| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 01/03/2013 | US20130001330 Deposition nozzle and apparatus for thin film deposition process |
| 01/03/2013 | US20130001196 Projected Plasma Source |
| 01/03/2013 | US20130000961 Crystallographically-oriented carbon nanotubes grown on few-layer graphene films |
| 01/03/2013 | US20130000847 Plasma processing apparatus |
| 01/03/2013 | US20130000558 Deposition device |
| 01/03/2013 | US20130000557 Apparatus for the Efficient Coating of Subtrates Including Plasma Cleaning |
| 01/03/2013 | US20130000555 Modular system and process for continuous deposition of a thin film layer on a substrate |
| 01/03/2013 | DE112011100870T5 Beschichteter keramischer Schneideeinsatz und Verfahren zur Herstellung desselben Thereof coated ceramic cutting insert and methods for making |
| 01/03/2013 | DE102012010603A1 Coated sealing product useful for sealing a device in presence of a lubricant, comprises an elastomeric base body, which is partially provided with a coating |
| 01/03/2013 | CA2840254A1 Jet-spouted bed reactor having a specific profile |
| 01/02/2013 | EP2540877A1 Single crystal diamond movable structure and manufacturing method thereof |
| 01/02/2013 | EP2540864A1 Inspection of a component comprising a cladding layer bonded to a substrate |
| 01/02/2013 | EP2540863A1 Cvd processing method and cvd device using said method |
| 01/02/2013 | EP2540862A1 Carbon film laminate |
| 01/02/2013 | EP2540861A1 Method of forming high-k dielectric films based on novel zirconium, and hafnium precursors and their use for semiconductor manufacturing |
| 01/02/2013 | EP2540733A1 Deposition of indium containing thin films using new indium precursors |
| 01/02/2013 | EP2540732A1 Deposition of gallium containing thin films using new gallium precursors. |
| 01/02/2013 | EP2540731A1 Volatile group 2 metal precursors |
| 01/02/2013 | EP2539921A1 Apparatus and method for reactive ion etching |
| 01/02/2013 | EP2539488A1 Chromium -free passivation process of vapor deposited aluminum surfaces |
| 01/02/2013 | EP2539485A2 Fluidized bed pyrocarbon coating |
| 01/02/2013 | EP2539484A1 Method and device for layer deposition |
| 01/02/2013 | EP2539483A1 Method and device for rapidly heating and cooling a substrate and immediately subsequently coating the same under vacuum |
| 01/02/2013 | EP2539479A1 Devices and method for precipitating a layer on a substrate |
| 01/02/2013 | CN202643920U Gas diffusion homogenizing device and plasma process equipment by using gas diffusion homogenizing device |
| 01/02/2013 | CN202643841U Radio-frequency electrode of vacuum coating machine |
| 01/02/2013 | CN202643840U Substrate for solar panel-type plasma enhanced chemical vapor deposition (PECVD) equipment |
| 01/02/2013 | CN202643839U Plasma chemical vapor deposition (CVD) system for heterojunction solar cells |
| 01/02/2013 | CN202643838U Integral vacuum cavity structure suitable for plasma reinforcement chemical vapor deposition process equipment |
| 01/02/2013 | CN202643837U Silicon nitride film preparation device |
| 01/02/2013 | CN202643836U Large area deposition diamond film hot wire support |
| 01/02/2013 | CN102859679A Wafer carrier with sloped edge |
| 01/02/2013 | CN102859657A Heat treating apparatus |
| 01/02/2013 | CN102859654A Silicon carbide epitaxial wafer and process for production thereof, silicon carbide bulk substrate for epitaxial growth purposes and process for production thereof, and heat treatment apparatus |
| 01/02/2013 | CN102859647A Apparatus and method for reactive ion etching |
| 01/02/2013 | CN102859034A Vertical inline CVD system |
| 01/02/2013 | CN102859033A A coating method for gas delivery system |
| 01/02/2013 | CN102859032A Carbon film laminate |
| 01/02/2013 | CN102859031A Vacuum processing device, method for moving substrate and alignment mask, alignment method, and film forming method |
| 01/02/2013 | CN102859030A Coating device, and method for operating a coating device with a shielding plate |
| 01/02/2013 | CN102858483A Surface-coated cutting tool and method for manufacturing same |
| 01/02/2013 | CN102858077A Plasma cleaning equipment in two-sided turnover door structure |
| 01/02/2013 | CN102851653A Large area film deposition apparatus |
| 01/02/2013 | CN102851652A Heater for MOCVD (metal-organic chemical vapor deposition) equipment |
| 01/02/2013 | CN102851651A Chemical vapor deposition device and chemical vapor deposition method |
| 01/02/2013 | CN102851650A Deposition nozzle and apparatus for thin film deposition process |
| 01/02/2013 | CN102851649A Method for in-situ cleaning MOCVD (metal organic chemical vapor deposition) reaction chamber |
| 01/02/2013 | CN102851648A Apparatus for atomic layer deposition, sealing method and nozzle set for deposition |
| 01/02/2013 | CN102851647A Integration of bottom-up metal film deposition |
| 01/02/2013 | CN102851638A Mask assembly and mask frame assembly using the same |
| 01/02/2013 | CN102211184B Method for preparing tin nanometer rod completely covered by carbon nanometer tube |
| 01/02/2013 | CN102140627B Preparation method of planarized coating layer for diamond with ultra-large-aperture inner holes |
| 01/02/2013 | CN101916740B In-situ dry clean chamber for front end of line fabrication |
| 01/02/2013 | CN101821040B Edge replacement-type cutting chip |
| 01/02/2013 | CN101680088B Method and apparatus for production of metal oxide thin film |
| 01/02/2013 | CN101652502B Cutting insert having ceramic coating |
| 01/02/2013 | CN101578388B Film deposition of amorphous films with a graded bandgap by electron cyclotron resonance |
| 01/02/2013 | CN101568666B Metal gas supply apparatus and remaining gas removal apparatus used for thin film depositing apparatus and method thereof |
| 01/02/2013 | CN101252087B SiCN film formation method and apparatus |
| 01/02/2013 | CN101050522B Method for forming tetragonal zirconium oxide layer and method for fabricating capacitor having the same |
| 01/02/2013 | CN101005029B Film formation method and apparatus for semiconductor process |
| 01/01/2013 | US8344417 Gallium nitride semiconductor structures with compositionally-graded transition layer |
| 01/01/2013 | US8343881 Silicon dioxide layer deposited with BDEAS |
| 01/01/2013 | US8343593 Method of coating inner and outer surfaces of pipes for thermal solar and other applications |
| 01/01/2013 | US8343592 Asymmetrical RF drive for electrode of plasma chamber |
| 01/01/2013 | US8343591 Method for use with a coating process |
| 01/01/2013 | US8343589 Methods for making environmental barrier coatings and ceramic components having CMAS mitigation capability |
| 01/01/2013 | US8343583 Method for vaporizing non-gaseous precursor in a fluidized bed |
| 01/01/2013 | US8343582 Process for deposition of non-oxide ceramic coatings |
| 01/01/2013 | US8343581 Synthesis of pure nanotubes from nanotubes |
| 01/01/2013 | US8343580 Organometallic compounds |
| 01/01/2013 | US8343437 Monitoring system based on etching of metals |
| 01/01/2013 | US8343309 Substrate processing apparatus |
| 01/01/2013 | US8343308 Ceiling plate and plasma process apparatus |
| 01/01/2013 | US8343307 Showerhead assembly |
| 01/01/2013 | US8343306 Plasma processing apparatus and method of plasma distribution correction |
| 01/01/2013 | US8343305 Method and apparatus for diagnosing status of parts in real time in plasma processing equipment |
| 01/01/2013 | US8343281 Source gas supply unit, and deposition apparatus and method using the same |
| 01/01/2013 | US8343280 Multi-zone substrate temperature control system and method of operating |
| 01/01/2013 | US8343279 Apparatuses for atomic layer deposition |
| 01/01/2013 | US8343278 Mask assembly and deposition and apparatus for a flat panel display using the same |
| 01/01/2013 | US8343277 Substrate processing apparatus |
| 01/01/2013 | US8342121 Plasma processing apparatus |
| 01/01/2013 | US8342119 Self aligning non contact shadow ring process kit |
| 12/27/2012 | WO2012176990A1 Anti-fingerprint and anti-reflection coating method and apparatus |
| 12/27/2012 | WO2012176989A1 A diamine compound or its salt, preparing method of the same, and uses of the same |
| 12/27/2012 | WO2012176988A1 Organometallic compound, preparing method of the same, and preparing method of thin film using the same |
| 12/27/2012 | WO2012176899A1 Method for manufacturing substrate with transparent conductive oxide film |
| 12/27/2012 | WO2012176850A1 Laminated film and electronic device |
| 12/27/2012 | WO2012176824A1 Method for inspecting laminated film and method for producing laminated film |
| 12/27/2012 | WO2012176607A1 Method of manufacturing multilayer body, method of processing substrate, and multilayer body |
| 12/27/2012 | WO2012176467A1 Glass sheet with transparent conductive membrane and manufacturing method therefor |
| 12/27/2012 | WO2012176242A1 Plasma processing device |
| 12/27/2012 | WO2012175334A2 Method and device for depositing oleds, in particular evaporation device therefor |
| 12/27/2012 | WO2012175331A1 Method for processing substrates and device therefor |
| 12/27/2012 | WO2012175315A1 Device for generating aerosol and depositing a light-emitting layer |
| 12/27/2012 | WO2012175289A1 Polymeric substrate material for physical and chemical vapor deposition processes, containing an adhesion-promoting polymeric layer, and the use thereof for producing concentrators of solar radiation |
| 12/27/2012 | WO2012175147A1 Method for producing a coating on an extrusion die |
| 12/27/2012 | WO2012174890A1 Plasma microwave cavity |
| 12/27/2012 | US20120329286 Semiconductor device manufacturing method, substrate processing method, substrate processing apparatus and recording medium |