Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/2012
11/21/2012CN202543323U Low pressure chemical vapor deposition (LPCVD) preheating cavity temperature control system
11/21/2012CN202543322U Multifunctional combined chemical vapor deposition system device
11/21/2012CN202543321U Treatment device for metal organic (MO) source canning container
11/21/2012CN202543320U PECVD (Plasma Enhanced Chemical Vapor Deposition) tank
11/21/2012CN202543319U PECVD (Plasma enhanced chemical vapor deposition) deposition device and locking device for deposition groove of PECVD deposition device
11/21/2012CN202543318U Locking device for plasma enhanced chemical vapor deposition (PECVD) quartz tube
11/21/2012CN202543317U Novel MOCVD (Metal Organic Chemical Vapor Deposition) reaction device
11/21/2012CN202543316U Cooling baffle device in vacuum coating equipment
11/21/2012CN202543315U Novel connection structure of vacuum horizontal poly-p-xylylene deposition system
11/21/2012CN202543314U Improved winding system for film aluminum plating machine
11/21/2012CN202543299U Automatic control device of vacuum pressure of ionic chemical thermal treatment furnace
11/21/2012CN102791906A Control for and method of pulsed gas delivery
11/21/2012CN102791476A Laminate and process for production thereof
11/21/2012CN102791406A Coated ceramic cutting insert and method of making the same
11/21/2012CN102791405A Coated PCBN cutting insert, coated PCBN cutting tool using such coated PCBN cutting insert, and method for making the same
11/21/2012CN102791356A Exhaust-gas treatment system
11/21/2012CN102789934A Supporting carrier of magnesium oxide evaporating device
11/21/2012CN102787305A Device and method for reducing impurity deposit in chemical vapor deposition process
11/21/2012CN102787304A Film-forming method and film-forming device
11/21/2012CN102787303A Tray apparatus and crystalline film growth equipment
11/21/2012CN102787302A Gas uniformizing device for improving film preparation technology
11/21/2012CN102787298A Injector for a vacuum vapour deposition system
11/21/2012CN102786756A Three-dimensional continuous graphene network composite material and its preparation method
11/21/2012CN102061453B Hot-filament chemical vapor deposition batch preparation method of complicated-shape diamond coated cutting tool
11/21/2012CN102051593B Method and device for epitaxially growing metal oxide transparent conductive film
11/21/2012CN102016119B Heat treatment apparatus
11/21/2012CN102016116B Vaporizer and deposition system using the same
11/21/2012CN102002680B Bearing plate and ejection fixture with bearing plate
11/21/2012CN101974734B Method for preparing substrate material with multilayer composite protective film
11/21/2012CN101952935B Vacuum processing device, method for maintaining vacuum processing device and vacuum processing factory
11/21/2012CN101944560B Manufacturing method of semiconductor photonic device substrate
11/21/2012CN101899649B Method for forming tungsten film
11/21/2012CN101896301B Coated article with nanolayered coating scheme
11/21/2012CN101811871B Liner tray for metal organic chemical vapor deposition equipment and manufacturing process thereof
11/21/2012CN101760728B Chemical vapor deposition system
11/21/2012CN101736312B Method for coating surface of radiation module and coated radiation module
11/21/2012CN101671191B Method for using full preoxidized fiber preform to prepare high-performance carbon-based composite material
11/21/2012CN101617388B Nitride semiconductor substrate
11/21/2012CN101542014B Silicon shelf towers
11/21/2012CN101497443B Reactor cleaning apparatus
11/21/2012CN101426954B Apparatus and method for controlling the surface temperature of a substrate in a process chamber
11/21/2012CN101151223B Object comprising a barrier coating, and method for the production of such an object
11/20/2012US8314466 Silicon structure, method for manufacturing the same, and sensor chip
11/20/2012US8313813 Process for treating a surface
11/20/2012US8313811 Plasma enhanced polymer ultra-thin multi-layer packaging
11/20/2012US8313807 High coordination sphere group 2 metal β-diketiminate precursors
11/20/2012US8313806 Vapor deposition method and apparatus
11/20/2012US8313805 Clamped showerhead electrode assembly
11/20/2012US8313804 Apparatus and methods for chemical vapor deposition
11/20/2012US8313612 Method and apparatus for reduction of voltage potential spike during dechucking
11/20/2012US8313611 Gas switching section including valves having different flow coefficients for gas distribution system
11/20/2012US8313578 Etching chamber having flow equalizer and lower liner
11/20/2012US8312840 Substrate processing apparatus and method
11/20/2012US8312839 Mixing frequency at multiple feeding points
11/20/2012US8312609 Method of manufacturing a patterned media stamper
11/15/2012WO2012154931A1 Methods for improving the bioactivity characteristics of a surface and objects with surfaces improved thereby
11/15/2012WO2012154690A1 Apparatus and method for multiple symmetrical divisional gas distribution
11/15/2012WO2012154217A1 Rf coupled plasma abatement system comprising an integrated power oscillator
11/15/2012WO2012153887A1 Apparatus for supplying raw materials
11/15/2012WO2012153819A1 Carbon film laminate, method of manufacturing said laminate, and lubricant using said laminate
11/15/2012WO2012153591A1 Film-forming apparatus
11/15/2012WO2012153438A1 Surface-coated cutting tool
11/15/2012WO2012151830A1 Gas inlet ring, gas inlet component, process chamber device and cvd equipment
11/15/2012WO2012125771A3 Substrate support assembly for thin film deposition systems
11/15/2012WO2012122253A3 Substrate carrier with multiple emissivity coefficients for thin film processing
11/15/2012US20120289061 Nanolayer deposition process
11/15/2012US20120289059 Chemical vaporizer for material deposition systems and associated methods
11/15/2012US20120289058 Semiconductor manufacturing apparatus and semiconductor device manufacturing method
11/15/2012US20120289057 Apparatus and method for multiple symmetrical divisional gas distribution
11/15/2012US20120288989 Manufacturing method of electrode of solar cell and manufacturing apparatus thereof
11/15/2012US20120288643 Multi-Zone Chuck
11/15/2012US20120288625 Gas supply apparatus, thermal treatment apparatus, gas supply method, and thermal treatment method
11/15/2012US20120288619 Electrostatic chuck, thin film deposition apparatus including the electrostatic chuck, and method of manufacturing organic light emitting display apparatus by using the thin film deposition apparatus
11/15/2012US20120287499 Film mirror, method for producing same, and sunlight reflecting mirror
11/15/2012US20120286152 Ion source with surface coating
11/15/2012US20120285623 Plasma processing apparatus and method
11/15/2012US20120285619 Electrostatic chuck having a plurality of heater coils
11/15/2012US20120285382 Epitaxial growth apparatus and epitaxial growth method
11/15/2012US20120285381 Heating system for a vapor-phase deposition source
11/15/2012US20120285380 Constant volume closure valve for vapor phase deposition source
11/15/2012DE112010000869T5 Plasmaverarbeitungsvorrichtung Plasma processing apparatus
11/15/2012DE10327618B4 Verfahren zur Ausbildung von Aluminiummetallverdrahtungen Process for the formation of aluminum metal wirings
11/15/2012DE102009026249B4 Plasma unterstütztes Abscheideverfahren, Halbleitervorrichtung und Abscheidevorrichtung Plasma assisted deposition, semiconductor device and separator
11/14/2012EP2522760A2 Method of making coated cemented carbide
11/14/2012EP2521804A1 Inline coating installation
11/14/2012EP2521803A1 Method for depositing multi-layered layers and/or gradient layers
11/14/2012CN202530161U Graphite boat convenient to disassemble and assemble
11/14/2012CN202530160U Silicon carbide soft landing loading and unloading device
11/14/2012CN202530159U Chemical vapor deposition furnace gas preheater
11/14/2012CN202530157U Coiled material plasma treatment device with correcting function
11/14/2012CN202530151U Differential vacuum indoor substrate lifting mechanism
11/14/2012CN102782809A Epitaxial wafer, light-receiving element, optical sensor device, and method for manufacturing epitaxial wafer and light-receiving element
11/14/2012CN102782808A P-type AlGaN layer, method for producing same and group III nitride semiconductor light-emitting element
11/14/2012CN102782195A Semiconductor epitaxial substrate
11/14/2012CN102782186A Chromium -free passivation process of vapor deposited aluminum surfaces
11/14/2012CN102782184A Cleaning solvent and cleaning method for metallic compound
11/14/2012CN102782183A Method and apparatus for depositing nanostructured thin layers with controlled morphology and nanostructure
11/14/2012CN102781659A Layered product and process for producing same
11/14/2012CN102776540A Magnesium alloy surface treatment process
11/14/2012CN102776491A Film-forming device and film forming method
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