Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
01/2013
01/24/2013WO2013011297A1 Method
01/24/2013WO2013010864A2 Device and method for determining the vapour pressure of a starting substance vaporized in a carrier gas stream
01/24/2013WO2012167060A3 Compositions and processes for depositing carbon-doped silicon-containing films
01/24/2013US20130023670 Heteroleptic Pyrrolecarbaldimine Precursors
01/24/2013US20130023669 Heteroleptic Pyrrolecarbaldimine Precursors
01/24/2013US20130023172 Textile including fibers deposited with material using atomic layer deposition for increased rigidity and strength
01/24/2013US20130023129 Pressure transmitter for a semiconductor processing environment
01/24/2013US20130023110 Method and apparatus for forming amorphous silicon film
01/24/2013US20130023062 Thin film manufacturing apparatus, thin film manufacturing method and method for manufacturing semiconductor device
01/24/2013US20130022995 Metal nanowire including gold nanoclusters on a surface thereof for binding target material and method of binding the target material to the metal nanowire
01/24/2013US20130022813 Method for preparing graphene nanoribbon on insulating substrate
01/24/2013US20130022761 Organic Silver Complexes, Their Preparation Methods and Their Methods for Forming Thin Layers
01/24/2013US20130022760 Plasma nitriding method
01/24/2013US20130022759 Plasma processing method and apparatus
01/24/2013US20130022752 Methods for treating a surface of a substrate by atmospheric plasma processing
01/24/2013US20130022745 Silane blend for thin film vapor deposition
01/24/2013US20130022744 Method of forming noble metal layer using ozone reaction gas
01/24/2013US20130022743 Vapor growth apparatus and vapor growth method
01/24/2013US20130022658 Depositing material with antimicrobial properties on permeable substrate using atomic layer deposition
01/24/2013US20130020711 Interconnect Pillars with Directed Compliance Geometry
01/24/2013US20130020281 Nanoimprinting method, method for producing a droplet arrangement pattern, and method for fabricating substrates
01/24/2013US20130019953 System and method for depositing a material on a substrate
01/24/2013US20130019863 Method of manufacturing a medicament dispenser device
01/24/2013US20130019805 Deposition source and deposition apparatus including the same
01/24/2013US20130019803 Methods and apparatus for the deposition of materials on a substrate
01/24/2013US20130019802 Nozzle arrangement and cvd-reactor
01/24/2013US20130019801 Film deposition apparatus and substrate processing apparatus
01/24/2013DE112011100871T5 Beschichteter PcBN-Schneideinsatz, diesen beschichteten PcBN-Schneideinsatz verwendendes beschichtetes PcBN-Schneidwerkzeug und Verfahren zur ihrer Herstelllung PcBN coated cutting insert, these coated PCBN cutting insert-use coated PCBN cutting tool and process for their Manufacture
01/24/2013DE102012205604A1 Selbstschmierende struktur und verfahren zur herstellung derselben Self-lubricating structure and method of producing same
01/24/2013DE102012106146A1 Verfahren zur chemischen Gasphasenabscheidung und Verfahren zur Herstellung lichtabgebender Vorrichtungen, das dieses nutzt A process for chemical vapor deposition and methods of preparing lichtabgebender devices that uses this
01/24/2013DE102011079327A1 Turbinenschaufel aus Faserverbundwerkstoff Turbine blade made of fiber composite material
01/24/2013DE102011051931A1 Vorrichtung und Verfahren zum Bestimmen des Dampfdrucks eines in einem Trägergasstrom verdampften Ausgangsstoffes Apparatus and method for determining the vapor pressure of a vaporized in a carrier gas stream starting material
01/23/2013EP2549840A1 Plasma processing device, plasma processing method, and method for manufacturing a semiconductor element
01/23/2013EP2549527A1 Deposition method
01/23/2013EP2549524A1 Thin-film forming device
01/23/2013EP2549522A1 Semiconductor thin-film manufacturing method, seminconductor thin-film manufacturing apparatus, susceptor, and susceptor holding tool
01/23/2013EP2548995A1 Manufacturing method for transparent conductive carbon film, and transparent conductive carbon film
01/23/2013EP2547806A1 A palette system for thin film deposition facilities for collecting and recovering deposited materials
01/23/2013EP2547624A2 System and method for polycrystalline silicon deposition
01/23/2013CN202695519U Equipment for preparing vertical GaN (gallium nitride) based LED (light emitting-diode) chip by using metal substrate
01/23/2013CN202695373U Cam-locked showerhead electrode and assembly thereof
01/23/2013CN202689775U Door hinge positioning device for coating machine
01/23/2013CN202688448U PECVD (plasma enhanced chemical vapor deposition) equipment with automatic control system for heat exhaust fan
01/23/2013CN202688447U Heat exchange sleeve
01/23/2013CN202688446U Plate type PECVD (plasma enhanced chemical vapor deposition) heating carrying plate
01/23/2013CN202688445U Metal organic compound chemical vapor deposition heater
01/23/2013CN202688444U Graphite boat
01/23/2013CN202688443U Convenient and fast graphite boat
01/23/2013CN202688442U Easily-inserted graphite boat
01/23/2013CN202688441U Novel graphite boat
01/23/2013CN202688440U Efficient graphite boat
01/23/2013CN202688439U Conveying system for gas pipeline
01/23/2013CN202688438U Special gas tank for plasma enhanced chemical vapor deposition (PECVD) coating equipment
01/23/2013CN202688437U Special gas pipeline and hot-line plasma enhanced chemical vapor deposition equipment with same
01/23/2013CN202688436U Detachable special gas hole
01/23/2013CN202688435U Gas distributing device for metal organic chemical gas phase deposition reaction device and reaction device
01/23/2013CN202688434U Guide rail of plasma enhanced chemical vapor deposition (PECVD) carrier plate
01/23/2013CN202688433U Equipment for coating crystalline silicon solar cells
01/23/2013CN202688432U Crystalline silicon solar battery two-layer coating equipment
01/23/2013CN202688426U Chip shelling resistant lower film coating blocking sheet
01/23/2013CN102892922A Method and apparatus for remote plasma source assisted silicon-containing film deposition
01/23/2013CN102892921A A method for producing a deposit and a deposit on a surface of a silicon substrate
01/23/2013CN102892920A Method of processing multilayer film
01/23/2013CN102892919A Manufacturing method for transparent conductive carbon film, and transparent conductive carbon film
01/23/2013CN102892706A Method for fixation onto layer comprising amorphous carbon film, and laminate
01/23/2013CN102891077A Method for preparing high k-gate dielectrics on surface of graphene by utilizing water-based atomic layer deposition technology
01/23/2013CN102891073A Preparation method of low-temperature plasma auxiliary aluminum induced polycrystalline silicon carbide film
01/23/2013CN102888596A Chamber device and plasma treatment equipment provided with same
01/23/2013CN102888595A Film deposition apparatus and substrate processing apparatus
01/23/2013CN102888594A Chemical vapor deposition method and method of manufacturing light-emitting device
01/23/2013CN102888593A Device for coating pyrolytic carbon on graphite sphere surface and gas-phase carbon depositing method
01/23/2013CN102888592A Guide roller supporting device of film plating machine
01/23/2013CN101909819B Method for manufacturing an extremely hydrophobic surface
01/23/2013CN101905126B Method and apparatus to help promote contact of gas with vaporized material
01/23/2013CN101899653B Flange for transmitting process gas
01/23/2013CN101842514B Method and apparatus for sealing an opening of a processing chamber
01/23/2013CN101813236B Gas transmission device and transmission method
01/23/2013CN101701333B Rectangular chemical vapour deposition reactor
01/23/2013CN101665927B Film deposition apparatus, substrate processor, film deposition method
01/23/2013CN101473061B Apparatuses, systems and methods for rapid cleaning of plasma confinement rings with minimal erosion of other chamber parts
01/23/2013CN101139092B Method for preparing nanometer carbon tube on the aluminum foil
01/22/2013US8357815 Metal compound, material for chemical vapor phase growth, and process for forming metal-containing thin film
01/22/2013US8357614 Ruthenium-containing precursors for CVD and ALD
01/22/2013US8357435 Flowable dielectric equipment and processes
01/22/2013US8357430 Chemical vapor deposition of gaseous trisilylamine and gaseous ammonia, mono, di or tri carbylamino compounds; relatively low temperatures and relatively high growth rates
01/22/2013US8357429 Methods for forming articles having apertures and articles having substantially reduced residual compressive stress
01/22/2013US8357425 Process of making a coated substrate by crosslinking nanoparticles
01/22/2013US8357265 Cleaning method and a vacuum processing apparatus
01/22/2013US8357264 Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power RF generator
01/22/2013US8357262 Corrosion-resistant member, treatment apparatus and sample treatment method using the member, and method for manufacture of corrosion-resistant member
01/22/2013US8357241 Method of organic material vacuum evaporation and apparatus thereof
01/22/2013US8356575 Ion source and plasma processing apparatus
01/22/2013US8356572 Clamping unit for depositing thin film solar cell and signal feed-in method
01/22/2013US8356571 Applicator and application method for applying a sealant to a flanged seam
01/22/2013CA2577151C Focusing nozzle
01/22/2013CA2445996C Method of making fluid diffusion layers and electrodes having reduced surface roughness
01/18/2013CA2783266A1 Metal dusting protection for welded pipe assemblies
01/17/2013WO2013009913A2 Mixed metal oxide barrier films and atomic layer deposition method for making mixed metal oxide barrier films
01/17/2013WO2013009794A1 Methods of dechucking and system thereof
01/17/2013WO2013009184A1 Floating substrate monitoring and control device, and method for the same
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