fabrication
11/28/2012CN101560651B Heat treatment oven with inductive heating
11/28/2012CN101528637B Power control for densification of one or more porous articles
11/28/2012CN101473063B Cvd coating scheme including alumina and/or titanium-containing materials and method of making the same
11/28/2012CN101372739B Method for removing metal impurity from quartz component part used in heat processing apparatus of batch type
11/27/2012US8320723 Optical imaging probe connector
11/27/2012US8318327 Low contamination components for semiconductor processing apparatus and methods for making components
11/27/2012US8318268 AA stacked graphene-diamond hybrid material by high temperature treatment of diamond and the fabrication method thereof
11/27/2012US8318267 Method and apparatus for forming silicon oxide film
11/27/2012US8318266 Enhanced copper growth with ultrathin barrier layer for high performance interconnects
11/27/2012US8318252 Antimony precursors for GST films in ALD/CVD processes
11/27/2012US8318251 Method for coating honeycomb seal using a slurry containing aluminum
11/27/2012US8318250 Anchored nanostructure materials and method of fabrication
11/27/2012US8318249 Method for selective deposition and devices
11/27/2012US8318248 Spatially controlled atomic layer deposition in porous materials
11/27/2012US8318240 Method and apparatus to remove a segment of a thin film solar cell structure for efficiency improvement
11/27/2012US8318238 Film position adjusting method, memory medium and substrate processing system
11/27/2012US8317971 Plasma processing apparatus and method of manufacturing magnetic recording medium
11/27/2012US8317970 Ceiling electrode with process gas dispersers housing plural inductive RF power applicators extending into the plasma
11/27/2012US8317969 Plasma processing apparatus
11/27/2012US8317968 Apparatus including gas distribution member supplying process gas and radio frequency (RF) power for plasma processing
11/27/2012US8317927 Systems and methods for sealing in site-isolated reactors
11/27/2012US8317926 Duplex surface treatment of metal objects
11/27/2012US8317925 Method and system for mask handling in high productivity chamber
11/27/2012US8317924 Gas treatment apparatus, gas treatment method, and storage medium
11/27/2012US8317923 Protective self-aligned buffer layers for damascene interconnects
11/27/2012US8317922 Gas injection unit and thin film deposition apparatus having the same
11/27/2012US8317921 In situ growth of oxide and silicon layers
11/27/2012US8316797 Microwave plasma reactors
11/27/2012US8316796 Film coating system and isolating device thereof
11/22/2012WO2012158714A1 Ion-assisted direct growth of porous materials
11/22/2012WO2012158532A1 Improved microwave plasma reactors
11/22/2012WO2012157370A1 Method of opening reaction chamber and vapor phase growth device
11/22/2012WO2012157161A1 Method of washing semiconductor manufacturing apparatus component, apparatus for washing semiconductor manufacturing apparatus component, and vapor phase growth apparatus
11/22/2012WO2012156684A1 Burner for flame coating
11/22/2012WO2012156062A1 Method for plasma-treating a substrate in a plasma device
11/22/2012WO2012155264A1 Group 11 mono-metallic precursor compounds and use thereof in metal deposition
11/22/2012WO2012094182A3 Chuck for chemical vapor deposition systems and related methods therefor
11/22/2012US20120296033 Hard, Impermeable, Flexible and Conformal Organic Coatings
11/22/2012US20120296032 Coated electronic devices and associated methods
11/22/2012US20120295119 Method of making coated metal articles
11/22/2012US20120295116 Laminate and process for its production
11/22/2012US20120295081 Composite material and method for producing same
11/22/2012US20120295058 Mems anchor and spacer structure
11/22/2012US20120295038 Method and apparatus for using solution based precursors for atomic layer deposition
11/22/2012US20120295028 Thin-film formation apparatus system and thin-film formation method
11/22/2012US20120295014 Injector for a vacuum vapour deposition system
11/22/2012US20120293188 Apparatus and method of using impedance resonance sensor for thickness measurement
11/22/2012US20120292500 Mass spectrometer sampling cone with coating
11/22/2012US20120292289 Transport roller for the vacuum treatment of substrates
11/22/2012US20120292288 Method for treatment of a temporarily bonded product wafer
11/22/2012US20120292256 Hydrophobic Materials Made By Vapor Deposition Coating and Applications Thereof
11/22/2012US20120291863 Solar cell and manufacturing method thereof
11/22/2012US20120291708 Vacuum deposition apparatus
11/22/2012US20120291707 Floating wafer track with lateral stabilization mechanism
11/22/2012US20120291706 Atmospheric Pressure Plasma Processing Apparatus
11/22/2012US20120291705 Methods and apparatus for controlled chemical vapor deposition
11/22/2012DE102011075969A1 Reibungsverbessernde Polymere für DLC-beschichtete Oberflächen Friction-enhancing polymers for DLC-coated surfaces
11/22/2012CA2834809A1 Group 11 mono-metallic precursor compounds and use thereof in metal deposition
11/21/2012EP2525416A2 Method for rear point contact fabrication for solar cells
11/21/2012EP2524979A1 Single-crystal substrate, group iii element nitride crystal obtained using same, and process for produicng group iii element nitride crystal
11/21/2012EP2524067A1 Mounting for fixing a reactor in a vacuum chamber
11/21/2012CN202549895U Solar cell substrate feeding and blanking device of plasma enhanced CVD system
11/21/2012CN202543327U Plasma enhanced chemical vapor deposition vacuum equipment
11/21/2012CN202543326U Spray head for chemical vapor deposition method
11/21/2012CN202543325U Gas-inlet distribution device of chemical vapor deposition furnace
11/21/2012CN202543324U Cyclone drying type evaporator
1 ... 77 78 79 80 81 82 83 84 85 86 87 88 89 90 91 92 93 94 95 96 97 ... 719