Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
02/2013
02/13/2013CN102922815A Water-cooled flat plate layered CuCrZr/OFHC-Cu/CVD-W plasma-facing part and manufacturing method thereof
02/13/2013CN102345134B Preparation method for wettability controllable porous structure of titanium and titanium alloy surface
02/13/2013CN102286743B Steel-based mosaic diamond coating and preparation method thereof
02/13/2013CN102242336B Film preparation method for reducing stress of hard film
02/13/2013CN101999173B Apparatus for manufacturing thin film solar cell
02/13/2013CN101809197B Film forming apparatus
02/13/2013CN101809187B Organosiloxane materials for selective area deposition of inorganic materials
02/13/2013CN101802259B Device for very high frequency plasma assisted CVD under atmospheric pressure, and applications thereof
02/13/2013CN101088150B Tensile and compressive stressed materials for semiconductors
02/12/2013US8372483 Methods for forming thin films comprising tellurium
02/12/2013US8372482 Methods and apparatus for controlled chemical vapor deposition
02/12/2013US8372481 Methods of forming material on a substrate, and a method of forming a field effect transistor gate oxide on a substrate
02/12/2013US8372239 Plasma processing apparatus
02/12/2013US8372238 Multiple-electrode plasma processing systems with confined process chambers and interior-bussed electrical connections with the electrodes
02/12/2013US8372205 Reducing electrostatic charge by roughening the susceptor
02/12/2013US8372204 Susceptor for MOCVD reactor
02/12/2013US8372203 Apparatus temperature control and pattern compensation
02/12/2013US8372202 Film deposition apparatus
02/12/2013US8372201 High temperature ALD inlet manifold
02/12/2013US8372200 Shower plate, method for manufacturing the shower plate, plasma processing apparatus using the shower plate, plasma processing method and electronic device manufacturing method
02/07/2013WO2013019041A2 Method for manufacturing solid electrolyte thin film and manufacturing device thereof
02/07/2013WO2013018998A1 Plasma generation apparatus and plasma generation method
02/07/2013WO2013018577A1 Organic ruthenium compound for chemical vapor deposition raw material and production method for said organic ruthenium compound
02/07/2013WO2013018483A1 Method and apparatus for manufacturing substrate provided with thin film
02/07/2013WO2013018413A1 Alkoxide compound and raw material for forming thin film
02/07/2013WO2013018366A1 Nbon film, method for producing nbon film, hydrogen generation device, and energy system provided with same
02/07/2013WO2013018319A1 Plasma cvd device
02/07/2013WO2013018292A1 Film formation method
02/07/2013WO2013018265A1 Feedstock gasification and supply device
02/07/2013WO2013017514A1 Device and method for producing thin films
02/07/2013WO2013017495A1 Tool and process for treating an object by plasma generators
02/07/2013WO2013016950A1 Electric contact and method for preparing thereof
02/07/2013WO2011046191A9 Jig for semiconductor production and method for producing same
02/07/2013US20130034669 Methods of making cell carrier
02/07/2013US20130034668 Method for Producing Plasma Flow, Method for Plasma Processing, Apparatus for Producing Plasma, and Apparatus for Plasma Processing
02/07/2013US20130034667 Inorganic nanocoating primed organic film
02/07/2013US20130034666 Inductive plasma sources for wafer processing and chamber cleaning
02/07/2013US20130034663 Methods and systems relating to light sources for use in industrial processes
02/07/2013US20130032829 Deposition source assembly, organic layer deposition apparatus, and method of manufacturing organic light-emitting display apparatus by using the organic layer deposition apparatus
02/07/2013US20130032574 Capacitive-coupled plasma processing apparatus and method for processing substrate
02/07/2013US20130032092 Apparatus for coating substrates using the eb/pvd method
02/07/2013US20130032091 Cleaning method of film forming device and semiconductor manufacturing apparatus
02/07/2013US20130031794 RAZOR BLADES WITH ALUMINUM MAGNESIUM BORIDE (AlMgB14)-BASED COATINGS
02/07/2013DE102011052325A1 Reinigungsmodul und Reinigungsverfahren für Substrate und/oder Substratträger Cleaning module and cleaning process for substrates and / or substrate carrier
02/06/2013EP2553144A1 Gas injection device with uniform gas velocity
02/06/2013EP2553143A1 Modular gas injection device
02/06/2013EP2553142A1 Surface treatment apparatus
02/06/2013EP2553141A2 Metal nitride containing film deposition using combination of amino-metal and halogenated metal precursors
02/06/2013EP2553140A1 Process and apparatus for deposition of multicomponent semiconductor layers
02/06/2013EP2553139A1 Method of processing multilayer film
02/06/2013EP2552828A2 Method for the supply of fluorine
02/06/2013CN202717846U Special tool for installing wafer bracket
02/06/2013CN202717845U Plate type PECVD (plasma enhanced chemical vapor deposition) coated carrier plate
02/06/2013CN102918932A Microwave introduction mechanism, microwave plasma source and microwave plasma treatment device
02/06/2013CN102918180A Tightly fitted ceramic insulator on large area electrode
02/06/2013CN102918179A Apparatus and method for supplying electric power to a CVD - reactor
02/06/2013CN102918178A Apparatus for forming metal oxide film, method for forming metal oxide film and metal oxide film
02/06/2013CN102918177A Method for manufacturing a coated member
02/06/2013CN102916093A Method for depositing high insulating property SiO2 film with low-damage PECVD (Plasma Enhanced Chemical Vapor Deposition)
02/06/2013CN102916060A Silicon-based thin-film solar cell and preparation method thereof
02/06/2013CN102915925A Method for depositing an amorphous carbon film with improved density and step coverage
02/06/2013CN102915910A Method of manufacturing semiconductor device and substrate processing apparatus
02/06/2013CN102912321A Gas distribution device of coating apparatus
02/06/2013CN102912320A Deposition apparatus and deposition method
02/06/2013CN102912319A Liquid material vaporizer
02/06/2013CN102912318A Method of reducing contaminant particles in reaction chamber and chemical vapor deposition apparatus
02/06/2013CN102912317A Method for manufacturing shape-controlled nanometer zinc and antimony alloy material
02/06/2013CN102912316A Deposition source assembly and organic layer deposition apparatus
02/06/2013CN102912315A Method for growing InN-base film material
02/06/2013CN102912314A Amorphous Ge/Te deposition process
02/06/2013CN102912313A Apparatus and method for controlling plasma potential
02/06/2013CN102352510B Method for preparing high-performance silicon-doped type diamond film layer on magnesium alloy at low temperature
02/06/2013CN102260857B Crystal silicon surface coating and method for preparing same
02/06/2013CN102185217B Connecting member and method for radio-frequency power supply in silicon-based film battery deposition clamp
02/06/2013CN101713066B Method for depositing film and film deposition apparatus
02/06/2013CN101548364B Top panel and plasma processing apparatus
02/06/2013CN101425551B Antireflective coatings for photovoltaic applications
02/06/2013CN101367756B Tellurium (Te) precursor for manufacturing phase-change memory material
02/05/2013US8367983 Apparatus including heating source reflective filter for pyrometry
02/05/2013US8367866 Single-source precursor and methods therefor
02/05/2013US8367566 Method for manufacturing semiconductor device and method for processing substrate
02/05/2013US8367527 Method of fabricating polycrystalline silicon thin film
02/05/2013US8367250 Device for storing electric power comprising a protective barrier layer for the collector
02/05/2013US8367225 Coating, article coated with coating, and method for manufacturing article
02/05/2013US8367207 Method of producing a hydrogenated amorphous carbon coating
02/05/2013US8367166 Synthesis of higher diamondoids
02/05/2013US8366892 Graphite electrode
02/05/2013US8366871 Method and apparatus for cleaning and surface conditioning objects using plasma
02/05/2013US8366869 Processing apparatus and processing method
02/05/2013US8366868 Substrate processing apparatus
02/05/2013US8366833 Plasma processing apparatus and plasma processing method
02/05/2013US8366832 Driving shaft of effusion cell for deposition system and deposition system having the same
02/05/2013US8366831 Evaporation source
02/05/2013US8366830 Susceptor apparatus for inverted type MOCVD reactor
02/05/2013US8366829 Multi-station decoupled reactive ion etch chamber
02/05/2013US8366828 Shower head and substrate processing apparatus
02/05/2013US8366827 Chamber inserts and apparatuses for processing a substrate
02/05/2013US8366423 Method and arrangement for realizing a vacuum in a vacuum chamber
02/05/2013US8366225 Image recording apparatus, its control method and storage medium recording its control program
01/2013
01/31/2013WO2013016532A1 Systems for and methods of controlling time-multiplexed deep reactive-ion etching processes
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