Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
03/2013
03/12/2013US8394229 Susceptor ring
03/12/2013US8394201 Atomic layer deposition apparatus
03/12/2013US8394200 Vertical plasma processing apparatus for semiconductor process
03/12/2013US8394199 Processing device
03/12/2013CA2673326C Method of making scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s)
03/07/2013WO2013033497A1 High content pcbn compact including w-re binder
03/07/2013WO2013033315A2 Wafer carrier with thermal features
03/07/2013WO2013033132A1 Method for the deposition of a porous coating
03/07/2013WO2013032746A1 Sheet wafer furnace with gas preservation system
03/07/2013WO2013032406A1 A system and a method for depositing a layer on a substrate
03/07/2013WO2013032168A1 Susceptor
03/07/2013WO2013031952A1 Surface-coated cutting tool
03/07/2013WO2013031915A1 Cutting tool
03/07/2013WO2013031542A1 Functional film manufacturing method and functional film
03/07/2013WO2013031458A1 Cutting tool
03/07/2013WO2013031142A1 Film forming method and storage medium
03/07/2013WO2013030959A1 Plasma film forming apparatus and plasma film forming method
03/07/2013WO2013030953A1 Antenna for plasma processing apparatus, and plasma processing apparatus using antenna
03/07/2013WO2013030576A1 Improved deposition technique for depositing a coating on a device
03/07/2013WO2013030516A1 Method of modifying surfaces
03/07/2013WO2013030451A1 Filter preunit
03/07/2013WO2013029982A1 Coating station
03/07/2013WO2013029500A1 Shower of large diameter mocvd reactor
03/07/2013WO2013029118A1 Patterning method
03/07/2013US20130060340 COATING FOR A CoCrMo SUBSTRATE
03/07/2013US20130059431 Device and method for substrate processing
03/07/2013US20130059415 Film deposition apparatus, film deposition method and storage medium
03/07/2013US20130059132 Laminate Having a One-Dimensional Composite Structure
03/07/2013US20130059093 Method of producing coated member
03/07/2013US20130059092 Method and apparatus for gas distribution and plasma application in a linear deposition chamber
03/07/2013US20130059091 Method for forming carbon nanotubes and carbon nanotube film forming apparatus
03/07/2013US20130059084 Chemical Vapor Deposition of Metal Layers for Improved Brazing
03/07/2013US20130059079 Nickel film forming method
03/07/2013US20130059078 Use of ruthenium tetroxide as a precursor and reactant for thin film depositions
03/07/2013US20130059077 Method of Atomic Layer Deposition Using Metal Precursors
03/07/2013US20130059073 Apparatus and Method for making atomic layer deposition on fine powders
03/07/2013US20130059071 Low contamination components for semiconductor processsing apparatus and methods for making components
03/07/2013US20130059063 Manufacturing device and manufacturing method for organic el element
03/07/2013US20130055953 Substrate support, substrate processing device and method of placing a substrate
03/07/2013DE112010004736T5 Aufnahmefür cvd und verfahren zur herstellung eines films unterverwendung derselben Aufnahmefür and CVD process for producing a film using the same
03/07/2013DE102011112897A1 Vorrichtung und Verfahren zur Beschichtung eines Substrates Apparatus and method for coating a substrate
03/07/2013DE102011053229A1 Depositing material layer on substrate surface of thin layer solar cell substrate, comprises arranging thin layer solar cell substrate on substrate holder in reaction chamber, introducing reaction gas, and performing deposition reaction
03/06/2013EP2565908A1 Vapor deposition device, vapor deposition method, and semiconductor element manufacturing method
03/06/2013EP2563948A1 Source and arrangement for processing a substrate
03/06/2013CN202766617U Substrate support structure and reaction cavity containing same
03/06/2013CN202766616U Hollow graphite supporting plate for ETP PECVD production line
03/06/2013CN202766615U Double-channel homogenizing low-pressure chemical vapor deposition system
03/06/2013CN102959739A Group III nitride semiconductor device and method for producing same
03/06/2013CN102959696A Manufacturing method for channel plate, channel plate, temperature adjustment plate, cold plate, and shower plate
03/06/2013CN102959681A Film-forming apparatus, and method for maintaining film-forming apparatus
03/06/2013CN102959125A Vacuum processing apparatus and plasma processing method
03/06/2013CN102959124A Sliding element
03/06/2013CN102958832A Graphene manufacturing apparatus and method
03/06/2013CN102958674A Surface treatment of rubber using low pressure plasma
03/06/2013CN102956522A Film crack detection apparatus and film forming apparatus
03/06/2013CN102956446A Metal chloride gas generator, hydride vapor phase epitaxy growth apparatus, and nitride semiconductor template
03/06/2013CN102953052A Film deposition apparatus, substrate processing apparatus, and plasma generating device
03/06/2013CN102953051A Chamber device and substrate treating plant with same
03/06/2013CN102953050A Large-diameter sprayer of MOCVD (metal organic chemical vapor deposition) reactor
03/06/2013CN102953049A Device for chemical vapor deposition coating
03/06/2013CN102953048A Nano doping structure and preparation method thereof
03/06/2013CN102953047A Film deposition apparatus
03/06/2013CN102953046A CVD (chemical vapor deposition) reaction cavity and CVD equipment
03/06/2013CN102953045A System and technology for chemical vapor deposition coating
03/06/2013CN102953044A Method for forming dlc film on spline shaft and hot cathode pig plasma cvd device
03/06/2013CN102953043A Diamond-like carbon and manufacturing method thereof
03/06/2013CN102953042A Wafer transfer system of CVD machine and wafer transfer method
03/06/2013CN102953031A Structure with water and oil shedding characteristic and preparing method thereof
03/06/2013CN102344134B Preparation method of graphite
03/06/2013CN102330069B Preparation method of carbon nano tube
03/06/2013CN102267693B Low-temperature preparation method of carbon nanotube
03/06/2013CN102089872B Film production method
03/06/2013CN102067286B Crystal growth process for nitride semiconductor, and method for manufacturing semiconductor device
03/06/2013CN102033361B Manufacture method of liquid crystal orientation layer
03/06/2013CN101990707B Method for detecting abnormal placement state of substrate, substrate processing method, computer-readable storage medium and substrate processing apparatus
03/06/2013CN101914762B Air inlet spray head structure for metal-organic chemical vapor deposition equipment
03/06/2013CN101801988B Organometallic precursors for use in chemical phase deposition processes
03/06/2013CN101736324B Microwave plasma preparation method of superhard titanium nitride thin film
03/06/2013CN101535524B Method and system for performing plasma enhanced atomic layer deposition
03/06/2013CN101481794B Film formation method and apparatus for semiconductor process
03/06/2013CN101469006B Metal complexes of tridentate beta-ketoiminates
03/06/2013CN101082125B Apparatus for thermal and plasma enhanced vapor deposition and method of operating
03/05/2013US8392347 Coating color database creating method, search method using the database, their system, program, and recording medium
03/05/2013US8390469 External conditions audio playback system and method
03/05/2013US8389071 Apparatus and method for forming carbon protective layer
03/05/2013US8389062 Spraying system for progressive spraying of non-rectangular objects
03/05/2013US8389054 Fabrication technique for metallic devices with embedded optical elements, optical devices, or optical and electrical feedthroughs
03/05/2013US8389053 Method of cleaning powdery source supply system, storage medium, substrate processing system and substrate processing method
03/05/2013US8388756 Evaporation source and vapor deposition apparatus using the same
03/05/2013US8388755 Thermalization of gaseous precursors in CVD reactors
03/05/2013US8388754 System and method for depositing a material on a substrate
03/05/2013US8388753 Coating apparatus
03/05/2013US8388709 Coated article
03/05/2013US8387563 Combinatorial process system
03/05/2013US8387562 Plasma processor and plasma processing method
03/05/2013US8387561 Method and apparatus for cathodic arc ion plasma deposition
03/05/2013US8387560 Plasma processing unit
03/05/2013US8387559 Semiconductor manufacturing plant
03/05/2013US8387557 Method for forming silicon-containing materials during a photoexcitation deposition process
03/05/2013US8387467 Method for testing the coating of a vane base
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