Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
12/2012
12/27/2012US20120329283 Multiple gas plasma forming method and icp source
12/27/2012US20120328882 Infusing a porous media with an active chemical agent vapor
12/27/2012US20120328798 Inter-low-permittivity layer insulating film, and method for forming inter-low-permittivity layer insulating film
12/27/2012US20120328780 Dual Section Module Having Shared and Unshared Mass Flow Controllers
12/27/2012US20120325777 Plasma processing apparatus and plasma processing method
12/27/2012US20120325773 Integrated process modulation for psg gapfill
12/27/2012US20120325649 Method of supporting a workpiece during physical vapour deposition
12/27/2012US20120325404 Plasma processing apparatus
12/27/2012US20120325151 Chemical vapor deposition flow inlet elements and methods
12/27/2012US20120325149 Gas distribution system
12/27/2012US20120325148 Method for Positioning Wafers in Multiple Wafer Transport
12/27/2012US20120325147 Method for depositing a polymer layer containing nanomaterial on a substrate material and apparatus
12/27/2012US20120325146 Plasma Processing Apparatus
12/27/2012US20120325145 Batch type processing apparatus
12/27/2012US20120325143 Mask frame assembly for thin-film deposition
12/27/2012US20120325087 Hydrogen selective protective coating, coated article and method
12/27/2012DE112004001102B4 Verfahren zur Steuerung der Planheit und der Elektronenbeweglichkeit von mit Diamant beschichtetem Silizium und dadurch gebildeten Strukturen Method for controlling the flatness and the electron mobility of silicon coated with diamond and structures formed thereby
12/27/2012DE102012200528A1 Modifying surface properties e.g. transmissivity of substrate, comprises depositing functional layer on surface of substrate, and treating entire surface of functional layer by laser beam such that property of functional layer is changed
12/27/2012DE102011077878A1 Polymeres Substratmaterial für physikalische und chemische Vapor Deposition-Prozesse, eine haftvermittelnde polymere Schicht enthaltend, und dessen Verwendung zur Herstellung von Konzentratoren solarer Strahlung Polymeric substrate material for physical and chemical vapor deposition processes, an adhesion-promoting polymeric layer containing, and the use thereof for the production of solar radiation concentrators
12/27/2012DE102011051261A1 Verfahren und Vorrichtung zum Abscheiden von OLEDs insbesondere Verdampfungsvorrichtung dazu Method and apparatus for depositing OLEDs in particular evaporation apparatus to
12/27/2012DE102011051260A1 Verfahren und Vorrichtung zum Abscheiden von OLEDs Method and apparatus for depositing OLEDs
12/27/2012DE102011051226A1 Plasma-assisted deposition for depositing dielectric layer on silicon-containing substrate, useful for manufacturing a solar cell, comprises e.g. supplying a gas, monitoring an emission intensity of gas, and controlling a process parameter
12/27/2012DE10124609B4 Verfahren zum Abscheiden aktiver Schichten auf Substraten A method for depositing active layers on substrates
12/26/2012EP2538458A2 Methods of making absorber layers for photovoltaic devices and photovoltaic devices
12/26/2012EP2538435A1 Epitaxial substrate and method for producing same
12/26/2012EP2538434A1 Epitaxial substrate and method for producing same
12/26/2012EP2537956A1 Thin film manufacturing apparatus, thin film manufacturing method, and method for maintaining thin film manufacturing apparatus
12/26/2012EP2537802A2 Electrode and method for supplying current to a reactor
12/26/2012EP2536869A1 Constant volume closure valve for vapor phase deposition source
12/26/2012EP2536868A1 Heating system for a vapor-phase deposition source
12/26/2012EP2536867A2 VAPOR DEPOSITION METHODS OF SiCOH LOW-K FILMS
12/26/2012EP2536866A1 Continuous patterned layer deposition
12/26/2012EP2536865A1 Coating device, and method for operating a coating device with a shielding plate
12/26/2012CN202626288U Plasma enhanced chemical vapor deposition (PECVD) system configuration for heterojunction solar cell
12/26/2012CN202626287U Graphite plate and reaction chamber with same
12/26/2012CN202626286U Water-cooled furnace bottom structure of pit-type heating furnace
12/26/2012CN202626285U Equipment for preparing two-dimensional nano-film
12/26/2012CN202626284U Thin film deposition equipment
12/26/2012CN202626282U Workpiece support frame used for vacuum coating equipment
12/26/2012CN202626281U Laminated vacuum plating clamp
12/26/2012CN102845137A Methods and apparatus for induction coil arrangement in plasma processing system
12/26/2012CN102844892A New intrinsic absorber layer for photovoltaic cells
12/26/2012CN102844854A Multifunctional heater/chiller pedestal for wide range wafer temperature control
12/26/2012CN102844474A Epitaxial silicon carbide single-crystal substrate and method for producing the same
12/26/2012CN102844464A Surface treatment apparatus
12/26/2012CN102844463A Coating method and apparatus
12/26/2012CN102844462A Coating for a cocrmo substrate
12/26/2012CN102844461A Process for internally coating functional layers with through-hardened material
12/26/2012CN102842637A Substrate treatment device and substrate treatment method
12/26/2012CN102842636A Substrate heating base used for chemical vapor deposition system
12/26/2012CN102839362A Substrate treatment apparatus
12/26/2012CN102839361A Chemical vapor deposition furnace
12/26/2012CN102839360A Batch type processing apparatus
12/26/2012CN102839359A Miniature experimental facility for low-pressure chemical vapor phase deposition
12/26/2012CN102839358A Hot purging structure of metal organic chemical vapor deposition device
12/26/2012CN102127751B Boron-doped diamond micro-nano material with columnar array structure and preparation method thereof
12/26/2012CN102017096B 成膜装置 Film forming apparatus
12/26/2012CN101978472B Nanofilm protective and release matrices
12/26/2012CN101900108B Sliding member for compressor
12/26/2012CN101899651B Amino vinylsilane precursors for the stressed SiN films
12/26/2012CN101880867B Plasma enhanced chemical vapor deposition device
12/26/2012CN101876066B Method and device for configuring number of carrying plates of production line device
12/26/2012CN101660142B Film deposition apparatus and a film deposition method
12/26/2012CN101595244B Vapor deposition methods for forming a metal- containing layer on a substrate
12/26/2012CN101591763B Insulating type multifunctional ion chemical heat treatment device
12/26/2012CN101521143B Lining mechanism for semiconductor processing equipment and manufacturing method thereof
12/26/2012CN101443474B Method and apparatus for improving uniformity of large-area substrates
12/26/2012CN101442003B Organosilane-containing material for insulation film, method for producing the same, and semiconductor device
12/26/2012CN101350294B System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy
12/25/2012US8337960 Seasoning method for film-forming apparatus
12/25/2012US8337959 Mold is disposed in an evacuable chamber, cleaned to remove surface organic contamination and coated with the surface release layer in a chamber, all without relocation or undesired time delay; imprint lithography
12/25/2012US8337952 Metal sulfide thin film and method for production thereof
12/25/2012US8337951 Superhydrophobic surface and method of forming same using high-aspect ratio nano-texture
12/25/2012US8337950 Method for depositing boron-rich films for lithographic mask applications
12/25/2012US8337945 Method for producing an element, including a multiplicity of nanocylinders on a substrate
12/25/2012US8337662 Plasma confinement rings including RF absorbing material for reducing polymer deposition
12/25/2012US8337661 Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of an unmatched low power RF generator
12/25/2012US8337660 Capacitively coupled plasma reactor having very agile wafer temperature control
12/25/2012US8337622 Manufacturing apparatus and method for semiconductor device
12/25/2012US8337620 Crucible having a monitor system and a cover with a slot which receives light for illuminating coating material
12/25/2012US8337619 Polymeric coating of substrate processing system components for contamination control
12/25/2012US8337141 Rotary nanotube bearing structure and methods for manufacturing and using the same
12/25/2012US8336490 Plasma processing apparatus
12/25/2012US8336489 Thermal evaporation apparatus, use and method of depositing a material
12/25/2012US8336488 Multi-station plasma reactor with multiple plasma regions
12/25/2012US8336487 Film forming apparatus
12/22/2012CA2778082A1 Electrode and method for supplying current to a reactor
12/20/2012WO2012174207A2 Chemical vapor infiltration apparatus and process
12/20/2012WO2012173931A1 Process gas diffuser assembly for vapor deposition system
12/20/2012WO2012173912A1 Germanium containing coating for inner surfaces of cylinder liners
12/20/2012WO2012173692A1 Cvd mask alignment for oled processing
12/20/2012WO2012173276A1 Hard-film-covered member covered by hard film, and method for manufacturing same
12/20/2012WO2012173067A1 Semiconductor device manufacturing method, semiconductor device, semiconductor device manufacturing apparatus, and storage medium
12/20/2012WO2012172920A1 Substrate support apparatus and vapour-phase deposition apparatus
12/20/2012WO2012172505A1 Solar selective absorber based on double nitride composite material and process for its preparation
12/20/2012WO2012172304A1 Method and device for manufacturing a barrier layer on a flexible substrate
12/20/2012WO2012171975A1 Methods and systems for controlling silicon rod temperature
12/20/2012WO2012171661A1 Method for the plasma treatment of workpieces and workpiece with a gas barrier layer
12/20/2012WO2012171354A1 Exhausting method, exhausting apparatus and substrate processing device
12/20/2012WO2012124913A3 Noble group iv-b organometallic compound, and method for preparing same
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