Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
01/2013
01/31/2013WO2013016369A1 Apcvd of doped titanium oxide and the coated article made thereby
01/31/2013WO2013016319A1 Methods for reducing nitrogen oxides emissions
01/31/2013WO2013016266A1 Methods and apparatus for deposition processes
01/31/2013WO2013016237A2 Heteroleptic pyrrolecarbaldimine precursors
01/31/2013WO2013016229A2 Heteroleptic pyrrolecarbaldimine precursors
01/31/2013WO2013015943A1 Textile including fibers deposited with material using atomic layer deposition for increased rigidity and strength
01/31/2013WO2013015417A1 Laminate, gas barrier film, production method for laminate, and laminate production device
01/31/2013WO2013015412A1 Laminated body, gas barrier film, and method for producing laminated body and gas barrier film
01/31/2013WO2013015281A1 Shower head apparatus and film forming apparatus
01/31/2013WO2013015280A1 Plasma device and method for producing carbon thin film using same
01/31/2013WO2013014248A1 Quick closure for reactors and converter
01/31/2013WO2013013588A1 Chamber device and plasma processing apparatus having same
01/31/2013WO2013013362A1 Method for eliminating bridging in contact hole process
01/31/2013US20130030361 Coated medical implant
01/31/2013US20130030191 Group IV Metal Complexes For Metal-Containing Film Deposition
01/31/2013US20130029138 Grafted polymer coatings
01/31/2013US20130029123 Tin oxide deposited by linear plasma enhanced chemical vapor deposition
01/31/2013US20130029096 Coated article and method for making same
01/31/2013US20130029095 Coated article and method for making same
01/31/2013US20130029094 Coated article and method for making same
01/31/2013US20130029061 Electron beam plasma chamber
01/31/2013US20130029043 Maskant free diffusion coating process
01/31/2013US20130029042 Atomic Layer Deposition Apparatus And Loading Methods
01/31/2013US20130028829 System and method for growth of enhanced adhesion carbon nanotubes on substrates
01/31/2013US20130027698 Self-arranging, luminescence-enhancement device for surface-enhanced luminescence
01/31/2013US20130026137 Device and method for generating a pulsed anisothermal atmospheric pressure plasma
01/31/2013US20130026135 Apparatuses, systems and methods for treating substrate
01/31/2013US20130026028 Bromine-sensitized solar photolysis of carbon dioxide
01/31/2013US20130025918 Crystallographically-oriented carbon nanotubes grown on few-layer graphene films
01/31/2013US20130025790 Plasma processing apparatus and plasma processing method
01/31/2013US20130025787 Baffle and substrate treating apparatuses including the same
01/31/2013US20130025537 Processing condition inspection and optimization method of damage recovery process, damage recovering system and storage medium
01/31/2013US20130025536 Apparatus for precursor delivery system for irradiation beam instruments
01/31/2013DE102011052306A1 Verfahren zur Erzeugung einer permeationshemmenden Beschichtung von Kunststoffbehältern und Beschichtungsanlage Method for producing a permeationshemmenden coating of plastic containers and coating plant
01/31/2013DE102009042103B4 Verfahren zur Behandlung einer Oberfläche A method for treating a surface
01/30/2013EP2551374A1 Method for generating a permeation-restricting coating on plastic containers and coating device
01/30/2013EP2551370A1 Maskant free diffusion coating process
01/30/2013EP2550378A1 Hydrogen selective protective coating, coated article and method
01/30/2013CN202713783U Ultra-high heat conducting metal base circuit board
01/30/2013CN202705471U Idler wheel outer cover convenient to clean
01/30/2013CN202705470U Chemical vapor deposition equipment
01/30/2013CN202705469U Double-glow chemical vapor deposition device
01/30/2013CN202705468U Film-coating pendant special for flat plate type PECVD (Plasma Enhanced Chemical Vapor Deposition)
01/30/2013CN202705467U Boat auxiliary device and atomic layer deposition system
01/30/2013CN202705466U Hanging device for chemical vapor deposition processing
01/30/2013CN202705465U CVI (Chemical Vapor Infiltration) compaction device based on carbon/carbon reducing tubular products
01/30/2013CN202705464U Air regulation device
01/30/2013CN202705463U Device special for amorphous silicon film uniform deposition of solar cell panel
01/30/2013CN202705462U Chemical vapor deposition equipment
01/30/2013CN202705461U Graphite disk and irregular-shaped lining
01/30/2013CN102906865A Inter-low-permittivity layer insulating film, and method for forming inter-low-permittivity layer insulating film
01/30/2013CN102906305A Gas and liquid injection methods and apparatus
01/30/2013CN102906304A Silicon dioxide layer deposited with BDEAS
01/30/2013CN102903785A Method for improving solar cell sheet conversion efficiency by adopting hydrogenation passivation
01/30/2013CN102903764A Three-layered silicon nitride antireflective film of crystalline silicon solar cell and preparation method thereof
01/30/2013CN102903653A Unloading device and unloading method for high-temperature grown wafer
01/30/2013CN102903616A ZnO substrate-based graphene CVD direct epitaxial growth method and manufactured device
01/30/2013CN102899719A Thin-film deposition system
01/30/2013CN102899639A Novel special hook of C/C support plate for PECVD (Plasma Enhanced Chemical Vapor Deposition) device
01/30/2013CN102899638A Gas spray head device for photo-assisted metal metallorganics chemical vapor deposition
01/30/2013CN102899637A Vapour delivery system
01/30/2013CN102899636A Method for cleaning metal-organic chemical vapor deposition (MOCV) reaction chamber in situ
01/30/2013CN102899635A Method for cleaning metal-organic chemical vapor deposition (MOCV) reaction chamber in situ
01/30/2013CN102899634A Hole type nitrogen-indium-gallium p-InxGa1-xN film and preparation thereof
01/30/2013CN102899633A Preparation method of selective emitter battery mask
01/30/2013CN102899631A Annealing system and method for ITO film in roll to roll
01/30/2013CN102304700B Preparation method of nitrogen-doped zinc oxide film
01/30/2013CN102181941B Method for preparing textured surface of polycrystalline silicon
01/30/2013CN101985742B Gas ejection unit for chemical vapor deposition device
01/30/2013CN101864553B Integrated manufacturing method of microminiature parts based on surface coating
01/30/2013CN101830089B Wear-resistant membrane structure, die and manufacturing method thereof
01/30/2013CN101775592B Direct-current plasma CVD apparatus and method for producing diamond using the same
01/30/2013CN101483146B Bonding structure and semiconductor device manufacturing apparatus
01/29/2013US8364422 Method of presuming interior situation of process chamber and storage medium
01/29/2013US8362576 Transistor with reduced depletion field width
01/29/2013US8362521 III nitride semiconductor crystal, III nitride semiconductor device, and light emitting device
01/29/2013US8361639 Coating, article coated with coating, and method for manufacturing article
01/29/2013US8361566 Method of fabrication of fibers, textiles and composite materials
01/29/2013US8361551 Methods forming high dielectric target layer
01/29/2013US8361550 Method for forming SrTiO3 film and storage medium
01/29/2013US8361549 Power loading substrates to reduce particle contamination
01/29/2013US8361548 Method for efficient coating of substrates including plasma cleaning and dehydration
01/29/2013US8361535 Latent print development apparatus
01/29/2013US8361276 Large area, atmospheric pressure plasma for downstream processing
01/29/2013US8361274 Etching apparatus and etching method
01/29/2013US8361234 Substrate treatment apparatus
01/29/2013US8361232 Vapor deposition apparatus and process for continuous indirect deposition of a thin film layer on a substrate
01/29/2013US8361231 Liquid vaporization system
01/29/2013US8361230 Magnetic mask holder
01/29/2013US8361229 Seal configuration for a system for continuous deposition of a thin film layer on a substrate
01/29/2013US8360003 Plasma reactor with uniform process rate distribution by improved RF ground return path
01/29/2013US8360002 In-situ flux measurement devices, methods, and systems
01/29/2013US8360001 Process for deposition of semiconductor films
01/29/2013US8359999 Film forming device
01/28/2013DE202009018759U1 Beschichtungsanlage Coating machine
01/24/2013WO2013012693A1 Dual phase cleaning chambers and assemblies comprising the same
01/24/2013WO2013012210A2 Tray for loading substrates
01/24/2013WO2013011974A1 Method for producing substrate with metal body
01/24/2013WO2013011923A1 Sic epitaxial wafer and method for producing same, and device for producing sic epitaxial wafer
01/24/2013WO2013011784A1 Metal with diamond-like carbon film, and method for forming diamond-like carbon film
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