| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 02/28/2013 | WO2013028970A1 Ionic liquid release coat for use in metal flake manufacture |
| 02/28/2013 | WO2013027682A1 Method for forming ge-sb-te film, method for forming ge-te film, method for forming sb-te film, and program |
| 02/28/2013 | WO2013027549A1 Semiconductor device manufacturing method, substrate processing method, substrate processing apparatus, and recording medium |
| 02/28/2013 | WO2013027470A1 Plasma processor, microwave introduction device, and plasma processing method |
| 02/28/2013 | WO2013027102A1 Deposition system having acces gates and related method |
| 02/28/2013 | WO2013027098A1 Deposition systems including a precursor gas furnace within a reaction chamber, and related methods |
| 02/28/2013 | WO2013027096A1 Direct liquid injection for halide vapor phase epitaxy systems and methods |
| 02/28/2013 | WO2013026493A1 Corner cut mask |
| 02/28/2013 | WO2013026492A1 Protection of edge exclusion mask shielding |
| 02/28/2013 | WO2012148880A3 A method for the preparation of doped single graphene sheets |
| 02/28/2013 | US20130053938 Surface protective and release matrices |
| 02/28/2013 | US20130053760 Device and method for generating an electrical discharge in hollow bodies |
| 02/28/2013 | US20130052830 Plasma reactor having dual inductively coupled plasma source |
| 02/28/2013 | US20130052806 Deposition systems having access gates at desirable locations, and related methods |
| 02/28/2013 | US20130052804 Multi-gas centrally cooled showerhead design |
| 02/28/2013 | US20130052477 CUTTING TOOLS WITH Al-Cr-B-N/Ti-Al-N MULTILAYER COATINGS |
| 02/28/2013 | US20130052455 Cutting insert with a titanium oxycarbonitride coating and method for making the same |
| 02/28/2013 | US20130052371 Movable liner assembly for a deposition zone in a cvd reactor |
| 02/28/2013 | US20130052369 Plasma reactor |
| 02/28/2013 | US20130052368 Methods for preparing thin films by atomic layer deposition using hydrazines |
| 02/28/2013 | US20130052349 Organometallic compounds |
| 02/28/2013 | US20130052348 Atomic layer deposition apparatus |
| 02/28/2013 | US20130052347 Dynamic fluid valve and method for establishing the same |
| 02/28/2013 | US20130052346 Cvd reactor with gas flow virtual walls |
| 02/28/2013 | US20130052333 Deposition systems having reaction chambers configured for in-situ metrology and related methods |
| 02/28/2013 | US20130052332 Methods, apparatus, and systems for controlling an initial line width of radiation curable gel ink |
| 02/28/2013 | US20130052119 Method for producing transparent conductive carbon film, and transparent conductive carbon film |
| 02/28/2013 | US20130048289 Sealing system, method of manufacture thereof and articles comprising the same |
| 02/28/2013 | US20130048216 Capacitive cvd reactor and methods for plasma cvd process |
| 02/28/2013 | US20130047924 Substrate processing apparatus and film deposition apparatus |
| 02/28/2013 | US20130047923 Film deposition apparatus, substrate processing apparatus, and plasma generating device |
| 02/28/2013 | US20130047922 Thermal bridge for chemical vapor deposition reactors |
| 02/28/2013 | US20130047921 Source and arrangement for processing a substrate |
| 02/28/2013 | DE112011101625T5 Epitaktische Siliciumcarbid-Wafer und Herstellungsverfahren für diese, Siliciumcarbid-Massensubstrat für epitaktisches Wachstum und Herstellungsverfahren für dieses, und Wärmebehandlungsvorrichtung Epitaxial silicon wafer and manufacturing method for these, silicon carbide-ground substrate for epitaxial growth and production method for this, and the heat treatment apparatus |
| 02/28/2013 | DE102012016485A1 Schneideinsatz mit einer Titanoxycarbonitrid-Beschichtung und Verfahren zur Herstellung desselben The cutting insert of the same with a titanium oxycarbonitride coating and methods for making |
| 02/28/2013 | DE102011111629A1 Verfahren zur Herstellung periodischer kristalliner Silizium-Nanostrukturen A process for preparing crystalline silicon-periodic nanostructures |
| 02/28/2013 | CA2783953A1 A cutting insert with a titanium oxycarbonitride coating and method for making the same |
| 02/27/2013 | EP2562798A1 Process for producing silicon oxide films from organoaminosilane precursors |
| 02/27/2013 | EP2562797A1 Process for producing silicon oxide films from organoaminosilane precursors |
| 02/27/2013 | EP2562291A1 Wafer carrier with varying thermal resistance |
| 02/27/2013 | EP2562290A2 Wafer carrier with varying thermal resistance |
| 02/27/2013 | EP2562289A1 Method for forming DLC film on spline shaft and hot cathode PIG plasma CVD device |
| 02/27/2013 | EP2561116A1 Coating method and apparatus |
| 02/27/2013 | EP2561115A1 Ruthenium-containing precursors for cvd and ald |
| 02/27/2013 | CN202758844U Gas conveying system |
| 02/27/2013 | CN202755057U Plasma vacuum film coating chamber |
| 02/27/2013 | CN102947484A Device and method for simultaneously precipitating a plurality of semiconductor layers in a plurality of process chambers |
| 02/27/2013 | CN102947483A Heat treatment method having a heating step, a treatment step, and a cooling step |
| 02/27/2013 | CN102947482A Ruthenium-containing precursors for CVD and ALD |
| 02/27/2013 | CN102945903A Semiconductor device and method of fabricating the same |
| 02/27/2013 | CN102945803A Method for preparing nitrogen-free medium anti-reflection layer film |
| 02/27/2013 | CN102943252A High-power heater for metal-organic chemistry vapor deposition equipment |
| 02/27/2013 | CN102943251A Device for enhancing uniformity of PECVD (plasma enhanced chemical vapour deposition) coating film |
| 02/27/2013 | CN102943250A Independent control five-temperature zone ZnSe synthetic sedimentation furnace |
| 02/27/2013 | CN102943249A Cavity-type nitrogen-indium-gallium p-InxGal-xN thin film and preparation thereof |
| 02/27/2013 | CN102943248A Electronic Indium Gallium Nitride n-InxGal-xN thin film and preparation thereof |
| 02/27/2013 | CN102943247A Preparation method of inorganic proton conducting film |
| 02/27/2013 | CN102942178A Compound base of precious metal nanometer array and single layer graphene and preparation method thereof |
| 02/27/2013 | CN101982562B Method of forming dielectric films, new precursors and their use in the semi-conductor manufacturing |
| 02/27/2013 | CN101924015B Gas input device and semiconductor processing device |
| 02/27/2013 | CN101848917B Metal compound, chemical vapor deposition material containing the same, and method for producing metal-containing thin film |
| 02/27/2013 | CN101373731B Electrostatic chuck apparatus and temperature control method thereof |
| 02/26/2013 | US8383214 Diffusion barrier coatings having graded compositions and devices incorporating the same |
| 02/26/2013 | US8383210 Method of forming a film by deposition from a plasma |
| 02/26/2013 | US8383208 Method of fabricating organic light emitting device |
| 02/26/2013 | US8383200 High hardness nanocomposite coatings on cemented carbide |
| 02/26/2013 | US8383189 Selectable gloss coating system |
| 02/26/2013 | US8382942 Method and apparatus for reducing substrate backside deposition during processing |
| 02/26/2013 | US8382940 Device and method for producing chlorine trifluoride and system for etching semiconductor substrates using this device |
| 02/26/2013 | US8382939 Plasma processing chamber with enhanced gas delivery |
| 02/26/2013 | US8382904 Gas feed installation for machines depositing a barrier layer on containers |
| 02/26/2013 | US8382903 Vaporizer and semiconductor processing system |
| 02/26/2013 | US8382902 Single disc vapor lubrication |
| 02/26/2013 | US8382901 System and method for depositing a material on a substrate |
| 02/26/2013 | US8382900 Localized linear microwave source array pumping to control localized partial pressure in flat and 3 dimensional PECVD coatings |
| 02/26/2013 | US8381678 Wide area atmosphere pressure plasma jet apparatus |
| 02/26/2013 | US8381677 Prevention of film deposition on PECVD process chamber wall |
| 02/21/2013 | WO2013024315A1 Reaction chamber for deposition of a semiconductor layer on the plurality substrates in batches |
| 02/21/2013 | WO2013024314A1 Gas distribution system for a reaction chamber |
| 02/21/2013 | WO2013024313A1 Electrode structure for use in a reaction chamber |
| 02/21/2013 | WO2013024295A1 Tantalum oxide coatings |
| 02/21/2013 | WO2013024235A1 Plasma processing apparatus |
| 02/21/2013 | WO2013024226A1 Antireflection glazing unit equipped with a porous coating |
| 02/21/2013 | WO2013023270A1 Piston ring |
| 02/21/2013 | US20130046375 Plasma modified medical devices and methods |
| 02/21/2013 | US20130045592 Method for manufacturing silicon carbide semiconductor device and device for manufacturing silicon carbide semiconductor device |
| 02/21/2013 | US20130045563 Method and device for producing a semiconductor layer |
| 02/21/2013 | US20130045360 Surface modification of implant devices |
| 02/21/2013 | US20130045339 Techniques for diamond nucleation control for thin film processing |
| 02/21/2013 | US20130045338 Manufacturing of diffractive pigments by fluidized bed chemical vapor deposition |
| 02/21/2013 | US20130045334 Hardface coating systems and methods for metal alloys and other materials for wear and corrosion resistant applications |
| 02/21/2013 | US20130045331 Lateral flow atomic layer deposition apparatus and atomic layer deposition method using the same |
| 02/21/2013 | US20130043212 Continuous patterned layer deposition |
| 02/21/2013 | US20130042845 Sliding element, in particular piston ring, and combination of a sliding element with a mating running element |
| 02/21/2013 | US20130042813 Film deposition apparatus |
| 02/21/2013 | US20130042812 Composite shielding |
| 02/21/2013 | US20130042811 Combinatorial Plasma Enhanced Deposition Techniques |
| 02/21/2013 | US20130042810 Method and System for Mask Handling in High Productivity Chamber |
| 02/21/2013 | US20130042808 Film crack detection apparatus and film forming apparatus |
| 02/21/2013 | US20130042803 Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device |